公开(公告)号：US20040202954A1

公开(公告)日：2004-10-14

申请号：US10802808

申请日：2004-03-18

Applicant: FUJI PHOTO FILM CO., LTD.

Inventor： Makoto Momota ,  Hajime Nakao

IPC: G03C001/52

CPC classification number: G03F7/0397 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111

Abstract: A positive resist composition comprising (A) a resin capable of increasing its solubility in an alkali developer under action of an acid, wherein the resin contains a repeating unit originated in an acrylic acid ester derivative in an amount of 50 to 100 mol % based on all repeating units and has a repeating unit having a specific lactone structure and a repeating unit having a monohydroxyadamantane or dihydroxyadamantane structure, (B) a compound of generating an acid upon irradiation with actinic rays or radiation, and (C) an organic solvent, and a pattern formation method using the composition.

Abstract translation: 一种正型抗蚀剂组合物，其包含（A）能够在酸的作用下增加其在碱性显影剂中的溶解度的树脂，其中所述树脂含有源自丙烯酸酯衍生物的重复单元，其量为50至100摩尔％，基于 所有重复单元，具有特定内酯结构的重复单元和具有单羟基金刚烷或二羟基金刚烷结构的重复单元，（B）在用光化射线或辐射照射时产生酸的化合物，和（C）有机溶剂，以及 使用该组合物的图案形成方法。

公开(公告)号：US20030054282A1

公开(公告)日：2003-03-20

申请号：US10244247

申请日：2002-09-16

Inventor： Howard A. Fromson ,  William J. Rozell

IPC: G03C001/52 ,  G03F007/004

CPC classification number: G03F7/2022 ,  G03F7/20 ,  G03F7/2012 ,  G03F7/2014 ,  G03F7/203 ,  G03F7/2055

Abstract: A negative-working lithographic printing plate has a coating which is imaged by heating an area of the coating with an infrared laser and actinically reacting the coating in the heated area with ultraviolet or visible radiation. The coating contains an infrared absorber but the coating is not imageable by infrared radiation or by the heat generated. The imaging time is reduced since the actinic reaction rate is increased at the elevated temperature.

Abstract translation: 负性平版印刷版具有通过用红外激光加热涂层的区域并使加热区域中的涂层与紫外或可见光辐射使其成像的涂层。 该涂层含有红外线吸收剂，但涂层不能通过红外辐射或所产生的热量进行成像。 降低成像时间，因为在升高的温度下光化反应速率增加。

公开(公告)号：US20030129525A1

公开(公告)日：2003-07-10

申请号：US10174268

申请日：2002-06-18

Applicant: AGFA-GEVAERT

Inventor： Johan Lamotte

IPC: G03C001/52

CPC classification number: H01B1/127 ,  C08G61/126 ,  H05K3/02

Abstract: A material for making an electroconductive pattern, the material comprising a support and a light-exposure differentiable element, characterized in that the light-exposure differentiable element comprises a conductivity enhanced outermost layer containing a polyanion and a polymer or copolymer of a substituted or unsubstituted thiophene, and optionally a second layer contiguous with the outermost layer; and wherein the outermost layer and/or the optional second layer contains a monodiazonium salt capable upon exposure of reducing the conductivity of the exposed parts of the outermost layer relative to the unexposed parts of the outermost layer and a method of making an electroconductive pattern.

Abstract translation: 一种用于制造导电图案的材料，所述材料包括支撑体和曝光可微分元件，其特征在于，所述曝光可微分元件包括导电性增强的最外层，其含有聚阴离子和取代或未取代的噻吩的聚合物或共聚物 ，以及可选地与最外层邻接的第二层; 并且其中最外层和/或任选的第二层含有能够暴露于相对于最外层的未曝光部分的最外层的暴露部分的导电性降低的单重氮盐和制造导电图案的方法。

公开(公告)号：US20030022093A1

公开(公告)日：2003-01-30

申请号：US10203359

申请日：2002-08-08

Inventor： Shuichi Takahashi

IPC: G03C005/18 ,  G03C001/52 ,  G03F007/23

CPC classification number: G03F7/0233 ,  G03F7/091

Abstract: A radiation sensitive resin composition for i-line light exposure comprising an alkaline soluble resin and a quinonediazide group-containing photosensitizer where said alkaline soluble resin comprises a novolak resin and a mixture of one or two or more of resins selected from the group of (i) polyacrylate, (ii) polymethacrylate, (iii) a polystyrene derivative and (iv) a copolymer consisting of two or more of monomer units selected from the group of acrylic ester, methacrylic ester and styrene derivatives is applied on a substrate such as a substrate for a flat panel display and exposed preferably at the light-exposure quantity of 50 to 500 mJ/cm2 by an i-line light exposure source to form a pattern with high-resolution and a good pattern shape having no tailing.

Abstract translation: 一种用于i线曝光的辐射敏感性树脂组合物，其包含碱溶性树脂和含醌二叠氮化物基团的光敏剂，其中所述碱溶性树脂包含酚醛清漆树脂和选自以下的一种或两种或更多种树脂的混合物： ）聚丙烯酸酯，（ii）聚甲基丙烯酸酯，（iii）聚苯乙烯衍生物和（iv）由两种或更多种选自丙烯酸酯，甲基丙烯酸酯和苯乙烯衍生物的单体单元组成的共聚物施加在基材如基材 对于平板显示器，通过i线曝光源优选以50〜500mJ / cm 2的曝光量曝光，形成具有高分辨率和没有拖尾的良好图案形状的图案。

公开(公告)号：US20020146651A1

公开(公告)日：2002-10-10

申请号：US09911727

申请日：2001-07-25

Inventor： Osamu Uchida ,  Yasuhiro Ishiwata ,  Takayuki Ito ,  Nobutaka Fukagawa

IPC: G03C001/52 ,  G03C001/42 ,  G03C001/73 ,  G03C007/388 ,  G03C007/407 ,  C07C013/00 ,  C07C241/00

CPC classification number: C07D271/07 ,  C09B29/0066 ,  C09B29/26 ,  C09B29/28 ,  C09B29/325 ,  C09B29/36 ,  G03C1/42 ,  G03C7/413

Abstract: A color-developing agent of the formula (1-1): 1 wherein X represents a hydrogen atom or a substituent, and Z represents a carbamoyl, acyl, alkoxycarbonyl, or aryloxycarbonyl group. An azo dye of the formula (2-1): 2 wherein R1 represents a hydrogen atom or a substituent, and A represents a group of atoms necessary to form the azo dye by the compound of formula (2-1). A silver halide photographic light-sensitive material containing any of the color-developing agent and the azo dye in at least one photographic constitutional layer.

Abstract translation: 式（1-1）的显色剂：其中X表示氢原子或取代基，Z表示氨基甲酰基，酰基，烷氧基羰基或芳氧基羰基。 式（2-1）的偶氮染料：其中R1表示氢原子或取代基，A表示通过式（2-1）的化合物形成偶氮染料所需的原子团。 在至少一个照相结构层中含有任何显色剂和偶氮染料的卤化银照相感光材料。

公开(公告)号：US20040259019A1

公开(公告)日：2004-12-23

申请号：US10765843

申请日：2004-01-29

Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED

Inventor： Isao Yahagi

IPC: G03C001/52

CPC classification number: G03F7/40 ,  G03F7/0045 ,  G03F7/0226

Abstract: A positive photosensitive composition comprising a quinonediazide compound, a novolak resin, a compound reacting with the novolak resin by the action of an acid, and a compound generating an acid by heating.

Abstract translation: 包含醌二叠氮化合物，酚醛清漆树脂，通过酸作用与酚醛清漆树脂反应的化合物的正型光敏组合物和通过加热产生酸的化合物。

公开(公告)号：US20040224512A1

公开(公告)日：2004-11-11

申请号：US10788216

申请日：2004-02-27

Inventor： Yasuhiko Sato ,  Seiji Nakagawa ,  Jun Idebuchi ,  Motoya Kishida ,  Shuichi Taniguchi ,  Tsuyoshi Shibata

IPC: G03C001/52 ,  H01L021/302 ,  H01L021/461

CPC classification number: H01L21/31144 ,  G03F7/09 ,  H01L21/0332

Abstract: A method of manufacturing a semiconductor device comprises preparing a working film to be processed, forming an adhesion improving region on the working film for increasing an adhesion between the working film and a mask material containing carbon, forming the mask material on the working film, forming a resist pattern on the mask material, the mask material having a higher etching resistance for the working film than the resist pattern, transferring the pattern of the resist pattern onto the mask material, and etching the working film by using the mask material as a mask.

Abstract translation: 一种制造半导体器件的方法包括：制备待加工的工作薄膜，在工作薄膜上形成粘合改善区域，以增加工作薄膜和含有碳的掩模材料之间的粘附力，在工作薄膜上形成掩模材料，形成 在掩模材料上的抗蚀剂图案，掩模材料对抗蚀剂图案具有比工作膜更高的耐蚀刻性，将抗蚀剂图案的图案转印到掩模材料上，并且通过使用掩模材料作为掩模来蚀刻工作膜 。

公开(公告)号：US20040013965A1

公开(公告)日：2004-01-22

申请号：US10388488

申请日：2003-03-17

Inventor： Livia T. Memetea ,  Jonathan W. Goodin ,  Nicholas Bradford ,  Juana G. Jaramillo ,  Cheng Yang

IPC: G03C001/52

CPC classification number: B41M5/368 ,  B41C1/1008 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/24 ,  B41C2210/262 ,  B41N1/14

Abstract: A positive photosensitive composition for use with a radiation source comprises one or more polymers capable of being dissolved in an alkaline aqueous solution and a compound which, upon being heated, releases gas. The composition is stable in its state before exposure and has an excellent handling property. The sensitivity of a recording layer based on the composition of this invention is increased without compromising the handling characteristics. In addition radiation sensitive-elements based on the composition of the invention have good development latitude.

Abstract translation: 与辐射源一起使用的正性感光性组合物包含能够溶解在碱性水溶液中的一种或多种聚合物和被加热时释放气体的化合物。 组合物在曝光前状态稳定，处理性能优异。 基于本发明的组合物的记录层的灵敏度增加，而不损害处理特性。 此外，基于本发明的组合的辐射敏感元件具有良好的开发自由度。

公开(公告)号：US20020187417A1

公开(公告)日：2002-12-12

申请号：US10095711

申请日：2002-03-13

Applicant: FUJI PHOTO FILM CO., LTD.

Inventor： Kazumori Minami ,  Masanobu Takashima

IPC: G03C001/52

CPC classification number: G03C1/52 ,  B41M5/323 ,  B41M5/3335

Abstract: Disclosed is a heat-sensitive recording material containing an ultraviolet light absorber precursor which forms an ultraviolet light absorber by being irradiated with light, and a hydrogen donor.

Abstract translation: 公开了含有通过照射光而形成紫外光吸收剂的紫外光吸收剂前体和氢供体的热敏记录材料。

公开(公告)号：US20030215734A1

公开(公告)日：2003-11-20

申请号：US10356017

申请日：2003-01-31

Applicant: Gun Ei Chemical Industry Co., Ltd.

Inventor： Takeshi Tsuihiji ,  Michiyasu Yamazaki

IPC: C08G002/00 ,  C08J003/28 ,  G03C001/52 ,  C08F002/46 ,  G03C008/00

CPC classification number: G03F7/023 ,  C07C215/74 ,  C07C217/80 ,  C07C229/52 ,  C08G73/10 ,  G03F7/033 ,  G03F7/0388

Abstract: An object of the present invention is to provide a material which resolves the drawbacks associated with polyimide polymers, and yet retains the advantages offered by conventional polyimide polymers. An amino group containing phenol derivative of the present invention is represented by a general formula (1) show below, and the present invention also provides a polyimide precursor produced using such an amino group containing phenol derivative. 1 (wherein, R1, R2 and R3, which may be the same or different, each represent an alkyl group of 1 to 9 carbon atoms, an alkoxy group of 1 to 10 carbon atoms, a COOR group (in which R represents an alkyl group of 1 to 6 carbon atoms) or a hydrogen atom; R4 and R5, which may be the same or different, each represent an alkyl group of 1 to 9 carbon atoms or a hydrogen atom; X represents nullOnull, nullSnull, nullSO2null, nullC(CH3)2null, nullCH2null, nullC(CH3)(C2H5)null, or nullC(CF3)2null; and n represents an integer of 1 or greater).

Abstract translation: 本发明的目的是提供一种解决与聚酰亚胺聚合物有关的缺点的材料，并且仍然保留了常规聚酰亚胺聚合物所提供的优点。 本发明的含氨基的苯酚衍生物由下述通式（1）表示，本发明还提供使用含氨基的苯酚衍生物制造的聚酰亚胺前体。 （其中R 1，R 2和R 3可以相同或不同，分别表示1〜9个碳原子的烷基，1〜10个碳原子的烷氧基，COOR 基团（其中R表示1〜6个碳原子的烷基）或氢原子; R 4和R 5可以相同或不同，分别表示1〜9个碳原子的烷基 或者是氢原子; X表示-O - ， - S-，-SO 2 - ， - C（CH 3）2 - ， - CH 2 - ， - C（CH 3）（C 2 H 5） - 或-C（CF 3） n表示1以上的整数）。