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    Charged-particle beam exposure device incorporating beam splitting
    4.
    发明授权
    Charged-particle beam exposure device incorporating beam splitting 失效
    并入光束分离的带电粒子束曝光装置

    公开(公告)号：US4568833A

    公开(公告)日：1986-02-04

    申请号：US740308

    申请日：1985-06-03

    申请人： Bernardus J. G. M. Roelofs

    发明人： Bernardus J. G. M. Roelofs

    IPC分类号： H01J37/22 ,  H01J37/30 ,  H01J37/317 ,  H01L21/027 ,  H01J3/16 ,  H01J29/60 ,  H01J37/302

    CPC分类号： H01J37/317 ,  H01J37/3007

    摘要： For forming an array or series of elementary beams of charged particles, a beam exposure device includes a mirror system having a matrix of sub-mirrors. Using such a composite mirror, a multiple beam image is formed in a location which deviates from the position of the cross-over of principal rays of the elementary beams. Consequently, the elementary beams, which may alternatively be ion beams, can be separated modulated and controlled. For suitable imaging, such as the writing of patterns for a micro-electronic circuit element, the images and the cross-over of the principal rays of the elementary beams are combined. For this purpose, use is made of a second mirror whose sub-mirrors have an optical effect which opposes that of the first mirror.

    摘要翻译： 为了形成带电粒子的阵列或一系列基本束，束曝光装置包括具有子反射镜矩阵的反射镜系统。 使用这种复合反射镜，在偏离基本光束的主光线的交叉位置的位置处形成多光束图像。 因此，可以分离调制和控制基本光束，其也可以是离子束。 对于合适的成像，例如写入微电子电路元件的图案，组合基本光束的图像和主光线的交叉。 为此，使用第二反射镜，其副反射镜具有与第一反射镜相反的光学效果。

    Multiple electron mirror apparatus
    5.
    发明授权
    Multiple electron mirror apparatus 失效
    多电子反射镜设备

    公开(公告)号：US3864596A

    公开(公告)日：1975-02-04

    申请号：US27277872

    申请日：1972-07-18

    申请人： MINNESOTA MINING & MFG

    发明人： MAFFITT KENT N

    IPC分类号： G11C11/23 ,  H01J29/60 ,  H01J31/58 ,  H01J29/52

    CPC分类号： H01J31/58 ,  G11C11/23 ,  H01J29/60

    摘要： An electron beam system using an electron beam source, a magnetic prism and a plurality of electron mirrors with associated electron beam focusing or cross-section control lenses and beam deflection units permits an electron beam from the electron beam source to be modified or acted upon as required by the electron mirrors as the electron beam is sequentially presented to the electron mirrors. An electron beam is directed to the first electron mirror where it is reflected and directed to the next electron mirror, etc. The electron beam is acted upon at an electron mirror in accordance with the voltage bias applied to the electron mirror. The voltage bias may be set to passively mirror the entire beam or a portion thereof, modulate the beam in accordance with the surface condition of the mirror or permit the beam to impinge on the mirror surface. The electron beam focusing or cross-section control lenses and deflection units provide for selective direction of the beam and control of the cross-section to determine the portion and size of such portion of an electron mirror surface which will influence or be influenced by the electron beam.

    摘要翻译： 使用电子束源，磁性棱镜和具有相关联的电子束聚焦或横截面控制透镜和光束偏转单元的多个电子反射镜的电子束系统允许来自电子束源的电子束被修改或作用为 当电子束被顺序地呈现给电子反射镜时，电子反射镜需要这种光束。 电子束被引导到第一电子反射镜，在其中它被反射并被引导到下一个电子反射镜等。根据施加到电子反射镜的电压偏置，电子束被作用在电子反射镜上。 电压偏压可以被设置为被动地镜像整个光束或其一部分，根据反射镜的表面状态来调制光束，或允许光束撞击在镜面上。 电子束聚焦或横截面控制透镜和偏转单元提供光束的选择性方向并且控制横截面以确定将影响或受电子影响的电子反射镜表面的这部分的部分和尺寸 光束。

    Cathode-ray tube
    8.
    发明授权
    Cathode-ray tube 失效
    阴极射线管

    公开(公告)号：US4808890A

    公开(公告)日：1989-02-28

    申请号：US895915

    申请日：1986-08-13

    申请人： Eiichi Yamazaki

    发明人： Eiichi Yamazaki

    IPC分类号： H01J29/02 ,  H01J29/60 ,  H01J31/10 ,  H01J29/70 ,  H01J29/76

    CPC分类号： H01J29/60

    摘要： A cathode-ray tube having an electron gun for emitting an electron beam and a reflecting electrode for forming in front thereof a substantially planar reflecting potential surface which reflects the electron beam from the electron gun toward an anode target formed on the inner surface of the tube.

    摘要翻译： 一种具有用于发射电子束的电子枪的阴极射线管和用于在其前面形成基本上平面的反射电位表面的反射电极，该反射电位反映来自电子枪的电子束朝向形成在管的内表面上的阳极靶 。