摘要:
A solid state imaging pickup device with a single-layer electrode structure which eliminates the release area at the terminal part of the charge transfer electrodes by surrounding the charge transfer electrodes with a dummy pattern, or with a pattern formed by connecting the charge transfer electrodes of a certain phase with each other at the outermost periphery. Surrounding the charge transfer electrode improves embedding performance when an insulating film is re-flowed for flattening inter-electrode gaps. This enables formation of a good metal wire or shielding film with no step-cut, thus improving the reliability of a solid state imaging pickup device.
摘要:
A charge transfer device has a charge transfer region under charge transfer electrodes for stepwise conveying charge packets through potential wells to a floating diffusion region, and the charge transfer region has a boundary sub-region contracting toward the floating diffusion region, wherein the final potential well is created at a certain portion in said boundary sub-region close to the floating diffusion region so that each charge packet travels over a short distance, thereby enhancing a charge transfer efficiency.
摘要:
A charge transfer structure includes an insulating film on a first semiconductor region, a plurality of transfer electrodes and a signal generating circuit. The plurality of transfer electrodes are formed on the insulating film, and each of the plurality of transfer electrodes is composed of a barrier electrode and an accumulation electrode. The signal generating circuit generates first to 2N-th (N is a positive integer more than 1) pulse signals which are supplied to every 2N transfer electrodes of the plurality of transfer electrodes in an interline mode. As a result, a signal charge can be transferred for the 2N transfer electrodes at maximum during one cycle of the first to 2N-th pulse signals.
摘要:
In a charge transfer device, a floating gate is provided in an insulating film which is provided on a charge transfer channel layer. A buffer amplifier is connected with the floating gate, and detects signal charges in the charge transfer channel layer to generate a signal indicative of an output voltage corresponding to the signal charges. A bias gate is provided in the insulating film apart from the floating gate to cover at least a part of the floating gate. A bias applying unit applies a bias voltage to the bias gate in response to the output voltage signal such that an alternate current (AC) component of a voltage of the floating gate is substantially equal to an AC component of a voltage of the bias gate.
摘要:
A solid image pickup device that can be operated at high speed and can suppress the dark current with high sensitivity, and a process for producing the same are provided. The solid image pickup device comprises a shunt wiring layers 7a and 7d of the transfer electrodes are formed with an accumulated film of a high melting point metal 13 and a nitride or an oxide of a high melting point metal 14. The solid image pickup device is produced by the process comprising a step of forming, on transfer electrodes 3a and 4b, shunt wiring layers 7a and 7d comprising an accumulated film comprising a nitride layer or an oxide layer of a high melting point metal 14 having a high melting point metal layer 13 formed thereon, and a step of conducting, after forming a dielectric film 36 to have a concave part on a sensor 2, a heat treatment at a temperature of from 800 to 900° C.
摘要:
A two-phase, single-ply-electrode type charge-coupled device is provided that has a pair of a potential barrier region and a charge storage region underlying one charge transfer electrode. The charge storage region is formed in such a manner that the potential of the charge storage region becomes gradually deep in charge transfer direction. This structure enables smooth charge transfer.
摘要:
A charge-coupled device has a first P-type well layer which forms a charge transfer section and a second P-type well layer which forms a floating diffusion layer section and within which the first P-type well layer is formed. The second P-type well layer below the floating diffusion layer section has an impurity concentration lower than that of the first P-type well layer whereby a depletion layer formed therein by a PN-junction flares in the direction to the second P-type well layer. With this arrangement, it is made possible to reduce the floating diffusion capacitance and to maintain a large output voltage with respect to a signal electron charge.
摘要:
A multiple independent bit Flash memory cell has a gate that includes a first oxide layer, a discontinuous nitride layer on the first oxide layer, a second oxide layer on the discontinuous nitride layer and the first oxide layer, and a polysilicon layer on the second oxide layer. The discontinuous nitride layer has regions residing at different portions of the layer. These portions are separated by the second oxide layer. Thus, with a smaller channel length, charge that otherwise would migrate from one region to the other and/or strongly influence its neighboring it is blocked/impeded by the second oxide layer. In this manner, the potential for charge sharing between the regions is reduced, and a higher density chip multiple independent bit Flash memory cells may be provided.
摘要:
An integrated memory circuit of the type of an NROM memory includes recessed bit lines formed of a material having a low ohmic resistance. By recessing the bit lines with respect to the semiconductor substrate surface of a peripheral controlling circuit for an array of memory cells allows to form the word line lithography on a perfect or almost perfect plane so that the word line formation results in a production with higher yield and, therefore, lower costs for the individual integrated memory circuit.
摘要:
A charge coupled device including: a substrate; a semiconductor layer overlying the substrate; a semiconductor layer overlying the semiconductor layer; a charge storage layer existing on the semiconductor layer and sandwiched by a pair of isolation regions; an impurity region between the semiconductor layer and the charge storage layer; a dielectric film overlying the charge storage layer and the isolation regions, and an electrode formed by a conductive film. In accordance with the present invention, the increase of the amount of the charge storage and of the higher photosensitivity can be simultaneously satisfied. The fluctuation of the characteristics of the charge coupled device in accordance with the present invention is smaller than that of the conventional charge coupled device. Further, the method of the fabrication is less complicated than that for the conventional charge coupled device.