公开(公告)号：US11629260B2

公开(公告)日：2023-04-18

申请号：US17851353

申请日：2022-06-28

申请人： SEIKO EPSON CORPORATION

发明人： Toru Saito ,  Naoki Koike ,  Toshiyuki Yoda ,  Kyohei Tanaka

IPC分类号： C09D11/101 ,  C09D11/30 ,  B41J11/00 ,  B41M5/00 ,  C09D11/38

摘要： A radiation-curable ink jet composition includes a multifunctional monomer and a vinyl methyl oxazolidinone. The content of the multifunctional monomer is 5 to 50 mass % based on the total amount of the radiation-curable ink jet composition.

公开(公告)号：US11618832B2

公开(公告)日：2023-04-04

申请号：US16325991

申请日：2017-08-17

申请人： VIRGINIA TECH INTELLECTUAL PROPERTIES, INC.

发明人： Maruti Hegde ,  Timothy E. Long ,  Viswanath Meenakshisundaram ,  Christopher B. Williams ,  Nicholas Chartrain

IPC分类号： C08F2/46 ,  C08F2/50 ,  C08G61/04 ,  C09D11/101 ,  B33Y70/00 ,  C09D11/102 ,  B33Y10/00 ,  B29C64/135

摘要： Polymer resins for the vat photopolymerization of thermoplastics are provided, in particular for the vat photopolymerization of thermoplastics with exception thermal stability and mechanical properties. In some aspects, the polymer resins are prepared by ring opening of an aromatic dianhydride with an alcohol containing an acrylate or methacrylate to produce a photocrosslinkable diacid monomer; conversion of the photocrosslinkable diacid monomer to a photocrosslinkable diacyl chloride; and polymerization of the photocrosslinkable diacyl chloride with an aromatic diamine to produce a photocrosslinkable precursor polymer. Upon crosslinking and drying, a thermal imidization can yield aromatic polyimide polymers with high yield and with micron-scale structural resolution.

公开(公告)号：US11613661B2

公开(公告)日：2023-03-28

申请号：US16377610

申请日：2019-04-08

申请人： CANON KABUSHIKI KAISHA

发明人： Takayuki Hiratani ,  Kyohei Wada

IPC分类号： C08F2/46 ,  C08F2/50 ,  C08G61/04 ,  C09D11/102 ,  C09D11/101 ,  B29C64/291 ,  B33Y10/00 ,  B33Y70/00 ,  B29K71/00 ,  B29K33/00 ,  B29K9/00 ,  B29K63/00

摘要： A curable resin composition includes: an oxetane compound (A) having one oxetanyl group as a cationic polymerizable reactive group and at least one hydroxyl group; a cationic polymerizable compound (B) which is a cationic polymerizable compound other than the oxetane compound (A) and has two or more cationic polymerization reactive groups; a rubber particle (C); and a curing agent (D), wherein the oxetane compound (A) is contained at 30 parts by mass or more and 60 parts by mass or less, based on 100 parts by mass of total mass of the oxetane compound (A) and the cationic polymerizable compound (B), and the rubber particle (C) has a group capable of reacting with the oxetane compound (A) or the cationic polymerizable compound (B) on a surface of the rubber particle (C).

公开(公告)号：US11607838B2

公开(公告)日：2023-03-21

申请号：US16451027

申请日：2019-06-25

申请人： MIMAKI ENGINEERING CO., LTD.

发明人： Masaru Ohnishi

IPC分类号： B29C64/112 ,  B41J2/14 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y70/00 ,  B29C64/209 ,  B29C64/264 ,  C09D11/322 ,  C09D11/037 ,  C09D11/08 ,  C09D11/101 ,  C09D11/033 ,  B41M5/00 ,  B41J11/00 ,  B29K105/06 ,  B29K105/00 ,  B29K401/00

摘要： A liquid ejecting apparatus, a liquid ejecting method and an ink are provided, so as to appropriately increase the strength of ink after fixing. The liquid ejecting apparatus is configured to eject an ink by an inkjet method, and includes an inkjet head configured to eject the ink. The inkjet head has a nozzle configured to eject the ink. The ink includes a resin particle having a size capable of passing through the nozzle. The resin particle contains a fibrous substance. The fibrous substance is, for example, fibers of cellulose.

公开(公告)号：US20230083182A1

公开(公告)日：2023-03-16

申请号：US17983012

申请日：2022-11-08

申请人： SUMITOMO CHEMICAL COMPANY, LIMITED

发明人： Tomohiro FUKUURA ,  Yoshihiro HARADA ,  Yoshifumi KOMATSU ,  Masayoshi TOKUDA

IPC分类号： C09D11/52 ,  C09D11/101 ,  C09D11/03 ,  C09D11/38 ,  C09D11/107

摘要： The photosensitive composition according to the present invention is a photosensitive composition including a semiconductor particle (A), a photopolymerizable compound (C) and a photopolymerization initiator (D), in which the photosensitive composition satisfies any one or more of the following (a) to (c): (a) the photosensitive composition further includes a stabilizer (E), and a content of the stabilizer (E) is 8% by mass or more based on the total amount of the photosensitive composition; (b) the photopolymerizable compound (C) includes a (meth)acrylate compound (C1) having a molecular weight of 180 or less; and (c) the photopolymerizable compound (C) includes a compound (C2) having a vinyl ether group and a (meth)acryloyl group in the same molecule.

公开(公告)号：US11591485B2

公开(公告)日：2023-02-28

申请号：US17723966

申请日：2022-04-19

申请人： Board of Regents, The University of Texas System ,  Adaptive 3D Technologies

发明人： Gregory T. Ellson ,  Benjamin R. Lund ,  Walter Voit

IPC分类号： B29C64/124 ,  C09D11/101 ,  C09D11/102 ,  C09D11/033 ,  C08G18/38 ,  C08G18/08 ,  B33Y10/00 ,  B33Y70/00 ,  C08G18/73 ,  C08G18/76 ,  C08G18/72 ,  C08G18/75 ,  C08G18/79 ,  C08G18/20 ,  B29K75/00

摘要： A method of three-dimensional stereolithography printing a thiourethane polymer part using the vat resin. Adding a resin to a vat of a three-dimensional stereolithography printer, the resin a liquid mixture including: a first type of monomer including two or more thiol functional groups, a second type of monomer including two or more isocyanate functional groups, a photolatent base, an anionic step-growth polymerization reaction inhibitor and a light absorber. The photolatent base is decomposable upon exposure to a light to form a non-nucleophillic base catalyst having a pKa greater than 7. The anionic step-growth polymerization reaction inhibitor has an acidic group configured to form an acid-base pair with the non-nucleophillic base. The light absorber has an absorbance in the liquid mixture that is greater than an absorbance of the photolatent base at a wavelength of the light used for the exposure.

公开(公告)号：US11584811B2

公开(公告)日：2023-02-21

申请号：US17060552

申请日：2020-10-01

申请人： 3D Systems, Inc.

发明人： Mehrgan Khavari ,  Khalil Moussa ,  Scott Broce

IPC分类号： B33Y70/00 ,  C08F20/36 ,  C09D11/101

摘要： Build materials for 3D printing applications are described herein which, in some embodiments, comprise monomeric species operable for producing articles with high Tg and/or high heat deflection temperature while maintaining shelf stability. In one aspect, a polymerizable liquid comprises at least 20 weight percent isocyanurate polyacrylate; a photoinitiator component; and a crystallization inhibitor component comprising monomeric curable material, oligomeric curable material or mixtures thereof, wherein the polymerizable liquid does not exhibit crystallization over a period of 28 days at a storage temperature of 5-10° C.

公开(公告)号：US20230049921A1

公开(公告)日：2023-02-16

申请号：US17789819

申请日：2020-12-17

申请人： SHIN-ETSU CHEMICAL CO., LTD.

发明人： Takeharu TOYOSHIMA ,  Toshiyuki OZAI

IPC分类号： C08G77/20 ,  C08G77/12 ,  C08G77/08 ,  C08G77/442 ,  C09D11/101

摘要： A curable composition which comprises (A) an organopolysiloxane represented by formula (1) (wherein R1 represents an alkyl group, R2 represents an alkyl or aryl group, R3 represents a hydrogen atom or methyl group, Me represents a methyl group, m is an integer of 1-10, and a and b are integers of 1 or larger, a+b being an integer of 3-120), (B) a photopolymerization initiator, and (C) a hydrosilylation catalyst and which has a surface tension at 23° C. of 23-30 mN/m and a viscosity at 23° C. of 5-80 mPa·s.

公开(公告)号：US20230027920A1

公开(公告)日：2023-01-26

申请号：US17778787

申请日：2020-11-19

申请人： SOLVAY SPECIALTY POLYMERS USA, LLC

发明人： Joel Pollino ,  Kermit S. Kwan ,  Stéphane Jeol ,  Eduardo Soriano

IPC分类号： C08G73/10 ,  C09D11/102 ,  C09D11/101 ,  C09D179/08 ,  B33Y10/00 ,  B33Y40/10 ,  B33Y70/00 ,  B29C64/124 ,  B29C64/314

摘要： The present invention relates to polyetherimide polymers which can for example be used in lithographic processes for the photofabrication of three-dimensional (3D) articles. The invention further relates to compositions including these polyetherimide polymers. Still further, the invention relates to lithographic methods to form 3D articles or objects that incorporate the aforementioned polymer compositions.

公开(公告)号：US20230018944A1

公开(公告)日：2023-01-19

申请号：US17810384

申请日：2022-07-01

申请人： Soh NOGUCHI ,  Takashi Okada ,  Masahide Kobayashi

发明人： Soh NOGUCHI ,  Takashi Okada ,  Masahide Kobayashi

IPC分类号： C09D11/38 ,  C09D11/101 ,  C09D11/107 ,  B41M5/00 ,  B41M7/00

摘要： An active energy ray curing composition can be applied to cured matter of a first active energy ray curing composition. The active energy ray curing composition contains a second active energy ray curing composition containing a monofunctional monomer, a polyfunctional monomer, and a photopolymerization initiator. The proportion of the polyfunctional monomer to the second active energy ray composition is 60 percent by mass or more. The proportion of the polyfunctional monomer modified with the same number of an oxyalkylene group as the number of functional groups of the polyfunctional monomer is 90 percent by mass of the polyfunctional monomer, and the proportion of a tri- or higher polyfunctional monomer is 50 percent by mass or more to the modified polyfunctional monomer.