公开(公告)号：US11641724B2

公开(公告)日：2023-05-02

申请号：US17649167

申请日：2022-01-27

申请人： Apple Inc.

发明人： Jiahui Liang ,  Anirban Das ,  Jungyup Kim ,  Martin Melcher ,  Srinivasan Varadharajan ,  Wolf Oetting

IPC分类号： H05K5/06 ,  C23C14/06 ,  C23C14/14 ,  G04G17/08 ,  H05K5/00 ,  H05K5/02 ,  G09F9/30 ,  G04G17/02 ,  H05K5/03

摘要： An electronic device can include a housing component that can define an interior surface and an exterior surface of the device, a metallic film deposited on the interior surface and extending at least partially onto the exterior surface, and a ceramic film deposited on the exterior surface and at least partially over a portion of the metallic film on the exterior surface. The ceramic film can be in electrical communication with a portion of the metallic film deposited on the interior surface to form an electrical pathway from the exterior surface to the interior surface.

公开(公告)号：US11600490B2

公开(公告)日：2023-03-07

申请号：US17111867

申请日：2020-12-04

申请人： TOKYO ELECTRON LIMITED

发明人： Mitsuhiro Okada ,  Tatsuya Miyahara ,  Keisuke Fujita

IPC分类号： H01L21/00 ,  C23C14/14 ,  H01L21/02 ,  C23C14/58 ,  H01L21/3065 ,  C23C14/54

摘要： There is provided a method of forming a silicon film, which includes: a film forming step of forming the silicon film on a base, the silicon film having a film thickness thicker than a desired film thickness; and an etching step of reducing the film thickness of the silicon film by supplying an etching gas containing bromine or iodine to the silicon film.

公开(公告)号：US20230056566A1

公开(公告)日：2023-02-23

申请号：US17976420

申请日：2022-10-28

申请人： Applied Materials, Inc.

发明人： Subramanya P. HERLE ,  David Masayuki ISHIKAWA

IPC分类号： H01M4/1395 ,  C23C14/56 ,  C23C14/24 ,  C23C14/30 ,  C23C14/34 ,  H01M4/38 ,  H01M4/134 ,  H01M4/62 ,  H01M4/04 ,  C23C14/14 ,  H01M4/36

摘要： Methods for forming anode structures are provided and include transferring a flexible substrate a first deposition chamber arranged downstream from a first spool chamber, the first deposition chamber containing a first coating drum capable of guiding the flexible substrate past a first plurality of deposition units, and guiding the flexible substrate past the first plurality of deposition units while depositing a lithium metal film on the flexible substrate via the first plurality of deposition units. The method also includes transferring the flexible substrate from the first deposition chamber to a second deposition chamber, the second deposition chamber containing a second coating drum capable of guiding the flexible substrate past a second deposition unit containing a crucible capable of depositing ceramic on the lithium metal film, and guiding the flexible substrate past the crucible while depositing a ceramic protective film on the lithium metal film via the evaporation crucible.

公开(公告)号：US11577544B2

公开(公告)日：2023-02-14

申请号：US16464850

申请日：2017-12-14

申请人： Rubattel & Weyermann S.A.

发明人： Mehdy Larriere ,  Benjamin Tixier

IPC分类号： B44C1/22 ,  G04B19/12 ,  G04B37/22 ,  G04D3/00 ,  C23C14/04 ,  G04B45/00 ,  C23C14/02 ,  C23C14/14 ,  C23C14/58 ,  C23C28/02 ,  C23C28/00 ,  C03C17/34 ,  C23F1/00 ,  C03C15/00 ,  C03C17/36

摘要： A method for fabricating an external element or a timepiece dial from non-conductive material, by performing or repeating a basic cycle of making a base from a non-conductive, or ceramic, or glass. or sapphire substrate; dry coating the base with a first sacrificial protective metal layer; etching a decoration with an ultrashort pulse laser to a depth at least equal to the local thickness of the first layer; dry coating the decoration and the remaining part of the first layer with a second metal and/or coloured decorative treatment layer; chemically removing each first layer; and before or after chemical removal of each first layer, mechanically levelling on the upper level of the base the compound thus formed.

公开(公告)号：US20230032284A1

公开(公告)日：2023-02-02

申请号：US17863700

申请日：2022-07-13

申请人： VERGASON TECHNOLOGY, INC.

发明人： Joshua B. Soper ,  Gregory A. Pilgrim

IPC分类号： C23C14/14 ,  C23C14/54 ,  C23C14/58

摘要： A multi-layer PVD film stack contains high index of refraction base material(s), followed by a semi-transparent low index of refraction cap layer. The base layer(s) provide the color range of the film. The thickness of the cap layer dictates the degree to which the film retains the color properties of the base material and the reflectivity of the cap material. The cap layer not only increases the reflectivity of the base material, but it also decreases the reflectivity lost when the PVD film is topcoat lacquered. The lacquering is advantageous in protecting the PVD film but it decreases the reflectivity of the high index of refraction materials (generally n value>1.9 at 632 nm). These materials are desirable due to their color properties but are too dark after lacquering for many commercial applications. We address this problem by utilizing a high refractive index metal, or metals, as an opaque first layer followed by a thin semi-transparent second layer of a low refractive index metal. Upon topcoat lacquering, the resulting coating retains most of the aesthetically pleasing properties of the base metal(s) but minimizes the darkening of the metal(s) after topcoat due to the low refractive index of the second layer, which is in contact with the lacquer.

公开(公告)号：US11560617B2

公开(公告)日：2023-01-24

申请号：US16815890

申请日：2020-03-11

申请人： NIKE, Inc.

发明人： Jeremy Gantz ,  Yuanmin Wang

IPC分类号： B32B37/02 ,  C23C14/14 ,  A41D13/01 ,  A43B1/00 ,  C23C16/06 ,  B44C1/165 ,  B44C3/00 ,  B32B37/00 ,  B32B37/14 ,  B44C1/10 ,  B44C1/16 ,  B32B37/24 ,  B32B38/14

摘要： As described above, one or more aspects of the present disclosure provide articles having structural color, and methods of making articles having structural color.

公开(公告)号：US11518143B2

公开(公告)日：2022-12-06

申请号：US17029572

申请日：2020-09-23

申请人： Pratt & Whitney Canada Corp.

发明人： Joel Larose ,  Alan D. Cetel ,  David A. Litton ,  Brian S. Tryon

IPC分类号： B32B15/01 ,  B32B15/04 ,  C23C30/00 ,  C23C14/02 ,  C23C14/16 ,  C23C14/58 ,  C23C14/14 ,  C23C28/00 ,  C23C28/02 ,  C22C5/04 ,  C22C19/05 ,  C22C19/03 ,  C22C30/00 ,  F01D5/28

摘要： A coating-substrate combination includes: a Ni-based superalloy substrate comprising, by weight percent: 2.0-5.1 Cr; 0.9-3.3 Mo; 3.9-9.8 W; 2.2-6.8 Ta; 5.4-6.5 Al; 1.8-12.8 Co; 2.8-5.8 Re; 2.8-7.2 Ru; and a coating comprising, exclusive of Pt group elements, by weight percent: Ni as a largest content; 5.8-9.3 Al; 4.4-25 Cr; 3.0-13.5 Co; up to 6.0 Ta, if any; up to 6.2 W, if any; up to 2.4 Mo, if any; 0.3-0.6 Hf; 0.1-0.4 Si; up to 0.6 Y, if any; up to 0.4 Zr, if any; up to 1.0 Re, if any.

公开(公告)号：US20220372612A1

公开(公告)日：2022-11-24

申请号：US17663549

申请日：2022-05-16

申请人： Applied Materials, Inc.

发明人： PRASANNAKALLESHWARA BUDDAPPA RAMACHANDRAPPA ,  Sambhu Nath Kundu ,  Vicente M. Lim ,  Visweswaren Sivaramakrishnan ,  Subramanya P. Herle

IPC分类号： C23C14/24 ,  C23C14/14 ,  C23C14/54

摘要： Methods and systems for the delivery of molten metals and metal alloys at a fixed volume are provided. The system includes an evaporation system having a fluid inlet port and a fluid delivery system. The fluid delivery system includes an ampoule operable to hold a source material. The ampoule includes a fluid outlet port and a gas inlet port. The fluid delivery system further includes a fluid delivery line operable to deliver the source material to the evaporation system. The fluid delivery line includes a first end fluidly coupled with the fluid outlet port and a second end fluidly coupled to the fluid inlet port. The fluid delivery line further includes a first isolation valve disposed along the fluid delivery line and a second isolation valve disposed along the fluid delivery line which define a fixed volume of the fluid delivery line.

公开(公告)号：US11501974B2

公开(公告)日：2022-11-15

申请号：US16471174

申请日：2017-12-19

申请人： TANAKA KIKINZOKU KOGYO K.K.

发明人： Yohei Mizuno ,  Tetsuya Kato ,  Chiharu Ishikura

IPC分类号： H01L21/285 ,  H01L29/40 ,  H01L29/417 ,  H01L29/45 ,  C22C5/06 ,  C23C14/14 ,  C23C14/58 ,  H01J37/34

摘要： An electrode structure of a back electrode including metal layers laminated in the following order: a Ti layer, a Ni layer, and a Ag alloy layer. The Ag alloy layer includes an Ag alloy and an addition metal M selected from Sn, Sb, and Pd. The electrode structure is configured such that when subjected to elemental analysis with an X-ray photoelectron spectrometer in the depth direction from the Ag alloy layer to the Ni layer, on the boundary between the Ni layer and the Ag alloy layer, an intermediate region where spectra derived from all the metals, Ni, Ag, and the addition element M, can be detected is observable, and, when each metal content in the intermediate region is converted based on the spectra derived from all the metals Ni, Ag, and the addition element M, the maximum of the addition element M content is 5 at % or more.

公开(公告)号：US11501959B2

公开(公告)日：2022-11-15

申请号：US16184447

申请日：2018-11-08

申请人： Cardinal CG Company

发明人： Klaus Hartig

IPC分类号： H01J37/34 ,  H01J37/32 ,  C23C14/00 ,  C23C14/35 ,  C23C14/14

摘要： Some embodiments provide a magnetron sputtering apparatus including a vacuum chamber within which a controlled environment may be established, a target comprising one or more sputterable materials, wherein the target includes a racetrack-shaped sputtering zone that extends longitudinally along a longitudinal axis and comprises a straightaway area sandwiched between a first turnaround area and a second turnaround area, a gas distribution system that supplies a first gas mixture to the first turnaround area and/or the second turnaround area and supplies a second gas mixture to the straightaway area, wherein the first gas mixture reduces a sputtering rate relative to the second gas mixture. In some cases, the first gas mixture includes inert gas having a first atomic weight and the second gas mixture includes inert gas having a second atomic weight, wherein the second atomic weight is heavier than the first atomic weight.