公开(公告)号：WO2020182386A1

公开(公告)日：2020-09-17

申请号：PCT/EP2020/053292

申请日：2020-02-10

Applicant: ASML NETHERLANDS B.V.

Inventor： AKHSSAY, Mhamed ,  VAN BOKHOVEN, Laurentius, Johannes, Adrianus

IPC: G03F7/20

Abstract: A method of predicting thermally induced aberrations of a projection system for projecting a radiation beam, the method comprising: calculating a change in temperature of the projection system from a power of the radiation beam output from the projection system using a dynamic linear function; and calculating the thermally induced aberrations from the calculated change in temperature using a static non-linear function.

公开(公告)号：WO2020178008A1

公开(公告)日：2020-09-10

申请号：PCT/EP2020/053999

申请日：2020-02-17

Applicant: ASML NETHERLANDS B.V.

Inventor： UEBEL, Patrick, Sebastian ,  BAUERSCHMIDT, Sebastian, Thomas ,  GÖTZ, Peter, Maximilian

IPC: G03F1/00 ,  G02F1/365 ,  G02F1/35 ,  G03F7/20 ,  G03F9/00

Abstract: Disclosed is an optical component, being configured to function as an optical frequency converter in a broadband radiation source device. The optical component comprises a gas cell, and a hollow-core photonic crystal fiber at least partially enclosed within said gas cell. The local cavity volume of said gas cell, where said hollow-core photonic crystal fiber is enclosed within the gas cell, comprises a maximum value of 36cm 3 per cm of length of said hollow-core photonic crystal fiber.

公开(公告)号：WO2020173683A1

公开(公告)日：2020-09-03

申请号：PCT/EP2020/053104

申请日：2020-02-07

Applicant: ASML NETHERLANDS B.V.

Inventor： DRIESSEN, Theodorus, Wilhelmus

IPC: H05G2/00

Abstract: A target apparatus (300) for an extreme ultraviolet (EUV) light source includes a target generator, a sensor module (130), and a target generator controller (325). The target generator includes a reservoir (115) configured to contain target material (114) that produces EUV light in a plasma state and a nozzle structure (117) in fluid communication with the reservoir. The target generator defines an opening (119) in the nozzle structure through which the target material received from the reservoir is released. The sensor module is configured to: detect an aspect relating to target material released from the opening as the target material travels along a trajectory toward a target space (112), and produce a one-dimensional signal from the detected aspect. The target generator controller is in communication with the sensor module and the target generator, and is configured to modify characteristics of the target material based on an analysis of the one-dimensional signal.

公开(公告)号：WO2020173652A1

公开(公告)日：2020-09-03

申请号：PCT/EP2020/052244

申请日：2020-01-30

Applicant: ASML NETHERLANDS B.V.

Inventor： JANSEN, Maarten, Jozef ,  AUER, Frank

IPC: G03F7/20

Abstract: The invention provides a stage system comprising a stage (ST) which is movable in respect of a reference structure. One of the stage and the reference structure comprises a reflective surface (REFS). An optical position sensor (I F1) is arranged at the other one of the stage and the reference structure and is configured to determine a position of the reflective surface relative to the optical position sensor. An optical shape sensor (IF2) is configured to determine a shape of the reflective surface. The stage system further comprises a position measurement controller configured to derive a stage position of the stage from the position of the reflective surface relative to the optical position sensor and from the shape of the reflective surface as determined by the optical shape sensor.

公开(公告)号：WO2020169303A1

公开(公告)日：2020-08-27

申请号：PCT/EP2020/051778

申请日：2020-01-24

Applicant: ASML NETHERLANDS B.V.

Inventor： TAO, Jun ,  BARON, Stanislas, Hugo, Louis ,  SU, Jing ,  LUO, Ya ,  CAO, Yu

IPC: G03F1/36 ,  G03F7/20 ,  G06N3/08 ,  G06N20/00

Abstract: Described herein are training methods and a mask correction method. One of the methods is for training a machine learning model configured to predict a post optimal proximity correction (OPC) image for a mask. The method involves obtaining (i) a pre-OPC image associated with a design layout to be printed on a substrate, (ii) an image of one or more assist features for the mask associated with the design layout, and (iii) a reference post- OPC image of the design layout; and training the machine learning model using the pre-OPC image and the image of the one or more assist features as input such that a difference between the reference image and a predicted post-OPC image of the machine learning model is reduced.

公开(公告)号：WO2020164951A1

公开(公告)日：2020-08-20

申请号：PCT/EP2020/052662

申请日：2020-02-04

Applicant: ASML NETHERLANDS B.V.

Inventor： HASAN, Shakeeb Bin ,  REN, Yan ,  GOOSEN, Maikel, Robert ,  MANGNUS, Albertus, Victor, Gerardus ,  SMAKMAN, Erwin, Paul

IPC: H01J37/04 ,  H01J37/05 ,  H01J37/26

Abstract: Disclosed among other aspects is a charged particle inspection system including an absorbing component and a programmable charged-particle mirror plate arranged to modify the energy distribution of electrons in a beam and shape the beam to reduce the energy spread of the electrons and aberrations of the beam, with the absorbing component including a structure defining a cavity, the cavity having an interior surface, and a metamaterial aborber provided on the interior surface. In operation, the cavity extends along a part of the beam path. In further embodiments, the metamaterial includes a set of absorbing structures configured as absorbing structures provided on a transparent conductive layer. Further, a method using such an absorbing component and with the programmable charged-particle mirror plate including a set of pixels configured to generate a customized electric field to shape the beam and using such a programmable charged-particle mirror plate is disclosed.

公开(公告)号：WO2020164918A1

公开(公告)日：2020-08-20

申请号：PCT/EP2020/052250

申请日：2020-01-30

Applicant: ASML NETHERLANDS B.V.

Inventor： DONKERBROEK, Arend, Johannes ,  CHOWDHURY, Yassin ,  JANSSEN, Maurice, Henricus, Franciscus

IPC: G03F7/20

Abstract: The present invention provides an apparatus comprising a projection system having an optical axis and configured to project a radiation beam. The apparatus comprises a measurement unit arranged to measure the radiation beam projected by the projection system, the measurement unit comprising an opening through which the radiation beam passes in use, and a sensing surface extending transverse to the optical axis and arranged to measure the radiation beam passing through the opening. The lithographic apparatus is configured to move the sensing surface in a plane transverse to the optical axis between a plurality of measurement positions. The radiation beam defines a view in said plane, and the measurement unit is configured such that the sensing surface captures, in each measurement position, a portion of the view smaller than 100% of the view. The present invention comprises a corresponding method.

公开(公告)号：WO2020164868A1

公开(公告)日：2020-08-20

申请号：PCT/EP2020/051355

申请日：2020-01-21

Applicant: ASML NETHERLANDS B.V.

Inventor： DE HOOGH, Joost ,  NAKIBOGLU, Günes ,  SCHMITZ, Roger, Wilhelmus, Antonius, Henricus ,  VAN DE MOESDIJK, Remco, Yuri ,  KÖK, Yücel ,  TALEBAN FARD, Nafiseh

IPC: G03F7/20

Abstract: A device comprising a compartment, said compartment comprising a wafer stage configured to hold a semiconductor wafer on a clamp, wherein the wafer stage is configured to follow a route within the compartment in operational use, the device comprising: a first component having a first surface facing a first portion of the route; a second component having a second surface facing a second portion of the route; a thermal control system operative to maintain a first temperature of the first surface and a second temperature of the second surface at a common set-point magnitude.

公开(公告)号：WO2020160852A1

公开(公告)日：2020-08-13

申请号：PCT/EP2020/050051

申请日：2020-01-03

Applicant: ASML NETHERLANDS B.V.

Inventor： BUTLER, Hans ,  JANSEN, Bas ,  DE HOON, Cornelius, Adrianus, Lambertus

IPC: G01P15/09 ,  G01P21/00 ,  G03F7/20 ,  G01D3/032

Abstract: The invention relates to an electronic system for an accelerometer having a piezoelectric element and a first mechanical resonance frequency, comprising: a) a damping circuit configured to: - receive an acceleration signal from the piezoelectric element; - electronically dampen an amplitude of the first mechanical resonance frequency; and - generate a damped acceleration signal, b) an extender configured to: - receive the damped acceleration signal; - extend the frequency response; and - output an extended damped acceleration signal, wherein the extender is configured to have a first electronic anti-resonance frequency matching the damped first mechanical resonance frequency, and to have a frequency response between the first electronic anti-resonance frequency and a higher second frequency that is substantially opposite to a corresponding frequency response of the combination of the accelerometer and the damping circuit.

公开(公告)号：WO2020148069A1

公开(公告)日：2020-07-23

申请号：PCT/EP2019/086403

申请日：2019-12-19

Applicant: STICHTING VU ,  STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN ,  UNIVERSITEIT VAN AMSTERDAM ,  ASML NETHERLANDS B.V.

Inventor： UBACHS, Wilhelmus ,  VERSOLATO, Oscar, Oreste

IPC: G03F7/20 ,  H05G2/00

Abstract: An EUV radiation source of a laser-produced-plasma type, comprising: a fuel emitter configured to produce fuel droplets; and a laser system configured to illuminate a fuel droplet with radiation for converting the fuel droplet into a plasma at a plasma formation region; wherein the laser system comprises: a laser configured to produce radiation of a first wavelength; and a nonlinear medium configured to receive radiation of the first wavelength, produce radiation of a second wavelength using a nonlinear optical process at a radiation conversion region, and deliver radiation of the second wavelength to the plasma formation region; wherein the second wavelength is longer than the first wavelength.