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161.发明申请
公开(公告)号：WO2020086478A1
公开(公告)日：2020-04-30
申请号：PCT/US2019/057256
申请日：2019-10-21
Applicant: ASML NETHERLANDS B.V.
Inventor： LABETSKI, Dzmitry , LAFORGE, Andrew, David , MA, Yue
Abstract: Disclosed is a source for and method of generating extreme ultraviolet radiation in which spitting of molten target material is hindered through depletion of the number of hydrogen radicals available to enter deposits of molten target material and create hydrogen bubbles therein by introducing an active gas that reacts with the hydrogen radicals.
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公开(公告)号：WO2020083731A1
公开(公告)日：2020-04-30
申请号：PCT/EP2019/078152
申请日：2019-10-17
Applicant: ASML NETHERLANDS B.V.
Inventor： SAFINOWSKI, Pawel , BROUNS, Derk, Servatius, Gertruda
Abstract: Inspection apparatus for inspecting an object such as a pellicle for use in an EUV lithographic apparatus, the inspection apparatus comprising: - a vacuum chamber; - a load lock forming an interface between the vacuum chamber and an ambient environment; - a stage apparatus configured to receive the object from the load lock and displace the object inside the vacuum chamber; wherein the vacuum chamber comprises a first parking position and a second parking position for temporarily storing the object.
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公开(公告)号：WO2020083612A1
公开(公告)日：2020-04-30
申请号：PCT/EP2019/076370
申请日：2019-09-30
Applicant: ASML NETHERLANDS B.V.
Inventor： FANG, Wei , PU, Lingling
Abstract: A method for aligning a wafer image with a reference image, comprising: searching for a targeted reference position on the wafer image for aligning the wafer image with the reference image; and in response to a determination that the targeted reference position does not exist: defining a current lock position and an area that encloses the current lock position on the wafer image; computing an alignment score of the current lock position; comparing the alignment score of the current lock position with stored alignment scores of positions previously selected in relation to aligning the wafer image with the reference image; and aligning the wafer image with the reference image based on the comparison.
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公开(公告)号：WO2020078844A1
公开(公告)日：2020-04-23
申请号：PCT/EP2019/077587
申请日：2019-10-11
Applicant: ASML NETHERLANDS B.V. , CYMER, LLC
Inventor： CONLEY, Willard, Earl , THORNES, Joshua, Jon , HSU, Duan-Fu, Stephen , RECHTSTEINER, Gregory, Allen
IPC: G03F7/20
Abstract: Systems, methods, and computer programs for increasing a depth of focus for a lithography system are disclosed. In one aspect, a method includes providing an optical spectrum, a mask pattern, and a pupil design, that together are configured to provide the lithography system with a depth of focus. The method also includes iteratively varying the optical spectrum and an assist feature in the mask pattern to provide a modified optical spectrum and a modified mask pattern that increases the depth of focus. The method further includes configuring a component of the lithography system based on the modified optical spectrum and the modified mask pattern that increases the depth of focus.
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公开(公告)号：WO2020078721A1
公开(公告)日：2020-04-23
申请号：PCT/EP2019/076667
申请日：2019-10-02
Applicant: ASML NETHERLANDS B.V.
Inventor： VAN ZWOL, Pieter-Jan , BALTUSSEN, Sander , DE GRAAF, Dennis , FRANKEN, Johannes, Christiaan, Leonardus , GIESBERS, Adrianus, Johannes, Maria , KLEIN, Alexander, Ludwig , KLOOTWIJK, Johan, Hendrik , KNAPEN, Peter, Simon, Antonius , KURGANOVA, Evgenia , KUZNETSOV, Alexey, Sergeevich , NOTENBOOM, Arnoud, Willem , VALEFI, Mahdiar , VAN DE KERKHOF, Marcus, Adrianus , VAN DEN EINDEN, Wilhelmus, Theodorus, Anthonius, Johannes , VAN DER WOORD, Ties, Wouter , WONDERGEM, Hendrikus, Jan , ZDRAVKOV, Aleksandar, Nikolov
Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising: at least one membrane layer supported by a planar substrate, wherein the planar substrate comprises an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate, wherein the step of selectively removing the inner region of the planar substrate comprises using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer; such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border comprising the border region of the planar substrate and the first sacrificial layer situated between the border and the membrane layer.
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Patent Agency Ranking
公开(公告)号：WO2020078660A1
公开(公告)日：2020-04-23
申请号：PCT/EP2019/075316
申请日：2019-09-20
Applicant: ASML NETHERLANDS B.V.
Inventor： HU, Xuerang , LUO, Xinan , XI, Qingpo , LIU, Xuedong , REN, Weiming
IPC: H01J37/28 , H01J37/317
Abstract: An improved charged particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved alignment mechanism is disclosed. An improved charged particle beam inspection apparatus may include a second electron detection device to generate one or more images of one or more beam spots of the plurality of secondary electron beams during the alignment mode. The beam spot image may be used to determine the alignment characteristics of one or more of the plurality of secondary electron beams and adjust a configuration of a secondary electron projection system.
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公开(公告)号：WO2020074209A1
公开(公告)日：2020-04-16
申请号：PCT/EP2019/074443
申请日：2019-09-13
Applicant: ASML NETHERLANDS B.V.
Abstract: A combined enrichment and radioisotope production apparatus comprising an electron source arranged to provide an electron beam, the electron source comprising an electron injector and an accelerator, an undulator configured to generate a radiation beam using the electron beam, a molecular stream generator configured to provide a stream of molecules which is intersected by the radiation beam, a receptacle configured to receive molecules or ions selectively received from the stream of molecules, and a target support structure configured to hold a target upon which the electron beam is incident in use.
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公开(公告)号：WO2020069931A1
公开(公告)日：2020-04-09
申请号：PCT/EP2019/075801
申请日：2019-09-25
Applicant: ASML NETHERLANDS B.V.
Inventor： NIKIPELOV, Andrey , BECKERS, Johan, Franciscus, Maria
Abstract: The present invention relates to an object, such as a sensor for an immersion lithographic apparatus, which object has an outer layer which comes in contact with immersion liquid and wherein said outer layer has a composition comprising a rare earth element. The invention further relates to an immersion lithographic apparatus comprising such an object and to a method for manufacturing such an object.
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169.发明申请
公开(公告)号：WO2020064542A1
公开(公告)日：2020-04-02
申请号：PCT/EP2019/075321
申请日：2019-09-20
Applicant: ASML NETHERLANDS B.V.
Inventor： VELLANKI, Venugopal , SIMMONS, Mark, Christopher
Abstract: Described herein is a method of determining candidate patterns from a set of patterns of a patterning process. The method includes obtaining (i) a set of patterns of a patterning process, (ii) a search pattern having a first feature and a second feature, and (iii) a first search condition comprising a relative position between the first feature and the second feature of the search pattern; and determining a first set of candidate patterns from the set of patterns that satisfies the first search condition associated with the first feature and the second feature of the search pattern.
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公开(公告)号：WO2020064240A1
公开(公告)日：2020-04-02
申请号：PCT/EP2019/072680
申请日：2019-08-26
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： BLOKS, Ruud, Hendrikus, Martinus, Johannes , KUNNEN, Johan, Gertrudis, Cornelis , ZAAL, Oxana , LYONS, Joseph, Harry , SRIVASTAVA, Sudhir
Abstract: A level sensor system having a pneumatic sensor, a temperature sensor and a controller. The pneumatic sensor (10) has a reference outlet (100) for forming a reference gap (GR) with a reference surface (R) and a measurement outlet (200) for forming a measurement gap (GM) with a measurement surface, wherein the pneumatic sensor is configured to make a pneumatic sensor measurement indicative of a difference between a flow of gas out of the reference outlet and a flow of gas out of the measurement outlet. The temperature sensor (510a, b) is configured to make a temperature measurement indicative of a temperature of the reference surface and/or a temperature of the measurement surface. The controller (700) is configured to adjust the pneumatic sensor measurement based on the temperature measurement to generate a signal indicative of a difference in height between the reference gap and the measurement gap.
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