公开(公告)号：WO2004021413A1

公开(公告)日：2004-03-11

申请号：PCT/US2003/026985

申请日：2003-08-28

Applicant: APPLIED MATERIALS, INC.

Inventor： RICE, Michael ,  ELLIOTT, Martin, R. ,  LOWRANCE, Robert, B. ,  HUDGENS, Jeffrey, C. ,  ENGLHARDT, Eric, A.

IPC: H01L21/00

CPC classification number: H01L21/67017 ,  H01L21/67769 ,  H01L21/67775

Abstract: In a first aspect, an automatic door opener is provided that includes (1) a platform adapted to support a substrate carrier; (2) a door opening mechanism adapted to open a door of the substrate carrier while the substrate carrier is supported by the platform; and (3) a tunnel. The tunnel is adapted to extend from an opening in a clean room wall toward the platform and at least partially surround the platform. The tunnel is further adapted to direct a flow of air from the clean room wall toward the platform and out of the tunnel. Numerous other aspects are provided.

Abstract translation: 在第一方面，提供了一种自动开门器，其包括：（1）适于支撑衬底载体的平台; （2）门打开机构，其适于在基板载体由平台支撑的同时打开基板载体的门; 和（3）隧道。 隧道适于从洁净室壁中的开口延伸到平台并且至少部分地围绕平台。 隧道还适于将来自洁净室壁的空气流引向平台并且离开隧道。 提供了许多其他方面。

公开(公告)号：WO2020168021A1

公开(公告)日：2020-08-20

申请号：PCT/US2020/018021

申请日：2020-02-13

Applicant: APPLIED MATERIALS, INC.

Inventor： RICE, Michael ,  BALUJA, Sanjeev ,  AUBUCHON, Joseph ,  PONNEKANTI, Hari ,  SILVETTI, Mario D. ,  GRIFFIN, Kevin

IPC: C23C16/44 ,  C23C16/54

Abstract: Exhaust systems for handling multiple effluent streams are described. Some embodiments include pressure drops to prevent perturbations from one effluent source from affecting a second effluent source. Some embodiments incorporate an exhaust assembly with multiple inlets and pumps and a single outlet. The exhaust assembly includes shared auxiliary components like purge and cooling systems.

公开(公告)号：WO2020092046A1

公开(公告)日：2020-05-07

申请号：PCT/US2019/057324

申请日：2019-10-22

Applicant: APPLIED MATERIALS, INC.

Inventor： AUBUCHON, Joseph ,  BALUJA, Sanjeev ,  KASHYAP, Dhritiman Subha ,  LEE, Jared Ahmad ,  ULAVI, Tejas ,  RICE, Michael

IPC: H01L21/02 ,  H01L21/324 ,  C23C16/455 ,  H01L21/67 ,  H01J37/32 ,  H05H1/46

Abstract: Apparatus and methods to process one or more wafers are described. A processing chamber comprises a first processing station comprising a first gas injector having a first face, a first emissivity and a first temperature, a second processing station comprising a second gas injector having a second face, a second emissivity and a second temperature, and a substrate support assembly comprising a plurality of substantially coplanar support surfaces, the substrate support assembly configured to move the support surfaces between the first processing station and the second processing station. When a wafer is on the support surfaces, a temperature skew of less than about 0.5 °C is developed upon moving the wafer between the stations in about 0.5 seconds.

公开(公告)号：WO2020023854A1

公开(公告)日：2020-01-30

申请号：PCT/US2019/043626

申请日：2019-07-26

Applicant: APPLIED MATERIALS, INC.

Inventor： LEE, Jared ,  BALUJA, Sanjeev ,  AUBUCHON, Joseph ,  KASHYAP, Dhritiman Subha ,  RICE, Michael

IPC: C23C16/455

Abstract: Apparatus and methods for providing high velocity gas flow showerheads for deposition chambers are described. The showerhead has a faceplate in contact with a backing plate that has a concave portion to provide a plenum between the backing plate and the faceplate. A plurality of thermal elements is within the concave portion of the backing plate and extends to contact the faceplate.

公开(公告)号：WO2016077270A1

公开(公告)日：2016-05-19

申请号：PCT/US2015/059828

申请日：2015-11-10

Applicant: APPLIED MATERIALS, INC.

Inventor： THIRUNAVUKARASU, Sriskantharajah ,  PEH, Eng Sheng ,  NEMANI, Srinivas D. ,  SUNDARRAJAN, Arvind ,  AVULA, Avinash ,  YIEH, Ellie Y. ,  RICE, Michael ,  ADDIEGO, Ginetto

IPC: H01L21/677 ,  H01L21/673

CPC classification number: H01L21/67389 ,  B25J11/0095 ,  H01L21/67363 ,  H01L21/67369

Abstract: Embodiments of multi-cassette carrying cases are provided herein. In some embodiments a multi-cassette carrying case includes: a body having an inner volume; a door coupled to the body to selectively seal off the inner volume; and a plurality of cassette holders disposed in the inner volume to hold one or more substrate cassettes. In some embodiments, a method of transferring substrates includes: placing a substrate in a substrate cassette, wherein an inner volume of the substrate cassette is sealed from an environment outside of the substrate cassette; and placing the substrate cassette in a multi-cassette carrying case.

Abstract translation: 这里提供了多盒式携带箱的实施例。 在一些实施例中，多盒式手提箱包括：具有内部容积的主体; 一个门连接到主体以选择性地密封内部容积; 以及设置在所述内部容积中以容纳一个或多个衬底盒的多个盒座。 在一些实施例中，传送衬底的方法包括：将衬底放置在衬底盒中，其中衬底盒的内部体积与衬底盒外的环境密封; 并将衬底盒放置在多盒式手提箱中。

公开(公告)号：WO2007078407A1

公开(公告)日：2007-07-12

申请号：PCT/US2006/042703

申请日：2006-10-31

Applicant: APPLIED MATERIALS, INC.

Inventor： RICE, Michael

IPC: H01L21/67 ,  H01L21/673

CPC classification number: H01L21/67366

Abstract: The invention provides apparatus and manufacturing methods for a liner adapted to enclose a space within a substrate carrier and further adapted to prevent gas from reaching the enclosed space. The liner may be removable from the substrate carrier. The liner may be self- supporting and/or the liner may be supported by interior walls of the substrate carrier. The liner may be adapted to absorb particles to prevent contamination of substrates stored in the substrate carrier. The liner may be an interior glass coating in a substrate carrier that prevents outgassing from the substrate carrier. Numerous other aspects are disclosed.

Abstract translation: 本发明提供了一种用于衬垫的装置和制造方法，该衬垫适用于将衬底载体内的空间包围，并且还适于防止气体到达封闭空间。 衬垫可以从衬底载体移除。 衬里可以是自支撑的和/或衬垫可以由衬底载体的内壁支撑。 衬垫可以适于吸收颗粒以防止存储在衬底载体中的衬底的污染。 衬里可以是衬底载体中的内部玻璃涂层，其防止从衬底载体脱气。 公开了许多其他方面。

公开(公告)号：WO2007061603A2

公开(公告)日：2007-05-31

申请号：PCT/US2006/042952

申请日：2006-10-30

Applicant: APPLIED MATERIALS, INC.

Inventor： RICE, Michael ,  CRAVALHO, Nicholas ,  BRODINE, Jeffrey, A.

IPC: B66C23/00

CPC classification number: H01L21/67748 ,  H01L21/67742 ,  H01L21/67745 ,  H01L21/68707

Abstract: In one aspect, a first apparatus is provided that is adapted to transfer a substrate between a transfer chamber and a processing chamber. The first apparatus includes a robot having a first blade, a second blade spaced from the first blade, and a central hub coupled to the first blade by at least a first arm and coupled to the second blade by at least a second arm. The first blade and the second blade are spaced so as to allow (a) both blades to simultaneously extend through a slit valve that separates a transfer chamber from a processing chamber coupled to the transfer chamber when the robot is positioned within the transfer chamber; and (b) the first and second blades to transfer substrates to and remove substrates from the processing chamber without raising or lowering the first and second blades or the robot. Numerous other aspects are provided.

Abstract translation: 在一个方面，提供了适于在传送室和处理室之间传送衬底的第一设备。 第一装置包括具有第一叶片的机器人，与第一叶片间隔开的第二叶片，以及通过至少第一臂联接到第一叶片并通过至少第二臂联接到第二叶片的中心轮毂。 第一叶片和第二叶片间隔开以允许（a）当机器人位于传送室内时，两个叶片同时延伸穿过狭缝阀，该狭缝阀将传送室与耦合到传送室的处理室分离; 以及（b）第一和第二刀片，用于将基板转移到处理室中并从基板上移除基板，而不会升高或降低第一和第二叶片或机器人。 提供了许多其他方面。

公开(公告)号：WO2005083752A2

公开(公告)日：2005-09-09

申请号：PCT/US2005/005672

申请日：2005-02-23

Applicant: APPLIED MATERIALS, INC. ,  PARKHE, Vijay, D. ,  LEOPOLD, Matthew ,  RONAN, Timothy ,  MARTIN, Todd, W. ,  NG, Edward ,  KHURANA, Nitin ,  SUH, Song-Moon ,  FAY, Richard ,  HAGERTY, Christopher ,  RICE, Michael ,  ANGELO, Darryl ,  AHMAN, Kurt, J. ,  TSAI, Matthew, C. ,  SANSONI, Steve

Inventor： PARKHE, Vijay, D. ,  LEOPOLD, Matthew ,  RONAN, Timothy ,  MARTIN, Todd, W. ,  NG, Edward ,  KHURANA, Nitin ,  SUH, Song-Moon ,  FAY, Richard ,  HAGERTY, Christopher ,  RICE, Michael ,  ANGELO, Darryl ,  AHMAN, Kurt, J. ,  TSAI, Matthew, C. ,  SANSONI, Steve

IPC: H01L21/00

CPC classification number: C23C16/463 ,  H01L21/6831 ,  H01L21/6875 ,  H01L21/68757 ,  Y10T279/23

Abstract: A substrate support has a support structure and a coating on the support structure having a carbon-hydrogen network. The coating has a contact surface having a coefficient of friction of less than about 0.3 and a hardness of at least about 8 GPa. The contact surface of the coating is capable of reducing abrasion and contamination of a substrate that contacts the contact surface. In one version, the support structure has a dielectric covering an electrode. A plurality of mesas on the dielectric have a coating with the contact surface thereon. In another version, contamination of substrate is reduced by providing a substrate lifting assembly having a pair of arcuate fins with raised protrusions to support the substrates.

Abstract translation: 衬底支撑件具有支撑结构，并且在具有碳 - 氢网络的支撑结构上具有涂层。 涂层具有摩擦系数小于约0.3，硬度至少约8GPa的接触表面。 涂层的接触表面能够减少与接触表面接触的基底的磨损和污染。 在一个版本中，支撑结构具有覆盖电极的电介质。 电介质上的多个台面具有其上具有接触表面的涂层。 在另一个版本中，通过提供具有一对具有凸起的凸起以支撑基板的弓形翅片的基板提升组件来降低基板的污染。