中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

35 records (took 0.013 seconds)

    IMAGE SENSOR USING THIN-FILM SOI
    23.
    发明申请
    IMAGE SENSOR USING THIN-FILM SOI 审中-公开
    使用薄膜SOI的图像传感器

    公开(公告)号：WO2008033508A2

    公开(公告)日：2008-03-20

    申请号：PCT/US2007020011

    申请日：2007-09-14

    Applicant: CORNING INC ,  BORRELLI NICHOLAS F ,  BRADY MICHAEL D ,  BURT RONALD L ,  GADKAREE KISHOR P

    Inventor： BORRELLI NICHOLAS F ,  BRADY MICHAEL D ,  BURT RONALD L ,  GADKAREE KISHOR P

    CPC classification number: H01L27/14692 ,  H01L21/76254 ,  H01L27/14618 ,  H01L27/1464 ,  H01L2924/0002 ,  H01L2924/00

    Abstract: Systems and methods related to an image sensor of one or more embodiments include subjecting a donor semiconductor wafer to an ion implantation process to create an exfoliation layer of semiconductor film on the donor semiconductor wafer, forming an anodic bond between the exfoliation layer and an insulator substrate by means of electrolysis; separating the exfoliation layer from the donor semiconductor wafer to transfer the exfoliation layer to the insulator substrate; and creating a plurality of image sensor features proximate to the exfoliation layer. Forming the anodic bonding by electrolysis may include the application of heat, pressure and voltage to the insulator structure and the exfoliation layer attached to the donor semiconductor wafer. Image sensor devices include an insulator structure, a semiconductor film, an anodic bond between them, and a plurality of image sensor features. The semiconductor film preferably comprises an exfoliation layer of a substantially single-crystal donor semiconductor wafer.

    Abstract translation: 涉及一个或多个实施例的图像传感器的系统和方法包括使施主半导体晶片经受离子注入工艺以在施主半导体晶片上产生半导体膜的剥离层，在剥离层和绝缘衬底之间形成阳极键合 通过电解; 从供体半导体晶片分离剥离层以将剥离层转移到绝缘基板; 以及在剥离层附近产生多个图像传感器特征。 通过电解形成阳极键合可以包括向绝缘体结构和附着于施主半导体晶片的剥离层施加热，压力和电压。 图像传感器装置包括绝缘体结构，半导体膜，它们之间的阳极键以及多个图像传感器特征。 该半导体膜优选包括基本上单晶施主半导体晶片的剥离层。

    MASK, MASK BLANK, PHOTOSENSITIVE MATERIAL THEREFOR AND FABRICATION THEREOF
    24.
    发明申请
    MASK, MASK BLANK, PHOTOSENSITIVE MATERIAL THEREFOR AND FABRICATION THEREOF 审中-公开
    遮罩，遮罩，其感光材料及其制造

    公开(公告)号：WO2004107044A3

    公开(公告)日：2005-04-14

    申请号：PCT/US2004015243

    申请日：2004-05-13

    Applicant: BELLMAN ROBERT A ,  BORRELLI NICHOLAS F ,  HARES GEORGE B ,  SMITH CHARLENE M ,  WALTON ROBIN M ,  CORNING INC

    Inventor： BELLMAN ROBERT A ,  BORRELLI NICHOLAS F ,  HARES GEORGE B ,  SMITH CHARLENE M ,  WALTON ROBIN M

    IPC: C03C3/064 ,  C03C3/091 ,  C03C15/00 ,  G03F1/30 ,  G03F1/32 ,  G03F1/34 ,  G03F1/14 ,  G02B6/16 ,  G03F1/00

    CPC classification number: G03F1/30 ,  C03C3/064 ,  C03C3/091 ,  C03C15/00 ,  G03F1/32 ,  G03F1/34

    Abstract: Disclosed are masks and mask blanks for photolithographic processes, photosensitive materials and fabrication method therefor. Photosensitive materials are used in the masks for recording permanent pattern features via UV exposure. The masks are advantageously phase-shifting, but can be gray-scale masks having index patterns with arbitrary distribution of refractive index and pattern dimension. The masks may have features above the surface formed from opaque or attenuating materials. Alumino-boro-germano-silicate glasses having a composition comprising, in terms of mole percentage, 1-6% of Al2O3, 10-36% of B2O3, 2-20% of GeO2, 40-80% of SiO2, 2-10% of R2O, where R is selected from Li, Na and K, and expressed in terms of weight percentage of the glass, 0-5% of F, can be used for the mask substrate.

    Abstract translation: 公开了用于光刻工艺的掩模和掩模坯料，感光材料及其制造方法。 光敏材料用于通过紫外线曝光记录永久图案特征的掩模。 掩模有利地是相移，但是可以是具有折射率和图案尺寸的任意分布的索引图案的灰度掩模。 掩模可以具有由不透明或衰减材料形成的表面上方的特征。 氧化铝 - 硼 - 锗酸 - 硅酸盐玻璃，其组成包括以摩尔百分比计为1〜6％的Al 2 O 3，10-36％的B 2 O 3，2〜20％的GeO 2，40〜80％的SiO 2，2-10 R 2选自Li，Na和K的R 2 O％，并且以玻璃重量百分比表示，0-5％的F可以用于掩模基板。

    MASK, MASK BLANK, PHOTOSENSITIVE FILM THEREFOR AND FABRICATION THEREOF
    25.
    发明申请
    MASK, MASK BLANK, PHOTOSENSITIVE FILM THEREFOR AND FABRICATION THEREOF 审中-公开
    遮罩，遮罩，其感光膜及其制造方法

    公开(公告)号：WO2004107046A2

    公开(公告)日：2004-12-09

    申请号：PCT/US2004014005

    申请日：2004-05-05

    Applicant: BELLMAN ROBERT A ,  BORRELLI NICHOLAS F ,  WALTON ROBIN M ,  CORNING INC

    Inventor： BELLMAN ROBERT A ,  BORRELLI NICHOLAS F ,  WALTON ROBIN M

    IPC: C03C17/02 ,  C03C23/00 ,  G03F1/00 ,  G03F1/26 ,  G03F1/60 ,  G03F1/14

    CPC classification number: G03F1/60 ,  C03C17/02 ,  C03C23/002 ,  C03C2217/23 ,  C03C2218/32 ,  C03C2218/328 ,  G03F1/26

    Abstract: Disclosed are masks and mask blanks for photolithographic processes, photosensitive films and fabrication method therefor. Photosensitive films are deposited on a substrate in the masks for recording permanent pattern features via UV exposure. The masks are advantageously phase-shifting, but can be gray-scale masks having index patterns with arbitrary distribution of refractive index and pattern depth. The masks may have features above the surface formed from opaque or attenuating materials. Boro-germano-silicate photosensitive films having a composition consisting essentially, in terms of mole percentage, of: 0-20% of B2O3, 5-25% of GeO2 and the remainder SiO2 can be used for the film. The film is advantageously deposited by using PECVD wherein tetramethoxygermane is used as the germanium source.

    Abstract translation: 公开了用于光刻工艺的掩模和掩模坯料，感光膜及其制造方法。 感光膜沉积在掩模中的基底上，用于通过UV曝光记录永久图案特征。 掩模有利地是相移，但是可以是具有折射率和图案深度的任意分布的索引图案的灰度掩模。 掩模可以具有由不透明或衰减材料形成的表面上方的特征。 具有组成基本上以摩尔百分比为基准的硼硅酸盐光敏膜：0-20％的B2O3，5-25％的GeO2和剩余的SiO 2可用于该膜。 该薄膜有利地通过使用四甲氧基锗烷作为锗源的PECVD沉积。

    POLARIZING GLASSES HAVING INTEGRAL NON-POLARIZING REGIONS
    27.
    发明申请
    POLARIZING GLASSES HAVING INTEGRAL NON-POLARIZING REGIONS 审中-公开
    具有整体非极化区域的极化玻璃

    公开(公告)号：WO1997035812A1

    公开(公告)日：1997-10-02

    申请号：PCT/US1997004870

    申请日：1997-03-25

    Applicant: CORNING INCORPORATED ,  BORRELLI, Nicholas, F. ,  MOORE, Chag, B. ,  SACHENIK, Paul, A.

    Inventor： CORNING INCORPORATED

    IPC: C03B27/012

    CPC classification number: C03C23/00 ,  C03C14/006 ,  C03C15/00

    Abstract: Polarizing glass having localized regions or patterns of non-polarizing glass is disclosed. The non-polarizing regions are formed by use of reducing gas-blocking material, local thermal heating of the glass, or by etching techniques. Figures (1a) - (1b) show the reducing gas-blocking method where a shadow mask (4) or a thin layer of material (6) is formed on the surface of the glass (2) to retard the reduction process and enable the production of color gradients and/or designs or patterns in the glass. The masked glass is exposed to a reducing atmosphere such that the reducible phase in the exposed or unprotected regions (8) is reduced and the non-polarizing region (masked region) (10) is not reduced.

    Abstract translation: 公开了具有非偏振玻璃的局部区域或图案的偏光玻璃。 非偏振区域通过使用还原气体阻挡材料，玻璃的局部热加热或蚀刻技术形成。 图（1a） - （1b）示出了在玻璃（2）的表面上形成荫罩（4）或薄层材料（6）的还原气体阻断方法，以延缓还原过程，并使 生产玻璃中的色彩渐变和/或设计或图案。 掩蔽的玻璃暴露于还原气氛中，使得暴露或未被保护的区域（8）中的可还原相位减小，并且非偏振区域（掩蔽区域）（10）不被还原。

    GLASS PHOTONIC CRYSTAL BAND-GAP DEVICES WITH POLARIZING PROPERTIES
    28.
    发明申请
    GLASS PHOTONIC CRYSTAL BAND-GAP DEVICES WITH POLARIZING PROPERTIES 审中-公开
    具有极性特性的玻璃光子晶体带隙设备

    公开(公告)号：WO2008005488A2

    公开(公告)日：2008-01-10

    申请号：PCT/US2007/015464

    申请日：2007-07-03

    Applicant: CORNING INCORPORATED ,  BORRELLI, Nicholas F ,  KOCH, Karl W III ,  KUCHINSKY, Sergey A ,  MARJANOVIC, Sasha

    Inventor： BORRELLI, Nicholas F ,  KOCH, Karl W III ,  KUCHINSKY, Sergey A ,  MARJANOVIC, Sasha

    IPC: C03B37/022 ,  C03B37/025 ,  C03B37/15 ,  G02B5/30

    CPC classification number: G02B5/3025 ,  B82Y20/00 ,  C03B23/037 ,  C03B23/203 ,  C03B37/028 ,  G02B1/005

    Abstract: The invention is directed to polarizing devices that can be scaled to polarize electromagnetic radiation having wavelengths in ultraviolet to microwave range; and more particularly to devices suitable for use at visible and IR wavelengths. The device has a length, a width and a thickness, and a patterned system of channels, voids or holes embedded in or through a glass matrix and running through the thickness of the glass to thereby polarize incoming electromagnetic radiation having two polarization modes orthogonal to one another, blocking the passage of or reflecting one mode and permitting the other mode to pass through the device. The glass can be any glass suitable for transmitting the electromagnetic radiation in the range it will be used without excessive transmission losses due to absorbance of radiation in that range by moieties present in the glass. In one aspect, the device according to the invention may be deemed a "universal" polarizer: in the sense that it can be made to work in wavelength ranges from the microwave to the ultraviolet. The devices can also be made of polymeric materials utilizing the principles enumerated in the specification.

    Abstract translation: 本发明涉及可以缩放以使具有紫外至波长范围的波长的电磁辐射极化的偏振装置; 并且更具体地涉及适用于可见光和IR波长的装置。 该装置具有长度，宽度和厚度，以及嵌入或穿过玻璃基体并且穿过玻璃的厚度的通道，空隙或孔的图案化系统，从而极化具有与一个正交的两个偏振模的入射电磁辐射 另一个，阻止或反射一种模式，并允许其他模式通过设备。 玻璃可以是任何玻璃，适用于在不影响透射损失的范围内传输电磁辐射，这是由于玻璃中存在的部分的辐射吸光度。 在一个方面，根据本发明的装置可以被认为是“通用”偏振器：在可以使其在从微波到紫外线的波长范围内工作的意义上。 这些装置也可以由使用说明书中列举的原理的聚合材料制成。

Patent Agency Ranking