PHOTONIC-CRYSTAL TRANSPARENT-CONDUCTOR ASSEMBLY
    1.
    发明申请
    PHOTONIC-CRYSTAL TRANSPARENT-CONDUCTOR ASSEMBLY 审中-公开
    光电晶体透明导体总成

    公开(公告)号:WO2009085102A1

    公开(公告)日:2009-07-09

    申请号:PCT/US2008/013523

    申请日:2008-12-09

    CPC classification number: G02B6/10 G02B6/02342

    Abstract: A photonic-crystal (PC)-based transparent-conductor assembly is disclosed, wherein the assembly includes a photonic-crystal cloaking element (PCCE) that surrounds at least one opaque conducting element. The PCCE has a refractive index distribution designed to 'cloak' the at least one conductor contained therein from light incident upon the PCCE within a select wavelength range. The cloaking effect from the PCCE leaves light incident upon the assembly traveling in its original path as if undisturbed, thereby effectively rendering the conductor, as well as the PCCE, "transparent." This allows for the formation of a transparent conductor from an otherwise opaque conductor. One or more such PC transparent-conductor assemblies can be configured so that a pattern of otherwise opaque conducting elements can form a transparent electrode array useful for a variety of electric-field-driven optical devices such as optical displays.

    Abstract translation: 公开了一种基于光子晶体(PC)的透明导体组件,其中组件包括围绕至少一个不透明导电元件的光子晶体遮蔽元件(PCCE)。 PCCE具有折射率分布,其设计用于将选择波长范围内入射到PCCE上的光中包含的至少一个导体'披风'。 PCCE的掩盖效应使光线入射到原始路径上,如同不受干扰地运行,从而有效地使导体以及PCCE“透明”。 这允许从不透明导体形成透明导体。 可以配置一个或多个这样的PC透明导体组件,使得否则不透明的导电元件的图案可以形成用于各种电场驱动的光学器件(例如光学显示器)的透明电极阵列。

    MASK, MASK BLANK, PHOTOSENSITIVE MATERIAL THEREFOR AND FABRICATION THEREOF
    4.
    发明申请
    MASK, MASK BLANK, PHOTOSENSITIVE MATERIAL THEREFOR AND FABRICATION THEREOF 审中-公开
    遮罩,遮罩,其感光材料及其制造

    公开(公告)号:WO2004107044A2

    公开(公告)日:2004-12-09

    申请号:PCT/US2004/015243

    申请日:2004-05-13

    IPC: G03F

    CPC classification number: G03F1/30 C03C3/064 C03C3/091 C03C15/00 G03F1/32 G03F1/34

    Abstract: Disclosed are masks and mask blanks for photolithographic processes, photosensitive materials and fabrication method therefor. Photosensitive materials are used in the masks for recording permanent pattern features via UV exposure. The masks are advantageously phase-shifting, but can be gray-scale masks having index patterns with arbitrary distribution of refractive index and pattern dimension. The masks may have features above the surface formed from opaque or attenuating materials. Alumino-boro-germano-silicate glasses having a composition comprising, in terms of mole percentage, 1-6% of Al 2 O 3 , 10-36% of B 2 O 3 , 2-20% of GeO 2 , 40-80% of SiO 2 , 2-10% of R 2 O, where R is selected from Li, Na and K, and expressed in terms of weight percentage of the glass, 0-5% of F, can be used for the mask substrate.

    Abstract translation: 公开了用于光刻工艺的掩模和掩模坯料,感光材料及其制造方法。 光敏材料用于通过紫外线曝光记录永久图案特征的掩模。 掩模有利地是相移,但是可以是具有折射率和图案尺寸的任意分布的索引图案的灰度掩模。 掩模可以具有由不透明或衰减材料形成的表面上方的特征。 氧化铝 - 硼 - 锗酸 - 硅酸盐玻璃,其组成包括以摩尔百分比计为1〜6%的Al 2 O 3,10-36%的B 2 O 3,2〜20%的GeO 2,40〜80%的SiO 2,2-10 R 2选自Li,Na和K的R 2 O%,并且以玻璃重量百分比表示,0-5%的F可以用于掩模基板。

    BARRIER FILM FOR HYDROGEN COLORATION IN GLASS
    5.
    发明申请
    BARRIER FILM FOR HYDROGEN COLORATION IN GLASS 审中-公开
    玻璃中的氢气色彩遮蔽膜

    公开(公告)号:WO1997037946A1

    公开(公告)日:1997-10-16

    申请号:PCT/US1997004973

    申请日:1997-03-25

    Abstract: Methods of patterning or forming color gradients and/or designs on a glass surface are disclosed. Patterns are formed by depositing a film of metal on at least one surface of the glass; forming a layer of photoresist over the metal; exposing the article to light through a mask which contains a desired pattern; developing the piece to remove the exposed photoresist to reveal the underlying metal; removing the underlying metal to reveal the underlying glass; and removing the unexposed photoresist to reveal the underlying metal. To form color gradients or color patterns, the glass article is further treated in hydrogen at a temperature in the range of 300-600 DEG C to effect the desired surface coloration.

    Abstract translation: 公开了在玻璃表面上图案化或形成色彩渐变和/或设计的方法。 通过在玻璃的至少一个表面上沉积金属膜形成图案; 在金属上形成光致抗蚀剂层; 通过包含所需图案的面罩将物品曝光; 显影该片以除去暴露的光致抗蚀剂以露出下面的金属; 移除下面的金属以露出下面的玻璃; 并除去未曝光的光致抗蚀剂以露出下面的金属。 为了形成色彩渐变或颜色图案,玻璃制品在氢气中在300-600℃的温度下进一步处理以实现所需的表面着色。

    DIMENSIONAL SILICA-BASED POROUS SILICON STRUCTURES AND METHODS OF FABRICATION
    6.
    发明申请
    DIMENSIONAL SILICA-BASED POROUS SILICON STRUCTURES AND METHODS OF FABRICATION 审中-公开
    二维硅基多孔硅结构和制造方法

    公开(公告)号:WO2012027121A2

    公开(公告)日:2012-03-01

    申请号:PCT/US2011/047367

    申请日:2011-08-11

    Abstract: Methods of fabricating dimensional silica-based substrates or structures comprising a porous silicon layers are contemplated. According to one embodiment, oxygen is extracted from the atomic elemental composition of a silica glass substrate by reacting a metallic gas with the substrate in a heated inert atmosphere to form a metal-oxygen complex along a surface of the substrate. The metal-oxygen complex is removed from the surface of the silica glass substrate to yield a crystalline porous silicon surface portion and one or more additional layers are formed over the crystalline porous silicon surface portion of the silica glass substrate to yield a dimensional silica-based substrate or structure comprising the porous silicon layer. Embodiments are also contemplated where the substrate is glass-based, but is not necessarily a silica-based glass substrate. Additional embodiments are disclosed and claimed.

    Abstract translation: 考虑制造尺寸二氧化硅基衬底或包含多孔硅层的结构的方法。 根据一个实施例,通过在加热的惰性气氛中使金属气体与衬底反应以沿着衬底的表面形成金属 - 氧复合物,从二氧化硅玻璃衬底的原子元素组合物中提取氧。 将金属 - 氧复合物从二氧化硅玻璃基材的表面去除以产生结晶多孔硅表面部分,并且在石英玻璃基材的结晶多孔硅表面部分上形成一个或多个另外的层,以产生基于二氧化硅的尺寸 基材或包含多孔硅层的结构。 也考虑了其中衬底是基于玻璃的,但不一定是二氧化硅基玻璃衬底的实施例。 另外的实施例被公开和要求保护。

    TEXTURED SUPERSTRATES FOR PHOTOVOLTAICS
    7.
    发明申请
    TEXTURED SUPERSTRATES FOR PHOTOVOLTAICS 审中-公开
    纹身超薄镜

    公开(公告)号:WO2011066516A1

    公开(公告)日:2011-06-03

    申请号:PCT/US2010/058258

    申请日:2010-11-30

    CPC classification number: H01L31/02366 Y02E10/50

    Abstract: Textured superstrates for photovoltaic cells, for example, silicon tandem photovoltaic cells with light scattering properties which are sufficient for light trapping independent of wavelength are described herein. Features of a textured surface of a superstrate, via the method(s) used to make the textured superstrate, can be tailored to provide the desired light scattering/trapping properties. The method includes grinding and lapping or grinding, lapping, and etching of a glass superstrate.

    Abstract translation: 本文描述了用于光伏电池的纹理的覆层,例如具有光散射特性的硅串联光伏电池,其足以用于独立于波长的光捕获。 通过用于制造纹理的上层的方法,可以调整上覆层织构表面的特征以提供所需的光散射/捕获性能。 该方法包括研磨和研磨,研磨,研磨和蚀刻玻璃覆盖物。

    GLASS PHOTONIC CRYSTAL BAND-GAP DEVICES WITH POLARIZING PROPERTIES

    公开(公告)号:WO2008005488A3

    公开(公告)日:2008-05-02

    申请号:PCT/US2007015464

    申请日:2007-07-03

    Abstract: The invention is directed to polarizing devices that can be scaled to polarize electromagnetic radiation having wavelengths in ultraviolet to microwave range; and more particularly to devices suitable for use at visible and IR wavelengths. The device has a length, a width and a thickness, and a patterned system of channels, voids or holes embedded in or through a glass matrix and running through the thickness of the glass to thereby polarize incoming electromagnetic radiation having two polarization modes orthogonal to one another, blocking the passage of or reflecting one mode and permitting the other mode to pass through the device. The glass can be any glass suitable for transmitting the electromagnetic radiation in the range it will be used without excessive transmission losses due to absorbance of radiation in that range by moieties present in the glass. In one aspect, the device according to the invention may be deemed a "universal" polarizer: in the sense that it can be made to work in wavelength ranges from the microwave to the ultraviolet. The devices can also be made of polymeric materials utilizing the principles enumerated in the specification.

    IMAGE SENSOR USING THIN-FILM SOI
    9.
    发明申请

    公开(公告)号:WO2008033508A3

    公开(公告)日:2008-03-20

    申请号:PCT/US2007/020011

    申请日:2007-09-14

    Abstract: Systems and methods related to an image sensor of one or more embodiments include subjecting a donor semiconductor wafer to an ion implantation process to create an exfoliation layer of semiconductor film on the donor semiconductor wafer, forming an anodic bond between the exfoliation layer and an insulator substrate by means of electrolysis; separating the exfoliation layer from the donor semiconductor wafer to transfer the exfoliation layer to the insulator substrate; and creating a plurality of image sensor features proximate to the exfoliation layer. Forming the anodic bonding by electrolysis may include the application of heat, pressure and voltage to the insulator structure and the exfoliation layer attached to the donor semiconductor wafer. Image sensor devices include an insulator structure, a semiconductor film, an anodic bond between them, and a plurality of image sensor features. The semiconductor film preferably comprises an exfoliation layer of a substantially single-crystal donor semiconductor wafer.

    MAGNETIC PHOTONIC CRYSTAL STRUCTURE FOR PROVIDING SPATIAL FREQUENCY ASYMMETRY FOR LIGHT PROPAGATING IN DIFFERENT DIRECTIONS
    10.
    发明申请
    MAGNETIC PHOTONIC CRYSTAL STRUCTURE FOR PROVIDING SPATIAL FREQUENCY ASYMMETRY FOR LIGHT PROPAGATING IN DIFFERENT DIRECTIONS 审中-公开
    用于提供不同方向光传播的空间频率不对称的磁光子晶体结构

    公开(公告)号:WO2006058183A2

    公开(公告)日:2006-06-01

    申请号:PCT/US2005042675

    申请日:2005-11-22

    CPC classification number: B82Y20/00 G02B6/1225

    Abstract: A magnetic photonic crystal for providing asymmetry of spatial frequencies in the propagation of light is provided. The crystal is formed from at least two materials having different indices of refraction which are aligned along the longitudinal axis of the crystal. And arranged in an array whose symmetry does not include a spatial inversion operator such that (x,y) =/= (-x,-y). One or more of the materials forming the array is magnetic such that the magnetic group representation of the array does not include time inversion as a symmetric operator. In operation, when the magnetic material forming the material is magnetized, the group velocity property of light propagated in one direction along the axis of the array is different from the group velocity property of light transmitted in an opposite direction through the array. The magnetic photonic crystal may be used, for example, as an optical memory device or a high speed modulator/demodulator.

    Abstract translation: 提供了一种用于在光传播中提供空间频率不对称的磁光子晶体。 晶体由具有不同折射率的至少两种材料形成,其沿着晶体的纵向轴线排列。 并且排列成阵列,其对称性不包括空间反演算子,使得(x,y)= / =(-x,-y)。 形成阵列的一种或多种材料是磁性的,使得阵列的磁组表示不包括作为对称算子的时间反演。 在操作中,当形成材料的磁性材料被磁化时,沿着阵列的轴在一个方向上传播的光的组速度特性不同于沿与阵列相反的方向透射的光的组速度特性。 磁光子晶体可以用作例如光存储器件或高速调制器/解调器。

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