公开(公告)号：WO2013171214A1

公开(公告)日：2013-11-21

申请号：PCT/EP2013/059945

申请日：2013-05-14

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： VAN VEEN, Alexander Hendrik Vincent

IPC: H01J37/09 ,  H01J37/30 ,  H01J37/317

CPC classification number: H01J37/09 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/147 ,  H01J37/3007 ,  H01J37/302 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/026 ,  H01J2237/0262 ,  H01J2237/0264 ,  H01J2237/16 ,  H01J2237/182 ,  H01J2237/188

Abstract: The present invention relates to a charged particle lithography system. The system has a beamlet generator including a beam generator for generating a charged particle beam and an aperture array (6) for forming a plurality of beamlets from the charged particle beam, and a beamlet projector for projecting the beamlets onto a target surface. The charged particle beam generator includes a charged particle source (3) for generating a diverging charged particle beam, a collimator system (5a, 5b, 5c), one or more pumps (220), a high voltage shielding arrangement (201) for shielding components outside the high voltage shielding arrangement from high voltages within the high voltage shielding arrangement, and a cooling arrangement (203, 204) for removing heat. The one or more pumps are located between the high voltage shielding arrangement and the cooling arrangement.

Abstract translation: 本发明涉及带电粒子光刻系统。 该系统具有一个子束发生器，其包括用于产生带电粒子束的束发生器和用于从带电粒子束形成多个子束的孔径阵列（6），以及用于将子束投影到目标表面上的小射线投影仪。 带电粒子束发生器包括用于产生发散带电粒子束的带电粒子源（3），准直器系统（5a，5b，5c），一个或多个泵（220），用于屏蔽的高压屏蔽装置（201） 在高压屏蔽装置外部的高电压屏蔽装置之外的部件与高电压屏蔽装置内的高电压，以及用于去除热量的冷却装置（203,204）。 一个或多个泵位于高压屏蔽装置和冷却装置之间。

公开(公告)号：WO2012146789A1

公开(公告)日：2012-11-01

申请号：PCT/EP2012/057959

申请日：2012-05-01

Applicant: MAPPER LITHOGRAPHY IP B.V. ,  KUIPER, Vincent Sylvester ,  SLOT, Erwin ,  VAN KERVINCK, Marcel Nicolaas Jacobus ,  DE BOER, Guido ,  DE JONG, Hendrik Jan

Inventor： KUIPER, Vincent Sylvester ,  SLOT, Erwin ,  VAN KERVINCK, Marcel Nicolaas Jacobus ,  DE BOER, Guido ,  DE JONG, Hendrik Jan

IPC: G03F7/20

CPC classification number: G03F7/70733 ,  G03F7/7075 ,  H01L21/67178 ,  H01L21/67225 ,  H01L21/67745

Abstract: An apparatus (401) for transferring substrates (405) within a lithography system (300), the lithography system comprising a substrate preparation unit (360a-d) for clamping a substrate onto a substrate support structure to form a clamped substrate, and an interface with a substrate supply system (315) for receiving unclamped substrates. The apparatus comprises a body (680) provided with a first set of fingers (684a, b) for carrying an undamped substrate and a second set of fingers (685a, b) for carrying a substrate support structure (403), and the first set of fingers is located below the second set of fingers, and fingers of the first set of fingers have a different shape than the fingers of the second set of fingers.

Abstract translation: 一种用于在光刻系统（300）内传送衬底（405）的设备（401），所述光刻系统包括用于将衬底夹持到衬底支撑结构上以形成夹持衬底的衬底制备单元（360a-d） 具有用于接收未夹紧衬底的衬底供应系统（315）。 该设备包括：主体（680），其设置有用于承载无阻尼基板的第一组指状物（684a，b）和用于承载基板支撑结构（403）的第二组指状物（685a，b），第一组 的手指位于第二组手指之下，并且第一组手指的手指具有与第二组手指的手指不同的形状。

公开(公告)号：WO2012131108A1

公开(公告)日：2012-10-04

申请号：PCT/EP2012/056000

申请日：2012-04-02

Applicant: NTL LEMNIS HOLDING B.V. ,  DE VISSER, Alexander, Paul, Johannus ,  DEKKER, Martijn, Jeroen

Inventor： DE VISSER, Alexander, Paul, Johannus ,  DEKKER, Martijn, Jeroen

IPC: F21V3/02 ,  F21K99/00 ,  F21Y101/02 ,  F21Y113/00 ,  F21V7/04

CPC classification number: F21K9/20 ,  F21K9/232 ,  F21K9/235 ,  F21K9/60 ,  F21V3/02 ,  F21Y2113/13 ,  F21Y2115/10

Abstract: The invention relates to an LED light source comprising a light unit and a hollow curved cap (20) covering the light unit. The light unit comprises a plurality of light emitting diodes (LEDs) (3) distributed in the form of a spatial arrangement having a center position. The plurality of LEDs includes at least two different types of LEDs. Each type of LED is arranged for the emission of radiation within a different wavelength range. The cap is substantially transparent for radiation emitted by the light unit. The cap is further provided with an axially symmetric protrusion (22) forming a depression (21) in the exterior of the cap. The symmetry axis of the protrusion substantially coincides with the center position of the spatial arrangement of the plurality of LEDs.

Abstract translation: 本发明涉及一种LED光源，其包括光单元和覆盖该光单元的中空弯曲盖（20）。 光单元包括以具有中心位置的空间布置的形式分布的多个发光二极管（LED）（3）。 多个LED包括至少两种不同类型的LED。 每种类型的LED被布置用于在不同波长范围内发射辐射。 盖子对于由光单元发射的辐射是基本透明的。 帽还设置有在帽的外部形成凹部（21）的轴对称突起（22）。 突起的对称轴基本上与多个LED的空间布置的中心位置重合。

公开(公告)号：WO2012101132A1

公开(公告)日：2012-08-02

申请号：PCT/EP2012/051065

申请日：2012-01-24

Applicant: ISO GROEP MACHINEBOUW B.V. ,  STRUIJK, Wim ,  VAN DER EL, Wim ,  DE KONING, Dirk Jan ,  SCHOUTEN, Willem Nicolaas

Inventor： STRUIJK, Wim ,  VAN DER EL, Wim ,  DE KONING, Dirk Jan ,  SCHOUTEN, Willem Nicolaas

IPC: A01G9/08

CPC classification number: A01G9/083 ,  A01G9/085 ,  B25J15/0028

Abstract: The present invention relates to an apparatus for placing cuttings of plants in a cultivation medium. The apparatus comprises a cuttings supply system for supplying a plurality of cuttings, a camera system for identifying cuttings among the plurality of cuttings that are suitable for individual pick up using pattern recognition, a pick-up tool for picking up cuttings identified by the camera system, and a planting system for simultaneously planting multiple cuttings in the cultivation medium. The planting system and the pick-up tool are separate entities. Furthermore, the pick-up tool is arranged for suitably placing picked-up cuttings in the planting system.

Abstract translation: 本发明涉及一种将栽培植物放置在栽培培养基中的装置。 该装置包括用于供应多个切屑的切屑供应系统，用于识别适合于使用图案识别的各个拾取的多个切割中的切割的相机系统，用于拾取由相机系统识别的切割的拾取工具 以及用于在培养基中同时种植多个切屑的种植系统。 种植系统和拾取工具是独立的实体。 此外，拾取工具被布置成将拾取的切屑适当地放置在种植系统中。

公开(公告)号：WO2012080278A1

公开(公告)日：2012-06-21

申请号：PCT/EP2011/072654

申请日：2011-12-13

Applicant: MAPPER LITHOGRAPHY IP B.V. ,  DE BOER, Guido ,  DE JONG, Hendrik Jan ,  KUIPER, Vincent Silvester ,  SLOT, Erwin

Inventor： DE BOER, Guido ,  DE JONG, Hendrik Jan ,  KUIPER, Vincent Silvester ,  SLOT, Erwin

IPC: G03F7/20 ,  H01J37/317

CPC classification number: G03F7/70808 ,  G03F7/708 ,  G03F7/70975 ,  H01J37/16 ,  H01J37/185 ,  H01J2237/31774

Abstract: The invention relates to a lithography system (300) comprising a plurality of lithography system units. Each lithography system unit comprises a lithography apparatus (301) arranged in a vacuum chamber for patterning a substrate; a load lock system (310) for transferring substrates into and out of the vacuum chamber; and a door for enabling entry into the vacuum chamber for servicing purposes. The load lock system and the door of each lithography system unit are provided at the same side and face a free area at a side of the lithography system, in particular the service area (305).

Abstract translation: 本发明涉及包括多个光刻系统单元的光刻系统（300）。 每个光刻系统单元包括布置在用于图案化衬底的真空室中的光刻设备（301） 负载锁定系统（310），用于将衬底输送到真空室中; 以及能够进入真空室以进行维修目的的门。 每个光刻系统单元的负载锁定系统和门设置在同一侧并且面对光刻系统的一侧的自由区域，特别是服务区域（305）。

公开(公告)号：WO2012062727A1

公开(公告)日：2012-05-18

申请号：PCT/EP2011/069600

申请日：2011-11-08

Applicant: MAPPER LITHOGRAPHY IP B.V. ,  WIELAND, Marco Jan-Jaco ,  VAN DE PEUT, Teunis ,  VAN DER WILT, Floris Pepijn ,  HABEKOTTE, Ernst

Inventor： WIELAND, Marco Jan-Jaco ,  VAN DE PEUT, Teunis ,  VAN DER WILT, Floris Pepijn ,  HABEKOTTE, Ernst

IPC: H01J37/22 ,  H01J37/244 ,  H01J37/317 ,  H01J37/04 ,  H01J37/304 ,  B82Y10/00

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31762 ,  H01J2237/31774

Abstract: A maskless lithography system for exposing a target (121) according to pattern data (202). The system comprises an electron optical column (102) for generating a plurality of charged particle beamlets (132, 133) for exposing the target, the electron optical column including a beamlet blanker array (117) for modulating the beamlets, the beamlet blanker array including a plurality of receivers (150) for receiving beamlet data signals and a plurality of beamlet blanker elements (152) for modulating the beamlets in accordance with the data signals. The also comprises a data path (101) comprising a preprocessing system (140) for storing and processing the pattern data and a plurality of transmission channels (240) for transmitting the processed pattern data from the preprocessing system to the beamlet blanker elements. The data path further comprises a pattern streaming system (230) for receiving the pattern data and generating beamlet data signals, and first and second channel selectors (220, 320) connecting a subset of selected transmission channels among the transmission channels for transmitting the pattern data, wherein the first channel selector (220) is connected between the preprocessing system and the transmission channels and the second channel selector (320) is connected between the channels and the beamlet blanker elements.

Abstract translation: 一种用于根据图案数据（202）曝光目标（121）的无掩模光刻系统。 该系统包括用于产生用于曝光靶的多个带电粒子子束（132,133）的电子光学柱（102），该电子光学柱包括用于调制子束的子束遮蔽器阵列（117），该子束遮蔽器阵列包括 用于接收子束数据信号的多个接收器（150）和用于根据数据信号调制子束的多个子束消隐元件（152）。 还包括数据路径（101），包括用于存储和处理模式数据的预处理系统（140）和用于将处理的模式数据从预处理系统发送到子束消除器元件的多个传输通道（240）。 数据路径还包括用于接收模式数据并产生子束数据信号的模式流传输系统（230），以及连接用于发送模式数据的传输信道之间的所选传输信道的子集的第一和第二信道选择器（220,320） ，其中所述第一信道选择器（220）连接在所述预处理系统和所述传输信道之间，并且所述第二信道选择器（320）连接在所述信道和所述子束消除器元件之间。

公开(公告)号：WO2012055938A1

公开(公告)日：2012-05-03

申请号：PCT/EP2011/068803

申请日：2011-10-26

Applicant: MAPPER LITHOGRAPHY IP B.V. ,  WIELAND, Marco Jan-Jaco ,  VAN DE PEUT, Teunis ,  VAN VEEN, Alexander Hendrik Vincent ,  JAGER, Remco ,  STEENBRINK, Stijn Willem Herman Karel

Inventor： WIELAND, Marco Jan-Jaco ,  VAN DE PEUT, Teunis ,  VAN VEEN, Alexander Hendrik Vincent ,  JAGER, Remco ,  STEENBRINK, Stijn Willem Herman Karel

IPC: H01J37/04 ,  H01J37/22 ,  H01J37/317

CPC classification number: H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/22 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0437

Abstract: The invention relates to a charged-particle multi-beamlet lithography system. The system comprises a beam generator for generating a plurality of beamlets, a beamlet blanker array for patterning the plurality of beamlets, an optical fiber arrangement, and a projection system. The beamlet blanker array comprises a substrate provided with a first area comprising one or more modulators and a second area free of modulators. The beamlet blanker array comprises one or more light sensitive elements, electrically connected to the one or more modulators, and arranged to receive light beams carrying pattern data. The optical fiber arrangement comprises a plurality of optical fibers for guiding the light beams carrying pattern data towards the one or more light sensitive elements. The projection of the optical fiber arrangement onto a surface of the beamlet blanker array in a direction perpendicular to the surface falls entirely within the second area.

Abstract translation: 本发明涉及带电粒子多子束光刻系统。 该系统包括用于产生多个子束的光束发生器，用于对多个子束进行图案化的子束遮蔽器阵列，光纤布置和投影系统。 子束消隐器阵列包括设置有包括一个或多个调制器的第一区域和没有调制器的第二区域的衬底。 子束消隐器阵列包括电连接到一个或多个调制器的一个或多个光敏元件，并被布置成接收携带图案数据的光束。 光纤布置包括多个光纤，用于将携带图案数据的光束引向一个或多个光敏元件。 光束布置在垂直于表面的方向上投射到子束消除器阵列的表面上完全落在第二区域内。

公开(公告)号：WO2012035160A4

公开(公告)日：2012-03-22

申请号：PCT/EP2011/066156

申请日：2011-09-16

Applicant: BIOeCON INTERNATIONAL HOLDING N.V. ,  MAKKEE, Michiel ,  MOULIJN, Jacob Adriaan ,  LI, Jianrong ,  O'CONNOR, Paul ,  RASSER, Jacobus Cornelis ,  ROSHEUVEL, Armand Eduard

Inventor： MAKKEE, Michiel ,  MOULIJN, Jacob Adriaan ,  LI, Jianrong ,  O'CONNOR, Paul ,  RASSER, Jacobus Cornelis ,  ROSHEUVEL, Armand Eduard

IPC: C08B15/02 ,  C08B16/00 ,  C07C31/26

Abstract: A process is disclosed for conversion of cellulose in an Ionic Liquid medium. The process is characterized in that a cellulose-containing feedstock and an Ionic Liquid are mixed at a temperature below 80 °C. The mixture is heated to a conversion temperature in the range of 80 °C to 220 °C under a hydrogen atmosphere. The presence of hydrogen during the heating step significantly reduces the formation of degradation products.

公开(公告)号：WO2011157836A1

公开(公告)日：2011-12-22

申请号：PCT/EP2011/060161

申请日：2011-06-17

Applicant: LEMNIS LIGHTING PATENT HOLDING B.V. ,  DE VISSER, Alexander Paul Johannus

Inventor： DE VISSER, Alexander Paul Johannus

IPC: F21V29/00 ,  F21S8/08 ,  F21S8/00 ,  F21V15/01 ,  F21W131/103 ,  F21Y101/02 ,  F21W111/02

CPC classification number: F21V29/004 ,  F21V15/01 ,  F21V29/507 ,  F21V29/83 ,  F21W2111/02 ,  F21W2131/103 ,  F21Y2115/10 ,  Y02B20/72

Abstract: The invention relates to a luminaire including a housing and a light source. The light source includes one or more LEDs (6). The housing includes a heat conductive body (2) for accommodating the one or more LEDs, an upper surface having a plurality of first holes (12), a lower surface having a plurality of second holes (22), and a plurality of convection cooling ducts (14) connecting corresponding ones of the first and second holes. The convection cooling ducts are connected to the heat conductive body to form a heat conduction path from the one or more LEDs to the convection cooling ducts. Additionally, the convection cooling ducts are aligned substantially vertically when the luminaire is mounted for use, to form a cooling convection path through the ducts.

Abstract translation: 本发明涉及一种包括外壳和光源的灯具。 光源包括一个或多个LED（6）。 壳体包括用于容纳一个或多个LED的导热体（2），具有多个第一孔（12）的上表面，具有多个第二孔（22）的下表面和多个对流冷却 连接第一和第二孔中对应的孔的管道（14）。 对流冷却管道连接到导热体，以形成从一个或多个LED到对流冷却管道的热传导路径。 此外，当照明装置安装使用时，对流冷却管道基本垂直地排列，以形成通过管道的冷却对流路径。

公开(公告)号：WO2011117253A1

公开(公告)日：2011-09-29

申请号：PCT/EP2011/054372

申请日：2011-03-22

Applicant: MAPPER LITHOGRAPHY IP B.V. ,  HANFOUG, Rabah

Inventor： HANFOUG, Rabah

IPC: H01J37/244 ,  H01J37/317 ,  H01J37/304

CPC classification number: H01J37/244 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3045 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/2443

Abstract: Charged particle beamlet lithography system for transferring a pattern to a surface of a target comprising a sensor for determining one or more characteristics of one or more charged particle beamlets. The sensor comprises a converter element (1) for receiving charged particles (22) and generating photons in response. The converter element comprises a surface for receiving one or more charged particle beamlets, the surface being provided with one or more cells for evaluating one or more individual beamlets. Each cell comprises a predetermined blocking pattern (18) of one or more charged particle blocking structures forming multiple knife edges at transitions between blocking and non-blocking regions along a predetermined beamlet scan trajectory over the converter element surface. The converter element surface is covered with a coating layer (20) substantially permeable for said charged particles and substantially impermeable for ambient light. An electrically conductive layer (21) is located between the coating layer and the blocking structures.

Abstract translation: 用于将图案转印到目标表面的带电粒子束光刻系统，包括用于确定一个或多个带电粒子子束的一个或多个特性的传感器。 传感器包括用于接收带电粒子（22）并产生响应的光子的转换元件（1）。 转换器元件包括用于接收一个或多个带电粒子子束的表面，该表面设置有用于评估一个或多个单个子束的一个或多个单元。 每个单元包括一个或多个带电粒子阻挡结构的预定阻挡图案（18），其在转换器元件表面上沿预定的子束扫描轨迹在阻挡区域和非阻挡区域之间的转变处形成多个刀刃。 转换器元件表面覆盖有对于所述带电粒子基本可渗透的基本上不透气的涂层（20）。 导电层（21）位于涂层和阻挡结构之间。