公开(公告)号：WO2022189088A1

公开(公告)日：2022-09-15

申请号：PCT/EP2022/053207

申请日：2022-02-10

Applicant: ASML NETHERLANDS B.V.

Inventor： TREES, Dietmar, Uwe, Herbert ,  DRIESSEN, Theodorus, Wilhelmus ,  SAMS, Benjamin, Andrew ,  ATENCIO, Edgardo, Zamora ,  DVORAK, Ondrej

IPC: F16K13/10 ,  F16K99/00 ,  F16L55/103 ,  H05G2/00

Abstract: A component for a target material transfer system for a laser-produced plasma radiation source and a method of manufacturing such a component are disclosed. The component, which may, for example, be a target material transfer line, a freeze valve, or a flow restrictor, or some combination of this functionality, is made up of a glass capillary body sealed with glass-to-metal seals at both of its ends to a respective metal fitting. The method of manufacturing involves heating the ends of the glass capillary and then forming them to conform with, and forming a glass-to-metal seal with, the interior contours of the respective channels in each of the metal fittings.

公开(公告)号：WO2022179739A1

公开(公告)日：2022-09-01

申请号：PCT/EP2021/086729

申请日：2021-12-20

Applicant: ASML NETHERLANDS B.V.

Inventor： KLINKHAMER, Jacob, Fredrik, Friso ,  VAN HINSBERG, Michel, Alphons, Theodorus

IPC: G03F7/20

Abstract: Disclosed herein is a method for representing control parameter data for controlling a lithographic apparatus during a scanning exposure of an exposure field on a substrate, the method comprising: obtaining a set of periodic base functions, each base function out of said set of periodic base functions having a different frequency and a period smaller than a dimension associated with the exposure field across which the lithographic apparatus needs to be controlled; obtaining the control parameter data; and determining a representation of said control parameter data using the set of periodic base functions.

公开(公告)号：WO2022174991A1

公开(公告)日：2022-08-25

申请号：PCT/EP2022/050490

申请日：2022-01-12

Applicant: ASML NETHERLANDS B.V.

Inventor： SMORENBURG, Petrus, Wilhelmus ,  REININK, Johan ,  REIJNDERS, Marinus, Petrus ,  NIENHUYS, Han-Kwang ,  O'DWYER, David ,  ROOBOL, Sander, Bas ,  PORTER, Christina, Lynn ,  EDWARD, Stephen

IPC: G02B6/26 ,  H01S3/00 ,  H01S3/032 ,  H01S4/00 ,  G02F1/35 ,  G21K1/10 ,  H05G2/00

Abstract: An assembly and method for separating first radiation and second radiation in the far field, wherein the first radiation and the second radiation have non-overlapping wavelengths, The assembly comprises a capillary structure, wherein the first radiation and the second radiation propagate coaxially along at least a portion of the capillary structure, and an optical structure configured to control the spatial distribution of the first radiation outside of the capillary structure, through interference, such that the intensity of the first radiation in the far field is reduced along an optical axis of the second radiation.

公开(公告)号：WO2022167179A1

公开(公告)日：2022-08-11

申请号：PCT/EP2022/050489

申请日：2022-01-12

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： ALSAQQA, Ali ,  UEBEL, Patrick, Sebastian ,  TEUNISSEN, Paulus, Antonius, Andreas

IPC: G02B26/08 ,  G01N21/00 ,  G03F7/20

Abstract: An optical filter apparatus comprising an optical divergence device, operable to receive optical pulses and spatially distribute the optical pulses over an optical plane in dependence with a pulse energy of each of the optical pulses; and a spatial filter, located at said optical plane, operable to apply spatial filtering to the optical pulses based on a location of each of the optical pulses at the optical plane resulting from the spatial distributing.

公开(公告)号：WO2022167178A1

公开(公告)日：2022-08-11

申请号：PCT/EP2022/050480

申请日：2022-01-12

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN LAARHOVEN, Hendrik, Adriaan ,  VAN DEN BROEK, Bastiaan, Maurice ,  RUTIGLIANI, Vito, Daniele

IPC: G03F7/20

Abstract: Disclosed is a method of determining a measurement recipe for measurement of in-die targets (IDM) located within one or more die areas of an exposure field (EF). The method comprises obtaining first measurement data relating to measurement of a plurality of reference targets (RF) and second measurement data relating to measurement of a plurality of in-die targets (IDM), said targets having respective different overlay biases and measured using a plurality of different acquisition settings for acquiring said measurement data. One or more machine learning models are trained using said first measurement data to obtain a plurality of candidate measurement recipes, wherein said candidate measurement recipes comprise a plurality of combinations of a trained machine learned model and a corresponding acquisition setting; and a preferred measurement recipe is determined from said candidate measurement recipes using said second measurement data.

公开(公告)号：WO2022167177A1

公开(公告)日：2022-08-11

申请号：PCT/EP2022/050471

申请日：2022-01-12

Applicant: ASML NETHERLANDS B.V.

Inventor： TEN BERGE, Gerardus, Ferdinandus ,  HENDRIKS, Jimi

IPC: G03F7/20 ,  G03F1/62

Abstract: There is described a lithographic apparatus including a membrane assembly and a radiation beam path, wherein the membrane assembly includes a membrane, the membrane being disposed in the radiation beam path, wherein the membrane assembly is configured to selectively move the membrane from a first position in the radiation beam path to a second position in the radiation beam path. Also described is a membrane assembly, a method of extending the lifespan of a membrane, and the use of such apparatuses and methods in a lithographic apparatus or process.

公开(公告)号：WO2022161736A1

公开(公告)日：2022-08-04

申请号：PCT/EP2021/087888

申请日：2021-12-30

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： VAN BOKHOVEN, Laurentius, Johannes, Adrianus ,  AJGAONKAR, Mahesh, Upendra

IPC: G03F7/20

Abstract: Systems, apparatuses, and methods are provided for heating a plurality of optical components. An example method can include receiving an input radiation beam from a radiation source. The example method can further include generating a plurality of output radiation beams based on the input radiation beam. The example method can further include transmitting the plurality of output radiation beams towards a plurality of heater head optics configured to heat the plurality of optical components. Optionally, the example method can further include controlling a respective power value, and realizing a flat-top far-field profile, of each of the plurality of output radiation beams.

公开(公告)号：WO2022161726A1

公开(公告)日：2022-08-04

申请号：PCT/EP2021/087611

申请日：2021-12-23

Applicant: ASML NETHERLANDS B.V.

Inventor： THEEUWES, Thomas ,  WILDENBERG, Jochem, Sebastiaan ,  ZHANG, Lei ,  VAN ITTERSUM, Ronald

IPC: G03F7/20

Abstract: Disclosed is a method of determining a performance parameter or a parameter derived therefrom, the performance parameter being associated with a performance of a lithographic process for forming one or more structures on a substrate subject to the lithographic process. The method comprises obtaining a probability description distribution comprising a plurality of probability descriptions of the performance parameter, each probability description corresponding to a different position on the substrate and decomposing each probability description into a plurality of component probability descriptions to obtain a plurality of component probability description distributions. A component across-substrate-area model is determined for each of said plurality of component probability descriptions, which models its respective component probability description across a substrate area; and a value for said performance parameter or parameter derived therefrom is determined based on the component across-substrate-area models.

公开(公告)号：WO2022156875A1

公开(公告)日：2022-07-28

申请号：PCT/EP2021/050977

申请日：2021-01-19

Applicant: CARL ZEISS SMT GMBH ,  ASML NETHERLANDS B.V.

Inventor： SCHNEIDER, Eva ,  GRUNER, Toralf ,  TUDOROVSKIY, Timur

IPC: G03F7/20

Abstract: In a method of setting up a projection exposure system for exposing a radiation sensitive substrate with at least one image of a pattern, the projection exposure system comprises an illumination system (ILL) configured to generate illumination radiation (ILR) directed onto the pattern in an illumination field; a projection lens (PO) comprising a plurality of optical elements configured to project a part of the pattern lying in the illumination field onto an image field at the substrate with projection radiation; a measuring system (MS) capable of measuring at least one property of the projection radiation representing an aberration level at a plurality of spaced apart measuring points distributed in the image field; and an operating control system comprising at least one manipulator operatively connected to an optical element of the projection exposure system to modify imaging properties of the projection exposure system based on measurement results generated by the measuring system. The method comprises the step of determining, in a measuring point distribution calculation (MPDC), a measuring point distribution defining a number and positions of measuring points to be used in a measurement, wherein the measuring point distribution calculation (MPDC) is performed under boundary conditions representing at least: (i) manipulation capacities of the operating control system; (ii) measuring capacities of the measuring system; and (iii) predefined use case scenarios defining a set of representative use cases, wherein each use case corresponds to a specific aberration pattern generated by the projection exposure system under a predefined set of use conditions.

公开(公告)号：WO2022152479A1

公开(公告)日：2022-07-21

申请号：PCT/EP2021/085336

申请日：2021-12-12

Applicant: ASML NETHERLANDS B.V.

Inventor： JANSEN, Maarten, Jozef

IPC: G01B9/02001 ,  G01B9/02055 ,  G01B9/02003 ,  G03F7/20

Abstract: The invention provides an interferometer system comprising: - a light source configured to emit a first light beam and a second light beam; - an optics system configured to allow the first light beam to travel along a measurement path including a target, and the second light beam to travel along a fixed reference path excluding the target; and - a signal generator configured to introduce a power-modulated optical signal in the measurement path or the reference path to determine jitter caused by components of the interferometer system downstream of the signal generator.