公开(公告)号：WO2003067632A2

公开(公告)日：2003-08-14

申请号：PCT/US2003/003585

申请日：2003-02-05

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION

Inventor： LANGE, Steven, R.

IPC: H01L

CPC classification number: G02B17/086 ,  G02B17/0808 ,  G02B17/0856 ,  G02B17/0892 ,  G02B21/0016 ,  G02B21/025 ,  G02B21/04 ,  G02B21/18 ,  G02B21/367

Abstract: Techniques for utilizing a microscope inspection system capable of inspecting specimens at high throughput rates are described. The inspection system achieves the higher throughput rates by utilizing more than one detector array and a large field of view to scan the surface of the semiconductor wafers. The microscope inspection system also has high magnification capabilities, a high numerical aperture, and a large field of view. By using more than one detector array, more surface area of a wafer can be inspected during each scanning swath across the semiconductor wafers. The microscope inspection system is configured to have a larger field of view so that the multiple detector arrays can be properly utilized. Additionally, special arrangements of reflective and/or refractive surfaces are used in order to fit the detector arrays within the physical constraints of the inspection system.

Abstract translation: 描述了利用能够以高生产率检查试样的显微镜检查系统的技术。 检查系统通过利用多于一个的检测器阵列和大的视场扫描半导体晶片的表面来实现更高的吞吐率。 显微镜检查系统也具有高放大能力，高数值孔径和大视场。 通过使用多于一个的检测器阵列，可以在横跨半导体晶片的每个扫描条纹期间检查晶片的更多的表面积。 显微镜检查系统被配置为具有更大的视野，使得可以适当地利用多个检测器阵列。 此外，使用反射和/或折射表面的特殊布置，以便将检测器阵列装配在检查系统的物理限制内。

公开(公告)号：WO2003049109A1

公开(公告)日：2003-06-12

申请号：PCT/US2002/038267

申请日：2002-11-29

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION

Inventor： ZHU, Jun ,  MORARU, Alex ,  PEALE, Douglas

IPC: G11B21/02

CPC classification number: G11B5/59644 ,  G11B5/012 ,  G11B5/59633 ,  G11B20/1403 ,  G11B27/36 ,  G11B2005/001 ,  G11B2220/20

Abstract: A system (110) and method for performing a combined media certification and servo data writing function is disclosed. The system and method include mounting a plurality of media, such as hard disks (121), to a spindle (120) and using at least one positioner (117) to move multiple read write heads (113) over disk surfaces according to multiple specific aspects of the invention. One aspect of the invention comprises performing certification on a first pass, writing servo pattern data on a second pass, and verifying servo data on a third pass over the media. The system may require high performance read/write heads, writing of coherent patterns in addition to servo patterns, use of multiple positioners, and additional hardware to perform the joint certification and servowriting function.

Abstract translation: 公开了一种用于执行组合媒体认证和伺服数据写入功能的系统（110）和方法。 该系统和方法包括将诸如硬盘（121）的多个介质安装到主轴（120）上，并使用至少一个定位器（117）根据多个特定的位置将多个读写头（113）移动到磁盘表面上 本发明的方面。 本发明的一个方面包括在第一次通过时执行认证，在第二次通过时写入伺服模式数据，以及在媒体上进行第三遍验证伺服数据。 该系统可能需要高性能读/写头，除了伺服模式之外写相干图案，使用多个定位器以及附加硬件来执行联合认证和伺服功能。

公开(公告)号：WO2003042629A1

公开(公告)日：2003-05-22

申请号：PCT/US2002/035882

申请日：2002-11-08

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION

Inventor： MIEHER, Walter ,  WACK, Dan ,  LEVY, Ady

IPC: G01B11/00

CPC classification number: G03F7/70641 ,  G03F1/28 ,  G03F1/44 ,  G06K7/0095

Abstract: Methods and device structures used to determine the focus quality of a photolithographic pattern or a photolithographic system are disclosed. One aspect of the invention relates to focus masking structure (10) configured to form a focus patterns (12) that contain focus information relating to the focus quality. The focus masking structure (10) generally includes a plurality of source lines (30, 32) that are separated by alternating phase shift zones (34, 36). Another aspect of the invention relates to focus patterns that change with changes in focus. The focus patterns generally include a plurality of periodic structures that form measurable shifts therebetween corresponding to the sign and magnitude of defocus. Another aspect of the invention relates to a method of determining the focus quality of a photolithographic pattern or photolithographic system that generally includes: providing a focus masking structure (10), forming a focus pattern (12) on a work piece (18) with the focus masking structure (10), and obtaining focus information from the focus pattern.

Abstract translation: 公开了用于确定光刻图案或光刻系统的焦点质量的方法和装置结构。 本发明的一个方面涉及被配置为形成聚焦图案（12）的聚焦掩蔽结构（10），该聚焦图案包含与焦点质量有关的焦点信息。 聚焦掩模结构（10）通常包括被交替的相移区（34,36）分离的多条源极线（30,32）。 本发明的另一方面涉及随焦点变化而变化的聚焦图案。 聚焦图案通常包括多个周期性结构，其在散焦的符号和大小之间形成可测量的偏移。 本发明的另一方面涉及一种确定光刻图案或光刻系统的焦点质量的方法，其通常包括：提供聚焦掩模结构（10），在工件（18）上形成聚焦图案（12） 聚焦掩蔽结构（10），以及从焦点图案获得聚焦信息。

公开(公告)号：WO2003034492A3

公开(公告)日：2003-04-24

申请号：PCT/US2002/033154

申请日：2002-10-16

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION

Inventor： WEINER, Kurt, H. ,  VERMA, Gaurav

IPC: H01L23/58

Abstract: An improved voltage contrast test structure (100, 200, 250, 300) is disclosed. In general terms, the test structure can be fabricated in a single photolithography step or with a single reticle or mask. The test structure includes substructures (102, 104, 202, 204, 252, 254, 302, 304) which are designed to have a particular voltage potential pattern during a voltage contrast inspection. For example, when an electron beam is scanned across the test structure, an expected pattern of intensities are produced and imaged as a result of the expected voltage potentials of the test structure. However, when there is an unexpected pattern of voltage potentials present during the voltage contrast inspection, this indicates that a defect is present within the test structure. To produce different voltage potentials, a first set of substructures (102, 202, 252, 302) are coupled to a relatively large conductive structure (110, 210, 260, 302, 308), such as a large conductive pad, so that the first set of substructures charges more slowly than a second set of substructures that are not coupled to the relatively large conductive structure. Mechanisms for fabricating such a test structure are also disclosed. Additionally, searching mechanisms for quickly locating defects within such a test structure, as well as other types of voltage contrast structures, during a voltage contrast inspection are also provided.

公开(公告)号：WO2008144318A1

公开(公告)日：2008-11-27

申请号：PCT/US2008/063541

申请日：2008-05-13

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  CAI, Zhongping ,  SLOBODOV, Alexander ,  ROMANOVSKY, Anatoly ,  WOLTERS, Christian, H.

Inventor： CAI, Zhongping ,  SLOBODOV, Alexander ,  ROMANOVSKY, Anatoly ,  WOLTERS, Christian, H.

IPC: G01N21/95 ,  H01J43/18

CPC classification number: G01N21/9501 ,  G01N21/8851 ,  G01N2201/1241 ,  G01N2201/12769 ,  H01J43/18 ,  H01J43/30

Abstract: An inspection system and method is provided herein for increasing the detection range of the inspection system. According to one embodiment, the inspection system may include a photodetector having a plurality of stages, which are adapted to convert light scattered from a specimen into an output signal, and a voltage divider network coupled for extending the detection range of the photodetector (and thus, the detection range of the inspection system) by saturating at least one of the stages. This forces the photodetector to operate in a non-linear manner. However, measurement inaccuracies are avoided by calibrating the photodetector output to remove any non-linear effects that may be created by intentionally saturating the at least one of the stages. In one example, a table of values may be generated during a calibration phase to convert the photodetector output into an actual amount of scattered light.

Abstract translation: 本文提供了一种用于增加检查系统的检测范围的检查系统和方法。 根据一个实施例，检查系统可以包括具有多个级的光电检测器，其适于将从样本散射的光转换成输出信号，以及耦合的用于扩展光电检测器的检测范围的分压器网络 ，检查系统的检测范围）通过饱和至少一个级。 这迫使光电探测器以非线性方式工作。 然而，通过校准光电检测器输出以消除可能通过故意饱和至少一个级而产生的任何非线性效应来避免测量不准确。 在一个示例中，可以在校准阶段期间生成值表，以将光电检测器输出转换成实际的散射光量。

公开(公告)号：WO2008086528A3

公开(公告)日：2008-07-17

申请号：PCT/US2008/050914

申请日：2008-01-11

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  WIHL, Mark J. ,  XIONG, Yalin ,  YIIN, Lih-huah

Inventor： WIHL, Mark J. ,  XIONG, Yalin ,  YIIN, Lih-huah

IPC: G03F1/00

Abstract: A method for identifying lithographically significant defects. A photomask is illuminated to produce images that experience different parameters of the reticle as imaged by an inspection tool. Example parameters include a transmission intensity image and a reflection intensity image. The images are processed together to recover a band limited mask pattern associated with the photomask. A model of an exposure lithography system for chip fabrication is adapted to accommodate the band limited mask pattern as an input which is input into the model to obtain an aerial image of the mask pattern that is processed with a photoresist model yielding a resist-modeled image. The resist-modeled image is used to determine if the photomask has lithographically significant defects.

公开(公告)号：WO2008052080A2

公开(公告)日：2008-05-02

申请号：PCT/US2007/082433

申请日：2007-10-24

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  LORDI, Vincenzo ,  LEVI, Shem-Tov ,  HESS, Harald

Inventor： LORDI, Vincenzo ,  LEVI, Shem-Tov ,  HESS, Harald

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/68 ,  H01J2237/31762 ,  Y10S430/143

Abstract: A method and tool for conducting charged-particle beam direct write lithography is disclosed. A disclosed method involves condensing an initial design file down to a set of profiles and a pattern of relative locations to form a formatted pattern file. The formatted pattern file is adjusted to accommodate desired pattern corrections. Portions of the formatted pattern records are extracted to form data strips that have a plurality of channels with a pattern of profiles and spatial indicators. Data strips are sequentially read to construct a printable pattern of profiles and spatial indicators that specify the locations of the profiles. Additionally, the pattern of profiles are sequentially printed from each data strip onto a substrate to form the desired pattern on the substrate.

Abstract translation: 公开了一种用于进行带电粒子束直写光刻的方法和工具。 所公开的方法包括将初始设计文件缩小到一组简档和相对位置的图案以形成格式化的图案文件。 格式化的图案文件被调整以适应所需的图案校正。 提取格式化图案记录的部分以形成具有多个具有轮廓和空间指示符的图形的通道的数据条。 依次读取数据条以构成可指定轮廓位置的可打印模式和指定轮廓位置的空间指示器。 此外，轮廓的图案从每个数据带顺序地印刷到基底上以在基底上形成期望的图案。

公开(公告)号：WO2008031076A2

公开(公告)日：2008-03-13

申请号：PCT/US2007/077943

申请日：2007-09-07

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  TORTONESE, Marco ,  BEVIS, Christoper, F.

Inventor： TORTONESE, Marco ,  BEVIS, Christoper, F.

IPC: G01N13/16

CPC classification number: G01Q60/38 ,  G01Q70/02

Abstract: In one embodiment, an atomic force microscope comprises a frame, a beam coupled to the frame at a first end and a second end, a probe mounted to the beam, means for inducing relative motion between the beam and an underlying surface, and means for detecting a characteristic of the beam.

Abstract translation: 在一个实施例中，原子力显微镜包括框架，在第一端耦合到框架的梁和第二端，安装到梁的探针，用于引导梁和下面的表面之间的相对运动的装置，以及用于 检测光束的特性。

公开(公告)号：WO2007111696A2

公开(公告)日：2007-10-04

申请号：PCT/US2006/060701

申请日：2006-11-09

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  CHEN, Da ,  FOUQUET, Christophe ,  BANERJEE, Saibal ,  BHATTACHARYYA, Santosh ,  WANG, Joseph ,  YAO, Lian ,  VAN RIET, Mike ,  GERMANENKO, Igor

Inventor： CHEN, Da ,  FOUQUET, Christophe ,  BANERJEE, Saibal ,  BHATTACHARYYA, Santosh ,  WANG, Joseph ,  YAO, Lian ,  VAN RIET, Mike ,  GERMANENKO, Igor

IPC: G06T7/40

CPC classification number: G06T7/001 ,  G01N21/8851 ,  G01N21/9501 ,  G01N21/95607 ,  G06T2207/30148

Abstract: Methods, defect review tools, and systems for locating a defect in a defect review process are provided. One method includes acquiring one or more images and data from an inspection tool. The one or more images illustrate an area on a specimen in which a defect to be reviewed is located. The data indicates a position and features of the defect within the area. The method also includes acquiring one or more additional images of the specimen proximate the position of the defect indicated in the data using an imaging subsystem of a defect review tool. In addition, the method includes identifying a portion of the one or more additional images that corresponds to the one or more images. The method further includes determining a position of the defect within the portion of the one or more additional images using the data.

Abstract translation: 提供了方法，缺陷评估工具和用于在缺陷评估过程中定位缺陷的系统。 一种方法包括从检查工具获取一个或多个图像和数据。 一个或多个图像示出了待检查缺陷所在的样本上的区域。 数据表示该区域内缺陷的位置和特征。 该方法还包括使用缺陷评估工具的成像子系统获取在数据中指示的缺陷的位置附近的样本的一个或多个附加图像。 此外，该方法包括识别对应于一个或多个图像的一个或多个附加图像的一部分。 所述方法还包括使用所述数据确定所述一个或多个附加图像的所述部分内的所述缺陷的位置。

公开(公告)号：WO2007075496A3

公开(公告)日：2007-07-05

申请号：PCT/US2006/048089

申请日：2006-12-14

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  MAPOLES, Evan R. ,  CHEN, Grace H. ,  BEVIS, Christopher F. ,  SHORTT, David W.

Inventor： MAPOLES, Evan R. ,  CHEN, Grace H. ,  BEVIS, Christopher F. ,  SHORTT, David W.

IPC: G01B9/02 ,  G01B11/02 ,  G01B11/24 ,  G01B11/30 ,  G01N21/00 ,  G01N21/86 ,  G01N21/88 ,  G01V8/00 ,  G06K9/00 ,  H04N7/18 ,  H04N9/47

Abstract: A dark field surface inspection tool and system are disclosed herein. The tool includes an illumination source (303) capable of scanning light (I) onto an inspection surface (301). Light scattered (S) by each inspection point is captured as image data by a photo detector array (305) arranged at a fourier plane. The images captured are adaptively filtered to remove a portion of the bright pixels from the images to generate filtered images. The filtered images are then analyzed to detect defects in the inspection surface. Methods of the invention include using die-to-die comparison to identify bright portions of scattering patterns and generate unique image filters associated with those patterns. The associated images are then filtered to generate filtered images which are then used to detect defects Also, data models of light scattering behavior can be used to generate filters.