AN APPARATUS AND METHOD FOR ELECTRICAL TEST PREDICTION

    公开(公告)号:WO2018154588A1

    公开(公告)日:2018-08-30

    申请号:PCT/IL2018/050221

    申请日:2018-02-27

    Inventor: TUROVETS, Igor

    Abstract: A test site and method are herein disclosed for predicting E-test structure (in-die structure) and/or device performance. The test site comprises an E-test structure and OCD-compatible multiple structures in the vicinity of the E-test structure to allow optical scatterometry (OCD) measurements. The OCD-compatible multiple structures are modified by at least one modification technique selected from (a) multiplication type modification technique, (b) dummification type modification technique, (c) special Target design type modification technique, and (d) at least one combination of (a), (b) and (c) for having a performance equivalent to the performance of the E-test structure.

    OPTICAL SYSTEM AND METHOD FOR MEASURING PARAMETERS OF PATTERNED STRUCTURES IN MICROELECTRONIC DEVICES

    公开(公告)号:WO2018096526A1

    公开(公告)日:2018-05-31

    申请号:PCT/IL2016/051263

    申请日:2016-11-23

    Abstract: An optical system and method are presented for use in measurements on an upper surface of a layered sample when located in a measurement plane. The optical system is configured as a normal-incidence system having an illumination channel and a collection channel, and comprises an objective lens unit and a light propagation affecting device. The objective lens unit is accommodated in the illumination and collection channels, thereby defining a common optical path for propagation of illuminating light from the illumination channel toward an illuminating region in the measurement plane and for propagation of light returned from measurement plane to the collection channel. The light propagation affecting device comprises an apertured structure located in at least one of the illumination and collection channels, and configured to provide angular obscuration of light propagation path for blocking angular segments associated with light propagation from regions outside the illuminated region.

    METHOD FOR USE IN PROCESS CONTROL OF MANUFACTURE OF PATTERNED SAMPLES
    73.
    发明申请
    METHOD FOR USE IN PROCESS CONTROL OF MANUFACTURE OF PATTERNED SAMPLES 审中-公开
    用于制作样品样品过程控制的方法

    公开(公告)号:WO2016207891A1

    公开(公告)日:2016-12-29

    申请号:PCT/IL2016/050667

    申请日:2016-06-22

    Abstract: A method and system are presented for use in controlling a multiple patterning process of n patterning stages subsequently applied to a sample to produce a target pattern thereon. The method comprises: providing intermediate measured data indicative of an optical response of the sample after being patterned by m-th patterning stage, 1≤ m n ; processing said intermediate measured data, determining at least a location parameter of a predetermined feature of the pattern, and generating measured data indicative of said at least one selected parameter; utilizing said at least location parameter of the predetermined feature for optimizing a data interpretation model for interpretation of measured data indicative of an optical response from the sample being patterned by k-th subsequent patterning stage, m k ≤ n .

    Abstract translation: 提出了一种方法和系统,用于控制随后施加到样品以在其上产生目标图案的n个图案化阶段的多次图案化工艺。 该方法包括:提供指示在通过第m图案化阶段图案化之后样品的光学响应的​​中间测量数据,1≤m

    METHOD AND SYSTEM FOR OPTICAL METROLOGY IN PATTERNED STRUCTURES
    74.
    发明申请
    METHOD AND SYSTEM FOR OPTICAL METROLOGY IN PATTERNED STRUCTURES 审中-公开
    图形结构光学计量学方法与系统

    公开(公告)号:WO2016067296A1

    公开(公告)日:2016-05-06

    申请号:PCT/IL2015/051063

    申请日:2015-11-02

    Abstract: A data analysis method and system are presented for use in determining one or more parameters of a patterned structure located on top of an underneath layered structure. According to this technique, input data is provided which includes first measured data PMD being a function f of spectral intensity Iλ and phase φ , PMD=f(I λ ;φ) , corresponding to a complex spectral response of the underneath layered structure, and second measured data S meas indicative of specular reflection spectral response of a sample formed by the patterned structure and the underneath layered structure. Also provided is a general function F describing a relation between a theoretical optical response S theor of the sample and a modeled optical response S model of the patterned structure and the complex spectral response PMD of the underneath layered structure, such that S theor =F(S model ; PMD) . The general function is then utilized for comparing the second measured data S meas and the theoretical optical response S theor , and determining parameter(s) of interest of the top structure.

    Abstract translation: 提供了一种数据分析方法和系统,用于确定位于下层分层结构顶部的图案化结构的一个或多个参数。 根据该技术,提供输入数据,其包括对应于下层分层结构的复谱响应的光谱强度Iλ和相位φ,PMD = f(Iλ;φ)的函数f的第一测量数据PMD,以及 指示由图案化结构和下层分层结构形成的样品的镜面反射光谱响应的第二测量数据S meas。 还提供了描述样本的理论光学响应理论与图案化结构的建模的光学响应S模型与下面的分层结构的复谱响应PMD之间的关系的一般函数F,使得S isor = F( S模型; PMD)。 然后通用函数用于比较第二测量数据S meas和理论光学响应理论,以及确定顶部结构的感兴趣参数。

    OPTICAL PHASE MEASUREMENT METHOD AND SYSTEM
    75.
    发明申请
    OPTICAL PHASE MEASUREMENT METHOD AND SYSTEM 审中-公开
    光学相位测量方法与系统

    公开(公告)号:WO2015155779A1

    公开(公告)日:2015-10-15

    申请号:PCT/IL2015/050389

    申请日:2015-04-12

    Abstract: A measurement system for use in measuring parameters of a patterned sample is presented. The system comprises: a broadband light source; an optical system configured as an interferometric system; a detection unit; and a control unit. The interferometric system defines illumination and detection channels having a sample arm and a reference arm comprising a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms; the detection unit comprises a configured and operable for detecting a combined light beam formed by a light beam reflected from said reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by at least two spectral interference signatures. The control unit is configured and operable for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.

    Abstract translation: 提出了一种用于测量图案样品参数的测量系统。 该系统包括:宽带光源; 配置为干涉系统的光学系统; 检测单元; 和控制单元。 所述干涉仪系统定义具有采样臂和参考臂的照明和检测通道,所述参考臂包括参考反射器,并且被配置为用于诱导所述样本和参考臂之间的光程差; 检测单元包括被配置和可操作以检测由从所述反射器反射的光束形成的组合光束和从样本支架传播的光束,以及产生指示由至少两个光谱干涉特征形成的光谱干涉图案的测量数据 。 控制单元被配置和操作用于接收测量数据,并将基于模型的处理应用于频谱干涉图案,以确定样本中的图案的一个或多个参数。

    METHOD AND SYSTEM FOR DETERMINING STRAIN DISTRIBUTION IN A SAMPLE
    77.
    发明申请
    METHOD AND SYSTEM FOR DETERMINING STRAIN DISTRIBUTION IN A SAMPLE 审中-公开
    用于确定样品中应变分布的方法和系统

    公开(公告)号:WO2015004662A1

    公开(公告)日:2015-01-15

    申请号:PCT/IL2014/050615

    申请日:2014-07-08

    CPC classification number: G01N23/20 G01N2223/607 G01N2223/611

    Abstract: A control system is presented for use in measuring one or more parameters of a sample. The control system comprises an input utility and a processor utility. The input utility is configured for receiving input data including first data comprising X-ray Diffraction or High-Resolution X-ray Diffraction (XRD) response data of the sample indicative of a material distribution in the sample, and second data comprising optical response data of the sample to incident light indicative of at least a geometry of the sample. The processor utility is configured and operable for processing and analyzing one of the first and second data for optimizing the other one of the first and second data, and utilizing the optimized data for determining said one or more parameters of the sample including a strain distribution in the sample.

    Abstract translation: 呈现用于测量样品的一个或多个参数的控制系统。 控制系统包括输入实用程序和处理器实用程序。 输入实用程序被配置用于接收包括第一数据的输入数据,所述第一数据包括指示样本中的材料分布的样本的X射线衍射或高分辨率X射线衍射(XRD)响应数据,第二数据包括光学响应数据 样品至入射光,指示样品的至少几何形状。 处理器实用程序被配置和操作用于处理和分析第一和第二数据之一以优化第一和第二数据中的另一个数据,并且利用优化数据来确定样本的所述一个或多个参数,包括应变分布 例子。

    OPTICAL METROLOGY FOR IN-SITU MEASUREMENTS
    78.
    发明申请
    OPTICAL METROLOGY FOR IN-SITU MEASUREMENTS 审中-公开
    用于实地测量的光学计量学

    公开(公告)号:WO2014027354A1

    公开(公告)日:2014-02-20

    申请号:PCT/IL2013/050697

    申请日:2013-08-15

    Abstract: A method and system are presented for use in controlling a process applied to a patterned structure having regions of different layered stacks. The method comprises: sequentially receiving measured data indicative of optical response of the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time; and analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure. The analyzing and processing comprises: processing a part of said sequence of the data pieces and obtaining data indicative of one or more parameters of the structure; utilizing said data indicative of said one or more parameters of the structure and optimizing model data describing a relation between an optical response of the structure and one or more parameters of the structure; utilizing the optimized model data for processing at least a part of the sequence of the measured data pieces, and determining at least one parameters of the structure characterizing said process applied to the structure, and generating data indicative thereof.

    Abstract translation: 提出了一种方法和系统,用于控制应用于具有不同层叠叠层区域的图案化结构的工艺。 该方法包括:在预定处理时间内顺序地接收指示正在处理的结构的光学响应的​​测量数据,并产生随时间测量的对应的数据片段序列; 以及分析和处理所述数据段的序列并确定所述结构的至少一个主要参数。 分析和处理包括:处理所述数据片段的一部分并获得指示所述结构的一个或多个参数的数据; 利用表示所述结构的所述一个或多个参数的所述数据,以及描述所述结构的光学响应与所述结构的一个或多个参数之间的关系的最优化模型数据; 利用优化的模型数据来处理测量数据段的序列的至少一部分,以及确定表征应用于结构的所述过程的结构的至少一个参数,以及生成指示其的数据。

    GLAN-THOMPSON TYPE BROADBAND POLARIZER DEVICE FOR USE IN THE DEEP ULTRAVIOLET SPECTRAL RANGE AND METHOD OF ITS MANUFACTURE
    79.
    发明申请
    GLAN-THOMPSON TYPE BROADBAND POLARIZER DEVICE FOR USE IN THE DEEP ULTRAVIOLET SPECTRAL RANGE AND METHOD OF ITS MANUFACTURE 审中-公开
    用于深层超紫外光谱范围的GLAN-THOMPSON型宽带偏振器装置及其制造方法

    公开(公告)号:WO2005085917A1

    公开(公告)日:2005-09-15

    申请号:PCT/IL2004/000707

    申请日:2004-08-02

    CPC classification number: G02B27/283

    Abstract: A broadband polarizer device of a Glan-Thompson type is described, as well as a method of manufacturing such device. Such parameters as a material of the polarizer prisms, the prisms' configuration and a glue material, are selected so as to ensure total internal reflection for the broadband input light, including DUV spectral range (from about 190nm). The glue material is selected so as to be characterized by a dispersion profile matching that of the polarizer prisms' material for extraordinary and ordinary rays in the broadband spectral range. Different methods of manufacturing such broadband polarizer are described is disclosed.

    Abstract translation: 描述了Glan-Thompson型的宽带偏振器装置,以及制造这种装置的方法。 选择作为偏振棱镜的材料,棱镜结构和胶合材料的参数,以确保宽带输入光的全内反射,包括DUV光谱范围(约190nm)。 选择胶合材料,其特征在于在宽带光谱范围内与异常和普通光线的偏振棱镜材料的色散曲线相匹配。 公开了制造这种宽带偏振器的不同方法。

    METHOD AND SYSTEM FOR AUTOMATIC TARGET FINDING
    80.
    发明申请
    METHOD AND SYSTEM FOR AUTOMATIC TARGET FINDING 审中-公开
    用于自动目标查找的方法和系统

    公开(公告)号:WO2004113932A2

    公开(公告)日:2004-12-29

    申请号:PCT/IL2004/000525

    申请日:2004-06-17

    IPC: G01R

    CPC classification number: G03F7/70633 G03F9/7088

    Abstract: A method and system are presented for automatic target finding by using two imaging channels with relatively low and high magnifications, using the low magnification channel (relatively large field of view) for finding a region of interest (i.e., that of the targets location within the field), scanning this zone by grabbing images via the high magnification channel (relatively small field of view) and marking the overlay targets using image processing algorithms.

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