公开(公告)号：WO2016092506A1

公开(公告)日：2016-06-16

申请号：PCT/IB2015/059523

申请日：2015-12-10

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： COHEN, Oded ,  BARAK, Gilad ,  TUROVETS, Igor

IPC: H01L21/66 ,  G03F7/00

CPC classification number: G03F7/70625 ,  G03F7/70466 ,  G03F7/70683 ,  H01L22/30 ,  H01L22/34

Abstract: A test structure and method of its manufacture are presented for use in metrology measurements of a sample pattern. The test structure comprises a test pattern comprising a portion of the sample pattern including at least one selected feature and a blocking layer at least partially covering regions of the test structure adjacent to the at least one selected region

Abstract translation: 提供了一种测试结构及其制造方法，用于样本图形的度量测量。 测试结构包括测试图案，该测试图案包括样本图案的一部分，其包括至少一个所选择的特征，以及至少部分地覆盖与所述至少一个选定区域相邻的测试结构的区域的阻挡层

公开(公告)号：WO2015193904A1

公开(公告)日：2015-12-23

申请号：PCT/IL2015/050625

申请日：2015-06-18

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： BARAK, Gilad ,  COHEN, Oded ,  TUROVETS, Igor

IPC: G01N21/956 ,  G01N21/47 ,  G01B9/00 ,  G01J3/00

CPC classification number: G01N21/95607 ,  G01B2210/56 ,  G01N21/8806 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8848 ,  H01L22/30

Abstract: A test structure is presented for use in metrology measurements of a sample pattern formed by periodicity of unit cells, each formed of pattern features arranged in a spaced-apart relationship along a pattern axis. The test structure comprises a test pattern, which is formed by a main pattern which includes main pattern features of one or more of the unit cells and has a symmetry plane, and a predetermined auxiliary pattern including at least two spaced apart auxiliary features located within at least some features of the main pattern, parameters of which are to be controlled during metrology measurements.

Abstract translation: 提供测试结构用于由单位单元的周期性形成的样本图案的度量测量，每个单位单元由沿着图案轴线以间隔关系排列的图案特征形成。 测试结构包括测试图案，该测试图案由主图案形成，该主图案包括一个或多个单位单元的主图案特征并具有对称平面，以及预定的辅助图案，其包括位于其内的至少两个间隔开的辅助特征 最少的主要模式的一些特征，其参数在计量测量期间被控制。

公开(公告)号：WO2015101989A1

公开(公告)日：2015-07-09

申请号：PCT/IL2014/051143

申请日：2014-12-31

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： TUROVETS, Igor

IPC: H01L21/304 ,  H01L21/263 ,  H01L21/67 ,  G01B21/08

CPC classification number: B24B37/20 ,  B24B37/015 ,  B24B37/04 ,  H01L21/268 ,  H01L21/31055 ,  H01L21/31111 ,  H01L21/32125 ,  H01L21/67219 ,  H01L22/12 ,  H01L22/26

Abstract: A surface planarization system is presented. The system comprises an external energy source for generating a localized energy distribution within a processing region, and a control unit for operating the external energy source to create, by the localized energy distribution, a predetermined temperature pattern within the processing region such that different locations of the processing region are subjected to different temperatures. This provides that when a sample (e.g. semiconductor wafer) during its interaction with an etching material composition is located in the processing region, the temperature pattern at different locations of the sample's surface creates different material removal rates by the etching material composition (different etch rates).

Abstract translation: 提出了一种表面平面化系统。 该系统包括用于在处理区域内产生局部能量分布的外部能量源，以及控制单元，用于操作外部能量源，以通过局部能量分布产生处理区域内的预定温度模式， 处理区域经受不同的温度。 这提供了当样品（例如半导体晶片）在与蚀刻材料组合物相互作用期间位于处理区域中时，样品表面的不同位置处的温度图案通过蚀刻材料组成产生不同的材料去除速率（不同的蚀刻速率 ）。

公开(公告)号：WO2013018093A1

公开(公告)日：2013-02-07

申请号：PCT/IL2012/050283

申请日：2012-08-01

Applicant: NOVA MEASURING INSTRUMENTS LTD ,  BRILL, Boaz ,  SHERMAN, Boris ,  TUROVETS, Igor

Inventor： BRILL, Boaz ,  SHERMAN, Boris ,  TUROVETS, Igor

IPC: G03F7/20

CPC classification number: G01B11/02 ,  G03F7/70625

Abstract: A method and system are presented for monitoring measurement of parameters of patterned structures based on a predetermined fitting model. The method comprises: (a) providing data indicative of measurements in at least one patterned structure; and (b) applying at least one selected verification mode to said data indicative of measurements, said at least one verification mode comprising: I) analyzing the data based on at least one predetermined factor and classifying the corresponding measurement result as acceptable or unacceptable, II) analyzing the data corresponding to the unacceptable measurement results and determining whether one or more of the measurements providing said unacceptable result are to be disregarded, or whether one or more parameters of the predetermined fitting model are to be modified.

Abstract translation: 提出了一种方法和系统，用于基于预定的拟合模型来监测图案结构的参数的测量。 该方法包括：（a）提供指示至少一个图案化结构中的测量的数据; 所述至少一个验证模式包括：I）基于至少一个预定因素分析数据并将相应的测量结果分类为可接受或不可接受的，II ）分析对应于不可接受的测量结果的数据，以及确定提供所述不可接受结果的一个或多个测量是否被忽略，或者是否修改预定拟合模型的一个或多个参数。

公开(公告)号：WO2021165941A1

公开(公告)日：2021-08-26

申请号：PCT/IB2021/051501

申请日：2021-02-23

Applicant: NOVA MEASURING INSTRUMENTS LTD. ,  INTERNATIONAL BUSINESS MACHINES CORPORATION

Inventor： KONG, Dexin ,  SCHMIDT, Daniel ,  CEPLER, Aron J. ,  CHENG, Marjorie ,  KORET, Roy ,  TUROVETS, Igor

IPC: G06N20/00

Abstract: A method, a system, and a non-transitory computer readable medium for measuring a local critical dimension uniformity of an array of two-dimensional structural elements, the method may include obtaining an acquired optical spectrometry spectrum of the array; feeding the acquired optical spectrometry spectrum of the array to a trained machine learning process, wherein the trained machine learning process is trained to map an optical spectrometry spectrum to an average critical dimension (CD) and a local critical dimension uniformity (LCDU); and outputting, by the trained machine learning process, the average CD and the LCDU of the array.

公开(公告)号：WO2017115377A1

公开(公告)日：2017-07-06

申请号：PCT/IL2016/051403

申请日：2016-12-29

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： TUROVETS, Igor

IPC: H01L21/304 ,  H01L21/67

CPC classification number: H01L21/67248 ,  H01L21/31053 ,  H01L21/3212 ,  H01L21/67115 ,  H01L22/12 ,  H01L22/20 ,  H01L22/26

Abstract: A system and method are presented for controlling a process applied to a structure comprising at least one of material removal and material deposition processes. The system comprises: a heating radiation source configured and operable to generate a temperature field profile across a processing area of the structure; and a control unit configured and operable to control operation of said heating radiation source in accordance with a predetermined pattern map within the processing area, so as to create a corresponding pattern selective profile of said temperature field across said processing area providing desired pattern selective distribution of at least one parameter characterizing the process applied to the processing area of the structure.

Abstract translation: 提出了一种用于控制应用于包括材料去除和材料沉积过程中的至少一个的结构的过程的系统和方法。 该系统包括：加热辐射源，其被配置并且可操作以在整个结构的处理区域上产生温度场分布; 以及控制单元，其被配置为可操作以根据处理区域内的预定图案图来控制所述加热辐射源的操作，以便在所述处理区域上创建所述温度场的对应图案选择性轮廓，从而提供期望的图案选择分布 至少有一个参数表征应用于结构处理区域的过程。

公开(公告)号：WO2018154588A1

公开(公告)日：2018-08-30

申请号：PCT/IL2018/050221

申请日：2018-02-27

Applicant: NOVA MEASURING INSTRUMENTS LTD

Inventor： TUROVETS, Igor

IPC: H01L21/00

Abstract: A test site and method are herein disclosed for predicting E-test structure (in-die structure) and/or device performance. The test site comprises an E-test structure and OCD-compatible multiple structures in the vicinity of the E-test structure to allow optical scatterometry (OCD) measurements. The OCD-compatible multiple structures are modified by at least one modification technique selected from (a) multiplication type modification technique, (b) dummification type modification technique, (c) special Target design type modification technique, and (d) at least one combination of (a), (b) and (c) for having a performance equivalent to the performance of the E-test structure.

公开(公告)号：WO2015136533A1

公开(公告)日：2015-09-17

申请号：PCT/IL2015/050253

申请日：2015-03-10

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： TUROVETS, Igor

IPC: G03F7/20 ,  G03F7/00 ,  H01L21/00 ,  H01L21/02 ,  H01L21/027 ,  G01B21/00 ,  G01D18/00 ,  H04B17/00 ,  G03F1/72

CPC classification number: G01B11/272 ,  G01B2210/56 ,  G01N21/47 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/95607 ,  G01N2021/95615 ,  G01N2201/12753 ,  H01L21/0337 ,  H01L22/30

Abstract: An article is presented configured for controlling a multiple patterning process, such as a spacer self-aligned multiple patterning, to produce a target pattern. The article comprises a test site carrying a test structure comprising at least one pair of gratings, wherein first and second gratings of the pair are in the form of first and second patterns of alternating features and spaces and differ from the target pattern by respectively different first and second values which are selected to provide together a total difference such that a differential optical response from the test structure is indicative of a pitch walking effect.

Abstract translation: 呈现配置用于控制多个图案化工艺（例如间隔件自对准多重图案化）以产生目标图案的制品。 所述物品包括承载包括至少一对光栅的测试结构的测试位置，其中所述一对光栅中的第一和第二光栅具有交替特征和空间的第一和第二图案的形式，并且不同于目标图案分别不同的第一 以及第二值，其被选择以一起提供总差，使得来自测试结构的差分光学响应指示音调行走效果。

公开(公告)号：WO2014027354A1

公开(公告)日：2014-02-20

申请号：PCT/IL2013/050697

申请日：2013-08-15

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： TUROVETS, Igor ,  BOZDOG, Cornel ,  ELYASI, Dario

IPC: G01B11/24 ,  G01N21/00

CPC classification number: G01N21/9501 ,  G01B11/06 ,  G01B11/24 ,  G01B2210/56 ,  G01N21/47 ,  G01N21/8903 ,  G01N2201/12

Abstract: A method and system are presented for use in controlling a process applied to a patterned structure having regions of different layered stacks. The method comprises: sequentially receiving measured data indicative of optical response of the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time; and analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure. The analyzing and processing comprises: processing a part of said sequence of the data pieces and obtaining data indicative of one or more parameters of the structure; utilizing said data indicative of said one or more parameters of the structure and optimizing model data describing a relation between an optical response of the structure and one or more parameters of the structure; utilizing the optimized model data for processing at least a part of the sequence of the measured data pieces, and determining at least one parameters of the structure characterizing said process applied to the structure, and generating data indicative thereof.

Abstract translation: 提出了一种方法和系统，用于控制应用于具有不同层叠叠层区域的图案化结构的工艺。 该方法包括：在预定处理时间内顺序地接收指示正在处理的结构的光学响应的​​测量数据，并产生随时间测量的对应的数据片段序列; 以及分析和处理所述数据段的序列并确定所述结构的至少一个主要参数。 分析和处理包括：处理所述数据片段的一部分并获得指示所述结构的一个或多个参数的数据; 利用表示所述结构的所述一个或多个参数的所述数据，以及描述所述结构的光学响应与所述结构的一个或多个参数之间的关系的最优化模型数据; 利用优化的模型数据来处理测量数据段的序列的至少一部分，以及确定表征应用于结构的所述过程的结构的至少一个参数，以及生成指示其的数据。