METHOD OF FABRICATING HIGH-EFFICIENCY Cu(In,Ga)(Se,S)2 THIN FILMS FOR SOLAR CELLS
    2.
    发明申请
    METHOD OF FABRICATING HIGH-EFFICIENCY Cu(In,Ga)(Se,S)2 THIN FILMS FOR SOLAR CELLS 审中-公开
    制造用于太阳能电池的高效Cu(In,Ga)(Se,S)2薄膜的方法

    公开(公告)号:WO1996025768A1

    公开(公告)日:1996-08-22

    申请号:PCT/US1995001923

    申请日:1995-02-16

    CPC classification number: H01L31/0322 Y02E10/541 Y02P70/521 Y10S438/93

    Abstract: A process for producing a slightly Cu-poor thin film of Cu(In,Ga)(Se,S)2 comprises depositing a first layer (16) of (In,Ga)x(Se,S)y followed by depositing just enough Cu+(Se,S) or Cux(Se,S) to produce the desired slightly Cu-poor material layer (18). In variation, most, but not all, (about 90 % to 99 %) of the (In,Ga)x(Se,S)y layer (20) is deposited first, followed by deposition of all the Cu+(Se,S) or Cux(Se,S) layer (22) to go near stoichiometric, possibly or even preferably slightly Cu-rich, and then in turn followed by deposition of the remainder (about 1 % to 10 %) of the (In,Ga)x(Se,S)y layer (24) to end with a slightly Cu-poor composition. In yet another variation, a small portion (about 1 % to 10 %) of the (In,Ga)x(Se,S)y is first deposited as a seed layer (26), followed by deposition of all of the Cu+(Se,S) or Cux(Se,S) to make a very Cu-rich mixture layer (28), and then followed deposition of the remainder of the (In,Ga)x(Se,S)y layer (30) to go slightly Cu-poor in the final Cu(In,Ga)(Se,S)2 thin film.

    Abstract translation: 用于制造Cu(In,Ga)(Se,S)2的略微Cu不良薄膜的方法包括沉积(In,Ga)x(Se,S)y的第一层(16),然后沉积刚好 Cu +(Se,S)或Cux(Se,S)以产生所需的稍微不良铜的材料层(18)。 在变化中,首先沉积(In,Ga)x(Se,S)y层(20)的大部分但不是全部(约90%至99%),然后沉积所有Cu +(Se,S )或Cux(Se,S)层(22)接近化学计量,可能甚至优选略微富Cu,然后依次沉积(In,Ga)的余量(约1%至10%) )x(Se,S)y层(24)以稍微不合铜的组成结束。 在另一变型中,首先将(In,Ga)x(Se,S)y的一小部分(约1%至10%)沉积为籽晶层(26),然后沉积所有Cu + Se,S)或Cux(Se,S),以形成非常富Cu的混合层(28),然后将剩余的(In,Ga)x(Se,S)y层(30)沉积到 在最终的Cu(In,Ga)(Se,S)2薄膜中略微Cu-poor。

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