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    ATMOSPHERIC PLASMA SYSTEMS, APPARATUSES AND PROCESSES
    1.
    发明申请
    ATMOSPHERIC PLASMA SYSTEMS, APPARATUSES AND PROCESSES 审中-公开

    公开(公告)号：WO2021221675A1

    公开(公告)日：2021-11-04

    申请号：PCT/US2020/030842

    申请日：2020-04-30

    Applicant: HZO, INC.

    Inventor： JANIK, John

    IPC: H05H1/24 ,  H05H1/36

    Abstract: An apparatus for applying atmospheric plasma includes a plasma generator, a pair of plates, a matching network and a transport. The plasma generator includes a power supply configured to provide high frequency electromagnetic waves to energize a plasma precursor fed into a plasma generation zone by a plasma precursor feed. The power supply is electrically connected to at least one plate to allow the creation of plasma between the plates. An impedance matching network is in electrical communication with, and positioned between, the power supply and at least one of the pair of plates. A transport is configured to transport an object through the plasma between the plates.

    MULTI-LAYER DEPOSITION SYSTEM AND PROCESS
    2.
    发明申请
    MULTI-LAYER DEPOSITION SYSTEM AND PROCESS 审中-公开
    多层沉积系统和工艺

    公开(公告)号：WO2018045089A1

    公开(公告)日：2018-03-08

    申请号：PCT/US2017/049470

    申请日：2017-08-30

    Applicant: HZO, INC.

    Inventor： YUN, Yang ,  SORENSEN, Max ,  HSUEH, Chien-Lan ,  SU, Tining ,  DEMPSTER, Jim ,  ANDERSON, Alex ,  BAKER, Layton

    IPC: C23C16/455 ,  C23C16/00 ,  C23C16/44 ,  H01L21/00 ,  H01L21/02

    Abstract: A modular multilayer deposition system includes a plurality of modular deposition chambers, including at least one parylene deposition chamber and at least one ALD deposition chamber. The parylene deposition chamber is connected in series with the ALD deposition chamber. Substrates are automatically moved from within the parylene deposition chamber to within the ALD deposition chamber or from within the ALD deposition chamber to the parylene deposition chamber.

    Abstract translation: 模块化多层沉积系统包括多个模块化沉积室，包括至少一个派瑞林沉积室和至少一个ALD沉积室。 聚对二甲苯沉积室与ALD沉积室串联连接。 衬底自动地从聚对二甲苯沉积室内移动到ALD沉积室内或从ALD沉积室内到达聚对二甲苯沉积室。

    MASKING SUBSTRATES FOR APPLICATION OF PROTECTIVE COATINGS
    3.
    发明申请
    MASKING SUBSTRATES FOR APPLICATION OF PROTECTIVE COATINGS 审中-公开
    掩蔽基底以涂覆保护涂层

    公开(公告)号：WO2014110046A8

    公开(公告)日：2014-09-04

    申请号：PCT/US2014010526

    申请日：2014-01-07

    Applicant: HZO INC

    Inventor： ASTLE DAVID JAMES ,  CHILD TYLER CHRISTENSEN ,  KASAGANI VIMAL KUMAR ,  LOOSE CAMERON LAMAR ,  STEVENS BLAKE LEROY ,  SORENSON MAX ERNEST

    IPC: B05D1/32

    CPC classification number: B23K26/362 ,  B23K26/0622 ,  B23K26/082 ,  B23K26/361 ,  B23K26/402 ,  B23K2203/50 ,  C23C14/042 ,  C23C16/042 ,  H01L21/561 ,  H01L23/3121 ,  H01L2924/0002 ,  H05K3/285 ,  H05K3/288 ,  H05K2203/025 ,  H05K2203/092 ,  H05K2203/095 ,  H05K2203/107 ,  H05K2203/1105 ,  H05K2203/163 ,  H01L2924/00

    Abstract: A method for applying a protective coating to selected portions of a substrate is disclosed. The method includes applying a mask to or forming a mask on at least one portion of the substrate that is not to be covered with the protective coating. The mask may be selectively formed by applying a flowable material to the substrate. Alternatively, the mask may be formed from a preformed film. With the mask in place, the protective coating may be applied to the substrate and the mask. A portion of the protective coating that overlies the mask may be delineated from other portions of the protective coating; for example, by cutting, weakening or removing material from the protective coating at locations at or adjacent to the perimeter of the mask. The portion of the protective coating that overlies the mask, and the mask, may then be removed from the substrate.

    Abstract translation: 公开了一种用于将保护涂层施加到基底的选定部分的方法。 该方法包括将掩模施加到衬底的至少一部分上或者在未被保护涂层覆盖的衬底的至少一部分上形成掩模。 掩模可以通过将可流动材料施加到基底来选择性地形成。 或者，掩模可以由预制膜形成。 在面罩就位的情况下，可以将保护涂层施加到基板和面罩上。 覆盖在掩模上的一部分保护涂层可以从保护涂层的其他部分描绘出来; 例如通过在掩模周边处或附近的位置切割，削弱或去除保护涂层中的材料。 覆盖在掩模上的保护涂层部分和掩模然后可以从衬底上移除。

    MOISTURE RESISTANT ENERGY STORAGE DEVICES AND ASSOCIATED METHODS
    6.
    发明申请
    MOISTURE RESISTANT ENERGY STORAGE DEVICES AND ASSOCIATED METHODS 审中-公开
    防潮能源储存装置及相关方法

    公开(公告)号：WO2013192172A1

    公开(公告)日：2013-12-27

    申请号：PCT/US2013/046308

    申请日：2013-06-18

    Applicant: HZO, INC.

    Inventor： PETERSON, Rick, C. ,  SORENSON, Max

    IPC: H01M2/02

    CPC classification number: H01M10/425 ,  H01M2/1094 ,  Y10T29/49115

    Abstract: The disclosure extends to moisture resistant energy storage devices, such as rechargeable batteries, and associated methods of forming the same. An energy storage device, such as a rechargeable battery, may comprise a cell including at least one electrical terminal and a circuit board electrically coupled to the at least one electrical terminal. The rechargeable battery may also include a moisture resistant coating on at least a portion of at least one of a surface of the cell and a surface of the circuit board. A moisture resistant coating may reside between the circuit board and the cell.

    Abstract translation: 本公开延伸到诸如可充电电池的防潮能量存储装置及其相关方法。 诸如可再充电电池的能量存储装置可以包括电池，所述电池包括电耦合到所述至少一个电端子的至少一个电端子和电路板。 可再充电电池还可以在电池的表面和电路板的表面中的至少一个的至少一部分上包括防潮涂层。 防潮涂层可能驻留在电路板和电池之间。

    MASKS FOR USE IN APPLYING PROTECTIVE COATINGS TO ELECTRONIC ASSEMBLIES, MASKED ELECTRONIC ASSEMBLIES AND ASSOCIATED METHODS
    7.
    发明申请
    MASKS FOR USE IN APPLYING PROTECTIVE COATINGS TO ELECTRONIC ASSEMBLIES, MASKED ELECTRONIC ASSEMBLIES AND ASSOCIATED METHODS 审中-公开
    用于将电子组件应用于保护涂层的掩模，掩蔽电子组件及相关方法

    公开(公告)号：WO2013106442A1

    公开(公告)日：2013-07-18

    申请号：PCT/US2013/020850

    申请日：2013-01-09

    Applicant: HZO, INC.

    Inventor： STEVENS, Blake ,  SORENSON, Max ,  MARTIN, Sidney Edward, III

    IPC: H01L23/28

    CPC classification number: H01L21/02299 ,  B05C21/005 ,  H01L21/027 ,  H01L23/564 ,  H01L2924/0002 ,  H05K1/02 ,  H05K3/0073 ,  H05K3/28 ,  H05K3/284 ,  Y10T29/49002 ,  H01L2924/00

    Abstract: One or more masks may be used to control the application of protective (e.g., moisture-resistant, etc.) coatings to one or more portions of various components of an electronic device during assembly of the electronic device. A method for applying a protective coating to an electronic device includes assembling two or more components of the electronic device with one another. A mask may then be applied to the resultingelectronic assembly. The mask may shield selected portions of the electronic assembly, while other portions of the electronic assembly, i.e., those to which a protective coating is to be applied, may remain exposed through the mask. With the mask in place, application of a protective coating to portions of the electronic assembly exposed through the mask may commence. After application of the protective coating, the mask may be removed from the electronic assembly. Embodiments of masked electronic assemblies are also disclosed.

    Abstract translation: 可以使用一个或多个掩模来控制在组装电子设备期间将电子设备的各种部件的保护（例如防潮等）涂层施加到电子设备的各个部件的一个或多个部分。 将保护涂层施加到电子设备的方法包括将电子设备的两个或更多个部件彼此组装在一起。 然后可以将掩模应​​用于所得到的电子组件。 掩模可以屏蔽电子组件的选定部分，而电子组件的其它部分，即要施加保护涂层的那些部分，可以通过掩模保持暴露。 在面罩就位的情况下，可以开始对通过面罩暴露的电子组件的部分施加保护涂层。 在施加保护涂层之后，可以从电子组件移除掩模。 还公开了掩模电子组件的实施例。

    METHODS, APPARATUSES AND SYSTEMS FOR MONITORING FOR EXPOSURE OF ELECTRONIC DEVICES TO MOISTURE AND REACTING TO EXPOSURE OF ELECTRONIC DEVICES TO MOISTURE
    8.
    发明申请
    METHODS, APPARATUSES AND SYSTEMS FOR MONITORING FOR EXPOSURE OF ELECTRONIC DEVICES TO MOISTURE AND REACTING TO EXPOSURE OF ELECTRONIC DEVICES TO MOISTURE 审中-公开
    用于监测电子设备暴露于水分和反应电子设备暴露于水分的方法，装置和系统

    公开(公告)号：WO2013106253A1

    公开(公告)日：2013-07-18

    申请号：PCT/US2013/020376

    申请日：2013-01-04

    Applicant: HZO INC.

    Inventor： STEVENS, Blake ,  SORENSON, Max

    IPC: H02H7/127

    CPC classification number: H02H5/083 ,  G06F1/1656 ,  G06F1/28 ,  H02H5/00

    Abstract: Systems and methods for monitoring the moisture to which an electronic device is exposed may alter or vary operation of the electronic device. Operation of the electronic device may be altered or varied to provide a notification that the electronic device has been exposed to moisture. When an electronic device is exposed to moisture, an operational mode of the electronic device may be changed. A change in the operational mode of the electronic device may include termination of the supply of power to one or more components, which may protect those components. Programs or apps that provide a user of the electronic device with information regarding exposure of the electronic device to an amount of moisture that meets or exceeds a moisture response threshold are also disclosed.

    Abstract translation: 用于监测电子设备暴露于水分的系统和方法可以改变或改变电子设备的操作。 可以改变或改变电子设备的操作以提供电子设备暴露于湿气的通知。 当电子设备暴露于潮湿时，可以改变电子设备的操作模式。 电子设备的操作模式的改变可以包括终止向一个或多个组件供电，这可以保护这些组件。 还公开了向电子设备的用户提供关于电子设备暴露于达到或超过水分响应阈值的水分量的信息的程序或应用程序。

    PLASMA ASSISTED PARYLENE DEPOSITION
    10.
    发明申请
    PLASMA ASSISTED PARYLENE DEPOSITION 审中-公开

    公开(公告)号：WO2021221673A1

    公开(公告)日：2021-11-04

    申请号：PCT/US2020/030814

    申请日：2020-04-30

    Applicant: HZO, INC.

    Inventor： ASKIN, Robert ,  CLANCY, Sean

    IPC: C23C14/22 ,  C23C14/24 ,  C23C14/40

    Abstract: A method for depositing parylene onto a substrate includes utilizing a vaporization chamber and a pyrolysis chamber to crack a dimer into a monomer gas, directly ionizing the monomer gas by passing the monomer gas through a plasma generation chamber comprising plasma prior to injection of the monomer gas into a deposition chamber, and polymerizing the ionized monomer in the deposition chamber to create a polymer and a protective coating on a substrate.

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