PLANARIZATION FILMS FOR ADVANCED MICROELECTRONIC APPLICATIONS AND DEVICES AND METHODS OF PRODUCTION THEREOF
    1.
    发明申请
    PLANARIZATION FILMS FOR ADVANCED MICROELECTRONIC APPLICATIONS AND DEVICES AND METHODS OF PRODUCTION THEREOF 审中-公开
    用于高级微电子应用的平面薄膜及其制造方法

    公开(公告)号:WO2005017617A8

    公开(公告)日:2006-06-01

    申请号:PCT/US0334347

    申请日:2003-10-27

    Abstract: A planarization composition is disclosed herein that comprises: a) a structural constituent; and b) a solvent system, wherein the solvent system is compatible with the structural constituent and lowers the lowers at least one of the intermolecular forces or surface forces components of the planarization composition. A film that includes this planarization composition is also disclosed. In addition, another planarization composition is disclosed herein that comprises: a) a cresol-based polymer compound; and b) a solvent system comprising at least one alcohol and at least one ether acetate-based solvent. A film that includes this planarization composition is also disclosed. A layered component is also disclosed herein that comprises: a) a substrate having a surface topography; and b) a planarization composition or a film such as those described herein, wherein the composition is coupled to the substrate. Methods of forming a planarization compositions are also disclosed herein that comprise: a) providing a structural constituent; b) providing a solvent system, wherein the solvent system is compatible with the structural constituent and lowers at least one of the intermolecular forces or surface forces components of the planarization composition; and c) blending the structural constituent and the solvent system to form a planarization composition. Methods of forming a film are also disclosed that comprise: a) providing a planarization composition such as those disclosed herein; and b) evaporating at least part of the solvent system to form a film.

    Abstract translation: 本文公开了一种平面化组合物,其包括:a)结构成分; 和b)溶剂体系,其中所述溶剂体系与所述结构组分相容并降低所述平坦化组合物的至少一种分子间力或表面力组分。 还公开了包含该平坦化组合物的膜。 此外,本文公开了另外的平坦化组合物,其包括:a)甲酚基聚合物化合物; 和b)包含至少一种醇和至少一种乙酸乙烯酯类溶剂的溶剂体系。 还公开了包含该平坦化组合物的膜。 本文还公开了一种分层组件,其包括:a)具有表面形貌的衬底; 和b)平面化组合物或诸如本文所述的那些的膜,其中所述组合物与所述基材偶联。 本文还公开了形成平坦化组合物的方法,其包括:a)提供结构成分; b)提供溶剂体系,其中所述溶剂体系与所述结构组分相容并降低所述平坦化组合物的分子间力或表面力组分中的至少一种; 和c)将结构成分和溶剂体系混合以形成平坦化组合物。 还公开了形成膜的方法,其包括:a)提供诸如本文公开的那些的平坦化组合物; 和b)蒸发至少部分溶剂系统以形成膜。

    PLANARIZATION FILMS FOR ADVANCED MICROELECTRONIC APPLICATIONS AND DEVICES AND METHODS OF PRODUCTION THEREOF
    2.
    发明申请
    PLANARIZATION FILMS FOR ADVANCED MICROELECTRONIC APPLICATIONS AND DEVICES AND METHODS OF PRODUCTION THEREOF 审中-公开
    用于高级微电子应用的平面薄膜及其制造方法

    公开(公告)号:WO2005017617A1

    公开(公告)日:2005-02-24

    申请号:PCT/US2003/034347

    申请日:2003-10-27

    Abstract: A planarization composition is disclosed herein that comprises: a) a structural constituent; and b) a solvent system, wherein the solvent system is compatible with the structural constituent and lowers the lowers at least one of the intermolecular forces or surface forces components of the planarization composition. A film that includes this planarization composition is also disclosed. In addition, another planarization composition is disclosed herein that comprises: a) a cresol-based polymer compound; and b) a solvent system comprising at least one alcohol and at least one ether acetate-based solvent. A film that includes this planarization composition is also disclosed. A layered component is also disclosed herein that comprises: a) a substrate having a surface topography; and b) a planarization composition or a film such as those described herein, wherein the composition is coupled to the substrate. Methods of forming a planarization compositions are also disclosed herein that comprise: a) providing a structural constituent; b) providing a solvent system, wherein the solvent system is compatible with the structural constituent and lowers at least one of the intermolecular forces or surface forces components of the planarization composition; and c) blending the structural constituent and the solvent system to form a planarization composition. Methods of forming a film are also disclosed that comprise: a) providing a planarization composition such as those disclosed herein; and b) evaporating at least part of the solvent system to form a film.

    Abstract translation: 本文公开了一种平面化组合物,其包括:a)结构成分; 和b)溶剂体系,其中所述溶剂体系与所述结构组分相容并降低所述平坦化组合物的至少一种分子间力或表面力组分。 还公开了包含该平坦化组合物的膜。 此外,本文公开了另外的平坦化组合物,其包括:a)甲酚基聚合物化合物; 和b)包含至少一种醇和至少一种乙酸乙烯酯类溶剂的溶剂体系。 还公开了包含该平坦化组合物的膜。 本文还公开了一种分层组件,其包括:a)具有表面形貌的衬底; 和b)平面化组合物或诸如本文所述的那些的膜,其中所述组合物与所述基材偶联。 本文还公开了形成平坦化组合物的方法,其包括:a)提供结构成分; b)提供溶剂体系,其中所述溶剂体系与所述结构组分相容并降低所述平坦化组合物的分子间力或表面力组分中的至少一种; 和c)将结构成分和溶剂体系混合以形成平坦化组合物。 还公开了形成膜的方法,其包括:a)提供诸如本文公开的那些的平坦化组合物; 和b)蒸发至少部分溶剂系统以形成膜。

    COMPOSITIONS, LAYERS AND FILMS FOR OPTOELECTRONIC DEVICES, METHODS OF PRODUCTION AND USES THEREOF
    3.
    发明申请
    COMPOSITIONS, LAYERS AND FILMS FOR OPTOELECTRONIC DEVICES, METHODS OF PRODUCTION AND USES THEREOF 审中-公开
    光电器件的组合物,层和膜,其生产方法及其用途

    公开(公告)号:WO2008124711A1

    公开(公告)日:2008-10-16

    申请号:PCT/US2008/059612

    申请日:2008-04-08

    Abstract: Crosslinkable compositions are disclosed herein that comprise at least one silicon-based material comprising at least one alkyl group and at least one aryl or aromatic group, at least one catalyst, and at least one solvent. Optoelectronic devices are described that include: a) a surface within the device, and b) at least one sufficiently light-transmissive crosslinked film, wherein the film is formed from at least one silicon-based material, at least one catalyst, and at least one solvent. Optoelectronic device (105) are also disclosed, which include: a) a surface within the device (120), and b) at least one light-transmissive crosslinkable composition (140), wherein the composition comprises at least one silicon-based material, at least one crosslinking agent and at least one solvent. Methods of producing optoelectronic devices (105) are also disclosed that include: a) providing a surface (120), b) providing at least one sufficiently light-transmissive crosslinkable composition (140), wherein the composition comprises at least one silicon-based material and at least one catalyst, c) applying the crosslinkable material to the surface, and d) curing the crosslinkable material to form a sufficiently light-transmissive crosslinked composition. Crosslinkable compositions are disclosed that comprise: polyphenylsilsesquioxane, polyphenylsiloxane or a combination thereof, tetramethylammonium nitrate, at least one solvent, and an aminopropyl triethoxysilane-based compound.

    Abstract translation: 本文公开的可交联组合物包含至少一种包含至少一个烷基和至少一个芳基或芳族基团的硅基材料,至少一种催化剂和至少一种溶剂。 描述了光电器件,其包括:a)器件内的表面,以及b)至少一个足够透光的交联膜,其中所述膜由至少一种硅基材料,至少一种催化剂形成,并且至少 一种溶剂。 还公开了光电子器件(105),其包括:a)器件(120)内的表面,和b)至少一种透光性可交联组合物(140),其中所述组合物包含至少一种硅基材料, 至少一种交联剂和至少一种溶剂。 还公开了制造光电器件(105)的方法,其包括:a)提供表面(120),b)提供至少一种足够透光的可交联组合物(140),其中所述组合物包含至少一种硅基材料 和至少一种催化剂,c)将所述可交联材料施加到所述表面,以及d)固化所述可交联材料以形成足够透光的交联组合物。 公开了可交联组合物,其包含:聚苯基倍半硅氧烷,聚苯基硅氧烷或其组合,四甲基硝酸铵,至少一种溶剂和氨基丙基三乙氧基硅烷基化合物。

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