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    PARTICLE-OPTICAL SYSTEMS AND ARRANGEMENTS AND PARTICLE-OPTICAL COMPONENTS FOR SUCH SYSTEMS AND ARRANGEMENTS
    3.
    发明申请
    PARTICLE-OPTICAL SYSTEMS AND ARRANGEMENTS AND PARTICLE-OPTICAL COMPONENTS FOR SUCH SYSTEMS AND ARRANGEMENTS 审中-公开
    颗粒光学系统和安排以及这种系统和安排的颗粒光学部件

    公开(公告)号：WO2012041464A1

    公开(公告)日：2012-04-05

    申请号：PCT/EP2011/004777

    申请日：2011-09-23

    Applicant: APPLIED MATERIALS ISRAEL Ltd. ,  CARL ZEISS SMT GMBH ,  ZEIDLER, Dirk ,  KEMEN, Thomas ,  ANGER, Pascal ,  CASARES, Antonio ,  RIEDESEL, Christof

    Inventor： ZEIDLER, Dirk ,  KEMEN, Thomas ,  ANGER, Pascal ,  CASARES, Antonio ,  RIEDESEL, Christof

    IPC: H01J37/09

    CPC classification number: H01J37/09 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/21 ,  H01J37/28 ,  H01J37/3177 ,  H01J2237/0453 ,  H01J2237/0458 ,  H01J2237/0492 ,  H01J2237/1205

    Abstract: The present invention concerns a charged-particle multi-beamlet system that comprises a source of charged particles (301); a first multi-aperture plate (320) having plural apertures disposed in a charged particle beam path of the system downstream of the source; a first multi-aperture selector plate (313) having plural apertures; a carrier (340), wherein the first multi-aperture selector plate is mounted on the carrier; and an actuator (350) configured to move the carrier such that the first multi-aperture selector plate is disposed in the charged particle beam path of the system downstream of the source in a first mode of operation of the system, and such that the first multi-aperture selector plate is disposed outside of the charged particle beam path in a second mode of operation of the system. The source, the first multi-aperture plate and the carrier of the system are arranged such that a first number of charged particle beamlets is generated at a position downstream of both the first multi-aperture plate and the first multi-aperture selector plate in the first mode of operation, and that a second number of charged particle beamlets is generated at the position in the second mode of operation, wherein the first number of beamlets differs from the second number of beamlets.

    Abstract translation: 本发明涉及一种带电粒子多子束系统，其包括带电粒子源（301）; 第一多孔板（320），其具有设置在所述源的下游的所述系统的带电粒子束路径中的多个孔; 具有多个孔的第一多孔选择板（313） 载体（340），其中所述第一多孔径选择器板安装在所述载体上; 以及构造成移动所述载体的致动器（350），使得所述第一多孔径选择器板在所述系统的第一操作模式中被布置在所述源的下游的系统的带电粒子束路径中，并且使得所述第一 多孔径选择器板在系统的第二操作模式中设置在带电粒子束路径的外部。 源极，第一多孔板和系统的载体被布置成使得在第一多孔径板和第一多孔径选择器板的下游位置处产生第一数量的带电粒子子束 第一操作模式，并且在第二操作模式的位置处产生第二数量的带电粒子子束，其中第一数量的子束与第二数量的子束不同。

    CHARGED PARTICLE INSPECTION METHOD AND CHARGED PARTICLE SYSTEM
    4.
    发明申请
    CHARGED PARTICLE INSPECTION METHOD AND CHARGED PARTICLE SYSTEM 审中-公开
    充电颗粒检查方法和充电颗粒系统

    公开(公告)号：WO2007028596A1

    公开(公告)日：2007-03-15

    申请号：PCT/EP2006/008694

    申请日：2006-09-06

    Applicant: CARL ZEISS SMT AG ,  APPLIED MATERIALS ISRAEL LTD. ,  KEMEN, Thomas ,  KNIPPELMEYER, Rainer ,  SCHUBERT, Stefan

    Inventor： KEMEN, Thomas ,  KNIPPELMEYER, Rainer ,  SCHUBERT, Stefan

    IPC: H01J37/04 ,  H01J37/09 ,  H01J37/26

    CPC classification number: H01J37/04 ,  H01J37/045 ,  H01J37/09 ,  H01J37/145 ,  H01J37/147 ,  H01J37/244 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/04922 ,  H01J2237/04924 ,  H01J2237/04926 ,  H01J2237/15 ,  H01J2237/2446 ,  H01J2237/2448 ,  H01J2237/2561 ,  H01J2237/2817 ,  H01J2237/31774

    Abstract: The present invention relates to a charged particle system comprising: a charged particle source; a first multi aperture plate; a second multi aperture plate disposed downstream of the first multi aperture plate, a controller configured to selectively apply at least first and second voltage differences between the first and second multi aperture plates, wherein the charged particle source and the first and second multi aperture plates are arranged such that each of a plurality of charged particle beamlets traverses an aperture pair, said aperture pair comprising one aperture of the first multi aperture plate and one aperture of the second multi aperture plate, wherein plural aperture pairs are arranged such that a center of the aperture of the first multi aperture plate is, when seen in a direction of incidence of the charged particle beamlet traversing the aperture of the first multi aperture plate, displaced relative to a center of the aperture of the second multi aperture plate. The invention further pertains to a a particle-optical component configured to change a divergence of a set of charged particle beamlets and a charged particle inspection method comprising inspection of an object using different numbers of charged particle beamlets.

    Abstract translation: 带电粒子系统本发明涉及带电粒子系统，包括：带电粒子源; 第一个多孔板; 设置在第一多孔板的下游的第二多孔板，配置成选择性地施加第一和第二多孔板之间的至少第一和第二电压差的控制器，其中带电粒子源和第一和第二多孔板是 被布置为使得多个带电粒子子束中的每一个穿过孔径对，所述孔径对包括第一多孔板的一个孔和第二多孔板的一个孔，其中多个孔径对布置成使得 当从穿过第一多孔板的孔的带电粒子束的入射方向看时，第一多孔板的孔径相对于第二多孔板的孔的中心位移。 本发明还涉及一种构造成改变一组带电粒子子束的发散的粒子 - 光学部件和包括使用不同数量的带电粒子子束对物体进行检查的带电粒子检查方法。

    TEST OBJECT FOR TESTING AN ARRAY OF BEAMS
    6.
    发明申请
    TEST OBJECT FOR TESTING AN ARRAY OF BEAMS 审中-公开
    用于测试骨架阵列的测试对象

    公开(公告)号：WO2013032949A1

    公开(公告)日：2013-03-07

    申请号：PCT/US2012/052385

    申请日：2012-08-24

    Applicant: APPLIED MATERIALS ISRAEL, LTD. ,  APPLIED MATERIALS, INC. ,  CARL ZEISS SMT GMBH ,  ROSENBERG, Zvika ,  ELMALIACH, Nissim ,  ZEIDLER, Dirk ,  KEMEN, Thomas

    Inventor： ROSENBERG, Zvika ,  ELMALIACH, Nissim ,  ZEIDLER, Dirk ,  KEMEN, Thomas

    IPC: G01N23/225

    CPC classification number: H01J37/263 ,  H01J37/28 ,  H01J2237/2817 ,  H01J2237/2826

    Abstract: A test object for testing a multiple beam system is provided. The test object includes multiple regions, each made up of multiple fields, each of which includes multiple sub-fields, each of which includes multiple structural elements. The location and number of sub-fields of at least one field corresponds to the number of beams of an array of beams of the multiple beam system and to an expected spatial relationship between the beams of the array of beams. Various scanning patterns can be applied in order to allow the array of beams to scan the entire field. Images of the subfields obtained using the multiple beam system are used to evaluate spatial or optical characteristics thereof.

    Abstract translation: 提供了一种用于测试多光束系统的测试对象。 测试对象包括多个区域，每个区域由多个场组成，每个区域包括多个子场，每个子场包括多个结构元素。 至少一个场的子场的位置和数量对应于多光束系统的光束阵列的光束的数量以及光束阵列的光束之间的期望的空间关系。 可以应用各种扫描图案以允许波束阵列扫描整个场。 使用多光束系统获得的子场的图像用于评估其空间或光学特性。

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