Abstract:
The present invention relates to a charged particle system comprising: a charged particle source; a first multi aperture plate; a second multi aperture plate disposed downstream of the first multi aperture plate, a controller configured to selectively apply at least first and second voltage differences between the first and second multi aperture plates, wherein the charged particle source and the first and second multi aperture plates are arranged such that each of a plurality of charged particle beamlets traverses an aperture pair, said aperture pair comprising one aperture of the first multi aperture plate and one aperture of the second multi aperture plate, wherein plural aperture pairs are arranged such that a center of the aperture of the first multi aperture plate is, when seen in a direction of incidence of the charged particle beamlet traversing the aperture of the first multi aperture plate, displaced relative to a center of the aperture of the second multi aperture plate. The invention further pertains to a a particle-optical component configured to change a divergence of a set of charged particle beamlets and a charged particle inspection method comprising inspection of an object using different numbers of charged particle beamlets.
Abstract:
An objective lens arrangement is presented for mounting in a charged particle beam column adjacent to an anode tube that defines a beam drift space for a charged particle beam propagating towards a sample. The lens arrangement comprises a magnetic lens and an electrostatic lens, wherein the eletrostatic lens includes upper and lower electrodes arranged in a spaced-apart coaxial relationship along an optical axis of the lens arrangement.
Abstract:
Beschrieben wird eine Linsenanordnung mit lateral verschiebbarer optischer Achse für Teilchenstrahlen, insbesondere zur Übertragung von Bereichen einer Gegenstandsebene in die Bildebene mittels Elektronen, mit einer kombinierten Linse, welche aus einer Zylinderlinse und einer Quadrupollinse besteht, die mit elektrischen und/oder magnetischen Feldern beaufschlagbare Schlitzblenden aufweisen. Dabei ist die optische Achse der Quadrupollinse parallel zur Achse der Zylinderlinse orientiert und definiert die optische Achse der Abbildung, wobei deren Position relativ zur Achse der Zylinderlinse änderbar ist. Die Fokussierung der Quadrupollinse erfolgt in dem Schnitt, in welchem die Zylinderlinse ohne Fokussierung ist, und die Defokussierung der Quadrupollinse in dem Schnitt, in welchem die Zylinderlinse fokussiert. Erfindungsgemäss ist vorgesehen, dass die kombinierte Linse als Immersionslinse zur Abbildung von Sekundärelektronen betreibbar ist, das Immersionsfeld in axialer Richtung aus wenigstens zwei aneinunder angrenzenden Feldern besteht, wobei das erste Feld zwischen Objekt und erster Schlitzblende, das zweite Feld zwischen erster und zweiter Schlitzblende anliegt und beide Felder unabhängig von einander einstellbar sind. Gemäss Vorschlag wird weiterhin die Potentialdifferenz zwischen Objekt und erster Blende relativ zu der zwischen erster und zweiter Blende vergleichsweise klein und der Potentialverlauf zwischen Objekt und erster Blende näherungsweise linear vorgegeben. Die fokussierende/defokussierende Wirkung der kombinierten Linse ergibt sich aus der Überlagerung des Immersionsfeldes, des Zylinderlinsenfeldes und des Quadrupolfeldes. Eine Variante der vorgeschlagenen Linsenanordnung ist zum Einsatz als Kathodenlinse für eine Photokathode mit mehreren gleichartigen, nebeneinanderliegenden Emissionsbereichen vorgesehen.
Abstract:
An apparatus for inspecting a large area substrate for display manufacturing is described. The apparatus includes a vacuum chamber; a substrate support arranged in the vacuum chamber, wherein the substrate support is configured for supporting the large area substrate for display manufacturing; and a first imaging charged particle beam microscope configured for generating a charged particle beam for inspecting a substrate supported by the substrate support, wherein the first imaging charged particle beam microscope includes a retarding field lens component of an objective lens.
Abstract:
Provided is a small-size electronic lens having a small aberration for use in a microscope and an evaluation device using an electronic beam. The electronic lens is characterized in that its characteristic can be modified in a short time without using a complicated correction device. In the electronic lens, a correction electrode (11) is arranged in the vicinity of objective lenses (12, 13) as electrostatic lenses for correcting the aberration. Alternatively, a correction mechanism formed by a magnet is arranged in the vicinity of the objective lenses as magnetic lenses for correcting the aberration.
Abstract:
The present invention relates to a particle-optical component comprising a first multi -aperture plate, and a second multi -aperture plate forming a gap between them; wherein a plurality of apertures of the first multi -aperture plate is arranged such that each aperture of the plurality of apertures of the first multi-aperture plate is aligned with a corresponding aperture of a plurality of apertures of the second multi-aperture plate; and wherein the gap has a first width at a first location and a second width at a second location and wherein the second width is by at least 5% greater than the first width. In addition, the present invention pertains to charged particle systems and arrangements comprising such components and methods of manufacturing multi aperture plates having a curved surface.
Abstract:
An objective lens arrangement is presented for mounting in a charged particle beam column adjacent to an anode tube that defines a beam drift space for a charged particle beam propagating towards a sample (5). The lens (14) arrangement comprises a magnetic lens (14) and an electrostatic lens (16), wherein the eletrostatic lens includes upper (16C') and lower electrodes (16C) arranged in a spaced-apart coaxial relationship along an optical axis (OA) of the lens arrangement.