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    FLUORESCENT LIGHT SOURCE COMPRISING YTTRIA LAYER
    1.
    发明申请
    FLUORESCENT LIGHT SOURCE COMPRISING YTTRIA LAYER 审中-公开
    包含YTTRIA层的荧光灯源

    公开(公告)号：WO2006009349A1

    公开(公告)日：2006-01-26

    申请号：PCT/KR2005/001662

    申请日：2005-06-03

    Applicant: SUKGYUNG A.T CO., LTD ,  LIM, Hyung-joon ,  YOO, Young-chul ,  LEE, Sang-jin ,  KWON, O-sung ,  KWON, Joon-sung

    Inventor： LIM, Hyung-joon ,  YOO, Young-chul ,  LEE, Sang-jin ,  KWON, O-sung ,  KWON, Joon-sung

    IPC: H01J61/44

    CPC classification number: C09K11/7701 ,  H01J1/63 ,  H01J1/64 ,  H01J61/35

    Abstract: Disclosed herein is a fluorescent light source including an yttria layer. Specifically, the current invention provides a fluorescent light source having high quality and a long lifetime, which can prevent a decrease in initial luminance of a fluorescent light source, including a fluorescent lamp, and resist the radiation of ultraviolet light and the permeation of mercury, which are the causes of deterioration of the fluorescent light source, so as not to decrease the luminance in proportion to the lighting time of the fluorescent light source, thus assuring both initial luminance properties and luminance properties after use for a long period of time. Such a fluorescent light source includes glass, a fluorescent material layer, and an absorbing layer composed mainly of yttria particles formed between the glass and the fluorescent material layer or on the inner surface of the fluorescent material layer. In addition, an yttria coating composition used in the fluorescent light source and a method of fabricating the fluorescent light source using the composition are also provided.

    Abstract translation: 本文公开了包括氧化钇层的荧光光源。 具体地说，本发明提供了具有高质量和长寿命的荧光光源，其可以防止包括荧光灯在内的荧光灯的初始亮度降低，并且抵抗紫外线的辐射和汞的渗透， 这是荧光光源劣化的原因，以便不会与荧光光源的点亮时间成比例地降低亮度，从而长时间确保使用后的初始亮度特性和亮度特性。 这种荧光光源包括玻璃，荧光材料层和主要由形成在玻璃和荧光材料层之间或荧光材料层的内表面上的氧化钇颗粒组成的吸收层。 此外，还提供了用于荧光光源的氧化钇涂层组合物和使用该组合物制造荧光光源的方法。

    COLORLESS AND TRANSPARENT ANTIBIOTIC MATERIAL INCLUDING SILVER, AND A METHOD FOR THE PREPARATION OF IT
    2.
    发明申请
    COLORLESS AND TRANSPARENT ANTIBIOTIC MATERIAL INCLUDING SILVER, AND A METHOD FOR THE PREPARATION OF IT 审中-公开
    包括银的无色和透明抗生素材料及其制备方法

    公开(公告)号：WO2006041251A1

    公开(公告)日：2006-04-20

    申请号：PCT/KR2005/001663

    申请日：2005-06-03

    Applicant: SUKGYUNG A.T CO., LTD ,  LIM, Hyung-joon ,  YOO, Young-chul ,  KWON, O-sung ,  HEO, Doo-yang

    Inventor： LIM, Hyung-joon ,  YOO, Young-chul ,  KWON, O-sung ,  HEO, Doo-yang

    IPC: A01N59/16

    CPC classification number: A01N59/16 ,  A01N25/02 ,  A01N25/00 ,  A01N2300/00

    Abstract: Disclosed herein is a colorless and transparent antibiotic material including silver and a method of preparing the same. Specifically, the current invention pertains to a method of preparing a colorless and transparent antibiotic material including silver (Ag), which includes a) reacting a salt including a silver ion (Ag+) with a salt including a sulfate anion, to prepare a silver (Ag)-sulfate complex; and b) diluting the silver (Ag)-sulfate complex prepared in a) with water, and to an antibiotic material prepared using the method. Further, the current invention pertains to an antibiotic material including silver, which is harmless to the human body and exhibits disinfecting and antibiotic activities, and as well, is colorless and transparent and does not easily form colored oxides, unlike conventional silver-based antibiotic materials, and to a method of preparing such an antibiotic material. Thus, the colorless and transparent antibiotic material of this invention can be widely applied to manufacture industrial goods, such as non woven fabrics, packaging materials, etc., living goods, such as clothes, bedclothes, etc., and fiber goods.

    Abstract translation: 本文公开了包含银的无色透明抗生素材料及其制备方法。 具体地说，本发明涉及一种制备包括银（Ag）的无色透明抗生素材料的方法，其包括：a）使包含银离子（Ag +）的盐与包含硫酸根阴离子的盐反应，制备银（ Ag） - 硫酸盐络合物; 和b）用水稀释a）中制备的银（Ag） - 硫酸盐络合物，以及使用该方法制备的抗生素材料。 此外，本发明涉及包含银的抗生素材料，其对人体无害并具有消毒和抗生素活性，并且与常规的银基抗生素材料不同，它们是无色透明的并且不容易形成有色氧化物 ，以及制备这种抗生素材料的方法。 因此，本发明的无色透明抗生素材料可广泛用于制造无纺布，包装材料等工业用品，衣物，床上用品等生活用品，纤维制品等。

    PLASMA DISPLAY PANEL
    3.
    发明申请
    PLASMA DISPLAY PANEL 审中-公开
    等离子显示面板

    公开(公告)号：WO2008002099A1

    公开(公告)日：2008-01-03

    申请号：PCT/KR2007/003180

    申请日：2007-06-29

    Applicant: LG ELECTRONICS INC. ,  KWON, O Sung

    Inventor： KWON, O Sung

    IPC: H01J17/49

    CPC classification number: H01J11/24 ,  H01J9/02 ,  H01J11/12 ,  H01J2211/245

    Abstract: A plasma display panel is disclosed. The plasma display panel includes a substrate, a plurality of electrodes positioned on the substrate, a dielectric layer covering the plurality of electrodes. A height of the electrode around a central axis of a cross section of the electrode is larger than a height of the electrode at an edge of the cross section of the electrode.

    Abstract translation: 公开了一种等离子体显示面板。 等离子体显示面板包括基板，位于基板上的多个电极，覆盖多个电极的电介质层。 围绕电极横截面的中心轴线的电极的高度大于电极横截面边缘处的电极的高度。

    METHOD FOR MEASURING OF SCRATCH-RESISTANCE OF PLASTIC RESIN PRODUCTS
    4.
    发明申请
    METHOD FOR MEASURING OF SCRATCH-RESISTANCE OF PLASTIC RESIN PRODUCTS 审中-公开
    测量塑料树脂产品耐刮擦性的方法

    公开(公告)号：WO2008082218A1

    公开(公告)日：2008-07-10

    申请号：PCT/KR2007/006986

    申请日：2007-12-28

    Applicant: CHEIL INDUSTRIES INC. ,  KWON, Kee Hae ,  KIM, Il Jin ,  MOON, Hyung Rang ,  PARK, Jae Bum ,  KONG, Seong Ho ,  KWON, O Sung

    Inventor： KWON, Kee Hae ,  KIM, Il Jin ,  MOON, Hyung Rang ,  PARK, Jae Bum ,  KONG, Seong Ho ,  KWON, O Sung

    IPC: G01N3/46

    CPC classification number: G01N3/46

    Abstract: Disclosed herein is a method for evaluating scratch resistance of a plastic resin comprising scratching a surface of a test sample of plastic resin using a scratch apparatus; measuring a scratch profile by scanning the scratched test sample with a surface profile analyzer; and measuring a scratch resistance evaluation index using the measured scratch profile to evaluate the scratch resistance of the test sample based on the scratch resistance evaluation index. The method has good reliability and reproducibility, reduces measurement time and errors caused by measurers and measuring conditions, provides an easy measurement and can be widely applied to all plastic resins.

    Abstract translation: 本发明公开了一种用于评价塑料树脂的耐刮擦性的方法，包括使用刮擦装置刮擦塑料树脂试样的表面; 通过用表面轮廓分析仪扫描划痕的测试样品来测量划痕; 并使用所测量的刮擦轮廓来测量耐擦伤性评估指数，以基于耐擦伤性评估指数来评估测试样品的耐擦伤性。 该方法具有良好的可靠性和可重复性，减少测量时间和测量误差，测量条件，提供了简单的测量，可广泛应用于所有塑料树脂。

    METHODS OF FABRICATING SEMICONDUCTOR DEVICES AND STRUCTURES THEREOF
    6.
    发明申请
    METHODS OF FABRICATING SEMICONDUCTOR DEVICES AND STRUCTURES THEREOF 审中-公开
    制造半导体器件及其结构的方法

    公开(公告)号：WO2007054466A1

    公开(公告)日：2007-05-18

    申请号：PCT/EP2006/068084

    申请日：2006-11-03

    Applicant: INFINEON TECHNOLOGIES AG ,  KWON, O Sung

    Inventor： KWON, O Sung

    IPC: H01L21/336 ,  H01L29/49

    CPC classification number: H01L29/4983 ,  H01L29/665 ,  H01L29/6653 ,  H01L29/6656 ,  H01L29/7843 ,  Y10S257/90

    Abstract: Methods of forming spacers on sidewalls of features of semiconductor devices and structures thereof are disclosed. A preferred embodiment comprises a semiconductor device including a workpiece and at least one feature disposed over the workpiece. A first spacer is disposed on the sidewalls of the at least one feature, the first spacer comprising a first material. A first liner is disposed over the first spacer and over a portion of the workpiece proximate the first spacer, the first liner comprising the first material. A second spacer is disposed over the first liner, the second spacer comprising a second material. A second liner is disposed over the second spacer, the second liner comprising the first material.

    Abstract translation: 公开了在半导体器件的特征的侧壁上形成间隔物的方法及其结构。 优选实施例包括半导体器件，其包括工件和设置在工件上方的至少一个特征。 第一间隔件设置在至少一个特征的侧壁上，第一间隔件包括第一材料。 第一衬垫设置在第一间隔物上方，并且在靠近第一间隔物的工件的一部分上方，第一衬垫包括第一材料。 第二间隔件设置在第一衬垫上，第二间隔件包括第二材料。 第二衬垫设置在第二间隔件上，第二衬垫包括第一材料。

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