公开(公告)号：WO2007126559A3

公开(公告)日：2007-12-21

申请号：PCT/US2007006031

申请日：2007-03-08

Applicant: KLA TENCOR TECH CORP ,  KANDEL DANIEL ,  MIEHER WALTER D ,  GOLOVANEVSKY BORIS

Inventor： KANDEL DANIEL ,  MIEHER WALTER D ,  GOLOVANEVSKY BORIS

IPC: G01B11/00

CPC classification number: G03F7/70633

Abstract: Embodiments of the invention include a scatterometry target for use in determining the alignment between substrate layers. A target arrangement is formed on a substrate and comprises a plurality of target cells. Each cell has two layers of periodic features constructed such that an upper layer is arranged above a lower layer and configured so that the periodic features of the upper layer have an offset and/or different pitch than periodic features of the lower layer. The pitches are arranged to generate a periodic signal when the target is exposed to an illumination source. The target also includes disambiguation features arranged between the cells and configured to resolve ambiguities caused by the periodic signals generated by the cells when exposed to the illumination source.

Abstract translation: 本发明的实施例包括用于确定衬底层之间的对准的散射测量目标。 目标装置形成在衬底上并且包括多个目标单元。 每个单元具有两层周期性特征，所述两层周期性特征构造成使得上层布置在下层之上并且被配置为使得上层的周期性特征具有与下层的周期性特征相比偏移和/或不同的间距。 当目标暴露于照明源时，间距被安排成产生周期性信号。 目标还包括排列在单元之间的消歧特征，并且被配置为解决由单元在暴露于照明源时产生的周期性信号引起的歧义。

公开(公告)号：WO2010104799A2

公开(公告)日：2010-09-16

申请号：PCT/US2010/026557

申请日：2010-03-08

Applicant: KLA-TENCOR CORPORATION ,  LEVY, Ady ,  NGAI, Samuel ,  BEVIS, Christopher F. ,  CONCINA, Stefano ,  FIELDEN, John ,  MIEHER, Walter ,  MUELLER, Dieter ,  RICHARDSON, Neil ,  WACK, Dan ,  WAGNER, Larry

Inventor： LEVY, Ady ,  NGAI, Samuel ,  BEVIS, Christopher F. ,  CONCINA, Stefano ,  FIELDEN, John ,  MIEHER, Walter ,  MUELLER, Dieter ,  RICHARDSON, Neil ,  WACK, Dan ,  WAGNER, Larry

IPC: H01L21/66

CPC classification number: G01N21/9505 ,  G01N21/3581 ,  H01L22/12

Abstract: Systems and methods for determining one or more characteristics of a specimen using radiation in the terahertz range are provided. One system includes an illumination subsystem configured to illuminate the specimen with radiation. The system also includes a detection subsystem configured to detect radiation propagating from the specimen in response to illumination of the specimen and to generate output responsive to the detected radiation. The detected radiation includes radiation in the terahertz range. In addition, the system includes a processor configured to determine the one or more characteristics of the specimen using the output.

Abstract translation: 提供了使用太赫兹范围内的辐射来确定样本的一个或多个特征的系统和方法。 一个系统包括被配置为用辐射照射样本的照明子系统。 该系统还包括检测子系统，该检测子系统被配置为响应于样本的照射来检测从样本传播的辐射，并响应于检测到的辐射产生输出。 检测到的辐射包括太赫兹范围内的辐射。 另外，该系统包括配置成使用该输出来确定样本的一个或多个特性的处理器。

公开(公告)号：WO2004066028A2

公开(公告)日：2004-08-05

申请号：PCT/US2004/001570

申请日：2004-01-20

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  MIEHER, Walter, D. ,  MACK, Chris ,  HANKINSON, Matt

Inventor： MIEHER, Walter, D. ,  MACK, Chris ,  HANKINSON, Matt

IPC: G03F

CPC classification number: G03F7/70558 ,  G01N21/211 ,  G01N21/47 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/8416 ,  G03F7/70483 ,  G03F7/70533 ,  G03F7/70625 ,  G03F7/70641 ,  H01L22/12 ,  H01L22/20 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A method for determining one or more process parameter settings of a photolithographic system is disclosed.

Abstract translation: 公开了一种用于确定光刻系统的一个或多个工艺参数设置的方法。

公开(公告)号：WO2010104799A3

公开(公告)日：2011-01-27

申请号：PCT/US2010026557

申请日：2010-03-08

Applicant: KLA TENCOR CORP ,  LEVY ADY ,  NGAI SAMUEL ,  BEVIS CHRISTOPHER F ,  CONCINA STEFANO ,  FIELDEN JOHN ,  MIEHER WALTER ,  MUELLER DIETER ,  RICHARDSON NEIL ,  WACK DAN ,  WAGNER LARRY

Inventor： LEVY ADY ,  NGAI SAMUEL ,  BEVIS CHRISTOPHER F ,  CONCINA STEFANO ,  FIELDEN JOHN ,  MIEHER WALTER ,  MUELLER DIETER ,  RICHARDSON NEIL ,  WACK DAN ,  WAGNER LARRY

IPC: H01L21/66

CPC classification number: G01N21/9505 ,  G01N21/3581 ,  H01L22/12

Abstract: Systems and methods for determining one or more characteristics of a specimen using radiation in the terahertz range are provided. One system includes an illumination subsystem configured to illuminate the specimen with radiation. The system also includes a detection subsystem configured to detect radiation propagating from the specimen in response to illumination of the specimen and to generate output responsive to the detected radiation. The detected radiation includes radiation in the terahertz range. In addition, the system includes a processor configured to determine the one or more characteristics of the specimen using the output.

Abstract translation: 提供了使用太赫兹范围内的辐射来确定样本的一个或多个特征的系统和方法。 一个系统包括被配置为用辐射照射样本的照明子系统。 该系统还包括检测子系统，该检测子系统被配置为响应于样本的照射来检测从样本传播的辐射，并响应于检测到的辐射产生输出。 检测到的辐射包括太赫兹范围内的辐射。 另外，该系统包括配置成使用该输出来确定样本的一个或多个特性的处理器。

公开(公告)号：WO2004066028A3

公开(公告)日：2005-05-19

申请号：PCT/US2004001570

申请日：2004-01-20

Applicant: KLA TENCOR TECH CORP ,  MIEHER WALTER D ,  MACK CHRIS ,  HANKINSON MATT

Inventor： MIEHER WALTER D ,  MACK CHRIS ,  HANKINSON MATT

IPC: G01B11/00 ,  G01B11/14 ,  G01B11/28 ,  G03C5/00 ,  G03F20060101 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70558 ,  G01N21/211 ,  G01N21/47 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/8416 ,  G03F7/70483 ,  G03F7/70533 ,  G03F7/70625 ,  G03F7/70641 ,  H01L22/12 ,  H01L22/20 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A method for determining one or more process parameter settings of a photolithographic system is disclosed. The method is performed using a scatterometry tool (258) to measure a latent image of a pattern, a partially developed pattern, or a fully developed pattern. The scatterometry tool may be placed at the end of a stepper (254) or at the beginning of the resist developer (256).

Abstract translation: 公开了一种用于确定光刻系统的一个或多个工艺参数设置的方法。 使用散射测量工具（258）来执行该方法以测量图案的潜像，部分展开的图案或完全展开的图案。 散射测量工具可以放置在步进器（254）的末端或抗蚀剂显影剂开始处（256）。

公开(公告)号：WO2007126559A2

公开(公告)日：2007-11-08

申请号：PCT/US2007/006031

申请日：2007-03-08

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  KANDEL, Daniel ,  MIEHER, Walter, D. ,  GOLOVANEVSKY, Boris

Inventor： KANDEL, Daniel ,  MIEHER, Walter, D. ,  GOLOVANEVSKY, Boris

IPC: G01B11/00

CPC classification number: G03F7/70633

Abstract: Embodiments of the invention include a scatterometry target for use in determining the alignment between substrate layers. A target arrangement is formed on a substrate and comprises a plurality of target cells. Each cell has two layers of periodic features constructed such that an upper layer is arranged above a lower layer and configured so that the periodic features of the upper layer have an offset and/or different pitch than periodic features of the lower layer. The pitches are arranged to generate a periodic signal when the target is exposed to an illumination source. The target also includes disambiguation features arranged between the cells and configured to resolve ambiguities caused by the periodic signals generated by the cells when exposed to the illumination source.

Abstract translation: 本发明的实施例包括用于确定衬底层之间的对准的散射仪。 目标装置形成在基板上并且包括多个目标单元。 每个单元具有两层周期性特征，其被构造为使得上层布置在下层上方并且被配置为使得上层的周期特征具有与下层的周期特征相比偏移和/或不同的间距。 当目标暴露于照明源时，间距被布置成产生周期性信号。 目标还包括布置在单元之间的消歧特征，并被配置为解决由暴露于照明源时由单元产生的周期性信号引起的模糊。

公开(公告)号：WO2004076963A3

公开(公告)日：2004-11-18

申请号：PCT/US2004005419

申请日：2004-02-23

Applicant: KLA TENCOR TECH CORP ,  MIEHER WALTER D ,  LEVY ADY ,  GOLOVANEVSKY BORIS ,  FRIEDMANN MICHAEL ,  SMITH IAN ,  ADEL MICHAEL ,  FABRIKANT ANATOLY ,  BEVIS CHRISTOPHER F ,  FIELDEN JOHN ,  BAREKET NOAH ,  GROSS KEN ,  ZALICKI PIOTR ,  WACK DAN ,  DECECCO PAOLA ,  DZIURA THADDEUS G ,  GHINOVKER MARK

Inventor： MIEHER WALTER D ,  LEVY ADY ,  GOLOVANEVSKY BORIS ,  FRIEDMANN MICHAEL ,  SMITH IAN ,  ADEL MICHAEL ,  FABRIKANT ANATOLY ,  BEVIS CHRISTOPHER F ,  FIELDEN JOHN ,  BAREKET NOAH ,  GROSS KEN ,  ZALICKI PIOTR ,  WACK DAN ,  DECECCO PAOLA ,  DZIURA THADDEUS G ,  GHINOVKER MARK

IPC: G03F7/20 ,  G03F9/00 ,  G01B11/00

CPC classification number: G03F9/7088 ,  G01N21/956 ,  G01N2021/213 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70683 ,  G03F9/7049 ,  G03F9/7084

Abstract: Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For a plurality of periodic targets that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, an optical system is employed to thereby measure an optical signal from each of the periodic targets. There are predefined offsets between the first and second structures. An overlay error is determined between the first and second structures by analyzing the measured optical signals from the periodic targets using a scatterometry overlay technique based on the predefined offsets. The optical system comprises any one or more of the following apparatuses: a reflectometric, a ellipsomertic, imaging, interferometric, and/ or scanning angle system.

Abstract translation: 公开了一种确定多层样本的两层之间的覆盖误差的方法。 对于每个具有由第一层形成的第一结构和由第二层样品形成的第二结构的多个周期性目标，采用光学系统，从而测量来自每个周期性目标的光信号。 在第一和第二结构之间有预定义的偏移。 通过使用基于预定偏移的散射测量覆盖技术来分析来自周期性目标的所测量的光信号，在第一和第二结构之间确定覆盖误差。 光学系统包括以下装置中的任何一个或多个：反射测量，椭圆偏振，成像，干涉测量和/或扫描角度系统。

公开(公告)号：WO2004076963A2

公开(公告)日：2004-09-10

申请号：PCT/US2004/005419

申请日：2004-02-23

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  MIEHER, Walter, D. ,  LEVY, Ady ,  GOLOVANEVSKY, Boris ,  FRIEDMANN, Michael ,  SMITH, Ian ,  ADEL, Michael ,  FABRIKANT, Anatoly ,  BEVIS, Christopher, F. ,  FIELDEN, John ,  BAREKET, Noah ,  GROSS, Ken ,  ZALICKI, Piotr ,  WACK, Dan ,  DECECCO, Paola ,  DZIURA, Thaddeus, G. ,  GHINOVKER, Mark

Inventor： MIEHER, Walter, D. ,  LEVY, Ady ,  GOLOVANEVSKY, Boris ,  FRIEDMANN, Michael ,  SMITH, Ian ,  ADEL, Michael ,  FABRIKANT, Anatoly ,  BEVIS, Christopher, F. ,  FIELDEN, John ,  BAREKET, Noah ,  GROSS, Ken ,  ZALICKI, Piotr ,  WACK, Dan ,  DECECCO, Paola ,  DZIURA, Thaddeus, G. ,  GHINOVKER, Mark

IPC: G01B

CPC classification number: G03F9/7088 ,  G01N21/956 ,  G01N2021/213 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70683 ,  G03F9/7049 ,  G03F9/7084

Abstract: Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For a plurality of periodic targets that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, an optical system is employed to thereby measure an optical signal from each of the periodic targets. There are predefined offsets between the first and second structures. An overlay error is determined between the first and second structures by analyzing the measured optical signals from the periodic targets using a scatterometry overlay technique based on the predefined offsets. The optical system comprises any one or more of the following apparatus: an imaging reflectometer, an imaging spectroscopic reflectometer, a polarized spectroscopic imaging reflectometer, a scanning reflectometer system, a system with two or more reflectometers capable of parallel data acquisition, a system with two or more spectroscopic reflectometers capable of parallel data acquisition, a system with two or more polarized spectroscopic reflectometers capable of parallel data acquisition, a system with two or more polarized spectroscopic reflectometers capable of serial data acquisition without moving the wafer stage or moving any optical elements or the reflectometer stage, imaging spectrometers, imaging system with wavelength filter, imaging system with long-pass wavelength filter, imaging system with short-pass wavelength filter, imaging system without wavelength filter, interferometric imaging system, imaging ellipsometer, a spectroscopic ellipsometer, a laser ellipsometer having a photoelastic modulator, an imaging spectroscopic ellipsometer, a scanning ellipsometer system, a system with two or more ellipsometers capable of parallel data acquisition, a system with two or more ellipsometers capable of serial data acquisition without moving the wafer stage or moving any optical elements or the ellipsometer stage, a Michelson interferometer, and a Mach-Zehnder interferometer, a Sagnac interferometer, a scanning angle of incidence system, a scanning azimuth angle system, a +/- first order differential reflectometer, a +/- first order differential polarized reflectometer.

Abstract translation: 公开了一种确定多层样本的两层之间的覆盖误差的方法。 对于每个具有由第一层形成的第一结构和由第二层样品形成的第二结构的多个周期性目标，采用光学系统，从而测量来自每个周期性目标的光信号。 在第一和第二结构之间有预定义的偏移。 通过使用基于预定偏移的散射测量覆盖技术来分析来自周期性目标的所测量的光信号，在第一和第二结构之间确定覆盖误差。 光学系统包括以下装置中的任何一个或多个：成像反射计，成像光谱反射计，偏振光谱成像反射计，扫描反射计系统，具有两个或更多个能够并行数据采集的反射计的系统，具有两个 具有能够并行数据采集的两个或更多个偏振分光反射计的系统，具有两个或更多个偏振光谱反射计的系统，其能够进行串行数据采集而不移动晶片台或移动任何光学元件或 反射计阶段，成像光谱仪，波长滤波器成像系统，长波长滤波器成像系统，短波长滤波器成像系统，无波长滤波器成像系统，干涉成像系统，成像椭偏仪，光谱椭偏仪，激光 椭偏仪具有 光弹性调制器，成像光谱椭偏仪，扫描椭偏仪系统，具有能够并行数据采集的两个或更多个椭偏仪的系统，具有两个或更多个椭圆计的系统，能够进行串行数据采集而不移动晶片台或移动任何光学元件或 椭圆偏振台，迈克尔逊干涉仪和马赫 - 策德尔干涉仪，Sagnac干涉仪，入射系统的扫描角度，扫描方位角系统，+/-一阶微分反射计，+/-一阶差分偏振反射计 。