中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

23 records (took 0.013 seconds)

    METHOD FOR MONITORING A RETICLE
    2.
    发明申请
    METHOD FOR MONITORING A RETICLE 审中-公开
    监控方法

    公开(公告)号：WO2006113126A2

    公开(公告)日：2006-10-26

    申请号：PCT/US2006/012608

    申请日：2006-04-03

    Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  WATSON, Sterling, G. ,  LEVY, Ady ,  MACK, Chris, A. ,  STOKOWSKI, Stanley, E. ,  SAIDIN, Zain, K.

    Inventor： WATSON, Sterling, G. ,  LEVY, Ady ,  MACK, Chris, A. ,  STOKOWSKI, Stanley, E. ,  SAIDIN, Zain, K.

    IPC: G03F1/00 ,  G03C5/00 ,  G06K9/00

    CPC classification number: G03F1/84 ,  G03F1/38 ,  G03F1/50 ,  G03F7/70433 ,  G03F7/70625 ,  Y10S430/146

    Abstract: Reticles may comprise shading elements (SEs) for locally altering the reticle optical properties. However, such reticles may degrade over time as a result of repeated exposure to radiation in a lithography process, as the radiation may "heal" the SEs. Disclosed are techniques for monitoring a reticle in order to maintain confidence about the reticle's optical properties and the uniformity of patterns on wafers that are to be printed using the reticle. Reticles undergo periodic inspection comprising reticle transmission measurement and/or aerial imaging of the reticle. When such inspection indicates sufficient reticle degradation, the reticle is tagged for correction prior to its subsequent use in a lithography process.

    Abstract translation: 网状物可以包括用于局部改变光罩光学性质的遮蔽元件（SE）。 然而，由于辐射可能“治愈”SE，因此在光刻过程中由于反复暴露于辐射而导致这样的掩模版可能随时间而降解。 公开了用于监测掩模版的技​​术，以便保持关于掩模版的光学性质和将使用掩模版印刷的晶片上的图案的均匀性的置信度。 网格线进行定期检查，包括掩模版传输测量和/或掩模版的空中成像。 当这种检查表明足够的掩模版降解时，标线片被标记以在其后续在光刻工艺中使用之前进行校正。

    LED SOLAR ILLUMINATOR
    3.
    发明申请
    LED SOLAR ILLUMINATOR 审中-公开
    LED太阳能照明灯

    公开(公告)号：WO2012138460A2

    公开(公告)日：2012-10-11

    申请号：PCT/US2012028910

    申请日：2012-03-13

    Applicant: KLA TENCOR CORP ,  ZHAO GUOHENG ,  LEVY ADY ,  SALNIK ALEX ,  VAEZ-IRAVANI MEHDI ,  NICOLAIDES LENA ,  NGAI SAMUEL S H

    Inventor： ZHAO GUOHENG ,  LEVY ADY ,  SALNIK ALEX ,  VAEZ-IRAVANI MEHDI ,  NICOLAIDES LENA ,  NGAI SAMUEL S H

    IPC: G01N21/01 ,  F21S2/00 ,  F21V8/00 ,  G01R31/26

    CPC classification number: H05B33/0803

    Abstract: An apparatus for illuminating a target surface, the apparatus having a plurality of LED arrays, where each of the arrays has a plurality of individually addressable LEDs, and where at least one of the arrays is disposed at an angle of between about forty-five degrees and about ninety degrees relative to the target surface, where all of the arrays supply light into a light pipe, the light pipe having interior walls made of a reflective material, where light exiting the light pipe illuminates the target surface, and a controller for adjusting an intensity of the individually addressable light sources.

    Abstract translation: 一种用于照射目标表面的装置，该装置具有多个LED阵列，其中每个阵列具有多个独立可寻址的LED，并且其中至少一个阵列以大约四十五度之间的角度设置 并且相对于目标表面大约九十度，其中所有阵列将光提供到光管中，光管具有由反射材料制成的内壁，其中离开光管的光照射目标表面，以及用于调节的控制器 独立寻址光源的强度。

    METHOD FOR MONITORING A RETICLE
    4.
    发明申请
    METHOD FOR MONITORING A RETICLE 审中-公开
    监控方法

    公开(公告)号：WO2006113126A3

    公开(公告)日：2009-04-09

    申请号：PCT/US2006012608

    申请日：2006-04-03

    Applicant: KLA TENCOR TECH CORP ,  WATSON STERLING G ,  LEVY ADY ,  MACK CHRIS A ,  STOKOWSKI STANLEY E ,  SAIDIN ZAIN K

    Inventor： WATSON STERLING G ,  LEVY ADY ,  MACK CHRIS A ,  STOKOWSKI STANLEY E ,  SAIDIN ZAIN K

    IPC: G06K9/00 ,  G01R31/26 ,  H01L21/22 ,  H01L21/38 ,  H01L21/66

    CPC classification number: G03F1/84 ,  G03F1/38 ,  G03F1/50 ,  G03F7/70433 ,  G03F7/70625 ,  Y10S430/146

    Abstract: Reticles may comprise shading elements (SEs) for locally altering the reticle optical properties. However, such reticles may degrade over time as a result of repeated exposure to radiation in a lithography process, as the radiation may "heal" the SEs. Disclosed are techniques for monitoring a reticle in order to maintain confidence about the reticle's optical properties and the uniformity of patterns on wafers that are to be printed using the reticle. Reticles undergo periodic inspection comprising reticle transmission measurement and/or aerial imaging of the reticle. When such inspection indicates sufficient reticle degradation, the reticle is tagged for correction prior to its subsequent use in a lithography process.

    Abstract translation: 网状物可以包括用于局部改变光罩光学性质的遮蔽元件（SE）。 然而，由于辐射可能“治愈”SE，因此在光刻过程中由于反复暴露于辐射而导致这样的掩模版可能随时间而降解。 公开了用于监测掩模版的技​​术，以便保持关于掩模版的光学性质和将使用掩模版印刷的晶片上的图案的均匀性的置信度。 网格线进行定期检查，包括掩模版传输测量和/或掩模版的空中成像。 当这种检查表明足够的掩模版降解时，标线片被标记以在其后续在光刻工艺中使用之前进行校正。

    SCANNING ELECTRON MICROSCOPE WITH CRT-TYPE ELECTRON OPTICS
    5.
    发明申请
    SCANNING ELECTRON MICROSCOPE WITH CRT-TYPE ELECTRON OPTICS 审中-公开
    扫描电子显微镜与CRT型电子光学

    公开(公告)号：WO2007070475A2

    公开(公告)日：2007-06-21

    申请号：PCT/US2006047227

    申请日：2006-12-11

    Applicant: KLA TENCOR TECH CORP ,  ADLER DAVID L ,  LEVY ADY ,  RICHARDSON NEIL ,  MCCORD MARK A

    Inventor： ADLER DAVID L ,  LEVY ADY ,  RICHARDSON NEIL ,  MCCORD MARK A

    IPC: G21K7/00

    CPC classification number: H01J37/28 ,  H01J37/04 ,  H01J37/065 ,  H01J37/1475 ,  H01J37/18

    Abstract: One embodiment relates to an apparatus, including a CRT-type gun (for example, 102, or 302, or 510, or 1002, or 1113) and deflectors to generate and scan the electron beam, which utilizes the electron beam for inspection or metrology of a substrate. The apparatus may comprise a portable scanning electron microscope. Another embodiment relates to a method of inspecting a substrate or measuring an aspect of the substrate, where an electron beam is focused using electrostatic lenses formed by metal plates (704) supported by and separated by fused glass beads (706) or other insulating material. Another embodiment relates to a method of obtaining an electron beam image of a surface of a bulk specimen where a portable SEM device is moved to the bulk specimen. Other embodiments and features are also disclosed.

    Abstract translation: 一个实施例涉及一种包括CRT型枪（例如，102或302，或510，或1002或1113）和用于产生和扫描电子束的偏转器的装置，其利用电子束进行检查或计量 的基底。 该装置可以包括便携式扫描电子显微镜。 另一实施例涉及一种检查衬底或测量衬底的方面的方法，其中电子束被使用由熔融玻璃珠（706）或其他绝缘材料支撑并由其分离的金属板（704）形成的静电透镜聚焦。 另一实施例涉及一种获得便携式SEM装置移动到散装试样的散装试样的表面的电子束图像的方法。 还公开了其它实施例和特征。

    DEFECT DETECTION AND RESPONSE
    8.
    发明申请
    DEFECT DETECTION AND RESPONSE 审中-公开
    缺陷检测和响应

    公开(公告)号：WO2010077865A2

    公开(公告)日：2010-07-08

    申请号：PCT/US2009068060

    申请日：2009-12-15

    Applicant: KLA TENCOR CORP ,  ZHAO GUOHENG ,  ZAPALAC GEORGE H ,  NGAI SAMUEL S H ,  VAEZ-IRAVANI MEHDI ,  LEVY ADY ,  DHARMADHIKARI VINEET

    Inventor： ZHAO GUOHENG ,  ZAPALAC GEORGE H ,  NGAI SAMUEL S H ,  VAEZ-IRAVANI MEHDI ,  LEVY ADY ,  DHARMADHIKARI VINEET

    IPC: H01L21/66 ,  H01L31/042

    CPC classification number: G06T7/001 ,  G01N25/72 ,  G02F1/1309 ,  G06T2207/10048 ,  G06T2207/30148

    Abstract: To increase inspection throughput, the field of view of an infrared camera can be moved over the sample at a constant velocity. Throughout this moving, a modulation can be provided to the sample and infrared images can be captured using the infrared camera. Moving the field of view, providing the modulation, and capturing the infrared images can be synchronized. The infrared images can be filtered to generate the time delay lock-in thermography, thereby providing defect identification. This filtering can account for the number of pixels of the infrared camera in a scanning direction. For the case of optical modulation, a dark field region can be provided for the field of view throughout the moving, thereby providing an improved signal-to-noise ratio during filtering. Localized defects can be repaired by a laser integrated into the detection system or marked by ink for later repair in the production line.

    Abstract translation: 为了提高检查吞吐量，红外摄像机的视野可以以恒定的速度移动到样品上。 在整个移动过程中，可以向样品提供调制，并可以使用红外摄像机捕获红外图像。 可以同步移动视野，提供调制和捕获红外图像。 可以对红外图像进行滤波以产生延时锁定热成像，从而提供缺陷识别。 该过滤可以解释红外摄像机在扫描方向上的像素数。 对于光调制的情况，可以在整个移动期间为视场提供暗场区域，从而在滤波期间提供改善的信噪比。 局部缺陷可以通过集成到检测系统中的激光器或由墨水标记来修复，以便在生产线中进行后续修复。

    TEST STRUCTURES AND METHODS FOR MONITORING OR CONTROLLING A SEMICONDUCTOR FABRICATION PROCESS
    9.
    发明申请
    TEST STRUCTURES AND METHODS FOR MONITORING OR CONTROLLING A SEMICONDUCTOR FABRICATION PROCESS 审中-公开
    用于监测或控制半导体制造工艺的测试结构和方法

    公开(公告)号：WO2006012388A3

    公开(公告)日：2006-12-14

    申请号：PCT/US2005025821

    申请日：2005-07-22

    Applicant: KLA TENCOR TECH CORP ,  MONAHAN KEVIN ,  EICHELBERGER BRAD ,  LEVY ADY

    Inventor： MONAHAN KEVIN ,  EICHELBERGER BRAD ,  LEVY ADY

    IPC: G03F7/20

    CPC classification number: G03F7/70633 ,  G03F7/70625 ,  G03F7/70641 ,  G03F7/70683 ,  H01L22/34 ,  H01L2924/0002 ,  H01L2924/00

    Abstract: Various test structures and methods for monitoring or controlling a semiconductor fabrication process are provided. One test structure formed on a wafer as a monitor for a lithography process includes a bright field target (30) that includes first grating structures (32) . The test structure also includes a dark field target (34) that includes second grating structures (36) . The first and second grating structures have one or more characteristics that are substantially the same as one or more characteristics of device structures formed on the wafer. In addition, the test structure includes a phase shift target (38) having characteristics that are substantially the same as the characteristics of the bright field or dark field target except that grating structures (40) of the phase shift target are shifted in optical phase from the first or second grating structures. One or more characteristics of the targets can be measured and used to determine parameter (s) of the lithography process .

    Abstract translation: 提供了用于监测或控制半导体制造工艺的各种测试结构和方法。 在作为光刻处理的监视器的晶片上形成的一个测试结构包括包括第一光栅结构（32）的明场目标（30）。 测试结构还包括包括第二光栅结构（36）的暗场靶（34）。 第一和第二光栅结构具有与形成在晶片上的器件结构的一个或多个特性基本上相同的一个或多个特性。 此外，测试结构包括具有与亮场或暗场目标的特性基本相同的特性的相移目标（38），除了相移目标物的光栅结构（40）在光学相位 第一或第二光栅结构。 可以测量目标的一个或多个特征并用于确定光刻工艺的参数。

    SYSTEMS AND METHODS FOR MODIFYING A RETICLE'S OPTICAL PROPERTIES
    10.
    发明申请
    SYSTEMS AND METHODS FOR MODIFYING A RETICLE'S OPTICAL PROPERTIES 审中-公开
    用于修改虚拟光学特性的系统和方法

    公开(公告)号：WO2006113146A2

    公开(公告)日：2006-10-26

    申请号：PCT/US2006/012847

    申请日：2006-04-07

    Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  WATSON, Sterling, G. ,  LEVY, Ady ,  MACK, Chris, A. ,  STOKOWSKI, Stanley, E. ,  SAIDIN, Zain, K. ,  ZURBRICK, Larry, S.

    Inventor： WATSON, Sterling, G. ,  LEVY, Ady ,  MACK, Chris, A. ,  STOKOWSKI, Stanley, E. ,  SAIDIN, Zain, K. ,  ZURBRICK, Larry, S.

    IPC: G03F1/00 ,  G03C5/00 ,  G06K9/00

    CPC classification number: G06K9/2063 ,  G03F1/72 ,  G03F1/84 ,  Y10S430/146

    Abstract: Disclosed are systems and methods for modifying a reticle. In general, inspection results from a plurality of wafers or prediction results from a lithographic model are used to individually decrease the dose or any other optical property at specific locations of the reticle. In one embodiment, any suitable optical property of the reticle is modified by an optical beam, such as a femto-second laser, at specific locations on the reticle so as to widen the process window for such optical property. Examples of optical properties include dose, phase, illumination angle, and birefringence. Techniques for adjusting optical properties at specific locations on a reticle using an optical beam may be practiced for other purposes besides widening the process window.

    Abstract translation: 公开了用于修改掩模版的系统和方法。 通常，来自多个晶片的检查结果或来自光刻模型的预测结果被用于单独地减小光罩的特定位置处的剂量或任何其它光学特性。 在一个实施例中，掩模版的任何合适的光学性质通过光束（例如毫微微秒级激光器）在掩模版上的特定位置处被修改，以便加宽用于这种光学性质的工艺窗口。 光学性质的实例包括剂量，相位，照射角度和双折射率。 使用光束在光罩上的特定位置处调整光学特性的技术可以用于除加宽工艺窗口之外的其它目的。

Patent Agency Ranking