公开(公告)号：WO2017132435A1

公开(公告)日：2017-08-03

申请号：PCT/US2017/015223

申请日：2017-01-27

Applicant: HERMES MICROVISION INC. ,  REN, Weiming ,  LIU, Xuedrang ,  HU, Xuerang ,  CHEN, Zhongwei

Inventor： REN, Weiming ,  LIU, Xuedrang ,  HU, Xuerang ,  CHEN, Zhongwei

IPC: G06T7/00 ,  H01J37/252 ,  H01J37/20 ,  H01J37/28 ,  H01J37/26 ,  H01J37/06 ,  H01J37/04 ,  H01J37/10

CPC classification number: H01J37/06 ,  G01N23/2251 ,  G01N2223/418 ,  G01N2223/6116 ,  H01J37/145 ,  H01J37/1474 ,  H01J37/226 ,  H01J37/28 ,  H01J2237/2817

Abstract: A new multi-beam apparatus with a total FOV variable in size, orientation and incident angle, is proposed. The new apparatus provides more flexibility to speed the sample observation and enable more samples observable. More specifically, as a yield management tool to inspect and/or review defects on wafers/masks in semiconductor manufacturing industry, the new apparatus provide more possibilities to achieve a high throughput and detect more kinds of defects.

Abstract translation: 提出了一种新的多光束设备，其总大小，方向和入射角都是可变的。 新设备提供了更大的灵活性来加速样品观察，并使更多样品可观察。 更具体地说，作为用于检查和/或审查半导体制造工业中的晶片/掩模上的缺陷的产量管理工具，该新设备为实现高产量和检测更多种类的缺陷提供了更多的可能性。

公开(公告)号：WO2017015483A1

公开(公告)日：2017-01-26

申请号：PCT/US2016/043375

申请日：2016-07-21

Applicant: HERMES MICROVISION INC. ,  REN, Weiming ,  LIU, Xuedong ,  XUERANG, Hu ,  ZHONGWEI, Chen

Inventor： REN, Weiming ,  LIU, Xuedong ,  XUERANG, Hu ,  ZHONGWEI, Chen

IPC: G01N23/225 ,  H01J37/10 ,  H01J37/28

CPC classification number: H01J37/1474 ,  H01J37/06 ,  H01J37/10 ,  H01J37/1477 ,  H01J37/1478 ,  H01J37/28 ,  H01J2237/024 ,  H01J2237/0453 ,  H01J2237/0492 ,  H01J2237/103 ,  H01J2237/1205 ,  H01J2237/1516 ,  H01J2237/1534 ,  H01J2237/1536

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source- conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.

Abstract translation: 提出了一种用于以高分辨率和高吞吐量观察样品的多光束装置。 在该装置中，源极转换单元通过偏转平行的一次电子束的多个子束形成一个单个电子源的多个并行图像，并且一个物镜将多个偏转的子束聚焦在样本表面上并形成多个探针点 在其上。 使用可移动聚光透镜来准直一次电子束并改变多个探针点的电流，前束形成装置削弱一次电子束的库仑效应，并且源转换单元使尺寸最小化 通过最小化和补偿物镜和聚光透镜的离轴像差来实现多个探测点。

公开(公告)号：WO2012082169A1

公开(公告)日：2012-06-21

申请号：PCT/US2011/025098

申请日：2011-02-16

Applicant: HERMES-MICROVISION, INC. ,  CHEN, Zhongwei ,  REN, Weiming ,  KANAI, Kenichi ,  LIU, Xuedong

Inventor： CHEN, Zhongwei ,  REN, Weiming ,  KANAI, Kenichi ,  LIU, Xuedong

IPC: G01N23/00

CPC classification number: G01N23/2251 ,  G01N2223/6116 ,  G01N2223/646 ,  H01J37/141 ,  H01J2237/2817

Abstract: An apparatus basically uses a simple and compact multi-axis magnetic lens to focus each of a plurality of charged particle beams on sample surface at the same time. In each sub-lens module of the multi-axis magnetic lens, two magnetic rings are respectively inserted into upper and lower holes with non-magnetic radial gap. Each gap size is small enough to keep a sufficient magnetic coupling and large enough to get a sufficient axial symmetry of magnetic scale potential distribution in the space near to its optical axis. This method eliminates the non-axisymmetric transverse field in each sub-lens and the round lens field difference among all sub-lenses at the same time; both exist inherently in a conventional multi-axis magnetic lens.

Abstract translation: 基本上使用简单且紧凑的多轴磁透镜将多个带电粒子束中的每一个同时聚焦在样品表面上。 在多轴磁透镜的每个子透镜模块中，两个磁环分别插入上下孔中，具有非磁性径向间隙。 每个间隙尺寸足够小以保持足够的磁耦合，并且足够大以在靠近其光轴的空间中获得足够的磁标尺电位分布的轴对称性。 该方法消除了每个子透镜中的非轴对称横场和所有子透镜之间的圆形透镜场差; 两者都存在于传统的多轴磁性透镜中。

公开(公告)号：WO2012082171A1

公开(公告)日：2012-06-21

申请号：PCT/US2011/025100

申请日：2011-02-16

Applicant: HERMES-MICROVISION, INC. ,  CHEN, Zhongwei ,  REN, Weiming ,  KANAI, Kenichi ,  LIU, Xuedong

Inventor： CHEN, Zhongwei ,  REN, Weiming ,  KANAI, Kenichi ,  LIU, Xuedong

IPC: G01N23/00

CPC classification number: H01J37/141 ,  H01J37/28 ,  H01J2237/1035 ,  H01J2237/1415 ,  H01J2237/1534

Abstract: An apparatus basically uses a simple and compact multi-axis magnetic lens to focus each of a plurality of charged particle beams on sample surface at the same time. In each sub-lens module of the multi-axis magnetic lens, two magnetic rings are respectively inserted into upper and lower holes with non-magnetic radial gap. Each gap size is small enough to keep a sufficient magnetic coupling and large enough to get a sufficient axial symmetry of magnetic scale potential distribution in the space near to its optical axis. This method eliminates the non-axisymmetric transverse field in each sub-lens and the round lens field difference among all sub-lenses at the same time; both exist inherently in a conventional multi-axis magnetic lens.

Abstract translation: 设备基本上使用简单紧凑的多轴磁性透镜来同时将多个带电粒子束中的每一个聚焦在样品表面上。 在多轴磁性透镜的每个子透镜模块中，两个磁环分别插入具有非磁性径向间隙的上孔和下孔中。 每个间隙尺寸足够小以保持足够的磁耦合并且足够大以在靠近其光轴的空间中获得足够的磁标势电位分布的轴向对称性。 该方法同时消除了每个子透镜中的非轴对称横向场和所有子透镜之间的圆透镜场差; 都存在于传统的多轴磁性透镜中。

公开(公告)号：WO2011071549A1

公开(公告)日：2011-06-16

申请号：PCT/US2010/021722

申请日：2010-01-22

Applicant: HERMES MICROVISION, INC. ,  CHEN, Zhongwei ,  REN, Weiming ,  KANAI, Kenichi ,  LIU, Xuedong

Inventor： CHEN, Zhongwei ,  REN, Weiming ,  KANAI, Kenichi ,  LIU, Xuedong

IPC: G21K1/08

CPC classification number: H01J37/141 ,  H01J2237/1405

Abstract: The present invention relates to a multi-axis magnetic lens for a charged particle beam system. The apparatus eliminates the undesired non-axisymmetric transverse magnetic field components from the magnetic field generated by a common excitation coil and leaves the desired axisymmetric field for focusing each particle beam employed within the system.

Abstract translation: 本发明涉及带电粒子束系统的多轴磁透镜。 该装置从由公共的励磁线圈产生的磁场中消除不期望的非轴对称的横向磁场分量，并且留下用于聚焦在系统内采用的每个粒子束的期望的轴对称场。

公开(公告)号：WO2016145458A1

公开(公告)日：2016-09-15

申请号：PCT/US2016/027267

申请日：2016-04-13

Applicant: HERMES MICROVISION INC. ,  REN, Weiming ,  LI, Shuai ,  LIU, Xuedong ,  CHEN, Zhongwei

Inventor： REN, Weiming ,  LI, Shuai ,  LIU, Xuedong ,  CHEN, Zhongwei

IPC: H01J49/00 ,  G01N23/00 ,  G21K5/10 ,  G21K7/00

CPC classification number: H01J37/28 ,  H01J37/1472 ,  H01J2237/04924 ,  H01J2237/083 ,  H01J2237/1205 ,  H01J2237/1516

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.

Abstract translation: 提出了一种用于以高分辨率和高吞吐量观察样品的多光束装置。 在该装置中，源转换单元将单个电子源改变为虚拟多源阵列，初级投影成像系统投射阵列以在样本上形成多个探针点，并且聚光透镜调节多个探针的电流 斑点。 在源转换单元中，图像形成装置在子束极限装置的上游，从而产生较少散射的电子。 图像形成装置不仅形成虚拟多源阵列，而且补偿多个探测点的离轴像差。