公开(公告)号：WO2013112301A1

公开(公告)日：2013-08-01

申请号：PCT/US2013/021184

申请日：2013-01-11

Applicant: APPLIED MATERIALS, INC

Inventor： LISCHKA, David J. ,  ATKINSON, Jim K. ,  DOMIN, Jonathan Paul ,  LIU, Andrew

IPC: B24B37/04 ,  B24B37/34 ,  H01L21/683

CPC classification number: G01B7/023

Abstract: Methods, apparatus, and systems are provided for detecting the presence of a substrate in a load cup. The invention includes a proximity sensor having a detection pad disposed below a contact surface of a load cup assembly and a target disposed on a lever member and adapted to move toward the detection pad when a substrate is placed on the lever member and adapted to move away from the detection pad when a substrate is removed from the lever member. Numerous additional aspects are disclosed.

Abstract translation: 提供了用于检测负载杯中的衬底的存在的方法，装置和系统。 本发明包括接近传感器，其具有设置在负载杯组件的接触表面下方的检测垫和设置在杆构件上的靶，并且当衬底放置在杆构件上并适于移动时， 当从所述杆构件移除基板时，从所述检测垫开始。 公开了许多附加方面。

公开(公告)号：WO2013165919A1

公开(公告)日：2013-11-07

申请号：PCT/US2013/038690

申请日：2013-04-29

Applicant: APPLIED MATERIALS, INC.

Inventor： LIU, Andrew ,  CHEN, Hui

IPC: H01L21/302 ,  H01L21/677

CPC classification number: H01L21/67736 ,  B65G49/00 ,  H01L21/67173 ,  H01L21/6719 ,  H01L21/67219 ,  Y10T29/49826

Abstract: In one aspect, a substrate cleaning system is provided. The substrate cleaning system includes a plurality of cleaning modules; a conveyor for transporting a substrate between the cleaning modules; and a partition assembly that isolates the cleaning modules from the conveyor. Apparatus and methods for isolating CMP cleaning modules from a conveyor are provided, as are numerous other aspects.

Abstract translation: 一方面，提供了基板清洗系统。 基板清洗系统包括多个清洁模块; 用于在清洁模块之间传送基板的输送机; 以及将清洁模块与输送机隔离的分隔组件。 提供了用于从输送机分离CMP清洁模块的装置和方法，以及许多其它方面。