公开(公告)号：WO2016126404A1

公开(公告)日：2016-08-11

申请号：PCT/US2016/013592

申请日：2016-01-15

Applicant: APPLIED MATERIALS, INC.

Inventor： ALVAREZ, David ,  ATKINSON, Jim K.

IPC: H01L21/304

CPC classification number: B08B1/002 ,  B08B1/04 ,  B08B13/00 ,  B29C43/021 ,  B29C2043/024 ,  B29C2043/025 ,  B29C2043/029 ,  B29K2027/12 ,  B29K2075/00 ,  B29L2031/7728 ,  H01L21/67046

Abstract: Compression molded articles employing circumferential surfaces having friction-enhancing patterns to contact substrates during wet chemical processes are disclosed. An article such as an annular body may be formed by a compression molding technique. By including a patterned surface as part of an outer circumferential surface of the annular body, frictional contact between the annular body and the substrate may be enhanced as friction-reducing fluids associated with a wet chemical processes may be directed away from the desired friction contact area between the annular body and the substrate. In this manner, frictional contact may be enhanced and the substrate may be effectively positioned and moved during the wet chemical process to improve the effectively of the process.

Abstract translation: 公开了在湿化学过程中使用具有摩擦增强图案的圆周表面以接触基底的压缩成型制品。 诸如环形体的物品可以通过压缩成型技术形成。 通过将图案化表面作为环形体的外圆周表面的一部分，可以增强环形体与基底之间的摩擦接触，因为与湿化学过程相关联的减摩流体可以被指向远离期望的摩擦接触面积 在环形体和衬底之间。 以这种方式，可以增强摩擦接触，并且可以在湿化学过程期间有效地定位和移动基底，以有效地改进该方法。

公开(公告)号：WO2013112301A1

公开(公告)日：2013-08-01

申请号：PCT/US2013/021184

申请日：2013-01-11

Applicant: APPLIED MATERIALS, INC

Inventor： LISCHKA, David J. ,  ATKINSON, Jim K. ,  DOMIN, Jonathan Paul ,  LIU, Andrew

IPC: B24B37/04 ,  B24B37/34 ,  H01L21/683

CPC classification number: G01B7/023

Abstract: Methods, apparatus, and systems are provided for detecting the presence of a substrate in a load cup. The invention includes a proximity sensor having a detection pad disposed below a contact surface of a load cup assembly and a target disposed on a lever member and adapted to move toward the detection pad when a substrate is placed on the lever member and adapted to move away from the detection pad when a substrate is removed from the lever member. Numerous additional aspects are disclosed.

Abstract translation: 提供了用于检测负载杯中的衬底的存在的方法，装置和系统。 本发明包括接近传感器，其具有设置在负载杯组件的接触表面下方的检测垫和设置在杆构件上的靶，并且当衬底放置在杆构件上并适于移动时， 当从所述杆构件移除基板时，从所述检测垫开始。 公开了许多附加方面。

公开(公告)号：WO2007027486A2

公开(公告)日：2007-03-08

申请号：PCT/US2006/032927

申请日：2006-08-23

Applicant: APPLIED MATERIALS, INC. ,  JIA, Renhe ,  DIAO, Jie ,  WANG, You ,  TSAI, Stan D. ,  ATKINSON, Jim K. ,  KARUPPIAH, Lakshmanan ,  CHEN, Liang-Yuh

Inventor： JIA, Renhe ,  DIAO, Jie ,  WANG, You ,  TSAI, Stan D. ,  ATKINSON, Jim K. ,  KARUPPIAH, Lakshmanan ,  CHEN, Liang-Yuh

IPC: B24B1/00

CPC classification number: B24B37/042 ,  B24B53/017

Abstract: A method of conditioning processing pads increases the removal rate of conductive material from a substrate surface during polishing. In this method, the direction of rotation of the processing pad relative to the conditioning disc during conditioning is opposite the direction of rotation of the processing pad relative to the substrate during polishing.

Abstract translation: 调整处理垫的方法在抛光期间增加导电材料从衬底表面的去除速率。 在这种方法中，处理衬垫相对于调理盘在调节期间的旋转方向与抛光期间相对于衬底相对于处理垫的旋转方向。

公开(公告)号：WO2015061741A1

公开(公告)日：2015-04-30

申请号：PCT/US2014/062264

申请日：2014-10-24

Applicant: APPLIED MATERIALS, INC

Inventor： SAKATA, Clinton P. ,  CHEN, Hui ,  ATKINSON, Jim K. ,  BROWN, Brian J. ,  TANG, Jianshe ,  CHEN, Yufei ,  DING, Yunshuang

IPC: B24B37/34 ,  B24B37/04 ,  B25J15/00

CPC classification number: B08B1/006 ,  B08B1/04 ,  H01L21/67046

Abstract: In some embodiments, an apparatus for cleaning a substrate is provided that includes (1) a substrate chuck configured to support a substrate with a front side of the substrate accessible; (2) a buff pad assembly configured to support a buff pad having a diameter smaller than a diameter of the substrate; and (3) a swing arm coupled to the buff pad and configured to position and rotate the buff pad along the front side of the substrate, and control an amount of force applied by the buff pad against the front side of the substrate during cleaning. The substrate chuck, buff pad assembly and swing arm are configured to buff clean the substrate. Numerous additional aspects are disclosed.

Abstract translation: 在一些实施例中，提供了一种用于清洁衬底的设备，其包括（1）衬底卡盘，其构造成支撑具有可接近的衬底的前侧的衬底; （2）抛光垫组件，其构造成支撑直径小于所述基底的直径的抛光垫; 和（3）摆动臂，其联接到所述抛光垫并且构造成沿着所述基板的前侧定位和旋转所述抛光垫，并且在清洁期间控制由所述抛光垫施加在所述基板的前侧上的力的量。 衬底卡盘，抛光垫组件和摆臂配置为抛光清洁衬底。 公开了许多附加方面。

公开(公告)号：WO2011043866A4

公开(公告)日：2011-04-14

申请号：PCT/US2010/045709

申请日：2010-08-17

Applicant: APPLIED MATERIALS, INC. ,  KARUPPIAH, Lakshmanan ,  ZHANG, Dan ,  YAVELBERG, Simon ,  ATKINSON, Jim K. ,  CHEN, Hung Chih ,  MANTO, Noel ,  DOMIN, Jonathan

Inventor： KARUPPIAH, Lakshmanan ,  ZHANG, Dan ,  YAVELBERG, Simon ,  ATKINSON, Jim K. ,  CHEN, Hung Chih ,  MANTO, Noel ,  DOMIN, Jonathan

IPC: H01L21/302

Abstract: Embodiments described herein relate to an apparatus and method for a roller assembly that may be utilized in a brush cleaning module. In one embodiment, a roller assembly is described. The roller assembly includes an annular groove having at least two substantially parallel opposing sidewalls adapted to contact the major surfaces of a substrate along a periphery of the substrate, each of the opposing sidewalls comprising a compressible material having a pre-compressed dimension that is less than a thickness of the periphery of the substrate.