公开(公告)号：WO2023036593A1

公开(公告)日：2023-03-16

申请号：PCT/EP2022/073343

申请日：2022-08-22

Applicant: ASML NETHERLANDS B.V.

Inventor： GUO, Yunbo ,  WANG, Zhu ,  YANG, Feng ,  ZHAO, Qian ,  FENG, Mu ,  WANG, Jen-Shiang

IPC: G03F7/20 ,  G01B11/24 ,  G01B15/04 ,  G01N21/956 ,  G06N20/00 ,  H01J37/28

Abstract: Described herein is a metrology system and a method for converting metrology data via a trained machine learning (ML) model. The method includes accessing a first (MD1) SEM data set (e.g., images, contours, etc.) acquired by a first scanning electron metrology (SEM) system (TS1) and a second (MD2) SEM data set acquired by a second SEM system (TS2), where the first SEM data set and the second SEM data set being associated with a patterned substrate. Using the first SEM data set and the second SEM data set as training data, a machine learning (ML) model is trained (P303) such that the trained ML model is configured to convert (P307) a metrology data set (310) acquired (P305) by the second SEM system to a converted data set (311) having characteristics comparable to metrology data being acquired by the first SEM system. Furthermore, measurements may be determined based on the converted SEM data.

公开(公告)号：WO2021083608A1

公开(公告)日：2021-05-06

申请号：PCT/EP2020/077611

申请日：2020-10-01

Applicant: ASML NETHERLANDS B.V.

Inventor： ZHANG, Qiang ,  GUO, Yunbo ,  CAO, Yu ,  WANG, Jen-Shiang ,  LU, Yen-Wen ,  CHEN, Danwu ,  YANG, Pengcheng ,  LIANG, Haoyi ,  CHEN, Zhichao ,  PU, Lingling

IPC: G03F7/20

Abstract: A method for training a machine learning model to generate a predicted measured image includes obtaining (a) an input target image associated with a reference design pattern, and (b) a reference measured image associated with a specified design pattern printed on a substrate, wherein the input target image and the reference measured image are non-aligned images; and training, by a hardware computer system and using the input target image, the machine learning model to generate a predicted measured image.

公开(公告)号：WO2020011513A1

公开(公告)日：2020-01-16

申请号：PCT/EP2019/066520

申请日：2019-06-21

Applicant: ASML NETHERLANDS B.V.

Inventor： LIANG, Jiao ,  ZHANG, Chen ,  ZHANG, Qiang ,  GUO, Yunbo

IPC: G03F7/20

Abstract: A method for improving a process model by measuring a feature on a printed design that was constructed based in part on a target design is disclosed. The method includes obtaining a) an image of the printed design from an image capture device and b) contours based on shapes in the image. The method also includes identifying, by a pattern recognition program, patterns on the target design that include the feature and determining coordinates, on the contours, that correspond to the feature. The method further includes improving the process model by at least a) providing a measurement of the feature based on the coordinates and b) calibrating the process model based on a comparison of the measurement with a corresponding feature in the target design.

公开(公告)号：WO2019233711A1

公开(公告)日：2019-12-12

申请号：PCT/EP2019/062271

申请日：2019-05-14

Applicant: ASML NETHERLANDS B.V.

Inventor： WANG, Jen-Shiang ,  ZHAO, Qian ,  GUO, Yunbo ,  LU, Yen-Wen ,  FENG, Mu ,  ZHANG, Qiang

IPC: G03F7/20

Abstract: A method for improving a process model for a patterning process includes obtaining a) a measured contour (330) from an image capture device, and b) a simulated contour (510) generated from a simulation of the process model. The method also includes aligning the measured contour with the simulated contour by determining an offset between the measured contour and the simulated contour. The process model is calibrated to reduce a difference, computed based on the determined offset, between the simulated contour and the measured contour.