公开(公告)号：WO2021083608A1

公开(公告)日：2021-05-06

申请号：PCT/EP2020/077611

申请日：2020-10-01

Applicant: ASML NETHERLANDS B.V.

Inventor： ZHANG, Qiang ,  GUO, Yunbo ,  CAO, Yu ,  WANG, Jen-Shiang ,  LU, Yen-Wen ,  CHEN, Danwu ,  YANG, Pengcheng ,  LIANG, Haoyi ,  CHEN, Zhichao ,  PU, Lingling

IPC: G03F7/20

Abstract: A method for training a machine learning model to generate a predicted measured image includes obtaining (a) an input target image associated with a reference design pattern, and (b) a reference measured image associated with a specified design pattern printed on a substrate, wherein the input target image and the reference measured image are non-aligned images; and training, by a hardware computer system and using the input target image, the machine learning model to generate a predicted measured image.

公开(公告)号：WO2020035285A1

公开(公告)日：2020-02-20

申请号：PCT/EP2019/070142

申请日：2019-07-26

Applicant: ASML NETHERLANDS B.V.

Inventor： ZHANG, Chen ,  ZHANG, Qiang ,  WANG, Jen-Shiang ,  LIANG, Jiao

IPC: G03F7/20 ,  G06T7/00 ,  G01N21/956

Abstract: A method for evaluating images of a printed pattern is implemented by at least one programmable processor. The method includes obtaining (2310,2320) a first averaged image of the printed pattern, where the first averaged image is generated by averaging raw images of the printed pattern. The method also includes identifying (2330) one or more features of the first averaged image. The method further includes evaluating (2340) the first averaged image, by the programmable processor executing an image quality classification model and based at least on the one or more features. The evaluating includes determining (2350), by the image quality classification model, whether the first averaged image satisfies a metric.

公开(公告)号：WO2020011513A1

公开(公告)日：2020-01-16

申请号：PCT/EP2019/066520

申请日：2019-06-21

Applicant: ASML NETHERLANDS B.V.

Inventor： LIANG, Jiao ,  ZHANG, Chen ,  ZHANG, Qiang ,  GUO, Yunbo

IPC: G03F7/20

Abstract: A method for improving a process model by measuring a feature on a printed design that was constructed based in part on a target design is disclosed. The method includes obtaining a) an image of the printed design from an image capture device and b) contours based on shapes in the image. The method also includes identifying, by a pattern recognition program, patterns on the target design that include the feature and determining coordinates, on the contours, that correspond to the feature. The method further includes improving the process model by at least a) providing a measurement of the feature based on the coordinates and b) calibrating the process model based on a comparison of the measurement with a corresponding feature in the target design.

公开(公告)号：WO2019233711A1

公开(公告)日：2019-12-12

申请号：PCT/EP2019/062271

申请日：2019-05-14

Applicant: ASML NETHERLANDS B.V.

Inventor： WANG, Jen-Shiang ,  ZHAO, Qian ,  GUO, Yunbo ,  LU, Yen-Wen ,  FENG, Mu ,  ZHANG, Qiang

IPC: G03F7/20

Abstract: A method for improving a process model for a patterning process includes obtaining a) a measured contour (330) from an image capture device, and b) a simulated contour (510) generated from a simulation of the process model. The method also includes aligning the measured contour with the simulated contour by determining an offset between the measured contour and the simulated contour. The process model is calibrated to reduce a difference, computed based on the determined offset, between the simulated contour and the measured contour.