公开(公告)号：WO2017112060A1

公开(公告)日：2017-06-29

申请号：PCT/US2016/057552

申请日：2016-10-18

Applicant: CYMER, LLC ,  ASML NETHERLANDS B.V.

Inventor： THORNES, Joshua, Jon ,  AGGARWAL, Tanuj ,  O'BRIEN, Kevin, Michael ,  EVERTS, Frank ,  GODFRIED, Herman, Phillip ,  BURDT, Russell, Allen

IPC: G01J1/42 ,  G01J3/28 ,  G03F7/20 ,  H01S3/13

CPC classification number: G01J11/00 ,  G01J1/0228 ,  G01J1/0448 ,  G01J1/4257 ,  G03F7/70041 ,  G03F7/70516 ,  G03F7/7055 ,  G03F7/70558 ,  G03F7/70575 ,  H01S3/0014 ,  H01S3/10046 ,  H01S3/10069

Abstract: Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.

Abstract translation: 公开了作为激光器工作重复频率的函数的在线校准激光器性能。 校准可以是周期性的，并且在非暴露期间的计划期间进行。 可以使用各种标准来自动选择导致可靠规格性能的重复率。 重复频率的可靠值然后被提供给扫描仪，因为允许的值和激光/扫描仪系统然后被允许使用那些允许的重复率。

公开(公告)号：WO2021086640A1

公开(公告)日：2021-05-06

申请号：PCT/US2020/055987

申请日：2020-10-16

Applicant: CYMER, LLC

Inventor： BURDT, Russell, Allen ,  DUFFEY, Thomas, Patrick

IPC: G03F7/20

Abstract: A method of generating a test for a radiation source for a lithographic apparatus comprises a step of receiving data corresponding to a plurality of firing patterns of the radiation source. The method further comprises the step of analyzing the data to determine parameters for configuring one or more further firing patterns for testing the radiation source. The parameters are determined such that a stability of the radiation source when executing the one or more further firing patterns configured using the parameters is substantially the same as, or within predefined bounds relative to, a stability of the radiation source when executing the plurality of firing patterns. Furthermore, parameters are determined such that a total duration of the one or more further firing patterns when executed by the radiation source will be less than a duration of the plurality of firing patterns when executed by the radiation source.

公开(公告)号：WO2023287519A1

公开(公告)日：2023-01-19

申请号：PCT/US2022/032335

申请日：2022-06-06

Applicant: CYMER, LLC

Inventor： BURDT, Russell, Allen ,  SHIN, Jung, Yoon

IPC: G03F7/20

Abstract: A prediction apparatus is in communication with an optical source configured to produce a pulsed light beam for use by a photolithography exposure apparatus. The prediction apparatus includes: a photolithography module in communication with the photolithography exposure apparatus and configured to receive an identifier, the received identifier lacking data relating to an actual firing pattern defining properties of the pulsed light beam; and an optical source module in communication with the optical source, the optical source module configured to provide a forecast firing pattern to the optical source. The forecast firing pattern is associated with and determined from the received identifier, and forecasts one or more properties of the actual firing pattern.

公开(公告)号：WO2022197415A1

公开(公告)日：2022-09-22

申请号：PCT/US2022/017725

申请日：2022-02-24

Applicant: CYMER, LLC

Inventor： BURDT, Russell, Allen ,  GUVINDAN RAJU, Kumar, Raja ,  MINAKAIS, Matthew ,  MANLEY, David, Wesley

IPC: G03F7/20 ,  G05B23/02 ,  G06N20/00 ,  H01L21/66

Abstract: Systems for maintaining light sources for semiconductor photolithography in which a module making up part of the light source is evaluated at various pulse counts to produce a binary prediction as to whether the module is sufficiently likely to operate without failure in an ensuing sequence of pulses. The binary prediction may be made by a machine learning model trained on metrics extracted from measurements taken on deinstalled modules. A group of models, each trained differently, can be made available according to a selection made by the user or according to the maintenance objectives of the user.

公开(公告)号：WO2021262373A1

公开(公告)日：2021-12-30

申请号：PCT/US2021/034101

申请日：2021-05-25

Applicant: CYMER, LLC

Inventor： BURDT, Russell, Allen ,  MELCHIOR, John, Theodore ,  TENG, Kuo-Tai

IPC: G01J3/26 ,  G01J3/28 ,  G01J9/02 ,  G01J9/0246 ,  G03F7/70025 ,  G03F7/70575

Abstract: Information relating to an etalon is accessed, the etalon being associated with a calibration parameter having a pre-set default value, the etalon being configured to produce an interference pattern including a plurality of fringes from a received light beam, and the information relating to the etalon including first spatial information related to a first fringe of the plurality of fringes and second spatial information related to a second fringe of the plurality of fringes. A first wavelength value of the received light beam is determined based on the spatial information related to the first fringe and an initial value of the calibration parameter. A second wavelength value of the received light beam is determined based on the spatial information related to the second fringe and the initial value of the calibration parameter. The first wavelength value and the second wavelength value are compared to determine a measurement error value.

公开(公告)号：WO2021118777A1

公开(公告)日：2021-06-17

申请号：PCT/US2020/061113

申请日：2020-11-18

Applicant: CYMER, LLC

Inventor： MINAKAIS, Matthew ,  BURDT, Russell, Allen

IPC: G03F7/20 ,  H01S3/00

Abstract: A system includes a laser source configured to generate one or more bursts of laser pulses and a data collection and analysis system. The data collection and analysis system is configured to receive, from the laser source, data associated with the one or more bursts of laser pulses and determine, based on the received data, that the one or more bursts of laser pulses are for external use. The data collection and analysis system is further configured to determine, based on the received data, whether the one or more bursts of laser pulses are for an on-wafer operation or are for a calibration operation.