Abstract:
ALD processes for forming the silicon and oxygen containing films using mono-substituted TSA precursors are disclosed. The mono-substituted TSA precursors have the formula: (SiH 3 ) 2 N-SiH 2 -X, wherein X is a halogen atom or an amino group.
Abstract:
Mono-substituted TSA precursor Si-containing film forming compositions are disclosed. The precursors have the formula: (SiH 3 ) 2 N-SiH 2 -X, wherein X is selected from a halogen atom; an isocyanato group; an amino group; an N-containing C 4 -C 10 saturated or unsaturated heterocycle; or an alkoxy group. Methods for forming the Si-containing film using the disclosed mono-substituted TSA precursor are also disclosed.
Abstract:
A method for forming a modified surface comprising (l) on a substrate is provided wherein a reactive groups on the surface is condensed with alcohols, thiols, silanes or phosphonic acid in the presence of microwave energy.
Abstract:
Compounds and method of preparation of Si-X and Ge-X compounds (X = N, P, As and Sb) via dehydrogenative coupling between the corresponding unsubstituted silanes and amines (including ammonia) or phosphines catalyzed by metallic catalysts is described. This new approach is based on the catalytic dehydrogenative coupling of a Si-H and a X-H moiety to form a Si-X containing compound and hydrogen gas (X = N, P, As and Sb). The process can be catalyzed by transition metal heterogenous catalysts such as Ru(0) on carbon, Pd(0) on MgO) as well as transition metal organometallic complexes that act as homogeneous catalysts. The -Si-X products produced by dehydrogenative coupling are inherently halogen free. Said compounds can be useful for the deposition of thin films by chemical vapor deposition or atomic layer deposition of Si - containing films.
Abstract:
Embodiments of the presently-disclosed subject matter include a composition that comprises a particle, a plurality of surface functional groups on a surface of the particle, and a plurality of coating polymers bound to the surface functional groups and forming a coating on the particle that includes a density ratio of about 0.1 to about 20.0, the density ratio being equal to a Flory radius of the plurality of coating polymers divided by a distance between adjacent surface functional groups. Embodiments of the presently-disclosed subject matter also include methods for making the present compositions as well as methods for using the present compositions to deliver a bioactive agent and treat a subject in need thereof.
Abstract:
Verfahren zur Hydrophobierung eines mikroporösen, hydrophile Kieselsäure aufweisenden Wärmedämm-Formkörpers, bei dem dieser mit wenigstens einem Organosilan behandelt wird, und bei dem man in eine Kammer, die den mikroporösen, hydrophile Kieselsäure aufweisenden Wärmedämm-Formkörper enthält, solange ein oder mehrere, unter den Reaktionsbedingungen dampfförmige Organosilane einbringt, bis die Druckdifferenz Δρ > 20 mbar beträgt.
Abstract:
A method of preparing a cyclohexasilane compound from trichlorosilane is provided. The method includes contacting trichlorosilane with a reagent composition to produce a compound containing a tetradecahalocyclohexasilane dianion, such as a tetradecachlorocyclohexasilane dianion. The reagent composition typically includes (a) tertiary polyamine ligand; and (b) a deprotonating reagent, such as a tertiary amine having a pKa of at least about 10.5. Methods of converting the tetradecahalocyclohexasilane dianion-containing compound to cyclohexasilane or a dodecaorganocyclohexasilane are also provided.
Abstract:
Cyclic organo silicon compounds that may be employed as an electron donor for polymerization catalyst systems, polymerization catalyst systems employing the cyclic organosilicon compounds as an electron donor, methods of making the polymerization catalyst systems, and polymerization processes to produce polyolefin are disclosed. The organosilicon compounds, which are useful as electron donors in polymerization catalyst systems for the production of polyolefins, are represented by the formula (I): where Q 1 , Q 2 , Q 3 , and Q 4 may be identical or different and are each hetero-atoms selected from the group consisting of N, O, S, Si, B, and P. R 1 , R 2 , R 3 , and R 4 may be identical or different and are each hydrocarbon-based substituents to Q 1 , Q 2 , Q 3 , and Q 4 , respectively. The subscripts i, j, m, and n are independently 0 to 3. R 5 and R 6 may be identical or different and are each a bridging group with a backbone chain length between the two hetero-atoms Q 1 and Q 3 , and Q 2 and Q 4 , respectively, being 1-8 atoms. The bridging group is selected from the group consisting of aliphatic, alicyclic, and aromatic bivalent radicals.
Abstract:
A method to deposit water insoluble compounds onto solid matrices using aqueous systems is described. A transient water soluble complex is formed and dissociated when deposition takes place.