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    END TERMINATIONS FOR ELECTRODES USED IN ION IMPLANTATION SYSTEMS
    1.
    发明申请
    END TERMINATIONS FOR ELECTRODES USED IN ION IMPLANTATION SYSTEMS 审中-公开
    在离子植入系统中使用的电极的终止终止

    公开(公告)号：WO2010114954A3

    公开(公告)日：2011-01-13

    申请号：PCT/US2010029548

    申请日：2010-04-01

    Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ,  SINCLAIR FRANK ,  RADOVANOV SVETLANA ,  PURSER KENNETH H

    Inventor： SINCLAIR FRANK ,  RADOVANOV SVETLANA ,  PURSER KENNETH H

    IPC: H01L21/265

    CPC classification number: H01J37/3171 ,  H01J37/04 ,  H01J2237/036 ,  H01J2237/15

    Abstract: An ion implantation system includes an electrostatic lens. The electrostatic lens includes a terminal electrode, a ground electrode and a suppression electrode disposed therebetween. An ion beam enters the electrostatic lens through the terminal electrode and exits through the ground electrode. The electrodes have associated electrostatic equipotentials. An end plate is disposed between a top and bottom portion of the suppression electrode and/or the top and bottom portion of the ground electrode. The respective end plate has a shape which corresponds to the electrostatic equipotential associated with the particular electrode in order to maintain uniformity of the beam as it passes through the electrostatic lens.

    Abstract translation: 离子注入系统包括静电透镜。 静电透镜包括端子电极，接地电极和设置在它们之间的抑制电极。 离子束通过端子电极进入静电透镜并通过接地电极离开。 电极具有相关的静电等电位。 端板设置在抑制电极的顶部和底部之间和/或接地电极的顶部和底部之间。 相应的端板具有对应于与特定电极相关联的静电等电位的形状，以便在光束通过静电透镜时保持光束的均匀性。

    END TERMINATIONS FOR ELECTRODES USED IN ION IMPLANTATION SYSTEMS
    2.
    发明申请
    END TERMINATIONS FOR ELECTRODES USED IN ION IMPLANTATION SYSTEMS 审中-公开
    在离子植入系统中使用的电极的终止终止

    公开(公告)号：WO2010114954A2

    公开(公告)日：2010-10-07

    申请号：PCT/US2010/029548

    申请日：2010-04-01

    Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES ,  SINCLAIR, Frank ,  RADOVANOV, Svetlana ,  PURSER, Kenneth, H.

    Inventor： SINCLAIR, Frank ,  RADOVANOV, Svetlana ,  PURSER, Kenneth, H.

    IPC: H01L21/265

    CPC classification number: H01J37/3171 ,  H01J37/04 ,  H01J2237/036 ,  H01J2237/15

    Abstract: An ion implantation system includes an electrostatic lens. The electrostatic lens includes a terminal electrode, a ground electrode and a suppression electrode disposed therebetween. An ion beam enters the electrostatic lens through the terminal electrode and exits through the ground electrode. The electrodes have associated electrostatic equipotentials. An end plate is disposed between a top and bottom portion of the suppression electrode and/or the top and bottom portion of the ground electrode. The respective end plate has a shape which corresponds to the electrostatic equipotential associated with the particular electrode in order to maintain uniformity of the beam as it passes through the electrostatic lens.

    Abstract translation: 离子注入系统包括静电透镜。 静电透镜包括端子电极，接地电极和设置在它们之间的抑制电极。 离子束通过端子电极进入静电透镜并通过接地电极离开。 电极具有相关的静电等电位。 端板设置在抑制电极的顶部和底部之间和/或接地电极的顶部和底部之间。 相应的端板具有对应于与特定电极相关联的静电等电位的形状，以便在光束通过静电透镜时保持光束的均匀性。

    撮像装置およびその製造方法
    3.
    发明申请
    撮像装置およびその製造方法 审中-公开
    图像拾取装置及其制造方法

    公开(公告)号：WO2015151172A1

    公开(公告)日：2015-10-08

    申请号：PCT/JP2014/059492

    申请日：2014-03-31

    Applicant: パイオニア株式会社

    Inventor： 酒井　智和 ,  金田　弘喜 ,  岩崎　新吾

    IPC: H01J31/28 ,  H01J9/18 ,  H01J29/04 ,  H01J29/82 ,  H01J29/86 ,  H01J31/49

    CPC classification number: H01J9/18 ,  H01J29/82 ,  H01J29/86 ,  H01J29/864 ,  H01J31/127 ,  H01J31/128 ,  H01J37/073 ,  H01J2237/032 ,  H01J2237/036 ,  H01J2237/061 ,  H01J2237/0635

    Abstract: 　本発明は、単純な構造で、面放出源アレイと加速電極との間の適切な平行度を得ることができる撮像装置およびその製造方法を提供することを課題としている。　本発明の撮像装置は、下部基板（２１）と、下部基板（２１）上に、可塑性を有するダイボンド材（２４）を介してマウントした電子放出源アレイ（２２）と、電子放出源アレイ（２２）を囲繞するように、下部基板（２１）上に設けた周壁部（６）と、周壁部（６）に設けた支持部（３１）にセットされ、電子放出源アレイ（２２）から放出された電子を加速する加速電極（５）と、を備え、電子放出源アレイ（２２）は、支持部（３１）により構成される仮想平面と平行になるように、マウントされている。

    Abstract translation: 本发明解决了提供以下问题：图像拾取装置，其中以简单的结构在表面发射源阵列和加速电极之间实现了适当的平行度; 以及用于制造图像拾取装置的方法。 该图像拾取装置设置有：下基板（21）; 电子发射源阵列（22），其间具有管芯接合材料（24）安装在所述下基板（21）上，所述管芯接合材料具有可塑性; 设置在所述下基板（21）上的周壁部（6），使得所述周壁部围绕所述电子发射源阵列（22）; 以及设置在设置在周壁部（6）中的支撑部（31）并且加速从电子发射源阵列（22）发射的电子的加速电极（5）。 电子发射源阵列（22）安装成使得电子发射源阵列与由支撑部分（31）构成的虚拟平面平行。

    BEAM OPTICAL COMPONENT FOR CHARGED PARTICLE BEAMS
    4.
    发明申请
    BEAM OPTICAL COMPONENT FOR CHARGED PARTICLE BEAMS 审中-公开
    用于充电颗粒束的光束组件

    公开(公告)号：WO2005043579A1

    公开(公告)日：2005-05-12

    申请号：PCT/EP2004/012502

    申请日：2004-11-04

    Applicant: ICT INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH ,  FROSIEN, Juergen

    Inventor： FROSIEN, Juergen

    IPC: H01J37/02

    CPC classification number: H01J9/18 ,  H01J37/02 ,  H01J37/10 ,  H01J2237/036

    Abstract: The present invention relates to a beam optical component (1, 201) for acting on a charged particle beam (63) including a first element (3; 203) having a first opening (9; 209) for acting on the charged particle beam (63), at least a second element (5; 205) for acting on the charged particle beam (63); at least one distance piece (20a, 20b, 20c) positioned between the first element (3; 203) and the second element (5; 205) to define a minimum distance between the first element (3; 203) and the second element (5; 205); and a first holding piece (30a; 30b; 30c) for abutting the first element (3) to the at least one distance piece (20a, 20b, 20c), whereby the first holding piece (30a; 30b; 30c) is attached to the at least one distance piece (20a, 20b, 20c). First and second elements (3; 203; 5; 205) are preferably electrodes or pole pieces to act on the charged particle beam by an electrostatic or magnetic force. With the first holding piece (30a; 30b; 30c) attached to the at least one distance piece, distorting mechanical forces on the first and second elements (3, 5) are reduced which improves the performance of the respective beam optical components ( l ; 201).

    Abstract translation: 本发明涉及一种用于作用在带电粒子束（63）上的束光学部件（1,201），其包括具有用于作用在带电粒子束上的第一开口（9; 209）的第一元件（3; 203） 至少一个用于作用在带电粒子束（63）上的第二元件（5; 205）; 位于第一元件（3; 203）和第二元件（5; 205）之间的至少一个距离件（20a，20b，20c），以限定第一元件（3; 203）和第二元件 5; 205）; 以及用于将所述第一元件（3）抵接到所述至少一个距离片（20a，20b，20c）的第一保持片（30a; 30b; 30c），由此所述第一保持片（30a; 30b; 30c） 所述至少一个距离件（20a，20b，20c）。 第一和第二元件（3; 203; 5; 205）优选地是通过静电或磁力作用在带电粒子束上的电极或极片。 在第一保持件（30a; 30b; 30c）附接到至少一个距离件上的情况下，使第一和第二元件（3,5）上的机械力变形减小，这改善了各个光束组件（1; 201）。

    CATHODE FILAMENT ASSEMBLY
    5.
    发明申请
    CATHODE FILAMENT ASSEMBLY 审中-公开

    公开(公告)号：WO2013175402A1

    公开(公告)日：2013-11-28

    申请号：PCT/IB2013/054181

    申请日：2013-05-21

    Applicant: KONINKLIJKE PHILIPS N.V. ,  PHILIPS INTELLECTUAL PROPERTY & STANDARDS GMBH

    Inventor： VOELLMER, Marcus, Walter ,  TERLETSKA, Zoryana

    IPC: H01J35/14 ,  H01J35/06

    CPC classification number: H01J35/06 ,  H01J1/18 ,  H01J1/92 ,  H01J9/042 ,  H01J35/14 ,  H01J35/165 ,  H01J37/065 ,  H01J2229/4824 ,  H01J2229/4831 ,  H01J2235/06 ,  H01J2237/032 ,  H01J2237/036 ,  H01J2237/038 ,  H01J2893/0006

    Abstract: The present invention relates to a cathode for an X-ray tube, an X- ray tube, a system for X-ray imaging, and a method for an assembly of a cathode for an X-ray tube. In order to provide a cathode with an improved and facilitated assembly, a cathode (10) for an X-ray tube is provided, comprising a filament (12), a support structure (14), a body structure (16), and a filament frame structure (18). The filament is provided to emit electrons towards an anode in an electron emitting direction (24), and the filament at least partially comprises a helical structure (26). Further, the filament is held by the support structure, which is fixedly connected to the body structure. The filament frame structure is provided for electron-optical focussing of the emitted electrons, and the filament frame structure is provided adjacent to the outer boundaries of the filament. The filament frame structure comprises frame surface portions arranged transverse to the emitting direction, and the filament frame structure is held by the support structure.

    Abstract translation: 本发明涉及一种用于X射线管的阴极，X射线管，X射线成像系统和用于组装X射线管的阴极的方法。 为了提供具有改进和便利的组件的阴极，提供了一种用于X射线管的阴极（10），其包括灯丝（12），支撑结构（14），主体结构（16）和 灯丝框架结构（18）。 提供灯丝以在电子发射方向（24）向阳极发射电子，并且灯丝至少部分地包括螺旋结构（26）。 此外，灯丝被固定地连接到主体结构的支撑结构保持。 提供灯丝框架结构用于发射的电子的电子 - 光学聚焦，并且灯丝框架结构设置在灯丝的外边界附近。 灯丝框架结构包括横向于发射方向布置的框架表面部分，并且灯丝框架结构由支撑结构保持。

    SUSTAINED SELF-SPUTTERING OF LITHIUM FOR LITHIUM PHYSICAL VAPOR DEPOSITION
    8.
    发明申请
    SUSTAINED SELF-SPUTTERING OF LITHIUM FOR LITHIUM PHYSICAL VAPOR DEPOSITION 审中-公开
    用于锂离子物理蒸发沉积的可持续自发溅射

    公开(公告)号：WO2014176457A1

    公开(公告)日：2014-10-30

    申请号：PCT/US2014/035358

    申请日：2014-04-24

    Applicant: VIEW, INC.

    Inventor： NEUMANN, Martin

    IPC: C23C14/34 ,  C23C14/14 ,  C23C14/54

    CPC classification number: C23C14/3457 ,  C23C14/185 ,  C23C14/3492 ,  C23C14/54 ,  H01J37/32733 ,  H01J37/3426 ,  H01J37/3476 ,  H01J2237/036 ,  H01J2237/202 ,  H01J2237/2487 ,  H01J2237/327 ,  H01J2237/332

    Abstract: A method of sustained self-sputtering of lithium in a sputtering station having a lithium metal target, the method comprising initiating a lithium sputtering reaction in the sputtering station by igniting an initial plasma comprising a majority fraction of inert gas ions and inducing a sustained lithium self-sputtering reaction by reducing supply of an inert gas to the sputtering station under conditions that provide a sustained self-sputtering lithium plasma comprising a majority fraction of lithium ions.

    Abstract translation: 一种在具有锂金属靶的溅射站中持续自溅射锂的方法，所述方法包括通过点燃包含大部分惰性气体离子并引起持续锂自身的初始等离子体在溅射站中引发锂溅射反应 在提供包含大部分锂离子的持续自溅射锂等离子体的条件下，通过减少向溅射站供应惰性气体的溅射反应。

    PLASMA GENERATOR (VARIANTS)
    9.
    发明申请
    PLASMA GENERATOR (VARIANTS) 审中-公开
    等离子体发生器（变量）

    公开(公告)号：WO2013162419A2

    公开(公告)日：2013-10-31

    申请号：PCT/RU2013000263

    申请日：2013-03-28

    Applicant: BERLIN EVGENIJ VLADIMIROVICH ,  GRIGORYEV VASILY JURYEVICH

    Inventor： BERLIN EVGENIJ VLADIMIROVICH ,  GRIGORYEV VASILY JURYEVICH

    CPC classification number: H01J37/3211 ,  H01J37/04 ,  H01J37/321 ,  H01J2237/002 ,  H01J2237/036

    Abstract: The invention relates to devices intended for processing materials in a low-temperature gas discharge plasma medium, and specifically to induction plasma generators arranged inside a process volume (working chamber). The technical problem addressed by the proposed invention consists in increasing the efficiency of the device; in increasing the operational reliability of the device; in increasing the purity of the plasma medium and in increasing the density of the plasma produced; increasing the service life of the device; reducing the level of noise; and reducing the overall dimensions of the device. In the plasma generator in accordance with the first embodiment, which plasma generator comprises a helical coil arranged inside a conducting screen, the inner surface of which has a near-cylindrical form, wherein the space between the turns of the coil and between the coil and the screen is filled with a dielectric, the coil is planar, the distance between the plane of the coil and the outer surface of the dielectric is less than twice the thickness of the coil, and the distance between the plane of the coil and the base of the inner surface of the screen is greater than twice the distance between the plane of the coil and the outer surface of the dielectric. In the plasma generator in accordance with the second embodiment, the coil is planar, the screen is in the form of a ring having an axis which is perpendicular to the plane of the coil, and that edge of the ring which is turned towards the volume in which it is necessary to produce the plasma is sealed by a dielectric. In the plasma generator in accordance with the third embodiment, the screen is electrically connected to one of the ends of the coil, and the dielectric strength of the dielectric is in the range of from 2.5 to 50. The proposed structural design of the generator ensures greater plasma density and increased purity of the plasma medium than in the prior art, with this being achieved under the same conditions in the discharge chamber and with the same HF power being supplied to the device. The proposed device has a high degree of efficiency, has good operational reliability and has an increased service life and small overall dimensions.

    Abstract translation: 本发明涉及用于在低温气体放电等离子体介质中处理材料的装置，特别涉及布置在处理容积（工作室）内的感应等离子体发生器。 本发明解决的技术问题在于提高设备的效率; 提高设备的运行可靠性; 在提高等离子体介质的纯度和提高所产生的等离子体的密度方面; 增加设备的使用寿命; 降低噪音水平; 并减少设备的整体尺寸。 在根据第一实施例的等离子体发生器中，该等离子体发生器包括布置在导电屏幕内部的螺旋线圈，其内表面具有近圆柱形形状，其中线圈的匝之间以及线圈与 屏幕填充有电介质，线圈是平面的，线圈的平面和电介质的外表面之间的距离小于线圈厚度的两倍，线圈的平面与基座之间的距离 屏幕的内表面的距离大于线圈的平面和电介质的外表面之间的距离的两倍。 在根据第二实施例的等离子体发生器中，线圈是平面的，屏幕是具有垂直于线圈平面的轴线的环的形式，并且环的边缘朝向体积 其中产生等离子体的必要性被电介质密封。 在根据第三实施例的等离子体发生器中，屏幕电连接到线圈的一个端部，并且电介质的介电强度在2.5至50的范围内。所提出的发电机的结构设计确保 与现有技术相比，等离子体介质的等离子体密度更高，纯度提高，这在放电室中的相同条件下实现，同样的HF功率被提供给器件。 所提出的装置具有高效率，良好的运行可靠性，使用寿命更长，整体尺寸小。

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