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    DECELERATION LENS
    2.
    发明申请
    DECELERATION LENS 审中-公开
    减光镜

    公开(公告)号：WO2012003154A1

    公开(公告)日：2012-01-05

    申请号：PCT/US2011/042025

    申请日：2011-06-27

    申请人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. ,  RADOVANOV, Svetlana ,  SCHALLER, Jason, M. ,  WHITE, Richard, M. ,  VERRIER, Kevin, R. ,  BLANCHETTE, James, W. ,  KOO, Bon, Woong ,  HERMANSON, Eric, D. ,  DANIELS, Kevin, M.

    发明人： RADOVANOV, Svetlana ,  SCHALLER, Jason, M. ,  WHITE, Richard, M. ,  VERRIER, Kevin, R. ,  BLANCHETTE, James, W. ,  KOO, Bon, Woong ,  HERMANSON, Eric, D. ,  DANIELS, Kevin, M.

    IPC分类号： H01J37/317 ,  H01J37/12

    CPC分类号： H01J37/12 ,  H01J37/3171 ,  H01J2237/0213 ,  H01J2237/032 ,  H01J2237/0475

    摘要： A system and method are disclosed for controlling an ion beam. A deceleration lens (7000) is disclosed for use in an ion implanter. The lens may include a suppression electrode (102), first and second focus electrodes, and first and second shields. The shields may be positioned between upper and lower portions of the suppression electrode. The first and second shields are positioned between the first focus electrode and an end station of the ion implanter. Thus positioned, the first and second shields protect support surfaces of said first and second focus electrodes from deposition of back- streaming particles generated from said ion beam. In some embodiments, the first and second focus electrodes may be adjustable to enable the electrode surfaces to be adjusted with respect to a direction of the ion beam. By adjusting the angle of the focus electrodes, parallelism of the ion beam can be controlled. Other embodiments are described and claimed.

    摘要翻译： 公开了用于控制离子束的系统和方法。 公开了用于离子注入机的减速透镜（7000）。 透镜可以包括抑制电极（102），第一和第二聚焦电极以及第一和第二屏蔽。 屏蔽件可以位于抑制电极的上部和下部之间。 第一和第二屏蔽件位于离子注入机的第一聚焦电极和端电极之间。 如此定位，第一和第二屏蔽件保护所述第一和第二聚焦电极的支撑表面免于从所述离子束产生的回流颗粒的沉积。 在一些实施例中，第一和第二聚焦电极可以是可调节的，以使电极表面相对于离子束的方向被调整。 通过调整聚焦电极的角度，可以控制离子束的平行度。 描述和要求保护其他实施例。

    COIL FILAMENT FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION SOURCE
    3.
    发明申请
    COIL FILAMENT FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION SOURCE 审中-公开
    用于等离子体增强化学气相沉积源的线圈纤维

    公开(公告)号：WO2016089620A1

    公开(公告)日：2016-06-09

    申请号：PCT/US2015/061756

    申请日：2015-11-20

    申请人： SEAGATE TECHNOLOGY LLC

    发明人： ATA, Romulo ,  FAN, Zhaohui ,  TANAKA, Samuel ,  PLATT, Christopher ,  MA, Xiaoding

    IPC分类号： C23C16/50 ,  C23C16/513

    CPC分类号： H01J37/32568 ,  C23C16/26 ,  C23C16/50 ,  H01J37/3233 ,  H01J37/32403 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32541 ,  H01J2237/032 ,  H01J2237/3321 ,  H01K1/18

    摘要： A vapor deposition source that includes a substantially vertical plate (122) to which first and second filament posts (118 and 120) are coupled. The vapor deposition source also includes a filament (100B) having a first end (102B) and a second end (104B). The filament (100B) provides a substantially concentric source of electrons. The first end (102B) of the filament (100B) is connected to the first filament post (118) and the second end (104B) of the filament (100B) is connected to the second filament post (120). The first end (102B) of the filament (100B) is substantially vertically aligned with the second end (104B) of the filament (100B) when the filament (100B) is connected to the first and second posts (118 and 120).

    摘要翻译： 一种气相沉积源，其包括基本垂直的板（122），第一和第二细丝柱（118和120）连接到该板上。 蒸镀源还包括具有第一端（102B）和第二端（104B）的灯丝（100B）。 灯丝（100B）提供基本上同心的电子源。 灯丝（100B）的第一端（102B）连接到第一灯丝柱（118），灯丝（100B）的第二端（104B）连接到第二灯丝柱（120）。 当细丝（100B）连接到第一和第二柱（118和120）时，灯丝（100B）的第一端（102B）与灯丝（100B）的第二端（104B）基本上垂直对准。

    ANCHORING INSERTS, ELECTRODE ASSEMBLIES, AND PLASMA PROCESSING CHAMBERS
    5.
    发明申请
    ANCHORING INSERTS, ELECTRODE ASSEMBLIES, AND PLASMA PROCESSING CHAMBERS 审中-公开
    锚固插件，电极组件和等离子体处理室

    公开(公告)号：WO2010111055A3

    公开(公告)日：2011-01-13

    申请号：PCT/US2010027273

    申请日：2010-03-15

    申请人： LAM RES CORP ,  HARDIN RANDALL ,  KEIHL JONATHAN ,  LYTLE DUANE

    发明人： HARDIN RANDALL ,  KEIHL JONATHAN ,  LYTLE DUANE

    IPC分类号： H05H1/34 ,  H01L21/203 ,  H01L21/205 ,  H01L21/265 ,  H01L21/3065

    CPC分类号： H01J37/04 ,  C23C16/4401 ,  C23C16/45565 ,  H01J37/3255 ,  H01J37/32605 ,  H01J37/32724 ,  H01J2237/032

    摘要： A silicon-based showerhead electrode is provided where backside inserts are positioned in backside recesses formed along the backside of the electrode. The backside inserts comprise a threaded outside diameter, a threaded inside diameter, and a tool engaging portion formed in the threaded inside diameter. The tool engaging portion is formed such that the backside insert further comprises one or more lateral shielding portions between the tool engaging portion and the threaded outside diameter to prevent a tool engaged with the tool engaging portion of the backside insert from extending beyond the threaded outside diameter of the insert. Further, the tool engaging portion of the backside insert comprises a plurality of torque-receiving slots arranged about the axis of rotation of the backside insert. The torque -receiving slots are arranged to avoid on-axis rotation of the backside insert via opposing pairs of torque receiving slots.

    摘要翻译： 提供硅基喷头电极，其中后侧插入件位于沿着电极的背面形成的背面凹部中。 后侧插入件包括螺纹外径，螺纹内径和形成为螺纹内径的工具接合部分。 工具接合部分形成为使得后侧插入件还包括在工具接合部分和螺纹外径之间的一个或多个横向遮蔽部分，以防止与后侧插入件的工具接合部分接合的工具延伸超过螺纹外径 的插入。 此外，后侧插入件的工具接合部分包括围绕后侧插入件的旋转轴线布置的多个扭矩接收槽。 扭矩接收槽布置成避免背面插入件经由相对的扭矩接收槽对的轴向旋转。

    KINEMATIC ION IMPLANTER ELECTRODE MOUNTING
    6.
    发明申请
    KINEMATIC ION IMPLANTER ELECTRODE MOUNTING 审中-公开
    动力离子植绒电极安装

    公开(公告)号：WO2005038856A2

    公开(公告)日：2005-04-28

    申请号：PCT/US2004/034457

    申请日：2004-10-15

    申请人： APPLIED MATERIALS, INC.

    发明人： SIMMONS, Jonathon, Y. ,  SHELLEY, John, R. ,  DEVANEY, Andrew, Stephen

    IPC分类号： H01J37/00

    CPC分类号： H01J37/08 ,  H01J27/024 ,  H01J37/023 ,  H01J37/3171 ,  H01J2237/032 ,  H01J2237/061

    摘要： A kinematic electrode mount is provided for an ion implanter in which an electrode insert member having an electrode body portion which defines an aperture, is inserted into an electrode support frame. In one embodiment, a first kinematic alignment pin of the insert member engages a first, groove-shaped kinematic alignment surface of the electrode support frame to align the first alignment pin in two orthogonal directions relative to the electrode support frame. In addition, a second kinematic alignment pin of the insert member engages a second kinematic alignment surface of the electrode support frame to align the insert member in a rotational orientation relative to the electrode support frame. A plurality of flanges of the insert member engage the electrode support frame to retain the insert member in the aligned position and to electrically couple the electrode insert member to the electrode support frame. A spring positioned between the electrode insert member and the electrode support frame biases the electrode insert member in the aligned and retained position relative to the electrode support frame. Inanother embodiment, the electrode support frame has alignment pins and the insert member has alignment slots.

    摘要翻译： 提供了一种用于离子注入机的运动电极座，其中具有限定孔的电极主体部分的电极插入件被插入到电极支撑框架中。 在一个实施例中，插入构件的第一运动学对准销接合电极支撑框架的第一槽形运动学对准表面，以使第一对准销相对于电极支撑框架在两个正交方向上对齐。 此外，插入构件的第二运动学对准销接合电极支撑框架的第二运动学对准表面，以使插入构件相对于电极支撑框架以旋转取向对准。 插入构件的多个凸缘接合电极支撑框架以将插入构件保持在对准位置并且将电极插入构件电耦合到电极支撑框架。 位于电极插入构件和电极支撑框架之间的弹簧将电极插入构件相对于电极支撑框架偏置在对准和保持位置。 在另一个实施例中，电极支撑框架具有对准销，并且插入构件具有对准槽。

    MULTI-ELECTRODE ELECTRON OPTICS
    7.
    发明申请
    MULTI-ELECTRODE ELECTRON OPTICS 审中-公开
    多电极电子光学

    公开(公告)号：WO2015071438A1

    公开(公告)日：2015-05-21

    申请号：PCT/EP2014/074679

    申请日：2014-11-14

    申请人： MAPPER LITHOGRAPHY IP B.V.

    发明人： WIELAND, Marco Jan-Jaco ,  URBANUS, Willem Henk

    IPC分类号： H01J37/317 ,  H01J37/065 ,  H01J37/12

    CPC分类号： G21K1/02 ,  G21K5/04 ,  H01J37/026 ,  H01J37/065 ,  H01J37/12 ,  H01J37/16 ,  H01J37/24 ,  H01J37/3002 ,  H01J37/3007 ,  H01J37/3174 ,  H01J37/3175 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/0216 ,  H01J2237/024 ,  H01J2237/032 ,  H01J2237/04 ,  H01J2237/1215 ,  H01J2237/16 ,  H01J2237/1825 ,  H01J2237/303 ,  H01J2237/30472

    摘要： The invention relates to a collimator electrode stack (70), comprising: - at least three collimator electrodes (71-80) for collimating a charged particle beam along an optical axis (A), wherein each collimator electrode comprises an electrode body with an electrode aperture for allowing passage to the charged particle beam, wherein the electrode bodies are spaced along an axial direction (Z) which is substantially parallel with the optical axis, and wherein the electrode apertures are coaxially aligned along the optical axis; and - a plurality of spacing structures (89) provided between each pair of adjacent collimator electrodes and made of an electrically insulating material, for positioning the collimator electrodes at predetermined distances along the axial direction. Each of the collimator electrodes (71-80) is electrically connected to a separate voltage output (151-160). The invention further relates to a method of operating a charged particle beam generator.

    摘要翻译： 本发明涉及一种准直器电极堆（70），包括： - 至少三个用于沿光轴（A）对带电粒子束进行准直的准直器电极（71-80），其中每个准直器 电极包括具有用于允许通过带电粒子束的电极孔的电极体，其中电极体沿基本平行于光轴的轴向方向（Z）间隔开，并且其中电极孔沿着 光轴; 以及 - 设置在每对相邻准直器电极之间并由电绝缘材料制成的多个间隔结构（89），用于沿着轴向方向以预定距离定位准直器电极。 每个准直器电极（71-80）电连接到单独的电压输出（151-160）。 本发明还涉及一种操作带电粒子束发生器的方法。

    CATHODE FILAMENT ASSEMBLY
    8.
    发明申请
    CATHODE FILAMENT ASSEMBLY 审中-公开

    公开(公告)号：WO2013175402A1

    公开(公告)日：2013-11-28

    申请号：PCT/IB2013/054181

    申请日：2013-05-21

    申请人： KONINKLIJKE PHILIPS N.V. ,  PHILIPS INTELLECTUAL PROPERTY & STANDARDS GMBH

    发明人： VOELLMER, Marcus, Walter ,  TERLETSKA, Zoryana

    IPC分类号： H01J35/14 ,  H01J35/06

    CPC分类号： H01J35/06 ,  H01J1/18 ,  H01J1/92 ,  H01J9/042 ,  H01J35/14 ,  H01J35/165 ,  H01J37/065 ,  H01J2229/4824 ,  H01J2229/4831 ,  H01J2235/06 ,  H01J2237/032 ,  H01J2237/036 ,  H01J2237/038 ,  H01J2893/0006

    摘要： The present invention relates to a cathode for an X-ray tube, an X- ray tube, a system for X-ray imaging, and a method for an assembly of a cathode for an X-ray tube. In order to provide a cathode with an improved and facilitated assembly, a cathode (10) for an X-ray tube is provided, comprising a filament (12), a support structure (14), a body structure (16), and a filament frame structure (18). The filament is provided to emit electrons towards an anode in an electron emitting direction (24), and the filament at least partially comprises a helical structure (26). Further, the filament is held by the support structure, which is fixedly connected to the body structure. The filament frame structure is provided for electron-optical focussing of the emitted electrons, and the filament frame structure is provided adjacent to the outer boundaries of the filament. The filament frame structure comprises frame surface portions arranged transverse to the emitting direction, and the filament frame structure is held by the support structure.

    摘要翻译： 本发明涉及一种用于X射线管的阴极，X射线管，X射线成像系统和用于组装X射线管的阴极的方法。 为了提供具有改进和便利的组件的阴极，提供了一种用于X射线管的阴极（10），其包括灯丝（12），支撑结构（14），主体结构（16）和 灯丝框架结构（18）。 提供灯丝以在电子发射方向（24）向阳极发射电子，并且灯丝至少部分地包括螺旋结构（26）。 此外，灯丝被固定地连接到主体结构的支撑结构保持。 提供灯丝框架结构用于发射的电子的电子 - 光学聚焦，并且灯丝框架结构设置在灯丝的外边界附近。 灯丝框架结构包括横向于发射方向布置的框架表面部分，并且灯丝框架结构由支撑结构保持。

    ANCHORING INSERTS, ELECTRODE ASSEMBLIES, AND PLASMA PROCESSING CHAMBERS
    9.
    发明申请
    ANCHORING INSERTS, ELECTRODE ASSEMBLIES, AND PLASMA PROCESSING CHAMBERS 审中-公开
    锚固插件，电极组件和等离子体处理室

    公开(公告)号：WO2010111055A2

    公开(公告)日：2010-09-30

    申请号：PCT/US2010/027273

    申请日：2010-03-15

    申请人： LAM RESEARCH CORPORATION ,  HARDIN, Randall ,  KEIHL, Jonathan ,  LYTLE, Duane

    发明人： HARDIN, Randall ,  KEIHL, Jonathan ,  LYTLE, Duane

    IPC分类号： H05H1/34 ,  H01L21/3065 ,  H01L21/203 ,  H01L21/205 ,  H01L21/265

    CPC分类号： H01J37/04 ,  C23C16/4401 ,  C23C16/45565 ,  H01J37/3255 ,  H01J37/32605 ,  H01J37/32724 ,  H01J2237/032

    摘要： A silicon-based showerhead electrode is provided where backside inserts are positioned in backside recesses formed along the backside of the electrode. The backside inserts comprise a threaded outside diameter, a threaded inside diameter, and a tool engaging portion formed in the threaded inside diameter. The tool engaging portion is formed such that the backside insert further comprises one or more lateral shielding portions between the tool engaging portion and the threaded outside diameter to prevent a tool engaged with the tool engaging portion of the backside insert from extending beyond the threaded outside diameter of the insert. Further, the tool engaging portion of the backside insert comprises a plurality of torque-receiving slots arranged about the axis of rotation of the backside insert. The torque -receiving slots are arranged to avoid on-axis rotation of the backside insert via opposing pairs of torque receiving slots.

    摘要翻译： 提供硅基喷头电极，其中后侧插入件位于沿着电极的背面形成的背面凹部中。 后侧插入件包括螺纹外径，螺纹内径和形成为螺纹内径的工具接合部分。 工具接合部分形成为使得后侧插入件还包括在工具接合部分和螺纹外径之间的一个或多个横向遮蔽部分，以防止与后侧插入件的工具接合部分接合的工具延伸超出螺纹外径 的插入。 此外，后侧插入件的工具接合部分包括围绕后侧插入件的旋转轴线布置的多个扭矩接收槽。 扭矩接收槽布置成避免背面插入件经由相对的扭矩接收槽对的轴向旋转。

    TECHNIQUES FOR REDUCING AN ELECTRICAL STRESS IN AN ACCELERATION/DECELERATION SYSTEM
    10.
    发明申请
    TECHNIQUES FOR REDUCING AN ELECTRICAL STRESS IN AN ACCELERATION/DECELERATION SYSTEM 审中-公开
    减少加速/减速系统中电气应力的技术

    公开(公告)号：WO2009076407A1

    公开(公告)日：2009-06-18

    申请号：PCT/US2008/086170

    申请日：2008-12-10

    申请人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. ,  TEKLETSADIX, Kasegn ,  LOW, Russell, J.

    发明人： TEKLETSADIX, Kasegn ,  LOW, Russell, J.

    IPC分类号： H01L21/3065 ,  H01L21/265

    CPC分类号： H01J37/3171 ,  H01J2237/0206 ,  H01J2237/032 ,  H01J2237/038 ,  H01J2237/047 ,  H01J2237/04735 ,  H01J2237/04756

    摘要： Techniques for reducing an electrical stress in a acceleration/deceleration system are disclosed. In one particular exemplary embodiment, the techniques may be realized as an acceleration/deceleration system. The acceleration/deceleration system may comprise an acceleration column including a plurality of electrodes having apertures through which a charged particle beam may pass. The acceleration/deceleration system may also comprise a plurality of voltage grading components respectively electrically coupled to the plurality of electrodes. The acceleration/deceleration system may further comprise a plurality of insulated conductors disposed proximate the plurality of voltage grading components to modify an electrical field about the plurality of voltage grading components.

    摘要翻译： 公开了一种用于减小加速/减速系统中的电应力的技术。 在一个特定的示例性实施例中，这些技术可以被实现为加速/减速系统。 加速/减速系统可以包括加速柱，其包括多个电极，其具有带孔粒子束可以通过的孔。 加速/减速系统还可以包括分别电耦合到多个电极的多个电压分级部件。 加速/减速系统还可以包括多个绝缘导体，其设置在多个电压分级部件附近，以修改围绕多个电压分级部件的电场。