Abstract:
The present invention relates to a water repellent material comprising a substrate and an ionic liquid based coating, as well as methods of forming such water repellent materials. In addition, the present invention relates to liquid dispersions comprising ionic liquids for use in forming water repellent coatings.
Abstract:
An object is to propose a method for forming a moisture curing-type coating material by which curing inside a coating film is sufficiently achieved even when the surface curing speed is high, blistering, peeling, or cracking is not caused to the coating film by moisture originating from water vapor from a substrate or the like, and good adhesiveness is maintained for a long period of time. The method for forming a moisture curing-type coating material includes: forming a substrate adjusting agent on a substrate; further applying a moisture curing-type coating material thereonto; and, when curing is caused by moisture, acquiring water vapor required for the curing by using water vapor present in the substrate, and/or water vapor arising from the substrate adjusting agent, in addition to water vapor present in outside air.
Abstract:
The object of the invention is a method for infiltrating a ceramic, artificial or natural stone surface, wherein a material forming a bond with valences on the surface is applied and mechanically rubbed onto the surface, whereby frictional heat is generated, wherein the material is used as a solution or suspension, and which comprises applying a hydrophobizing infiltration composition onto the surface to be coated, followed by rubbing it in until a homogeneous distribution and filling of the pores in the surface is achieved for improving the surface properties.
Abstract:
Described herein are compositions, silicon nitride films and methods for forming silicon nitride films using at least on cyclodisilazane precursor. In one aspect, there is provided a method of forming a silicon nitride film comprising the steps of: providing a substrate in a reactor; introducing into the reactor an at least one cyclodisilazane comprising a hydrocarbon leaving group and two Si-H groups wherein the at least one cyclodisilazane reacts on at least a portion of the surface of the substrate to provide a chemisorbed layer; purging the reactor with a purge gas; introducing a plasma comprising nitrogen and an inert gas into the reactor to react with at least a portion of the chemisorbed layer and provide at least one reactive site wherein the plasma is generated at a power density ranging from about 0.01 to about 1.5 W/cm2.
Abstract translation:本文描述的是组合物,氮化硅膜和至少使用环二硅氮烷前体形成氮化硅膜的方法。 在一个方面,提供一种形成氮化硅膜的方法,包括以下步骤:在反应器中提供衬底; 将包含烃离去基团和两个Si-H基团的至少一个环二硅氮烷引入反应器中,其中所述至少一种环二硅氮烷在基材表面的至少一部分上反应以提供化学吸附层; 用吹扫气净化反应器; 将包含氮气和惰性气体的等离子体引入反应器中以与化学吸附层的至少一部分反应并提供至少一个反应性位点,其中等离子体以约0.01至约1.5W / cm 2的功率密度产生。
Abstract:
Described herein are compositions, silicon nitride films and methods for forming silicon nitride films using at least on cyclodisilazane precursor. In one aspect, there is provided a method of forming a silicon nitride film comprising the steps of: providing a substrate in a reactor; introducing into the reactor an at least one cyclodisilazane comprising a hydrocarbon leaving group and two Si-H groups wherein the at least one cyclodisilazane reacts on at least a portion of the surface of the substrate to provide a chemisorbed layer; purging the reactor with a purge gas; introducing a plasma comprising nitrogen and an inert gas into the reactor to react with at least a portion of the chemisorbed layer and provide at least one reactive site wherein the plasma is generated at a power density ranging from about 0.01 to about 1.5 W/cm 2 .
Abstract:
Procédé de préparation d'un mélange stable au stockage comprenant une résine silicone MDT à groupements hydroxyles et un composé organique renfermant au moins un groupe époxy.
Abstract:
The present invention provides a slip resistant article comprising a substrate and a slip resistant coating applied on the surface of the substrate. The substrate is a ceramic tile substrate. The slip resistant coating is further prepared from a slip resistant solution, and the slip resistant solution comprises the reaction product of the following reaction components: 1-83.5 wt.% of a first silane, based on the total weight of the slip resistant solution as 100 wt.%, the general formula of the first silane being R 1 a Si (OR) 4-a-b R 2 b , wherein the value of a is 0 to 3; when the value of a is 0, the value of b is 0; when the value of a is 1, the value of b is 0 to 2; when the value of a is 2, the value of b is 0 to 1; when a value of a is 3, the value of b is 0; R represents alkyl group having 1 to 4 carbon atoms; R 1 represents hydrocarbyl group with epoxy functional group; and R 2 represents alkyl group having 1 to 2 carbon atoms; and 16.5-99 wt.% of a first solvent, based on the total weight of the slip resistant solution as 100 wt.%, the first solvent being water and/or alcohol.
Abstract translation:本发明提供一种防滑制品,其包括施加在基材表面上的基材和防滑涂层。 衬底是瓷砖衬底。 防滑涂层由防滑溶液进一步制备,防滑溶液包含以下反应组分的反应产物:1-83.5重量%的第一硅烷,基于防滑溶液的总重量为 100重量%,第一硅烷的通式为R a a Si(OR)4-a-b R b b,其中a的值为0至3; 当a的值为0时,b的值为0; 当a的值为1时,b的值为0〜2; 当a的值为2时,b的值为0〜1; 当a的值为3时,b的值为0; R表示具有1至4个碳原子的烷基; R1表示具有环氧官能团的烃基; 并且R 2表示具有1至2个碳原子的烷基; 和16.5-99重量%的第一溶剂,基于防滑溶液的总重量为100重量%,第一溶剂为水和/或醇。
Abstract:
Es wird ein Bindemittel zur Verfestigung einer geologischen Formation beschrieben, das eine Mischung aus A) einem Heterokondensat, erhältlich durch Hydrolyse und Kondensation von mindestens einer hydrolysierbaren Siliciumverbindung und mindestens einer Metall-, Phosphor- oder Borverbindung, wobei das Metall ausgewählt ist aus Al, Ge, Sn, Pb, Ti, Mg, Li, V, Nb, Ta, Zr und Hf, B) mindestens einem organischen polymerisierbaren oder polykondensierbaren Monomer oder Oligomer und C) mindestens einer hydrolysierbaren Siliciumverbindung, die einen nicht hydrolysierbaren Rest mit mindestens einer hydrophilen Gruppe umfasst, umfasst. Ferner wird ein Verfahren zur Verfestigung einer geologischen Formation mit diesem Bindemittel beschrieben.
Abstract:
Die vorliegende Erfindung betrifft ein hydrophobierendes Dispersionsgel mit vermindertem Wirkstoffgehalt, umfassend bezogen auf eine Gesamtmenge von 100 Gew.-% die Komponenten: (A) 0,1 - weniger als 50 Gew.-% Alkyltrialkoxysilan, (B) 0,1 - 1,0 Gew.-% verzweigte Polyacrylsäure, (C) 0,5 - 2,0 Gew.-% Trialkyl-Amin-N-oxid, (D) 3,0 - 10 Gew.-% nichtionisches Tensid und (E) 10 - 80 Gew.-% Wasser. Weiterhin betrifft die vorliegende Erfindung ein Verfahren zur Herstellung des hydrophobierenden Dispersionsgels sowie dessen Verwendung zur Hydrophobierung von mineralischen Materialien.