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    MAKING PARTICULATES OF CONTROLLED DIMENSIONS
    3.
    发明申请
    MAKING PARTICULATES OF CONTROLLED DIMENSIONS 审中-公开
    制作控制尺寸的粒子

    公开(公告)号：WO99066107A1

    公开(公告)日：1999-12-23

    申请号：PCT/US1999/013403

    申请日：1999-06-14

    IPC: B22F1/00 ,  C22C33/02 ,  C25C5/02 ,  H01F1/00 ,  H01F1/20 ,  H01F1/44 ,  H01F41/16 ,  H01F41/26 ,  C25F5/00 ,  C22B4/00

    CPC classification number: C22C33/0278 ,  B22F1/0055 ,  C25C5/02 ,  C25D1/00 ,  C25D1/20 ,  H01F1/0027 ,  H01F1/20 ,  H01F1/442 ,  H01F41/16 ,  H01F41/26 ,  Y10S428/925 ,  Y10S428/926 ,  Y10S428/935 ,  Y10T428/256 ,  Y10T428/2982 ,  Y10T428/2991

    Abstract: Particulates are made, especially magnetic Fe-Co alloys having high magnetic permeability, of controlled dimensions, especially those having a narrow thickness size distribution centered around a median or target thickness in the range of about 0.1-1.0 mu m, using electrodeposition typically on a smooth (polished) titanium cathode (30). The preferred continuous process uses a rotating drum cathode (30) inside a fixed anode (33) to grow flakes and to produce them automatically by inherent instability in the deposited shed into the electrolyte (12) where they are separated in a magnetic separator or other suitable device. If the flakes are soft iron or iron-cobalt alloys, the drum (30) generally is titanium or titanium alloy.

    Abstract translation: 制造颗粒，特别是具有高磁导率的磁性Fe-Co合金，具有受控尺寸，特别是具有以约0.1-1.0μm范围内的中值或目标厚度为中心的窄厚度尺寸分布的那些，通常使用电沉积 光滑（抛光）钛阴极（30）。 优选的连续方法使用固定阳极（33）内部的旋转鼓形阴极（30）来生长薄片，并通过沉积在电解质（12）中的固有不稳定性自动地产生它们，其中它们以磁分离器或其它方式分离 合适的装置。 如果薄片是软铁或铁钴合金，则鼓（30）通常是钛或钛合金。

    APPARATUS AND METHOD FOR HIGHLY CONTROLLED ELECTRODEPOSITION
    4.
    发明申请
    APPARATUS AND METHOD FOR HIGHLY CONTROLLED ELECTRODEPOSITION 审中-公开
    用于高度控制电沉积的装置和方法

    公开(公告)号：WO2004072331A3

    公开(公告)日：2004-10-28

    申请号：PCT/US2004004277

    申请日：2004-02-12

    Applicant: SURFECT TECHNOLOGIES INC ,  GRIEGO THOMAS P ,  SANCHEZ FERNANDO M

    Inventor： GRIEGO THOMAS P ,  SANCHEZ FERNANDO M

    IPC: B23K35/02 ,  C25D7/12 ,  C25D17/16 ,  H01F41/16 ,  H01F41/20 ,  H01F41/26 ,  H05K3/34 ,  C25D5/00 ,  C25D17/00

    CPC classification number: B23K35/0244 ,  B22F2998/00 ,  B22F2999/00 ,  C25D15/00 ,  C25D15/02 ,  C25D17/001 ,  H01F41/16 ,  H01F41/20 ,  H01F41/26 ,  H01L2224/11334 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01027 ,  H01L2924/014 ,  B22F1/025 ,  B22F1/0088

    Abstract: An apparatus and method for highly controlled electrodeposition, particularly useful for electroplating submicron structures. Enhanced control of the process provides for a more uniform deposit thickness over the entire substrate, and permits reliable plating of submicron features. The apparatus includes a pressurized electrochemical cell (10) to improve plating efficiency and reduce defects, vertical laminar flow of the electrolyte solution to remove surface gases from the vertically arranged substrate, a rotating wafer chuck (12) to eliminate edge plating effects, and a variable aperture (18) to control the current distribution and ensure deposit uniformity across the entire substrate. Also a dynamic profile anode whose shape can be varied to optimize the current distribution to the substrate. The anode is advantageously able to use metallic ion sources and may be placed close to the cathode thus minimizing contamination of the substrate.

    Abstract translation: 用于高度控制电沉积的装置和方法，特别适用于电镀亚微米结构。 该过程的增强控制提供了在整个基板上更均匀的沉积厚度，并且允许亚微米特征的可靠电镀。 该设备包括一个加压电化学电池（10），以提高电镀效率并减少缺陷，电解质溶液的垂直层流从垂直排列的衬底去除表面气体，旋转晶片吸盘（12）以消除边缘电镀效应，以及 可变孔径（18）以控制电流分布并确保整个基板上的沉积均匀性。 还可以改变其形状可以改变以优化对衬底的电流分布的动态轮廓阳极。 阳极有利地能够使用金属离子源并且可以靠近阴极放置，从而最小化衬底的污染。

    BISMUTH THIN FILM STRUCTURE AND METHOD OF CONSTRUCTION
    5.
    发明申请
    BISMUTH THIN FILM STRUCTURE AND METHOD OF CONSTRUCTION 审中-公开
    BISMUTH薄膜结构及其构造方法

    公开(公告)号：WO00037715A1

    公开(公告)日：2000-06-29

    申请号：PCT/US1999/027237

    申请日：1999-11-18

    IPC: C23C28/00 ,  C25D3/00 ,  C25D3/54 ,  C25D5/00 ,  C25D5/34 ,  C25D5/50 ,  G01R33/09 ,  G11B5/39 ,  H01F41/26 ,  H01L43/12 ,  G11B5/33 ,  H01L43/02

    CPC classification number: B82Y25/00 ,  B82Y10/00 ,  C25D3/54 ,  C25D5/50 ,  G01R33/09 ,  G11B5/3903 ,  G11B2005/3996 ,  H01F41/26 ,  H01L43/12 ,  Y10S205/922

    Abstract: The invention is directed to the use of electrochemical deposition to fabricate thin films of a material (e.g., bismuth) exhibiting a superior magnetoresistive effect. The process in accordance with a preferred embodiment produces a thin film of bismuth with reduced polycrystallinization and allows for the production of single crystalline thin films. Fabrication of a bismuth thin film in accordance with a preferred embodiment of the invention includes deposition of a bismuth layer (120) onto a substrate (200) with a metallic underlayer (118) using electrochemical deposition under relatively constant current density. Preferably, the resulting product is subsequently exposed to an annealing stage for the formation of single crystal bismuth thin film. The inclusion of these two stages in the process produces a thin film exhibiting superior MR with a simple field dependence in the process suitable for a variety of field sensing applications.

    Abstract translation: 本发明涉及使用电化学沉积来制造表现出优异磁阻效应的材料（例如铋）的薄膜。 根据优选实施方案的方法产生具有减少的多晶化的铋薄膜并允许制备单晶薄膜。 根据本发明的优选实施方案的铋薄膜的制造包括使用电化学沉积在相对恒定的电流密度下用金属底层（118）将铋层（120）沉积到基底（200）上。 优选地，将所得产物随后暴露于用于形成单晶铋薄膜的退火阶段。 在该方法中包含这两个阶段产生了在适用于各种场感测应用的工艺中具有优异MR的薄膜，具有简单的场依赖性。

    한극만 사용가능한 마그네트 제조 방법
    6.
    发明申请
    한극만 사용가능한 마그네트 제조 방법 审中-公开
    仅使用一个极的磁体制造方法

    公开(公告)号：WO2018004222A1

    公开(公告)日：2018-01-04

    申请号：PCT/KR2017/006737

    申请日：2017-06-27

    Applicant: (주)대한특수금속

    Inventor： 안준범

    IPC: H01F41/02 ,  H01F1/057 ,  H01F41/26 ,  B22F5/00 ,  B22F3/12 ,  B22F3/24 ,  C22C33/02

    Abstract: 영구자석(또는 마그네트라 칭함)과 요크(또는 차폐금속이라 칭함) 간의 본딩 수작업을 수행하지 않고도 이들 간의 결합력을 높이고, 결합 후 연마 및 도금과 같은 후속 공정의 효율 및 제품 완성도를 높일 수 있도록 하는 한극만 사용가능한 마그네트 제조 방법을 개시한다.

    Abstract translation:

    所述永磁体（或磁体QUOT）并提高它们之间的粘合力，而不必接合手之间进行磁轭（或屏蔽金属QUOT），随后的过程，如组合后的抛光效率和电镀和 一种制造磁铁的方法，它只能用于单极来提高产品的完成度。

    MAGNETIC MATERIALS FOR SECURITY APPLICATIONS
    8.
    发明申请
    MAGNETIC MATERIALS FOR SECURITY APPLICATIONS 审中-公开
    用于安全应用的磁性材料

    公开(公告)号：WO1990007784A1

    公开(公告)日：1990-07-12

    申请号：PCT/GB1990000024

    申请日：1990-01-09

    Applicant: SCIENTIFIC GENERICS LIMITED ,  DAVIES, Dafydd, Geraint

    Inventor： SCIENTIFIC GENERICS LIMITED

    IPC: H01F41/26

    CPC classification number: G08B13/2411 ,  G08B13/2417 ,  G08B13/2437 ,  G08B13/2442 ,  H01F41/26

    Abstract: A tag or marker is disclosed which comprises a substrate; an 'active' magnetic material which is a soft magnetic material having a high magnetic permeability and a low coercive force; and a deactivating material which is a hard or semi-hard magnetic material having a moderate or high coercive force and a moderate magnetic permeability, whereby the deactivating material, when subjected to a sufficiently high magnetising force, is able to clamp the magnetic properties of the 'active' material so as to deactivate the 'active' material. The tag or marker is characterised in that at least one of said 'active' material and said deactivating material is formed by an electrodeposition process. In another aspect, the deactivating material is formed from a steel containing 0.15 % carbon, 16-18 % chromium, and 6-8 % nickel, the balance being iron.

    Abstract translation: 公开了一种标签或标记，其包括基底; 作为具有高磁导率和低矫顽力的软磁性材料的“活性”磁性材料; 以及具有中等或高矫顽磁力和适度磁导率的硬质或半硬磁性材料的钝化材料，其中，当经受足够高的磁化力时，钝化材料能够夹紧 “活跃”材料，以使“活性”材料失效。 标签或标记的特征在于，所述“活性”材料和所述钝化材料中的至少一种通过电沉积工艺形成。 另一方面，钝化材料由含有0.15％碳，16-18％铬和6-8％镍的钢形成，余量为铁。

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