Invention Grant
- Patent Title: Advanced optical sensor and method for detecting an optical event in a light emission signal in a plasma chamber
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Application No.: US15351916Application Date: 2016-11-15
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Publication No.: US10692705B2Publication Date: 2020-06-23
- Inventor: Mihail Mihaylov , Xinkang Tian , Ching-Ling Meng , Jason Ferns , Joel Ng , Badru D. Hyatt , Zheng Yan , Vi Vuong
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: H01J37/32
- IPC: H01J37/32 ; G01J1/46 ; G01J1/42 ; G01J3/443 ; G01J3/28
Abstract:
An advanced optical sensor and method for detection of optical events in a plasma processing system. The method includes detecting at least one light emission signal in a plasma processing chamber. The at least one detected light emission signal including light emissions from an optical event. The method further includes processing the at least one light emission signal and detecting a signature of the optical event from the processed light emission signal.
Public/Granted literature
- US20170140905A1 ADVANCED OPTICAL SENSOR AND METHOD FOR PLASMA CHAMBER Public/Granted day:2017-05-18
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