公开(公告)号：US10692705B2

公开(公告)日：2020-06-23

申请号：US15351916

申请日：2016-11-15

Applicant: Tokyo Electron Limited

Inventor： Mihail Mihaylov ,  Xinkang Tian ,  Ching-Ling Meng ,  Jason Ferns ,  Joel Ng ,  Badru D. Hyatt ,  Zheng Yan ,  Vi Vuong

IPC: H01J37/32 ,  G01J1/46 ,  G01J1/42 ,  G01J3/443 ,  G01J3/28

Abstract: An advanced optical sensor and method for detection of optical events in a plasma processing system. The method includes detecting at least one light emission signal in a plasma processing chamber. The at least one detected light emission signal including light emissions from an optical event. The method further includes processing the at least one light emission signal and detecting a signature of the optical event from the processed light emission signal.

公开(公告)号：US20170140905A1

公开(公告)日：2017-05-18

申请号：US15351916

申请日：2016-11-15

Applicant: Tokyo Electron Limited

Inventor： Mihail Mihaylov ,  Xinkang Tian ,  Ching-Ling Meng ,  Jason Ferns ,  Joel Ng ,  Badru D. Hyatt ,  Zheng Yan ,  Vi Vuong

IPC: H01J37/32 ,  G01J1/42 ,  G01J3/28

Abstract: An advanced optical sensor and method for detection of optical events in a plasma processing system. The method includes detecting at least one light emission signal in a plasma processing chamber. The at least one detected light emission signal including light emissions from an optical event. The method further includes processing the at least one light emission signal and detecting a signature of the optical event from the processed light emission signal.