公开(公告)号：US20170140905A1

公开(公告)日：2017-05-18

申请号：US15351916

申请日：2016-11-15

Applicant: Tokyo Electron Limited

Inventor： Mihail Mihaylov ,  Xinkang Tian ,  Ching-Ling Meng ,  Jason Ferns ,  Joel Ng ,  Badru D. Hyatt ,  Zheng Yan ,  Vi Vuong

IPC: H01J37/32 ,  G01J1/42 ,  G01J3/28

Abstract: An advanced optical sensor and method for detection of optical events in a plasma processing system. The method includes detecting at least one light emission signal in a plasma processing chamber. The at least one detected light emission signal including light emissions from an optical event. The method further includes processing the at least one light emission signal and detecting a signature of the optical event from the processed light emission signal.

公开(公告)号：US20180068831A1

公开(公告)日：2018-03-08

申请号：US15453555

申请日：2017-03-08

Applicant: Tokyo Electron Limited

Inventor： Yan Chen ,  Xinkang Tian ,  Jason Ferns

IPC: H01J37/32

Abstract: Described herein are architectures, platforms and methods for determining endpoints of an optical emission spectroscopy (OES) data acquired from a plasma processing system. The OES data, for example, includes an absorption—step process, a desorption—step process, or a combination thereof. In this example, the OES data undergoes signal synchronization and transient signal filtering prior to endpoint determination, which may be implemented through an application of a moving average filter.

公开(公告)号：US10453653B2

公开(公告)日：2019-10-22

申请号：US15453555

申请日：2017-03-08

Applicant: Tokyo Electron Limited

Inventor： Yan Chen ,  Xinkang Tian ,  Jason Ferns

IPC: H01J37/32 ,  H01L21/3065 ,  H01L21/66

Abstract: Described herein are architectures, platforms and methods for determining endpoints of an optical emission spectroscopy (OES) data acquired from a plasma processing system. The OES data, for example, includes an absorption—step process, a desorption—step process, or a combination thereof. In this example, the OES data undergoes signal synchronization and transient signal filtering prior to endpoint determination, which may be implemented through an application of a moving average filter.

公开(公告)号：US10692705B2

公开(公告)日：2020-06-23

申请号：US15351916

申请日：2016-11-15

Applicant: Tokyo Electron Limited

Inventor： Mihail Mihaylov ,  Xinkang Tian ,  Ching-Ling Meng ,  Jason Ferns ,  Joel Ng ,  Badru D. Hyatt ,  Zheng Yan ,  Vi Vuong

IPC: H01J37/32 ,  G01J1/46 ,  G01J1/42 ,  G01J3/443 ,  G01J3/28

Abstract: An advanced optical sensor and method for detection of optical events in a plasma processing system. The method includes detecting at least one light emission signal in a plasma processing chamber. The at least one detected light emission signal including light emissions from an optical event. The method further includes processing the at least one light emission signal and detecting a signature of the optical event from the processed light emission signal.