Invention Grant
- Patent Title: Method, apparatus, and system for fin-over-nanosheet complementary field-effect-transistor
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Application No.: US15958426Application Date: 2018-04-20
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Publication No.: US11201152B2Publication Date: 2021-12-14
- Inventor: Ruilong Xie , Steven Soss , Steven Bentley , Daniel Chanemougame , Julien Frougier , Bipul Paul , Lars Liebmann
- Applicant: GLOBALFOUNDRIES INC.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES INC.
- Current Assignee: GLOBALFOUNDRIES INC.
- Current Assignee Address: KY Grand Cayman
- Agency: Williams Morgan, P.C.
- Main IPC: H01L29/76
- IPC: H01L29/76 ; H01L29/94 ; H01L31/062 ; H01L31/113 ; H01L31/119 ; H01L27/092 ; H01L29/06 ; H01L21/8238 ; H01L21/02 ; H01L29/66 ; H01L29/423 ; H01L29/08 ; H01L21/3065 ; H01L21/306 ; H01L29/51

Abstract:
A semiconductor device at least one first transistor of a first type disposed above a substrate and comprising a channel wider in one cross-section than tall, wherein the first type is a PFET transistor or an NFET transistor; and at least one second transistor of a second type disposed above the at least one first transistor and comprising a channel taller in the one cross-section than wide, wherein the second type is a PFET transistor or an NFET transistor, and the second type is different from the first type. Methods and systems for forming the semiconductor structure.
Public/Granted literature
- US20190326286A1 METHOD, APPARATUS, AND SYSTEM FOR FIN-OVER-NANOSHEET COMPLEMENTARY FIELD-EFFECT-TRANSISTOR Public/Granted day:2019-10-24
Information query
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