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    SIC SUBSTRATE TREATMENT METHOD
    131.
    发明公开
    SIC SUBSTRATE TREATMENT METHOD 审中-公开
    SIC基板处理方法

    公开(公告)号：EP3223302A1

    公开(公告)日：2017-09-27

    申请号：EP15861199.6

    申请日：2015-11-17

    申请人： Toyo Tanso Co., Ltd.

    发明人： YABUKI, Norihito ,  TORIMI, Satoshi ,  NOGAMI, Satoru

    IPC分类号： H01L21/265 ,  H01L21/302 ,  H01L21/3065

    CPC分类号： H01L21/046 ,  H01L21/302 ,  H01L21/306 ,  H01L21/3065 ,  H01L21/3247 ,  H01L21/67115 ,  H01L21/67346 ,  H01L21/7602 ,  H01L29/1608 ,  H01L29/66068 ,  H01L29/7813

    摘要： Provided is a SiC substrate treatment method for, with respect to a SiC substrate (40) that has, on its surface, grooves (41), activating ions while preventing roughening of the surface of the substrate. In the method, an ion activation treatment in which the SiC substrate (40) is heated under Si vapor pressure is performed to the SiC substrate (40) has, on its surface, an ion implantation region (46) in which ions have been implanted, and has the grooves (41) provided in a region including at least the ion implantation region (46), thereby ions that are implanted in the SiC substrate (40) is activated while etching the surface of the substrate.

    摘要翻译： 本发明提供一种SiC基板处理方法，该SiC基板处理方法对于在表面具有槽（41）的SiC基板（40），在防止基板表面粗糙化的同时激活离子。 在该方法中，在SiC基板（40）的表面上具有其中注入了离子的离子注入区域（46）的SiC基板（40）中执行其中在Si蒸气压下加热SiC基板（40）的离子激活处理 并且在至少包括离子注入区域（46）的区域中具有凹槽（41），由此注入到SiC衬底（40）中的离子在蚀刻衬底表面的同时被激活。

    GRAPHITE-COPPER COMPOSITE ELECTRODE MATERIAL AND ELECTRODE FOR ELECTRICAL DISCHARGE MACHINING USING SAID MATERIAL
    134.
    发明公开
    GRAPHITE-COPPER COMPOSITE ELECTRODE MATERIAL AND ELECTRODE FOR ELECTRICAL DISCHARGE MACHINING USING SAID MATERIAL 审中-公开
    GRAPHIT-KUPFERVERBUNDELEKTRODENMATERIAL UND ELEKTRODE ZUR FUNKENEROSIONSBEARBEITUNG MIT DIESEM MATERIAL

    公开(公告)号：EP3133048A1

    公开(公告)日：2017-02-22

    申请号：EP15779903.2

    申请日：2015-04-01

    申请人： Toyo Tanso Co., Ltd.

    发明人： KANDA, Masao ,  OHTA, Naoto ,  SAITO, Kiyoshi ,  OKADA, Masaki ,  ONISHI, Motoki ,  NAMIKI, Takeyuki

    IPC分类号： C01B32/23 ,  B23H1/06 ,  B23H9/00 ,  C04B41/88

    摘要： An object is to provide a graphite-copper composite electrode material that is capable of reducing electrode wear to a practically usable level and to provide an electrical discharge machining electrode using the material. A graphite-copper composite electrode material includes a substrate comprising a graphite material and having pores, and copper impregnated in the pores of the substrate, the electrode material having an electrical resistivity of 2.5 µΩm or less, preferably 1.5 µΩm or less, more preferably 1.0 µΩm or less. It is desirable that the substrate comprising the graphite material have an anisotropy ratio of 1.2 or less. It is desirable that an impregnation rate ϕ of the copper in the electrode material is 13% or greater. It is desirable that the substrate comprising the graphite material have a bulk density of from 1.40 Mg/m 3 to 1.85 Mg/m 3 .

    摘要翻译： 本发明的目的是提供一种石墨 - 铜复合电极材料，其能够将电极磨损降低到实际可用的水平，并提供使用该材料的放电加工电极。 石墨 - 铜复合电极材料包括含有石墨材料并具有孔隙的基底和浸渍在基底孔中的铜，该电极材料的电阻率为2.5微米或更小，优选为1.5微米或更小 ，更优选为1.0μm以下。 希望包含石墨材料的基板的各向异性比为1.2以下。 希望电极材料中铜的浸渍率为13％以上。 希望包含石墨材料的基材的堆积密度为1.40Mg / m 3至1.85Mg / m 3。

    METHOD FOR CARBURIZING TANTALUM MEMBER, AND TANTALUM MEMBER
    135.
    发明公开
    METHOD FOR CARBURIZING TANTALUM MEMBER, AND TANTALUM MEMBER 审中-公开
    渗碳钽元素和钽元素的方法

    公开(公告)号：EP2439308A4

    公开(公告)日：2017-01-04

    申请号：EP10783292

    申请日：2010-05-25

    申请人： TOYO TANSO CO

    发明人： ABE YOSHIHISA ,  WATANABE MASANARI ,  TAMURA OSAMU

    IPC分类号： C23C8/64

    CPC分类号： C23C8/64

    摘要： Provided is a method for carburizing a tantalum member whereby the tantalum member is less deformed by carburization and can be carburized with good flatness of the planar part thereof and in a uniform manner. The method is a method for subjecting a tantalum member 1 made of tantalum or a tantalum alloy and having a planar part 1a to a carburization process for allowing carbon to penetrate the member 1 from the surface toward the inner portion thereof and includes the steps of: setting the tantalum member 1 in a chamber 3 containing a carbon source by supporting the planar part 1a on a plurality of support rods 6 tapered at distal ends 6a thereof; and subjecting the tantalum member 1 to a carburization process by reducing in pressure and heating the interior of the chamber 3 to allow carbon derived from the carbon source to penetrate the tantalum member 1 from the surface thereof.

    METAL-CARBONACEOUS BRUCH AND METHOD FOR PRODUCING SAME
    137.
    发明公开
    METAL-CARBONACEOUS BRUCH AND METHOD FOR PRODUCING SAME 审中-公开
    金属 - 碳 - 基于笔刷和方法及其生产

    公开(公告)号：EP3054570A1

    公开(公告)日：2016-08-10

    申请号：EP14850455.8

    申请日：2014-10-01

    申请人： Toyo Tanso Co., Ltd.

    发明人： HOZUMI, Fumihiro

    IPC分类号： H02K13/00 ,  H01R39/20 ,  H02K15/02

    摘要： A carbonaceous material is fabricated by a mixture of carbon powder and a binder. 10 % by weight or more and 60 % by weight or less of metal powder to the fabricated carbonaceous material is mixed. The mixed carbonaceous material and metal powder are pressurized and formed. A brush base material is fabricated by burning of the pressurized and formed carbonaceous material and metal powder. The fabricated brush base material is impregnated with oil. An impregnation rate of the oil to the mixed carbonaceous material and metal powder may be 0.5 % by weight or more, for example.