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    DIAMOND ELECTRON EMISSION CATHODE, ELECTRON EMISSION SOURCE, ELECTRON MICROSCOPE, AND ELECTRON BEAM EXPOSURE DEVICE
    13.
    发明授权
    DIAMOND ELECTRON EMISSION CATHODE, ELECTRON EMISSION SOURCE, ELECTRON MICROSCOPE, AND ELECTRON BEAM EXPOSURE DEVICE 有权
    金刚石电子发射阴极，电子发射源，电子显微镜和电子束曝光装置

    公开(公告)号：EP1892741B1

    公开(公告)日：2011-09-28

    申请号：EP06766923.4

    申请日：2006-06-19

    申请人： Sumitomo Electric Industries, Ltd.

    发明人： Nishibayashi, Yoshiki, ,  Ueda, Akihiko, ,  Yamamoto, Yoshiyuki, ,  Imai, Takahiro,

    IPC分类号： H01J1/15 ,  H01J37/06 ,  H01J37/305

    CPC分类号： H01J1/15 ,  H01J1/14 ,  H01J37/06 ,  H01J2237/06308 ,  H01J2237/06316

    摘要： It is possible to provide an electron emission cathode, an electron emission source having a high-luminance and narrow energy width by using diamond and an electronic device using them. The diamond electron discharge cathode has a monocrystal diamond at least at a part of it. The diamond electron emission cathode has a columnar shape having a sharpened portion at a part of the electron emission section and is formed by at least two types of semiconductor having different electric characteristics. One of the types constituting the semiconductor is an n-type semiconductor containing 2 × 1015 cm-3 of n-type impurities or above and the other type is a p-type semiconductor containing 2 × 1015 cm-3 of p-type impurities or above. The p-type semiconductor is in contact with the n-type semiconductor and negative potential is applied to the n-type semiconductor with respect to the p-type semiconductor so that electrons flow from the n-type semiconductor to the p-type semiconductor by a pair of current introduction terminals, and the n-type semiconductor contains such a component that the electrons flow into the electron emission unit.

    摘要翻译： 通过使用金刚石和使用它们的电子器件，可以提供电子发射阴极，具有高亮度和窄能量宽度的电子发射源。 金刚石电子放电阴极至少在其一部分上具有单晶金刚石。 金刚石电子发射阴极具有在电子发射部分的一部分具有尖锐部分的圆柱形状，并且由至少两种具有不同电特性的半导体形成。 构成半导体的一种类型是含有2×1015cm-3以上的n型杂质的n型半导体，另一种是含有2×1015cm-3的p型杂质的p型半导体或 以上。 p型半导体与n型半导体接触，并且相对于p型半导体向n型半导体施加负电位，使得电子从n型半导体流向p型半导体 一对电流导入端子，n型半导体包含电子流入电子发射单元的成分。

    EXPOSURE APPARATUS
    15.
    发明授权
    EXPOSURE APPARATUS 有权
    接触设备

    公开(公告)号：EP3208826B1

    公开(公告)日：2018-04-11

    申请号：EP16204969.6

    申请日：2016-12-19

    申请人： Advantest Corporation

    发明人： HAMAGUCHI, Shinichi ,  TANAKA, Hitoshi ,  TOKUNO, Atsushi ,  KOJIMA, Shinichi ,  YAMADA, Akio

    IPC分类号： H01J37/317 ,  H01J37/10 ,  H01J37/04

    CPC分类号： H01J37/3177 ,  H01J37/045 ,  H01J37/065 ,  H01J37/09 ,  H01J37/10 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/06308 ,  H01J2237/0835 ,  H01J2237/31754

    摘要： The invention provides an exposure apparatus (100) including a formation module (122) which forms charged particle beams with different irradiation positions on a specimen. The formation module (122) includes: a particle source (20) which emits the charged particle beams from an emission region (21) in which a width in a longitudinal direction is different from and a width in a lateral direction orthogonal to the longitudinal direction; an aperture array device (60) provided with openings (62) arranged in an illuminated region (61) in which a width in a longitudinal direction is different from a width in a lateral direction orthogonal to the longitudinal direction; illumination lenses (30, 50) provided between the particle source (20) and the aperture array device (60); and a beam cross-section deformation device (40) which is provided between the particle source (20) and the aperture array device (60), and deforms a cross-sectional shape of the charged particle beams into an anisotropic shape by an action of a magnetic field or an electric field.

    Electron gun, method of controlling same, and electron beam additive manufacturing machine
    16.
    发明公开
    Electron gun, method of controlling same, and electron beam additive manufacturing machine 有权
    电子枪和蛋鸡生产方式来控制方法的机器意味着电子

    公开(公告)号：EP2911181A1

    公开(公告)日：2015-08-26

    申请号：EP15154861.7

    申请日：2015-02-12

    申请人： JEOL Ltd.

    发明人： Satoh, Takashi

    IPC分类号： H01J37/305 ,  H01J37/063

    CPC分类号： H01J3/08 ,  B22F3/1055 ,  B23K15/002 ,  B23K15/0026 ,  B23K15/0086 ,  B23K15/06 ,  B33Y30/00 ,  H01J3/02 ,  H01J3/024 ,  H01J3/027 ,  H01J37/063 ,  H01J37/305 ,  H01J2237/06308 ,  H01J2237/065 ,  H01J2237/3128 ,  Y02P10/295

    摘要： There is disclosed a method of controlling an electron gun without causing decreases in brightness of the electron beam if a current-limiting aperture cannot be used. The electron gun (10) has a cathode (11), a Wehnelt electrode (12), a control electrode (13), an anode (14), and a controller (22). The Wehnelt electrode (12) has a first opening in which the tip of the cathode is inserted, and focuses thermal electrons emitted from the tip of the cathode (11). The thermal electrons emitted from the tip of the cathode (11) are caused to pass into a second opening by the control electrode (13). The anode (14) accelerates the thermal electrons emitted from the cathode (11) such that the thermal electrons passed through the second opening pass through a third opening and impinge as an electron beam (B1) on a powdered sample (8). The controller (22) sets the bias voltage and the control voltage based on combination conditions of the bias voltage and control voltage to maintain the brightness of the beam constant.

    摘要翻译： 有盘在游离缺失电子枪控制的方法，无需在电子束的亮度曹景伟跌幅如果限流孔，不能使用。 电子枪（10）具有一个阴极（11），文纳尔控制电极（12），一个控制电极（13）到阳极（14），以及控制器（22）。 文纳尔控制电极（12）具有在其中阴极的前端插入的第一开口，并聚焦从阴极（11）的尖端发射热电子。 从阴极（11）的尖端发射的热电子被导致传递到由所述控制电极（13）的第二开口。 阳极（14）加速从阴极（11）所发射的热电子审查并通过第二开口通过热电子穿过第三开口和撞击，以电子上的粉末状样品光束（B1）（8）。 该控制器（22），设定偏置电压，并根据上述偏置电压和控制电压，以保持光束恒定的亮度的组合条件的控制电压。

    Electron beam generator
    19.
    发明公开
    Electron beam generator 审中-公开
    Elektronenstrahlgenerator

    公开(公告)号：EP2523207A2

    公开(公告)日：2012-11-14

    申请号：EP12179910.0

    申请日：2003-10-30

    申请人： Mapper Lithography IP B.V.

    发明人： Wieland, Marco Jan-Jaco ,  Kampherbeek, Bert Jan ,  Van Veen, Alexander Hendrik Vincent ,  Kruit, Pieter

    IPC分类号： H01J37/317 ,  H01J37/06 ,  H01J3/02

    CPC分类号： H01J3/02 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/06 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/06308 ,  H01J2237/06375 ,  H01J2237/3045

    摘要： The invention relates to an electron beam generator for generating an electron beam, comprising an electron source and an extractor. The combination of electron source and extractor in use forms a negative lens, wherein said extractor has a positive voltage with respect to the source. The extractor and the electron source are positioned such that, in use, a space charge limited region is present between them. In an embodiment, the extractor is a planar extractor. In another embodiment, the source is a thermionic source.. The generator may comprise an illumination system for collimating the electron beam.

    摘要翻译： 本发明涉及一种用于产生电子束的电子束发生器，包括电子源和提取器。 使用的电子源和提取器的组合形成负透镜，其中所述提取器相对于源具有正电压。 提取器和电子源的定位使得在使用中存在空间电荷限制区域。 在一个实施例中，提取器是平面提取器。 在另一个实施例中，源是热离子源。发生器可以包括用于准直电子束的照明系统。

    ELECTRON BEAM EMITTER WITH SLOTTED GUN
    20.
    发明公开
    ELECTRON BEAM EMITTER WITH SLOTTED GUN 有权
    ELEKTRONENSTRAHLEMITTER MIT SCHLITZKANONE

    公开(公告)号：EP2301057A2

    公开(公告)日：2011-03-30

    申请号：EP09752910.1

    申请日：2009-05-20

    申请人： Advanced Electron Beams, Inc.

    发明人： WALTHER, Steven, Raymond ,  BUFANO, Michael, L. ,  FRIEDMAN, Gerald, M.

    IPC分类号： H01J37/06

    CPC分类号： H01J37/063 ,  H01J2237/06308 ,  H01J2237/06375

    摘要： An electron beam emitter includes an electron generator for generating electrons. The electron generator can have a housing containing at least one electron source for generating the electrons. The at least one electron source has a width. The electron generator housing can have an electron permeable region spaced from the at least one electron source for allowing extraction of the electrons from the electron generator housing. The electron permeable region can include a series of narrow elongate slots and ribs formed in the electron generator housing and extending laterally beyond the width of the at least one electron source. The electron permeable region can be configured and positioned relative to the at least one electron source for laterally spreading the electrons that are generated by the at least one electron source.

    摘要翻译： 电子束发射器包括用于产生电子的电子发生器。 电子发生器可以具有包含至少一个用于产生电子的电子源的壳体。 至少一个电子源具有宽度。 电子发生器壳体可以具有与至少一个电子源间隔开的电子透射区域，用于从电子发生器壳体提取电子。 电子透射区域可以包括形成在电子发生器壳体中并且横向延伸超过至少一个电子源的宽度的一系列窄的细长槽和肋。 电子透射区域可以相对于至少一个电子源被配置和定位，以横向扩展由至少一个电子源产生的电子。