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    ELEKTRONENKANONE UND STRAHLUNGSERZEUGUNGSANLAGE
    1.
    发明公开
    ELEKTRONENKANONE UND STRAHLUNGSERZEUGUNGSANLAGE 有权
    STRAHLUNGSERZEUGUNGSANLAGE

    公开(公告)号：EP3053182A1

    公开(公告)日：2016-08-10

    申请号：EP14772094.0

    申请日：2014-09-16

    Applicant: Siemens Aktiengesellschaft

    Inventor： HEID, Oliver

    IPC: H01J3/02 ,  H01J35/04 ,  H01J35/06 ,  H01J35/14

    CPC classification number: H01J3/027 ,  H01J3/02 ,  H01J3/18 ,  H01J35/06 ,  H01J35/14

    Abstract: The invention relates to an electron gun for generating a flat electron beam, comprising a cathode with an emission surface which is curved about a central axis and which is designed to emit electrons. The electron gun further comprises an accelerating device for accelerating the electrons in a radial direction towards a target region on the central axis. Furthermore, the emission surface has a width in the azimuth direction and a height oriented perpendicularly to the width, said width being at least ten times greater than the height.

    Abstract translation: 本发明涉及一种用于产生扁平电子束的电子枪，包括具有围绕中心轴弯曲且被设计为发射电子的发射表面的阴极。 电子枪还包括加速装置，用于沿着径向加速电子朝向中心轴线上的目标区域。 此外，发射表面具有方位角方向上的宽度和垂直于宽度的高度，所述宽度比高度高至少十倍。

    Emitter device with focusing columns
    2.
    发明公开
    Emitter device with focusing columns 审中-公开
    与聚焦柱发射器装置

    公开(公告)号：EP1406285A3

    公开(公告)日：2006-08-02

    申请号：EP03255974.2

    申请日：2003-09-23

    Applicant: Hewlett-Packard Development Company, L.P.

    Inventor： Schut, David ,  Govyadinov, Alexander ,  Yang, Xiaofeng

    IPC: H01J3/02

    CPC classification number: H01J3/02 ,  H01J3/022 ,  H01J3/18 ,  H01J29/481 ,  H01J29/62 ,  H01J2237/3175

    Abstract: An emitter device (10) including a focusing array (20) with plural focusing columns (24) to focus emissions from one or more emitters (28) onto a target medium. Relative movement between the target medium and the focused emissions allows each focusing column to focus emissions over an area of the target medium encompassing the movement range. In a preferred embodiment, separate emitter, focusing array and target medium chips are used. The focusing array may be moveable, or in a particularly preferred embodiment, is affixed to the emitter chip, in which case the target medium chip is movable or the focusing array includes beam direction control.

    MICROWAVE ELECTRON GUN
    5.
    发明授权
    MICROWAVE ELECTRON GUN 失效
    MICROWAVE电子枪

    公开(公告)号：EP0187852B1

    公开(公告)日：1992-06-03

    申请号：EP85903901.8

    申请日：1985-07-08

    Applicant: MADEY, John, M., J. ,  WESTENSKOW, Glen, A.

    Inventor： MADEY, John, M., J. ,  WESTENSKOW, Glen, A.

    IPC: H01J23/34 ,  H01J23/16 ,  H01J25/00 ,  H01J25/10 ,  H01J25/12 ,  H01J29/54 ,  H01J29/70 ,  H01J29/76 ,  H01J40/00

    CPC classification number: H05H7/18 ,  H01J3/02 ,  H01J23/06

    Abstract: An electron gun (10) that suppresses the non-linear space charge forces and phase-dependant focusing forces that are chiefly responsible for the high emittance of conventional electron guns. The gun comprises a resonant microwave cavity (15), a cathode (12) mounted in the cavity wall, and a momentum analyzer system (17). The resonant microwave cavity, when supplied with microwave power, supports an electromagnetic field having a high-gradient electric component directed along an acceleration axis. The cavity is formed with an exit aperture (32) at a location relative to the cathode such that emitted electrons are accelerated along the axis and pass through the exit aperture. The cavity length is chosen to allow the microwave field within the cavity volume to accelerate the electrons to an energy of about 0.5-1.0 MeV prior to the electrons' passing through the aperture. Bunching is provided by the momentum analyzer. An electron emerging from the cavity has an energy determined by the phase of the microwave field at the time of that electron's emission. Those electrons having energies corresponding to the desired inital phase value are permitted to pass through the momentum analyzer, thereby forming a prebunched electron beam for injection into a linear accelerator.

    Electron gun, method of controlling same, and electron beam additive manufacturing machine
    6.
    发明公开
    Electron gun, method of controlling same, and electron beam additive manufacturing machine 有权
    电子枪和蛋鸡生产方式来控制方法的机器意味着电子

    公开(公告)号：EP2911181A1

    公开(公告)日：2015-08-26

    申请号：EP15154861.7

    申请日：2015-02-12

    Applicant: JEOL Ltd.

    Inventor： Satoh, Takashi

    IPC: H01J37/305 ,  H01J37/063

    CPC classification number: H01J3/08 ,  B22F3/1055 ,  B23K15/002 ,  B23K15/0026 ,  B23K15/0086 ,  B23K15/06 ,  B33Y30/00 ,  H01J3/02 ,  H01J3/024 ,  H01J3/027 ,  H01J37/063 ,  H01J37/305 ,  H01J2237/06308 ,  H01J2237/065 ,  H01J2237/3128 ,  Y02P10/295

    Abstract: There is disclosed a method of controlling an electron gun without causing decreases in brightness of the electron beam if a current-limiting aperture cannot be used. The electron gun (10) has a cathode (11), a Wehnelt electrode (12), a control electrode (13), an anode (14), and a controller (22). The Wehnelt electrode (12) has a first opening in which the tip of the cathode is inserted, and focuses thermal electrons emitted from the tip of the cathode (11). The thermal electrons emitted from the tip of the cathode (11) are caused to pass into a second opening by the control electrode (13). The anode (14) accelerates the thermal electrons emitted from the cathode (11) such that the thermal electrons passed through the second opening pass through a third opening and impinge as an electron beam (B1) on a powdered sample (8). The controller (22) sets the bias voltage and the control voltage based on combination conditions of the bias voltage and control voltage to maintain the brightness of the beam constant.

    Abstract translation: 有盘在游离缺失电子枪控制的方法，无需在电子束的亮度曹景伟跌幅如果限流孔，不能使用。 电子枪（10）具有一个阴极（11），文纳尔控制电极（12），一个控制电极（13）到阳极（14），以及控制器（22）。 文纳尔控制电极（12）具有在其中阴极的前端插入的第一开口，并聚焦从阴极（11）的尖端发射热电子。 从阴极（11）的尖端发射的热电子被导致传递到由所述控制电极（13）的第二开口。 阳极（14）加速从阴极（11）所发射的热电子审查并通过第二开口通过热电子穿过第三开口和撞击，以电子上的粉末状样品光束（B1）（8）。 该控制器（22），设定偏置电压，并根据上述偏置电压和控制电压，以保持光束恒定的亮度的组合条件的控制电压。

    Electron beam exposure system
    8.
    发明公开
    Electron beam exposure system 审中-公开
    Elektronenstrahl-Belichtungssystem

    公开(公告)号：EP2565902A2

    公开(公告)日：2013-03-06

    申请号：EP12188366.4

    申请日：2003-10-30

    Applicant: MAPPER LITHOGRAPHY IP B.V.

    Inventor： Wieland, Marco Jan-Jaco ,  Kampherbeek, Bert Jan ,  Van Veen, Alexander Hendrik Vincent ,  Kruit, Pieter

    IPC: H01J37/302 ,  H01J37/317 ,  H01J37/304 ,  G03F7/20 ,  H01J37/06 ,  H01J3/02 ,  B82Y40/00 ,  B82Y10/00

    CPC classification number: H01J3/02 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/06 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/06308 ,  H01J2237/06375 ,  H01J2237/3045

    Abstract: The invention relates to a maskless lithography system for transferring a pattern onto the surface of a target. The system comprises a beamlet generator for generating a plurality of electron beamlets, a modulation array comprising a beamlet stop area and a beamlet blanker array comprising a beamlet blanking means for switching electron beamlets on and off, and, a focusing electron optical system, comprising at least one array of electrostatic lenses for focusing electron beamlets on said surface. The focusing optical system is adapted for maintaining the beamlets separate between the modulation array and the focusing electron optical system.

    Abstract translation: 本发明涉及一种用于将图案转印到目标表面上的无掩模光刻系统。 该系统包括用于产生多个电子子束的子波发生器，包括子束停止区域的调制阵列和包括用于切换电子束的子束消隐装置的子束消隐器阵列，以及聚焦电子光学系统，包括： 用于在所述表面上聚焦电子束的至少一个静电透镜阵列。 聚焦光学系统适于将子束保持在调制阵列和聚焦电子光学系统之间。

    Electron beam generator
    9.
    发明公开
    Electron beam generator 审中-公开
    Elektronenstrahlgenerator

    公开(公告)号：EP2523207A2

    公开(公告)日：2012-11-14

    申请号：EP12179910.0

    申请日：2003-10-30

    Applicant: Mapper Lithography IP B.V.

    Inventor： Wieland, Marco Jan-Jaco ,  Kampherbeek, Bert Jan ,  Van Veen, Alexander Hendrik Vincent ,  Kruit, Pieter

    IPC: H01J37/317 ,  H01J37/06 ,  H01J3/02

    CPC classification number: H01J3/02 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/06 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/06308 ,  H01J2237/06375 ,  H01J2237/3045

    Abstract: The invention relates to an electron beam generator for generating an electron beam, comprising an electron source and an extractor. The combination of electron source and extractor in use forms a negative lens, wherein said extractor has a positive voltage with respect to the source. The extractor and the electron source are positioned such that, in use, a space charge limited region is present between them. In an embodiment, the extractor is a planar extractor. In another embodiment, the source is a thermionic source.. The generator may comprise an illumination system for collimating the electron beam.

    Abstract translation: 本发明涉及一种用于产生电子束的电子束发生器，包括电子源和提取器。 使用的电子源和提取器的组合形成负透镜，其中所述提取器相对于源具有正电压。 提取器和电子源的定位使得在使用中存在空间电荷限制区域。 在一个实施例中，提取器是平面提取器。 在另一个实施例中，源是热离子源。发生器可以包括用于准直电子束的照明系统。

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