公开(公告)号：EP3396305A1

公开(公告)日：2018-10-31

申请号：EP16878891.7

申请日：2016-12-22

申请人： National Institute of Advanced Industrial Science and Technology ,  Mitsui Chemicals Tohcello, Inc.

发明人： ASAKA, Kinji ,  HORIUCHI, Tetsuya ,  ZHU, Zicai ,  TAKASE, Mitsuo

IPC分类号： G01B7/16 ,  G01D5/14

CPC分类号： G01B7/16 ,  G01D5/14

摘要： The present invention relates to a deformation sensor comprising a structure in which an ion-conductive polymer layer is sandwiched between soft electrodes, wherein non-uniform ion distribution is generated in the ion-conductive polymer layer by deformation, thereby generating a potential difference between the electrodes.

公开(公告)号：EP2842717B1

公开(公告)日：2018-08-15

申请号：EP13781753.2

申请日：2013-04-23

申请人： Mitsui Chemicals Tohcello, Inc.

发明人： KURODA, Hiroyuki ,  YAOITA, Takatoshi ,  SHISHIDO, Shigeyuki ,  IWASAKI, Yukihiro ,  MORI, Takafumi ,  FUNAKI, Katsuhiko ,  ZENKOH, Hirofumi

IPC分类号： B29C47/00 ,  C08J3/20 ,  C08J5/18

CPC分类号： B29C47/0021 ,  B29B7/38 ,  B29B7/88 ,  B29B9/04 ,  B29B9/16 ,  B29B2009/161 ,  B29C47/1009 ,  B29C47/1081 ,  B29C47/14 ,  B29C47/38 ,  B29C47/40 ,  B29C47/822 ,  B29C47/92 ,  B29C2947/926 ,  B29C2947/92828 ,  B29D7/01 ,  B29K2023/00 ,  B29K2105/24 ,  C08J3/203 ,  C08J5/18 ,  C08J2323/08 ,  H01L31/048 ,  H01L31/0481 ,  H01L31/18 ,  Y02E10/50

摘要： A method for manufacturing an encapsulating material sheet for a solar battery of the invention includes a step of producing an additive-containing pellet by soaking an additive A into a pellet including a polyolefin-based resin as a main component, a step of injecting the additive-containing pellet into a cylinder (103) from a supply opening (101) in an extrusion molder (100), and melting and kneading a resin composition including the polyolefin-based resin and the additive A in the cylinder (103), and a step of molding by extrusion the resin composition from a die (109) in the extrusion molder (100) into a sheet shape.

公开(公告)号：EP3351568A1

公开(公告)日：2018-07-25

申请号：EP16846093.9

申请日：2016-07-15

申请人： Mitsui Chemicals Tohcello, Inc.

发明人： KURIHARA Hiroyoshi ,  SAITO Manami

IPC分类号： C08F8/30

CPC分类号： C08F8/30 ,  C08F2800/20 ,  C08F2810/30

摘要： The present invention is a method for producing a polyfunctional polymer that contains a structural unit having a urethane bond and a polymerizable unsaturated bond in a side chain, and is characterised by including a reaction process in which a polymer (P) containing a structural unit (a) having a hydroxy group in a side chain and a monomer (M) having an isocyanate group and a polymerizable unsaturated bond are reacted in the presence of a bismuth carboxylate.

公开(公告)号：EP3316280A1

公开(公告)日：2018-05-02

申请号：EP16817719.4

申请日：2016-06-14

申请人： Mitsui Chemicals Tohcello, Inc.

发明人： HAYASHISHITA Eiji

IPC分类号： H01L21/301 ,  C09J7/02 ,  C09J201/00

CPC分类号： C09J7/255 ,  C09J7/20 ,  C09J7/25 ,  C09J7/30 ,  C09J133/08 ,  C09J133/12 ,  C09J201/00 ,  C09J2203/326 ,  C09J2205/302 ,  C09J2433/00 ,  C09J2467/006 ,  C09J2477/006 ,  H01L21/6836 ,  H01L21/78

摘要： The present invention provides a film for manufacturing a semiconductor part in which an evaluation step accompanied with a temperature change, a segmenting step, and a pickup step can be commonly performed, a method for manufacturing a semiconductor part, a semiconductor part, and an evaluation method. That is, a film 1 for manufacturing a semiconductor part includes a base layer 11, and an adhesive layer 12 disposed on one surface side of the base layer 11, wherein the ratio R E (= E'(160)/E'(-40)) of the elastic modulus of E'(160) of the base layer 11 at 160°C to the elastic modulus of E'(-40) of the base layer 11 at -40°C is such that R E ≥ 0.01, and the elastic modulus E'(-40) is 10 MPa or more and less than 1000 MPa. The present method includes a step of bonding the adhesive layer 12 to a back surface of the semiconductor wafer having circuits formed thereon, a step of separating the semiconductor wafer into segments to obtain semiconductor parts, and a pickup step of separating the semiconductor parts from the adhesive layer 12, and includes a step of evaluating the semiconductor wafer or the semiconductor parts prior to the pickup step.

摘要翻译： 本发明提供一种用于制造半导体部件的膜，其中可以共同执行伴随着温度变化的评估步骤，分段步骤和拾取步骤，用于制造半导体部件的方法，半导体部件以及评估 方法。 即，用于制造半导体部件的膜1包括基底层11和设置在基底层11的一个表面侧上的粘合剂层12，其中比率RE（= E'（160）/ E'（ - 40 ））为160℃时的基材层11的E'（160）的弹性模量与-40℃下的基材层11的E'（ - 40）的弹性模量的关系，RE≥0.01， 弹性模量E'（ - 40）为10MPa以上且小于1000MPa。 本方法包括以下步骤：将粘合剂层12粘合到其上形成有电路的半导体晶片的背面;将半导体晶片分割成段以获得半导体部件的步骤;以及拾取步骤，将半导体部件从 并且包括在拾取步骤之前评估半导体晶片或半导体部件的步骤。

公开(公告)号：EP3228654A1

公开(公告)日：2017-10-11

申请号：EP15865243.8

申请日：2015-11-13

申请人： Mitsui Chemicals Tohcello, Inc.

发明人： KIDOKORO Masako ,  NOMOTO Akira

IPC分类号： C08G81/02 ,  B32B9/00 ,  B32B27/30

CPC分类号： B32B27/30 ,  B32B9/00 ,  B32B2307/7242 ,  B32B2309/105 ,  C08G81/02 ,  C08G81/024 ,  C08J7/047 ,  C08J2367/02 ,  C08J2433/08 ,  C08J2479/02 ,  C09D133/08

摘要： A gas barrier polymer of the present invention is formed by heating a mixture including a polycarboxylic acid and a polyamine compound, in which, in an infrared absorption spectrum of the gas barrier polymer, when a total peak area in a range of an absorption band of equal to or more than 1493 cm -1 and equal to or less than 1780 cm -1 is A, and a total peak area in a range of an absorption band of equal to or more than 1598 cm -1 and equal to or less than 1690 cm -1 is B, an area ratio of an amide bond indicated by B/A is 0.370 or more.

摘要翻译： 本发明的阻气性聚合物是通过加热包含多元羧酸和多胺化合物的混合物而形成的，其中，在气体阻绝聚合物的红外吸收光谱中，当吸收带范围内的总峰面积 等于或大于1493cm -1并且等于或小于1780cm -1为A，并且在1598cm -1以上且小于等于1598cm -1的吸收带的范围内的总峰面积 1690cm -1为B时，由B / A表示的酰胺键的面积比为0.370以上。

公开(公告)号：EP3040390A4

公开(公告)日：2017-04-26

申请号：EP14840598

申请日：2014-08-21

申请人： MITSUI CHEMICALS TOHCELLO INC

发明人： USUGI SHINICHI ,  IGARASHI KOUJI ,  MORIMOTO AKIMITSU

IPC分类号： C09J7/02 ,  B32B25/12 ,  B32B25/14 ,  B32B25/18 ,  B32B27/00 ,  B32B27/08 ,  B32B27/18 ,  C09J201/00 ,  H01L21/56 ,  H01L23/29 ,  H01L23/31

CPC分类号： C09J7/0285 ,  B32B3/085 ,  B32B7/12 ,  B32B25/12 ,  B32B25/18 ,  B32B27/06 ,  B32B27/08 ,  B32B27/18 ,  B32B27/281 ,  B32B27/34 ,  B32B27/36 ,  B32B2307/306 ,  B32B2307/736 ,  B32B2307/748 ,  B32B2405/00 ,  B32B2457/00 ,  B32B2457/14 ,  C09J7/20 ,  C09J7/255 ,  C09J7/385 ,  C09J201/00 ,  C09J2201/134 ,  C09J2201/606 ,  C09J2203/326 ,  C09J2433/00 ,  C09J2467/006 ,  C09J2477/006 ,  C09J2479/086 ,  H01L21/561 ,  H01L21/565 ,  H01L21/568 ,  H01L21/6835 ,  H01L24/19 ,  H01L24/26 ,  H01L24/96 ,  H01L2221/68381 ,  H01L2224/12105 ,  H01L2924/15788 ,  H01L2924/181 ,  H01L2924/3511 ,  H01L2924/00

摘要： An adhesive film of the present invention includes a base material layer and a self-peeling adhesive layer laminated therein. The base material layer has a thermal contraction percentage in a direction of flow (thermal contraction percentage in an MD direction) and a thermal contraction percentage in an orthogonal direction with respect to the direction of flow (thermal contraction percentage in a TD direction) that satisfy the following conditions: (1) after heating at 150°C for 30 minutes, 0.4 ‰¤ | thermal contraction percentage in MD direction / thermal contraction percentage in TD direction| ‰¤ 2.5 and average of thermal contraction percentage in MD direction and thermal contraction percentage in TD direction ‰¤ 2%, and (2) after heating at 200°C for 10 minutes, 0.4 ‰¤ | thermal contraction percentage in MD direction / thermal contraction percentage in TD direction| ‰¤ 2.5 and average of thermal contraction percentage in MD direction and thermal contraction percentage in TD direction ‰¥ 3%.

摘要翻译： 本发明的粘合剂膜包括基材层和层压于其中的自剥离粘合剂层。 基材层相对于流动方向（TD方向的热收缩率），在流动方向（MD方向的热收缩率）和正交方向上的热收缩率分别为 条件如下：（1）在150℃加热30分钟后，0.4‰¤ MD方向热收缩率/ TD方向热收缩率| MD方向的热收缩率和TD方向的热收缩率的平均值≤2％，（2）在200℃加热10分钟后，0.4％ MD方向热收缩率/ TD方向热收缩率| MD方向的热收缩率和TD方向的热收缩率的平均值≥3％。

公开(公告)号：EP2871054B1

公开(公告)日：2017-04-05

申请号：EP13812960.6

申请日：2013-07-03

申请人： Mitsui Chemicals, Inc. ,  Mitsui Chemicals Tohcello, Inc.

发明人： FUKUMOTO Haruhiko ,  ODAGAWA Kenji ,  USUI Hideo ,  TAKAHASHI Eiichi ,  TAKAKI Toshihiko ,  TAKANO Masako ,  NAKAMURA Osamu ,  SHINDO Kiyotaka

IPC分类号： B32B9/00 ,  B32B27/00 ,  B32B37/00 ,  H01L31/042

CPC分类号： C08J7/045 ,  B32B27/08 ,  B32B27/28 ,  B32B37/182 ,  B32B2307/7244 ,  B32B2307/7246 ,  B32B2309/105 ,  B32B2310/08 ,  B32B2310/0831 ,  B32B2457/12 ,  B32B2457/20 ,  C08J7/042 ,  C08J7/126 ,  C08J2333/14 ,  C08J2367/02 ,  C08J2443/00 ,  C08J2483/00 ,  C08J2483/16 ,  H01L31/0481 ,  Y02E10/50 ,  Y10T428/31663

摘要： The laminate according to the invention is comprised of a base material (A), a silicon-containing layer (B) and a polymer layer (C) obtained from an organic acid metallic salt having a polymerizable group. The silicon-containing layer (B) and the polymer layer (C) are sequentially laminated over at least one surface of the base material (A), the silicon-containing layer (B) includes a high nitrogen concentration region comprised of silicon atoms and nitrogen atoms, silicon atoms and nitrogen atoms and oxygen atoms, or silicon atoms and nitrogen atoms and oxygen atoms and carbon atoms. The high nitrogen concentration region is formed by irradiating energy ray onto a polysilazane film formed over the base material (A) under an oxygen concentration equal to or lower than 5% and/or a relative humidity at room temperature (23°C) equal to or lower than 30% so as to denature at least a part of the film.

摘要翻译： 根据本发明的层压制品由基材（A），含硅层（B）和由具有可聚合基团的有机酸金属盐获得的聚合物层（C）组成。 含硅层（B）和聚合物层（C）依次层叠在基材（A）的至少一个表面上，含硅层（B）包括由硅原子构成的高氮浓度区域和 氮原子，硅原子和氮原子和氧原子，或者硅原子和氮原子以及氧原子和碳原子。 氮浓度高的区域是通过在等于或低于5％的氧气浓度和/或在室温（23℃）下的相对湿度等于或低于5％的条件下将能量射线照射到在基材（A）上形成的聚硅氮烷膜上而形成的。 或低于30％，从而使膜的至少一部分变性。

公开(公告)号：EP3007211A4

公开(公告)日：2016-12-14

申请号：EP14803829

申请日：2014-05-22

申请人： MITSUI CHEMICALS TOHCELLO INC

发明人： USUGI SHINICHI ,  IGARASHI KOUJI ,  MORIMOTO AKIMITSU

IPC分类号： H01L21/304 ,  C09J5/00 ,  H01L21/683

CPC分类号： H01L21/6835 ,  B32B43/006 ,  C09J5/00 ,  C09J2203/326 ,  C09J2205/302 ,  C09J2205/31 ,  H01L2221/68318 ,  H01L2221/68327 ,  H01L2221/68381 ,  H01L2221/68386

公开(公告)号：EP2871054A4

公开(公告)日：2016-03-02

申请号：EP13812960

申请日：2013-07-03

申请人： MITSUI CHEMICALS INC ,  MITSUI CHEMICALS TOHCELLO INC

发明人： FUKUMOTO HARUHIKO ,  ODAGAWA KENJI ,  USUI HIDEO ,  TAKAHASHI EIICHI ,  TAKAKI TOSHIHIKO ,  TAKANO MASAKO ,  NAKAMURA OSAMU ,  SHINDO KIYOTAKA

IPC分类号： B32B9/00 ,  B32B27/00 ,  B32B37/00 ,  H01L31/042

CPC分类号： C08J7/045 ,  B32B27/08 ,  B32B27/28 ,  B32B37/182 ,  B32B2307/7244 ,  B32B2307/7246 ,  B32B2309/105 ,  B32B2310/08 ,  B32B2310/0831 ,  B32B2457/12 ,  B32B2457/20 ,  C08J7/042 ,  C08J7/126 ,  C08J2333/14 ,  C08J2367/02 ,  C08J2443/00 ,  C08J2483/00 ,  C08J2483/16 ,  H01L31/0481 ,  Y02E10/50 ,  Y10T428/31663

摘要： The laminate according to the invention is comprised of a base material (A), a silicon-containing layer (B) and a polymer layer (C) obtained from an organic acid metallic salt having a polymerizable group. The silicon-containing layer (B) and the polymer layer (C) are sequentially laminated over at least one surface of the base material (A), the silicon-containing layer (B) includes a high nitrogen concentration region comprised of silicon atoms and nitrogen atoms, silicon atoms and nitrogen atoms and oxygen atoms, or silicon atoms and nitrogen atoms and oxygen atoms and carbon atoms. The high nitrogen concentration region is formed by irradiating energy ray onto a polysilazane film formed over the base material (A) under an oxygen concentration equal to or lower than 5% and/or a relative humidity at room temperature (23°C) equal to or lower than 30% so as to denature at least a part of the film.

公开(公告)号：EP2626911B1

公开(公告)日：2015-12-16

申请号：EP11830390.8

申请日：2011-10-07

申请人： Mitsui Chemicals, Inc. ,  Mitsui Chemicals Tohcello, Inc.

发明人： IKENAGA, Shigenobu ,  TAKEUCHI, Fumito ,  WATANABE, Keiji ,  TOKUHIRO, Jun ,  MUROFUSHI, Takanobu ,  YARIMIZU, Kazuhiro ,  ITO, Tomoaki ,  MARUKO, Nobuhiro

IPC分类号： H01L31/042 ,  C08F210/02 ,  C08K5/541 ,  C08L23/08 ,  C09K3/10 ,  C09D123/08

CPC分类号： H01L31/0481 ,  C08F4/65908 ,  C08F4/65912 ,  C08F4/6592 ,  C08F4/65925 ,  C08L2312/08 ,  C09D123/0815 ,  C09K3/10 ,  C09K2200/0617 ,  C09K2200/062 ,  Y02B10/12 ,  Y02E10/50 ,  C08F210/16 ,  C08F210/08 ,  C08F2500/03 ,  C08F2500/08 ,  C08F2500/12 ,  C08F210/14