公开(公告)号：EP2256780A2

公开(公告)日：2010-12-01

申请号：EP10008339.3

申请日：2008-01-24

Applicant: Hitachi High-Technologies Corporation

Inventor： Terada, Shohei ,  Taniguchi, Yoshifumi

IPC: H01J37/26 ,  H01J37/295

CPC classification number: H01J37/05 ,  H01J37/09 ,  H01J37/244 ,  H01J37/26 ,  H01J37/265 ,  H01J2237/0453 ,  H01J2237/057 ,  H01J2237/24455 ,  H01J2237/2446 ,  H01J2237/24485 ,  H01J2237/2802

Abstract: In order to correct measurement magnification and measurement position of a spectral image with high efficiency and with high accuracy using an electronic spectroscope and a transmission electron microscope regarding the spectral image formed in two orthogonal axes which are an amount of energy loss axis and a measurement position information axis; a method for correcting magnification and position and a system for correcting magnification and position, both of which are capable of correcting measurement magnification and measurement position of a spectral image with high efficiency and with high accuracy using an electronic spectroscope and a transmission electron microscope regarding the spectral image formed in two orthogonal axes which are an amount of energy loss axis and a measurement position information axis, are provided.

Abstract translation: 为了使用电子分光镜和透射型电子显微镜，对于作为能量损失轴和测量位置的两个正交轴上形成的光谱图像，以高效率和高精度来校正光谱图像的测量倍率和测量位置 信息轴; 用于校正放大率和位置的方法以及用于校正倍率和位置的系统，它们都能够使用电子分光镜和透射电子显微镜来高效率和高精度地校正光谱图像的测量倍率和测量位置 提供了作为能量损失轴的量和测量位置信息轴的两个正交轴中形成的光谱图像。

公开(公告)号：EP2027586A4

公开(公告)日：2010-11-24

申请号：EP07796127

申请日：2007-06-13

Applicant: SEMEQUIP INC

Inventor： GLAVISH HILTON F ,  JACOBSON DALE CONRAD ,  HORSKY THOMAS N ,  HAHTO SAMI K

IPC: G21K5/10 ,  H01J33/02

CPC classification number: H01J37/3171 ,  H01J37/05 ,  H01J37/09 ,  H01J2237/0044 ,  H01J2237/0455 ,  H01J2237/047 ,  H01J2237/0492 ,  H01J2237/057 ,  H01J2237/14 ,  H01J2237/30477 ,  H01J2237/31703 ,  H01L21/26513

公开(公告)号：EP1469503A3

公开(公告)日：2010-03-03

申请号：EP04009132.4

申请日：2004-04-16

Applicant: Carl Zeiss NTS GmbH

Inventor： Steigerwald, Michael, Dr. ,  Essers, Erik

IPC: H01J37/28 ,  H01J37/05 ,  H01J37/12 ,  H01J37/153

CPC classification number: H01J37/28 ,  H01J37/05 ,  H01J37/12 ,  H01J37/153

Abstract: An electron microscopy system (1) and an electron microscopy method for detection of time dependencies of secondary electrons generated by primary electrons is provided, in which the primary electron pulses are directed onto a sample surface (9) and electrons emanating from the sample surface are detected, time resolved. To this end the system comprises in particular a cavity resonator (53, 5). A cavity resonator can also be used to reduce aberrations of focusing lenses.

公开(公告)号：EP1965407A3

公开(公告)日：2010-01-27

申请号：EP08001366.7

申请日：2008-01-24

Applicant: Hitachi High-Technologies Corporation

Inventor： Terada, Shohei ,  Taniguchi, Yoshifumi

IPC: H01J37/26 ,  H01J37/295

CPC classification number: H01J37/05 ,  H01J37/09 ,  H01J37/244 ,  H01J37/26 ,  H01J37/265 ,  H01J2237/0453 ,  H01J2237/057 ,  H01J2237/24455 ,  H01J2237/2446 ,  H01J2237/24485 ,  H01J2237/2802

Abstract: In order to correct measurement magnification and measurement position of a spectral image with high efficiency and with high accuracy using an electronic spectroscope and a transmission electron microscope regarding the spectral image formed in two orthogonal axes which are an amount of energy loss axis and a measurement position information axis; a method for correcting magnification and position and a system for correcting magnification and position, both of which are capable of correcting measurement magnification and measurement position of a spectral image with high efficiency and with high accuracy using an electronic spectroscope and a transmission electron microscope regarding the spectral image formed in two orthogonal axes which are an amount of energy loss axis and a measurement position information axis, are provided.

Abstract translation: 为了使用电子分光镜和透射电子显微镜关于在作为能量损失轴的量和测量位置的量的两个正交轴上形成的光谱图像以高效率和高准确度校正光谱图像的测量放大率和测量位置 信息轴; 用于校正倍率和位置的方法以及用于校正倍率和位置的系统和这两种系统都能够使用电子分光镜和透射电子显微镜以高效率和高准确度校正光谱图像的测量放大率和测量位置， 提供在作为能量损失轴的量和测量位置信息轴的两个正交轴上形成的光谱图像。

公开(公告)号：EP2133903A2

公开(公告)日：2009-12-16

申请号：EP09251534.5

申请日：2009-06-11

Applicant: Kratos Analytical Limited

Inventor： Page, Simon

IPC: H01J37/08 ,  H01J37/05 ,  H01J37/295 ,  H01J37/30

CPC classification number: H01J37/05 ,  G01N23/2273 ,  H01J37/08 ,  H01J37/295 ,  H01J37/30 ,  H01J2237/05 ,  H01J2237/08 ,  H01J2237/0815

Abstract: The present invention provides an electron spectroscopy apparatus (12) comprising a high energy particle source (12) for irradiating a sample, an electron detector system (16) (e.g. including a delay line detector) for detecting electrons emitted from the sample and an ion gun (8) for delivering a polycyclic aromatic hydrocarbon (PAH) ion beam to the sample, wherein the ion gun comprises a polycyclic aromatic hydrocarbon ion source, for example comprising coronene. In an embodiment, the PAH is located in a heated chamber (22) and vaporised to produce gas phase PAH. The gas phase PAH molecules are then ionised by electron impact, extracted from the ion source via an extraction field and focussed using ion optics. The PAH ion beam can be used for surface cleaning and depth analysis.

Abstract translation: 本发明提供了一种包括用于照射样品的高能量粒子源（12），用于检测从样品发射的电子的电子检测器系统（16）（例如包括延迟线检测器）的电子能谱装置（12） 用于将多环芳烃（PAH）离子束输送到样品的枪（8），其中所述离子枪包括多环芳族烃离子源，例如包含芳烃。 在一个实施方案中，PAH位于加热室（22）中并蒸发以产生气相PAH。 气相PAH分子然后通过电子轰击电离，通过提取场从离子源提取，并使用离子光学聚焦。 PAH离子束可用于表面清洁和深度分析。

公开(公告)号：EP2128885A1

公开(公告)日：2009-12-02

申请号：EP08156906.3

申请日：2008-05-26

Applicant: FEI COMPANY

Inventor： Henstra, Alexander

IPC: H01J37/05 ,  H01J37/09 ,  H01J37/147 ,  H01J37/153 ,  H01J37/04

CPC classification number: H01J37/05 ,  H01J3/027 ,  H01J3/04 ,  H01J37/063 ,  H01J2237/045 ,  H01J2237/057 ,  H01J2237/061 ,  H01J2237/08 ,  H01J2237/15 ,  H01J2237/1534

Abstract: The invention describes a particle source in which energy selection occurs. The energy selection occurs by sending a beam of electrically charged particles 103 eccentrically through a lens 107. As a result of this, energy dispersion will occur in an image formed by the lens. By projecting this image onto a slit 109 in an energy selecting diaphragm 108, it is possible to allow only particles in a limited portion of the energy spectrum to pass. Consequently, the passed beam 113 will have a reduced energy spread. Deflection unit 112 deflects the beam to the optical axis 101. One can also elect to deflect a beam 105 going through the middle of the lens toward the optical axis and having, for example, greater current.
The energy dispersed spot is imaged on the slit by a deflector 111. When positioning the energy dispersed spot on the slit, central beam 105 is deflected from the axis to such an extent that it is stopped by the energy selecting diaphragm. Hereby reflections and contamination resulting from this beam in the region after the diaphragm are avoided. Also electron-electron interaction resulting from the electrons from the central beam interacting with the energy filtered beam in the area of deflector 112 is avoided.

Abstract translation: 本发明描述了发生能量选择的粒子源。 通过透过透镜107偏心地发送带电粒子103的束来进行能量选择。其结果是，由透镜形成的图像中会发生能量分散。 通过将该图像投影到能量选择膜108中的狭缝109上，可以仅允许能量谱的有限部分中的粒子通过。 因此，通过的梁113将具有减小的能量扩展。 偏转单元112将光束偏转到光轴101.还可以选择将穿过透镜中间的光束105偏转到光轴并具有例如更大的电流。 能量分散点通过偏转器111在狭缝上成像。当将能量分散点定位在狭缝上时，中心光束105从轴线偏转到由能量选择膜片停止的程度。 因此避免了在隔膜之后的区域中由该光束产生的反射和污染。 避免了在偏转器112的区域中与来自中心光束的电子与能量过滤光束相互作用的电子 - 电子相互作用。

公开(公告)号：EP1463089A3

公开(公告)日：2009-07-29

申请号：EP04006957.7

申请日：2004-03-23

Applicant: Hitachi High-Technologies Corporation

Inventor： Kaji, Kazutoshi Hitachi, Ltd., ,  Taniguchi, Yoshifumi Hitachi High-Technologies ,  Isakozawa, Shigeto Hitachi High-Technologies

IPC: H01J37/252 ,  H01J37/05 ,  H01J37/147

CPC classification number: H01J37/1471 ,  H01J37/05 ,  H01J37/28 ,  H01J2237/2802

Abstract: An electron microscope has an electron beam energy analyzer (energy filter) (11) to observe electron beam energy loss spectra and element distribution images. This electron microscope further includes a deflection coil (8) provided on the upstream side of a magnetic prism (9) to correct for the electron beam path in a plane normal to the optical axis and make the electron beam incident to the energy filter, a deflection coil (14) for correcting for the electron beam path in the energy axis direction of an energy dispersion surface (12) formed by the magnetic prism (9), and a control unit (21) for controlling the exciting conditions of the deflection coils (8,14).

公开(公告)号：EP2027586A2

公开(公告)日：2009-02-25

申请号：EP07796127.4

申请日：2007-06-13

Applicant: Semequip, Inc.

Inventor： GLAVISH, Hilton, F. ,  JACOBSON, Dale, Conrad ,  HORSKY, Thomas, N. ,  HAHTO, Sami, K.

IPC: G21K5/10 ,  H01J33/02

CPC classification number: H01J37/3171 ,  H01J37/05 ,  H01J37/09 ,  H01J2237/0044 ,  H01J2237/0455 ,  H01J2237/047 ,  H01J2237/0492 ,  H01J2237/057 ,  H01J2237/14 ,  H01J2237/30477 ,  H01J2237/31703 ,  H01L21/26513

Abstract: A multipurpose ion implanter beam line configuration constructed for enabling implantation of common monatomic dopant ion species and cluster ions, the beam line configuration having a mass analyzer magnet defining a pole gap of substantial width between ferromagnetic poles of the magnet and a mass selection aperture, the analyzer magnet sized to accept an ion beam from a slot-form ion source extraction aperture and to produce dispersion at the mass selection aperture in a plane corresponding to the width of the beam, the mass selection aperture capable of being set to a mass-selection width sized to select a beam of the cluster, the mass selection aperture also capable of being set to a substantially narrower mass-selection width and the analyzer magnet having a resolution at the mass selection aperture sufficient to enable selection of a beam of monatomic dopant ions of substantially a single atomic or molecular weight.

公开(公告)号：EP1662542A3

公开(公告)日：2008-12-31

申请号：EP05255244.5

申请日：2005-08-25

Applicant: SUMITOMO EATON NOVA CORPORATION

Inventor： Yagita, Takanori ,  Nishi, Takashi ,  Sugitani, Michiro ,  Murakami, Junichi ,  Tsukihara, Mitsukuni ,  Kabasawa, Mitsuaki ,  Ishikawa, Masaki ,  Kudo, Tetsuya

IPC: H01J37/317 ,  H01J37/05

CPC classification number: H01J37/05 ,  H01J37/317 ,  H01J49/26

Abstract: The present invention provides for an irradiation system with an ion beam/charged particle beam having an energy filter (17) formed by deflection electrodes (24-1, 24-2) and a deflection magnet (22) and means for switching therebetween wherein the deflection magnet has a general window-frame shape and is formed with a hollow portion at its centre and the deflection electrodes are installed, along with suppression electrodes (31-1, 31-2), in a vacuum chamber (23) arranged in the hollow portion of the deflection magnet. The deflection electrodes are installed with respect to the deflection magnet such that a deflection trajectory of a beam caused by a magnetic field and a deflection trajectory of a beam caused by an electric field overlap each other and since the deflection electrodes or the deflection magnet can be selectively used by way of a switching means the system can function with a wide range of beam conditions and thus is widely usable.

公开(公告)号：EP1703537B9

公开(公告)日：2008-10-22

申请号：EP05005886.6

申请日：2005-03-17

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

Inventor： Frosien, Jürgen ,  Lanio, Stefan

IPC: H01J37/244 ,  H01J37/05 ,  G01R31/305 ,  H01J49/48

CPC classification number: H01J37/05 ,  G01R31/305 ,  H01J37/244 ,  H01J49/488 ,  H01J2237/24465 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/26