OPTOMECHANICAL INERTIAL SENSOR
    32.
    发明公开

    公开(公告)号:EP3080618A4

    公开(公告)日:2017-11-01

    申请号:EP14869807

    申请日:2014-11-19

    申请人: INTEL CORP

    摘要: Embodiments of the present disclosure are directed towards techniques and configurations for MEMS sensing device configured to determine inertial change applied to the device. In one instance, the device may comprise a laser arrangement configured to generate a light beam, and a waveguide configured to split the light beam into two portions. The waveguide may include two arms through which the respective portions of the light beam may respectively pass, and disposed substantially parallel with each other and joined together around their respective ends to recombine the portions into a light beam. One of the arms may be deformable. A deformation of the arm may result in a change of an optical path length of a portion of the light beam traveling through the arm, causing a detectable change in light intensity of the recombined light beam outputted by the waveguide. Other embodiments may be described and/or claimed.

    REGISTRATION OF AN EXTENDED REFERENCE FOR PARAMETER MEASUREMENT IN AN OPTICAL SENSING SYSTEM
    33.
    发明公开
    REGISTRATION OF AN EXTENDED REFERENCE FOR PARAMETER MEASUREMENT IN AN OPTICAL SENSING SYSTEM 审中-公开
    注册EINER ERWEITERTEN REFERENZ ZUR PARAMETERMESSUNG在EINEM OPTISCHEN ERFASSUNGSSYSTEM

    公开(公告)号:EP2577222A4

    公开(公告)日:2017-06-28

    申请号:EP11790271

    申请日:2011-05-31

    摘要: An interferometric measurement system measures a parameter using at least one optical waveguide. A memory stores reference interferometric pattern data associated with a segment of the optical waveguide. Interferometric detection circuitry detects and stores measurement interferometric pattern data associated with the segment of the optical waveguide during a measurement operation. A spectral range of the reference interferometric pattern of the optical waveguide is greater than a spectral range of the measurement interferometric pattern of the optical waveguide. A processor shifts one or both of the measurement interferometric pattern data and the reference interferometric pattern data relative to the other to obtain a match and to use the match to measure the parameter. An example parameter is strain.

    摘要翻译: 干涉测量系统使用至少一个光波导来测量参数。 存储器存储与光波导的一段相关联的参考干涉图案数据。 干涉检测电路在测量操作期间检测并存储与光波导的段相关联的测量干涉图案数据。 光波导的参考干涉图案的光谱范围大于光波导的测量干涉图案的光谱范围。 处理器将测量干涉图案数据和参考干涉图案数据中的一者或两者相对于另一者移位以获得匹配并且使用匹配来测量参数。 示例参数是应变。

    REGISTRATION OF AN EXTENDED REFERENCE FOR PARAMETER MEASUREMENT IN AN OPTICAL SENSING SYSTEM
    36.
    发明公开
    REGISTRATION OF AN EXTENDED REFERENCE FOR PARAMETER MEASUREMENT IN AN OPTICAL SENSING SYSTEM 审中-公开
    扩展的参考参数测量在光学检测系统注册

    公开(公告)号:EP2577222A2

    公开(公告)日:2013-04-10

    申请号:EP11790271.8

    申请日:2011-05-31

    IPC分类号: G01B9/02 G01N21/47

    摘要: An interferometric measurement system measures a parameter using at least one optical waveguide. A memory stores reference interferometric pattern data associated with a segment of the optical waveguide. Interferometric detection circuitry detects and stores measurement interferometric pattern data associated with the segment of the optical waveguide during a measurement operation. A spectral range of the reference interferometric pattern of the optical waveguide is greater than a spectral range of the measurement interferometric pattern of the optical waveguide. A processor shifts one or both of the measurement interferometric pattern data and the reference interferometric pattern data relative to the other to obtain a match and to use the match to measure the parameter. An example parameter is strain.

    摘要翻译: 干涉测量系统测量使用至少一个光波导的参数。 存储器存储引用与光波导的一个段相关联的干涉图案数据。 干涉检测电路检测并存储与光波导的测量操作期间的段相关联的测量的干涉图案数据。 光波导的参考干涉图案的光谱范围是比光波导的测量的干涉图案的光谱范围更大。 处理器转移的一个或两个的测量的干涉图案数据和基准图案数据干涉相对于另一个的,以获得一个匹配,并使用匹配来测量参数。 一个示例参数是应变。

    FABRICATION OF FABRY-PEROT POLYMER FILM SENSING INTERFEROMETERS
    37.
    发明授权
    FABRICATION OF FABRY-PEROT POLYMER FILM SENSING INTERFEROMETERS 有权
    制作法布里 - 珀罗干涉仪传感器与聚合物层

    公开(公告)号:EP1206675B1

    公开(公告)日:2005-06-29

    申请号:EP00954748.0

    申请日:2000-08-18

    IPC分类号: G01B9/02

    CPC分类号: G01B9/02023 G01B2290/25

    摘要: A method of forming an interferometer film for an interferometer sensor comprises forming a parylene polymer layer (8) of substantially uniform thickness directly on an interferometer substrate (4;45), the layer forming the interferometer film. Since the interferometer film (8) is formed directly onto the surface of the interferometer substrate, there is improved conformity between the two surfaces at the interface between the polymer layer and the substrate and improved uniformity in the thickness of the film.

    NANOMETER METROLOGY
    39.
    发明公开
    NANOMETER METROLOGY 失效
    纳米计量。

    公开(公告)号:EP0630467A1

    公开(公告)日:1994-12-28

    申请号:EP94903970.0

    申请日:1994-01-10

    IPC分类号: G01B9 G01B15 G01D5 G01J9

    摘要: Appareil permettant de mesurer les déplacements d'un objet avec une précision nanométrique, destiné plus particulièrement à être utilisé dans la fabrication de nouveaux composants de traitement du signal. Cet appareil comprend une source de hautes fréquences destinée à produire un premier signal électrique (50), un transducteur (24) qui génère partiellement à partir du premier signal un signal intermédiaire d'une longueur d'onde inférieure, un système (56) de décalage de phase qui interagit avec le signal intermédiaire et qui est associé à l'objet de telle manière qu'un déplacement de l'objet entraîne le système (56) de décalage de phase à changer la longueur du chemin du signal intermédiaire d'une quantité directement liée au déplacement, un système (60) de transfert de phase qui génère un deuxième signal électrique au moins en partie à l'aide du signal intermédiaire de sorte que la phase du signal intermédiaire soit transférée sur le deuxième signal, et un détecteur (62) de phase qui mesure le changement de phase du deuxième signal par rapport au premier signal lors du déplacement de l'objet.