公开(公告)号：EP1956630A1

公开(公告)日：2008-08-13

申请号：EP07002552.3

申请日：2007-02-06

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

Inventor： Frosien, Jürgen ,  Banzhof, Helmut

IPC: H01J27/22 ,  H01J37/153 ,  H01J37/30

CPC classification number: H01J49/288 ,  H01J37/05 ,  H01J37/08 ,  H01J37/28 ,  H01J2237/057 ,  H01J2237/0805 ,  H01J2237/3174 ,  H01J2237/31749

Abstract: An ion beam device is described. The ion beam device includes an ion beam source 110 for generating an ion beam 170, the ion beam being emitted along a first axis 142, an aperture unit adapted to shape the ion beam, and an achromatic deflection unit 162 adapted to deflect ions of the ion beam having a predetermined mass by a deflecting angle. The achromatic deflection unit includes: an electric field generating component for generating an electric field, and a magnetic field generating component for generating a magnetic field substantially perpendicular to the electric field. The device further includes a mass separation aperture 154 adapted for blocking ions with a mass different from the predetermined mass and for allowing ions having the predetermined mass to trespass the mass separator, and an objective lens 124 having a second optical axis, wherein the second optical axis is inclined with regard to the first axis.

Abstract translation: 描述了离子束装置。 离子束装置包括用于产生离子束170的离子束源110，沿着第一轴线142发射的离子束，适于使离子束成形的孔单元和适于偏转离子束的离子的消色差偏转单元162 离子束具有预定质量的偏转角。 无彩色偏转单元包括：用于产生电场的电场产生部件和用于产生基本上垂直于电场的磁场的磁场产生部件。 该装置还包括质量分离孔154，其适于阻挡具有不同于预定质量的质量的离子并且允许具有预定质量的离子侵入质量分离器，以及具有第二光轴的物镜124，其中第二光学 轴相对于第一轴线倾斜。

公开(公告)号：EP1703537B1

公开(公告)日：2008-05-21

申请号：EP05005886.6

申请日：2005-03-17

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

Inventor： Frosien, Jürgen ,  Lanio, Stefan

IPC: H01J37/244 ,  H01J37/05 ,  G01R31/305 ,  H01J49/48

CPC classification number: H01J37/05 ,  G01R31/305 ,  H01J37/244 ,  H01J49/488 ,  H01J2237/24465 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/26

公开(公告)号：EP1176624B1

公开(公告)日：2007-10-17

申请号：EP01306059.5

申请日：2001-07-13

Applicant: Axcelis Technologies, Inc.

Inventor： Benveniste, Victor M. ,  Divergilio, William F. ,  Sinclair, Frank

IPC: H01J37/317 ,  H01J37/05 ,  H01J37/32 ,  H01J37/02 ,  H01P3/16

CPC classification number: H01J37/32623 ,  H01J37/05 ,  H01J37/3171 ,  H01J37/32678

公开(公告)号：EP0917725B1

公开(公告)日：2007-06-27

申请号：EP97936047.6

申请日：1997-07-10

Applicant: Gatan, Inc.

Inventor： KUNDMANN, Michael, Karl ,  GUBBENS, Alexander, Jozef ,  FRIEDMAN, Stuart, Lawrence ,  KRIVANEK, Ondrej, L.

IPC: H01J37/26 ,  H01J37/05 ,  H01J37/252

CPC classification number: H01J37/05 ,  H01J37/252 ,  H01J37/26 ,  H01J37/265 ,  H01J2237/24485 ,  H01J2237/24585 ,  H01J2237/2826

公开(公告)号：EP1209720A3

公开(公告)日：2006-11-15

申请号：EP01127285.3

申请日：2001-11-16

Applicant: Hitachi High-Technologies Corporation

Inventor： Kaji, Kazutoshi, Hitachi, Ltd, Intell Prop. Group ,  Aoyama, Takashi, Hitachi, Ltd, Intell Prop. Group ,  Taya, Shunroku, Hitachi High-Tech. Corporation ,  Isakozawa, Shigeto, Hitachi High-Tech. Corporation

IPC: H01J37/05 ,  H01J37/252

CPC classification number: G01N23/2251 ,  H01J37/05 ,  H01J37/244 ,  H01J37/252 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/24485 ,  H01J2237/24495 ,  H01J2237/2487 ,  H01J2237/262 ,  H01J2237/2802 ,  H05H1/0037

Abstract: An electron beam detector detects a peak of a spectrum, and when a peak position is deviated from a reference position on the electron beam detector, a controller for controlling an electron beam position on the electron beam detector is used to correct a deviation. An electron energy loss spectrum is measured while controlling correction a deviation between an electron beam position on a specimen, and a peak position of the spectrum, and a spectrum measuring with the electron beam detector.

Abstract translation: 电子束检测器检测光谱的峰值，并且当峰值位置偏离电子束检测器上的基准位置时，使用用于控制电子束检测器上的电子束位置的控制器来校正偏差。 测量电子能量损失谱，同时控制校正电子束在样本上的位置与光谱的峰值位置之间的偏差，以及用电子束检测器测量的光谱。

公开(公告)号：EP1662539A2

公开(公告)日：2006-05-31

申请号：EP05255243.7

申请日：2005-08-25

Applicant: SUMITOMO EATON NOVA CORPORATION

Inventor： Yagita, Takanori

IPC: H01J37/05 ,  H01J37/317

CPC classification number: H01J37/3171 ,  H01J37/05 ,  H01J49/26

Abstract: The invention provides for an irradiation system with an ion beam/charged particle beam, and in which the ion beam/charged particle beam is deflected by an energy filter (17) for the energy analysis so as to subsequently irradiate a wafer (19) and wherein the energy filer controls the spread of magnetic field distribution caused by a deflection magnet (14), cancels a leakage magnetic field in the longitudinal direction, and deflects the ion beam/charged particle beam at a uniform angle at any position in the scanning-deflection area.

Abstract translation: 本发明提供具有离子束/带电粒子束的照射系统，其中离子束/带电粒子束被能量过滤器（17）偏转用于能量分析，以便随后照射晶片（19）和 其特征在于，所述能量滤波器控制由偏转磁体（14）引起的磁场分布的扩散，抵消了所述纵向方向上的泄漏磁场，并使所述离子束/带电粒子束以扫描方向的任意位置以均匀的角度偏转， 偏转区域。

公开(公告)号：EP1625604A1

公开(公告)日：2006-02-15

申请号：EP04752159.6

申请日：2004-05-14

Applicant: Axcelis Technologies, Inc.

Inventor： BENVENISTE, Victor ,  HUANG, Yongzhang

IPC: H01J37/317 ,  H01J37/05 ,  H01J37/153

CPC classification number: H01J37/32082 ,  H01J37/05 ,  H01J37/3171 ,  H01J37/3266 ,  H01J2237/0041

Abstract: A mass analyzer for a ribbon shaped ion beam is disclosed. The mass analyzer comprises a pair of coils that define an entrance end and an exit end of the analyzer. Field clamps are employed at or proximate to one or more of the entrance and exit ends of the mass analyzer. The field clamps operate to terminate fringing fields close to the entrance and exit ends of the mass analyzer, thereby reducing the impact of such fringing fields on the ribbon beam and improving beam uniformity.

公开(公告)号：EP1063676A3

公开(公告)日：2005-06-15

申请号：EP00111394.3

申请日：2000-05-26

Applicant: Staib Instrumente GmbH

Inventor： Staib, Philippe, Dr.

IPC: H01J37/05 ,  H01J37/252

CPC classification number: H01J37/05 ,  H01J37/252

Abstract: Zur Abbildung eines Teilchenstrahls (108) aus geladenen Teilchen mit einer bestimmten Energie- und Winkelverteilung auf einer Detektoreinrichtung (140) mit einer Vorrichtung (100), die eine Ablenkeinrichtung (120) mit mindestens einer Abbremslinse (121-124), die dazu vorgesehen ist, im Teilchenstrahl (108) im wesentlichen parallele Teilchenbahnen (109) auszubilden, deren gegenseitigen Abstände der Winkelverteilung der Teilchen entsprechen, und eine Filtereinrichtung (130) umfaßt, die zwischen der Ablenkeinrichtung (120) und der Detektoreinrichtung (140) angeordnet ist, wobei die Filtereinrichtung (130) mit einem Potential zur Bildung eines Abbremsfeldes beaufschlagbar und dazu eingerichtet ist, für die Teilchen energieselektiv durchlässig zu sein, ist probenseitig vor der Ablenkeinrichtung (120) ein Eintrittsfenster (111) in Form einer axialsymmetrischen Stufenblende oder eines Eintrittsgitter angeordnet, das von der Ablenkeinrichtung (120) elektrisch getrennt ist und auf Massepotential liegt.

公开(公告)号：EP1517353A3

公开(公告)日：2005-03-30

申请号：EP03028695.9

申请日：2003-12-16

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

Inventor： Frosien, Jürgen, Dr. ,  Degenhardt, Ralf ,  Lanio, Stefan, Dr.

IPC: H01J37/153 ,  H01J37/05 ,  H01J37/28

CPC classification number: H01J37/05 ,  H01J37/153 ,  H01J2237/057 ,  H01J2237/1534

Abstract: The present invention provides a charged particle beam energy width reduction system. The system comprises a first element (110) acting in a focusing and dispersive manner in an x-z-plane; a second element (112) acting in a focusing and dispersive manner in the x-z-plane; a charged particle selection element (116; 116a; 116b) positioned between the first and the second element acting in a focusing and dispersive manner; and a focusing element (114; 314, 712; 714) positioned between the first and the second element acting in a focusing and dispersive manner.

Abstract translation: 本发明提供了一种带电粒子束能量宽度减小系统。 该系统包括在x-z平面中以聚焦和散射方式起作用的第一元件（110） 在x-z平面中以聚焦和散射方式起作用的第二元件（112） 位于所述第一元件和所述第二元件之间的带电粒子选择元件（116; 116a; 116b），所述带电粒子选择元件以聚焦和分散方式起作用; 以及定位在第一和第二元件之间的聚焦和散射方式的聚焦元件（114; 314,712; 714）。

公开(公告)号：EP0989584B1

公开(公告)日：2004-11-24

申请号：EP98118000.3

申请日：1998-09-23

Applicant: ADVANTEST CORPORATION

Inventor： Frosien, Jürgen Dr.

IPC: H01J37/153 ,  H01J37/05

CPC classification number: H01J37/05 ,  H01J37/153