Abstract:
Various aspects of the prsent invention are directed to electric-field-enhancement structures (100) and detection apparatuses (600, 700, 800) that employ such electric-field-enhancement structures. In one aspect of the present invention, an electric-field-enhancement structure (100) includes a substrate (102) having a surface (104). The substrate (102) is capable of supporting a planar mode (114) having a planar-mode frequency. A plurality of nanofeatures (106) is associated with the surface (104), and each of nanofeatures (106) exhibits a localized-surface-plasmon mode (116) having a localized-surface-plasmon frequency approximately equal to the planar-mode frequency.
Abstract:
An ellipsometer or polarimeter system and method for controlling intensity of an electromagnetic beam over a spectrum of wavelengths by applying control (P2) and beam (P) polarizers, optionally in combination with an intervening and control compensator (C).
Abstract:
An apparatus for imaging a tooth having a light source with a first spectral range and a second spectral range. A polarizing beamsplitter (18) light having a first polarization state toward the tooth and directs light from the tooth having a second polarization state along a return path toward a sensor (68), wherein the first and second polarization states are orthogonal. A first lens (22) in the return path directs image-bearing light from the tooth, through the polarizing beamsplitter (18), toward the sensor (68), and obtains image data from the redirected portion of the light having the second polarization state. A long-pass filter ( 15) in the return path attenuates light in the second spectral range. Control logic enables the sensor to obtain either the reflectance image or the fluorescence image.
Abstract:
The invention concerns a spectroscopic ellipsometer comprising a light source (1) emitting an optical beam, a polarizer (2) arranged on the path of the optical beam emitted by the light source, a sample holder (9) receiving the optical beam from the polarizer output, a polarisation analyser (3) designed to be traversed by the beam reflected by the sample to be analysed, a detection set which receives the beam from the analyser output and which comprises a monochromator (5) and a photodetector (4), means (6) for processing the signal in said detection set output, which include an electronic counter (13). Cooling means (12) maintain the detection set at a temperature lower than room temperature, minimising the noise of the detector so as to be constantly in the condition of minimum photon noise. The optimal measuring condition of the ellipsometer is reached by minimising all the sources of noise (lamps, detection, ambient noise).
Abstract:
Stress-induced photoelastic birefringence compensates for intrinsic birefringence of cubic crystalline structures (12) in deep ultraviolet (less than 200 nm) microlithographic imaging systems (10). Both the photoelastic birefringence and the intrinsic birefringence are expressed in a tensor format simplified by the symmetries of cubic crystalline structures. The stress-induced photoelastic birefringence can be sized to individually compensate for intrinsic birefringence exhibited in the same optical elements or preferably to collectively compensate for the cumulative effects of intrinsic birefringence in other optical elements in the lithography system.
Abstract:
A method for screening fiber polarization mode dispersion using a polarization optical time domain reflectometer is disclosed. A pulse radiation is emitted into an end of the fiber under test, and the backscattered radiation is measured by the POTDR and used to obtain an OTDR trace. A pulse radiation is emitted into an opposite end of the fiber under test, and the backscattered radiation is measured by the POTDR and used to obtain another OTDR trace. Either one or both traces are analyzed to compare the variation of intensity of signals along the length of the fiber, the variation in signals relating to the PMD along the length of the fiber.
Abstract:
A differential method has been developed which determines displacement from a defined point of optical transmission (e.g., ±45° from null, or null 90° and parallel 0°) and utilizes the coupled nature of the two signals for common mode noise rejection and signal enhancement. A beam of light (104) is modulated (130), applied to the chiral mixture (140), and then split into a first beam (146) and a related orthogonal beam (148) by a polarizer or prism (142). The first beam (146) and orthogonal beam (148) are converted into electrical signals (150) (152) before a differential comparison (170) of the signals is performed to detect a desired chiral species within the chiral mixture.
Abstract:
An interferometer includes a means for splitting, at a splitting location, an input light beam into a first beam and a second beam; and means for recombining, at a recombination location, the first beam and the second beam. The interferometer is designed such that the first beam will travel a first optical path length (OPL) from the splitting location to the recombination location, and the second beam will travel a second OPL from the splitting location to the recombination location and such that when the input light beam has been modulated at a data rate comprising a time interval, then the difference in optical path lengths between the first OPL and the second OPL is about equal to the time interval multiplied by the speed of light.