公开(公告)号：EP0009049A1

公开(公告)日：1980-04-02

申请号：EP79900259

申请日：1979-09-11

Applicant: WESTERN ELECTRIC CO

Inventor： COLLIER ROBERT JACOB

IPC: G21K1/08 ,  H01J37/30 ,  H01J37/302 ,  H01L21/30 ,  G21K5/00 ,  G21K5/04 ,  H01J29/46

CPC classification number: H01J37/302 ,  H01J37/3007

Abstract: Une technique avantageuse rapide d'ecriture de mires de microcircuits avec un point d'exploration electronique de dimensions variables est decrite dans l'art anterieur. Dans un tel systeme d'exposition a faisceau deux masques a ouvertures espaces l'un de l'autre (26, 40) avec un deflecteur (48) entre les deux sont inclus dans la colonne electronique du systeme. Un troisieme masque a ouvertures (56) et un deflecteur associe (54) sont ajoutes en serie aux composants de la colonne. Ainsi, la vitesse et d'autres caracteristiques de performance d'un tel systeme se trouvent nettement ameliorees.

公开(公告)号：EP2256779B1

公开(公告)日：2015-07-08

申请号：EP10164011.8

申请日：2010-05-27

Applicant: FEI COMPANY

Inventor： Miller, Tom

IPC: H01J37/09 ,  H01J37/147 ,  H01J37/302 ,  H01J37/305

CPC classification number: H01J37/3056 ,  H01J37/09 ,  H01J37/1471 ,  H01J37/302 ,  H01J2237/30472

公开(公告)号：EP2840588A1

公开(公告)日：2015-02-25

申请号：EP14181219.8

申请日：2014-08-18

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Biberger, Josef ,  Pulwey, Ralph ,  Tsyrulin, Katja ,  Salzer, Roland

IPC: H01J37/304 ,  H01J37/305

CPC classification number: H01J37/302 ,  H01J37/28 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/30488 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: The invention relates to a method for processing and/or observing an object (16) by means of at least one particle beam, in which the particle beam is scanned over the object (16). The method comprises: determining a scan region (RB1) on the object (16), the scan region (RB1) having a multiplicity of scan lines (RZ1 to RZ4), moving the particle beam in a first scanning direction (A) along one of the multiplicity of scan lines (RZ1 to RZ4), and changing from the first scanning direction (A) to a second scanning direction (A') at a change-of-direction time, wherein changing from the first scanning direction (A) to the second scanning direction (A') comprises a setting of a point of rotation (P1) in that scan line (RZ4) of the scan region (RB1) in which the particle beam is situated at the change-of-direction time, with an axis of rotation (A1) extending through the point of rotation (P1), and wherein the first scanning direction (A) is changed into the second scanning direction (A') by rotating the scan region (RB1) about the axis of rotation (A1), with the point of rotation (P1) being selected dependent on the direction of rotation.

Abstract translation: 本发明涉及由至少一个粒子束，其中所述粒子束在物体（16）扫描的装置，用于处理和/或在物体（16）观察的方法。 该方法包括：确定性采矿的扫描区域（RB1），其具有的扫描线的多重性（RZ1到RZ4），在第一扫描方向（A）沿着一个移动所述粒子束的物体（16），扫描区域（RB1）上 的扫描线（RZ1到RZ4）中，在方向转换对的一时间从所述第一扫描方向（A）移动到第二扫描方向（A“）改变，worin从第一扫描方向改变重（A）的 于第二扫描方向（A“）包括旋转的点的设置（P1）确实在其中粒子束位于方向变化的最时间扫描区域（RB1）的扫描线（RZ4）， 与旋转轴线（A1）延伸穿过旋转的（P1）的点，worin第一扫描方向（A）由大约的轴线旋转所述扫描区域（RB1）改变成所述第二扫描方向（A“） 旋转（A1）中，用旋转（P1）的点被选择依赖于旋转方向。

公开(公告)号：EP2003225A4

公开(公告)日：2011-03-16

申请号：EP07740157

申请日：2007-03-28

Applicant: HOYA CORP

Inventor： TAKAHASHI YUKIHIRO ,  HAMAMOTO TERUFUMI ,  SHINDE KENICHI

IPC: C23C14/22 ,  C23C14/48 ,  G02B1/11 ,  G02B1/111 ,  G02B1/18

CPC classification number: C23C14/32 ,  C23C14/0031 ,  C23C14/0042 ,  C23C14/221 ,  C23C14/54 ,  C23C14/564 ,  C23C16/30 ,  G02B1/11 ,  H01J27/02 ,  H01J37/08 ,  H01J37/302 ,  H01J37/317 ,  H01J37/3178 ,  H01J2237/006 ,  H01J2237/022

公开(公告)号：EP2003225A9

公开(公告)日：2009-05-06

申请号：EP07740157.8

申请日：2007-03-28

Applicant: HOYA CORPORATION

Inventor： TAKAHASHI, Yukihiro ,  HAMAMOTO, Terufumi ,  SHINDE, Kenichi

IPC: C23C14/22 ,  G02B1/11

CPC classification number: C23C14/32 ,  C23C14/0031 ,  C23C14/0042 ,  C23C14/221 ,  C23C14/54 ,  C23C14/564 ,  C23C16/30 ,  G02B1/11 ,  H01J27/02 ,  H01J37/08 ,  H01J37/302 ,  H01J37/317 ,  H01J37/3178 ,  H01J2237/006 ,  H01J2237/022

Abstract: An ion gun system 60 includes an ion gun 14 for irradiating an ion beam; an electric power supply unit 61 for supplying electric power to the ion gun; two mass flow regulators 64, 65 for introducing each of two types of gas in the ion gun; a control unit 12 connected to the electric power supply unit for working as ion gun control means for controlling electric power supplied to the ion gun from the electric power supply unit; and a control unit 12 connected to the mass flow regulators for working as mass flow control means for controlling the flow rate of gas introduced from the mass flow regulators in the ion gun. The control unit 12 as mass flow control means is provided with a function of changing the set value for the flow rate of each of the two types of gas to another set value by changing it stepwise within a range where the ion gun is working stably. Accordingly, shortening of film formation time can be attained.

公开(公告)号：EP2024750A2

公开(公告)日：2009-02-18

申请号：EP07798254.4

申请日：2007-06-07

Applicant: FEI COMPANY

Inventor： BIERHOFF, Mart Petrus Maria ,  BUIJSSE, Bart ,  KOOIJMAN, Cornelis Sander ,  VAN LEEUWEN, Hugo ,  TAPPEL, Hendrik Gezinus ,  SANFORD, Colin August ,  STOKS, Sander Richard Marie ,  BERGER, Steven ,  BORMANS, Ben Jacobus Marie ,  DRIESSEN, Koen Arnoldus Wilhelmus ,  PERSOON, Johannes A.H.W.G.

IPC: G01R1/44

CPC classification number: H01J37/26 ,  H01J37/16 ,  H01J37/18 ,  H01J37/185 ,  H01J37/20 ,  H01J37/21 ,  H01J37/226 ,  H01J37/244 ,  H01J37/261 ,  H01J37/28 ,  H01J37/302 ,  H01J2237/1405 ,  H01J2237/162 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/2003 ,  H01J2237/2006

Abstract: A compact electron microscope uses a removable sample holder having walls that form a part of the vacuum region in which the sample resides. By using the removable sample holder to contain the vacuum, the volume of air requiring evacuation before imaging is greatly reduced and the microscope can be evacuated rapidly. In a preferred embodiment, a sliding vacuum seal allows the sample holder to be positioned under the electron column, and the sample holder is first passed under a vacuum buffer to remove air in the sample holder.

公开(公告)号：EP2024732A2

公开(公告)日：2009-02-18

申请号：EP07798251.0

申请日：2007-06-07

Applicant: FEI Company

Inventor： BIERHOFF, Mart Petrus Maria ,  BUIJSSE, Bart ,  KOOIJMAN, Cornelis Sander ,  VAN LEEUWEN, Hugo ,  TAPPEL, Hendrik Gezinus ,  SANFORD, Colin August ,  STOKS, Sander Richard Marie ,  BERGER, Steven ,  BORMANS, Ben Jacobus Marie ,  DRIESSEN, Koen Arnoldus Wilhelmus ,  PERSOON, Johannes Antonius Hendricus Wilhelmus G.

IPC: G01N23/00

CPC classification number: H01J37/26 ,  H01J37/16 ,  H01J37/18 ,  H01J37/185 ,  H01J37/20 ,  H01J37/21 ,  H01J37/226 ,  H01J37/244 ,  H01J37/261 ,  H01J37/28 ,  H01J37/302 ,  H01J2237/1405 ,  H01J2237/162 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/2003 ,  H01J2237/2006

Abstract: A compact electron microscope uses a removable sample holder having walls that form a part of the vacuum region in which the sample resides. By using the removable sample holder to contain the vacuum, the volume of air requiring evacuation before imaging is greatly reduced and the microscope can be evacuated rapidly. In a preferred embodiment, a sliding vacuum seal allows the sample holder to be positioned under the electron column, and the sample holder is first passed under a vacuum buffer to remove air in the sample holder.

公开(公告)号：EP1891659A2

公开(公告)日：2008-02-27

申请号：EP06772085.4

申请日：2006-06-02

Applicant: AXCELIS TECHNOLOGIES, INC.

Inventor： VANDERPOT, John ,  HUANG, YongZhang

IPC: H01J37/317 ,  H01J37/244

CPC classification number: H01J37/244 ,  H01J37/045 ,  H01J37/09 ,  H01J37/302 ,  H01J37/3171 ,  H01J2237/022 ,  H01J2237/026 ,  H01J2237/028 ,  H01J2237/30433 ,  H01J2237/31705

Abstract: A system, method, and apparatus for mitigating contamination during ion implantation are provided. An ion source (112) , end station (117) , and mass analyzer (106) positioned between the ion source and the end station are provided, wherein an ion beam (110) is formed from the ion source and travels through the mass analyzer to the end station. An ion beam dump assembly comprising a particle collector, particle attractor, and shield are associated with the mass analyzer, wherein an electrical potential of the particle attractor is operable to attract and constrain contamination particles within the particle collector, and wherein the shield is operable to shield the electrical potential of the particle attractor from an electrical potential of an ion beam within the mass analyzer.

公开(公告)号：EP1812945A2

公开(公告)日：2007-08-01

申请号：EP05821396.8

申请日：2005-11-03

Applicant: Omniprobe, Inc.

Inventor： MOORE, Thomas, M. ,  ZAYKOVA-FELDMAN, Lyudmila

IPC: H01J37/08

CPC classification number: H01J37/302 ,  B82Y15/00 ,  G01N1/32 ,  H01J37/20 ,  H01J37/22 ,  H01J37/3056 ,  H01J2237/20 ,  H01J2237/202 ,  H01J2237/204 ,  H01J2237/206 ,  H01J2237/208 ,  H01J2237/2482 ,  H01J2237/28 ,  H01J2237/30411 ,  H01J2237/30472 ,  H01J2237/31745

Abstract: An apparatus for performing automated in-situ lift-out of a sample (150) from a specimen (125) includes a computer (100) having a memory with computer-readable instructions, a stage (120) for a specimen (125) and a nano-manipulator (130). The stage (120) and the nano-manipulator (130) are controlled by motion controllers (110) connected to the computer (100). The nano-manipulator (130) has a probe tip (140) for attachment to samples (150) excised from the specimen (125). The computer-readable instructions include instructions to cause the stage motion controllers (110) and the nano-manipulator motion controllers (110), as well as an ion-beam source (170), to automatically perform in-situ lift-out of a sample (150) from the specimen (125).

公开(公告)号：EP1779403A1

公开(公告)日：2007-05-02

申请号：EP05765910.4

申请日：2005-07-05

Applicant: Cebt Co., Ltd.

Inventor： Kim, Ho Seob ,  Kim, Byeng Jin

IPC: H01J37/147

CPC classification number: H01J37/263 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/14 ,  H01J37/04 ,  H01J37/3007 ,  H01J37/302 ,  H01J37/3174 ,  H01J2237/1205 ,  H01J2237/248 ,  H01J2237/28 ,  H01J2237/31752

Abstract: Provided is a method for controlling electron beams in a multi-microcolumn, in which unit microcolumns having an electron emitter, a lens, and a deflector are arranged in an n x m matrix. A voltage is uniformly or differentially applied to each electron emitter or extractor. The same control voltage or different voltages are applied to a region at coordinates in a control division area of each extractor to deflect the electron beams. Lens layers not corresponding to the extractors are collectively or individually controlled so as to efficiently control the electron beams of the unit microcolumn. Further, a multi-microcolumn using the method is provided.