Abstract:
Strain gages (81, 82, 83) are adhered to protective layers (31, 32) and an active portion (2) of a laminated-structure (10) of the piezoelectric actuator, respectively. Since it is possible to measure a total amount of displacement of the protective layers (31, 32) and the active portion (2), the measured amount of displacement of the laminated structure (10) is accurate even if there are difference in strain due to temperature and stress between them. The same effect can be obtained for such actuator whose laminated structure (10) further includes any member such as temperature compensating member (19) of metal whose elastic modulus is different from that of the laminated structure.
Abstract:
An electro-distortion device used, for example, as an actuator in a dot matrix printing head includes a stack of laminations (21) made of an electro-distortion material such as a piezo-electric ceramic material, with respective electrodes (22) sandwiched between successive laminations, such that the application of an electrical potential difference across the or each lamination brings about a change in the extent of the stack, along its stacking axis. In order that short circuiting between respective electrodes is prevented, the electrodes and the laminations are surrounded by an insulating material (23) such as an epoxy resin, which is in turn preferably encased in metal (31).
Abstract:
Un aspect de l'invention concerne un procédé de correction des déformations de la surface d'un objet équipé d'un dispositif de correction des déformations, ledit dispositif de correction comportant une couche piézoélectrique comprenant une première surface et une deuxième surface, une première pluralité de pistes électriques disposée sur la première surface de la couche piézoélectrique, une deuxième pluralité de pistes électriques disposée sur la deuxième surface de la couche piézoélectrique, les pistes de la première pluralité formant une pluralité de lignes et les pistes de la deuxième pluralité formant une pluralité de colonnes, chaque colonne de la pluralité de colonnes étant perpendiculaires aux lignes de la pluralité de lignes, le croisement d'une ligne et d'une colonne formant un pixel. Le procédé selon l'invention comprend une première étape de mesure des déformations de la surface à corriger ; une deuxième étape d'identification des pixels nécessaires à la correction desdites déformations ; une troisième étape d'application pour chaque pixel identifié, par l'intermédiaire de la ligne et de la colonne correspondant audit pixel, d'un champ électrique supérieur au champ coercitif du matériau piézoélectrique de la couche piézoélectrique.
Abstract:
A device for measuring superfine particle masses, comprising an exposure system having at least two measurement chambers (1) with identical geometries, each comprising a deposition surface (4) for particles with a respective aerosol supply (9) directed toward said deposition surface, the aerosol supply having an outlet region (17) for the supply of an aerosol onto the deposition surface, wherein at least one of the deposition surfaces is formed on a piezoelectric crystal (5) as superfine weighing scale, and means for generating a potential difference between the particles in the gas and the deposition surfaces, wherein a potential of at most 50 V relative to ground potential is applied to each of the deposition surfaces, a grate is arranged over each of the deposition surfaces, and a potential with a potential difference of at least 200 V in relation to the potential of the deposition surfaces is applied to each of the grates, wherein an electric field is generated between the grates and the respective deposition surfaces.
Abstract:
An ultrasound probe including a backing layer provided with grooves in which a piezoelectric member is allowed to be installed and a manufacturing method thereof. The ultrasound probe includes the piezoelectric member, and the backing layer disposed on a rear-side surface of the piezoelectric member and provided, on a front-side surface thereof, with grooves in which the piezoelectric member is installed.
Abstract:
Die Erfindung betrifft einen Kraftstoffinjektor (10), insbesondere Common-Rail-Injektor, mit einem Injektorgehäuse (11), in dem ein Hochdruckraum (15) ausgebildet ist, der über eine im Injektorgehäuse (11) angeordnete Versorgungsbohrung (19) mit unter Druck stehendem Kraftstoff versorgbar ist, mit wenigstens einer zumindest mittelbar mit dem Hochdruckraum (15) verbundenen, im Injektorgehäuse (11) ausgebildeten Einspritzöffnung (12) zum Einspritzen von Kraftstoff in den Brennraum einer Brennkraftmaschine, mit einem die wenigstens eine Einspritzöffnung (12) freigebenden oder verschließenden Einspritzglied (16), und mit einer Messeinrichtung (30) zur zumindest mittelbaren Erfassung des Drucks im Hochdruckraum (15) oder der Versorgungsbohrung (19), wobei die Messeinrichtung (30) dazu ausgebildet ist, eine elastische Verformung eines zumindest mittelbar mit der Versorgungsbohrung (19) oder dem Hochdruckraum (15) in Wirkverbindung angeordneten Verformungsbereichs (27) zu erfassen, und wobei die Messeinrichtung (30) ein Piezoelement (41) aufweist, das in einem mit dem Injektorgehäuse (11) verbundenen Gehäuse (35) aufgenommen.
Abstract:
In one embodiment a pressure sensor (100) is provided. The pressure sensor (100) includes a housing (104) having an input port (102) configured to allow a media to enter the housing. A support (122) is mounted within the housing, the support defining a first aperture (112) extending therethrough. A stress isolation member (110) is mounted within the first aperture of the support, the stress isolation member defining a second aperture (108) extending therethrough, wherein the stress isolation member is composed of silicon. A sensor die (106) is bonded to the stress isolation member. The sensor die includes a silicon substrate having an insulator layer on a first side (105) of the silicon substrate; and sensing circuitry disposed in the insulator layer on the first side, wherein a second side of the silicon substrate is exposed to the second aperture of the stress isolation member and the second side is reverse of the first side.
Abstract:
Provided is an elastic wave device which can be used at high frequencies and in which the Q factor can be enhanced. An elastic wave device (1) includes a supporting substrate (2); a high-acoustic-velocity film (3) stacked on the supporting substrate (2), in which the acoustic velocity of a bulk wave propagating therein is higher than the acoustic velocity of an elastic wave propagating in a piezoelectric film (5); a low-acoustic-velocity film (4) stacked on the high-acoustic-velocity film (3), in which the acoustic velocity of a bulk wave propagating therein is lower than the acoustic velocity of a bulk wave propagating in the piezoelectric film (5); the piezoelectric film (5) stacked on the low-acoustic-velocity film (4); and an IDT electrode (6) stacked on a surface of the piezoelectric film (5).