公开(公告)号：EP3079014A2

公开(公告)日：2016-10-12

申请号：EP16162738.5

申请日：2016-03-30

申请人： Shin-Etsu Chemical Co., Ltd.

发明人： HORIKOSHI, Jun

IPC分类号： G03F1/64

CPC分类号： G03F1/64

摘要： An EUV pellicle is proposed in which the pellicle frame is made of a material having a linear expansion coefficient of 10 x 10 -6 (1/K) or smaller, and as such this pellicle is recommendable for use in EUV exposure technology wherein temperature is raised and lowered repeatedly and hence the expansion and contraction of the pellicle frame would harm the pellicle membrane and the pellicle flatness.

摘要翻译： 提出了一种EUV薄膜，其中薄膜框架由线膨胀系数为10×10 -6（1 / K）或更小的材料制成，因此这种薄膜被推荐用于EUV曝光技术，其中温度是 反复升高和降低，因此防护膜框架的膨胀和收缩会损坏防护膜和防护膜的平整度。

公开(公告)号：EP2896994A1

公开(公告)日：2015-07-22

申请号：EP15151391.8

申请日：2015-01-16

申请人： Shin-Etsu Chemical Co., Ltd.

发明人： Motoyuki, Yamada ,  Shoji, Akiyama

IPC分类号： G03F1/00 ,  G03F1/62 ,  G03F1/64 ,  G03F1/24

CPC分类号： G03F1/24 ,  G03F1/142 ,  G03F1/62 ,  G03F1/64

摘要： Here are disclosed a pellicle for EUV and an assembly made up of this pellicle and a mask, which brings about a projection of low contrast (intensity) shadows of a mesh structure on the mask, thus minimizing the adverse effect of the shadow on the lithographic printing; also a method for assembling such assembly is disclosed wherein the pellicle is rotated relative to the mask to minimize the shadow contrast, in terms of a contrast ratio, of the mesh structure; the angle of the rotation is 30 degrees or smaller, and the resultant contrast ratio should be 25 % or lower.

摘要翻译： 这里公开了一种用于EUV的防护薄膜组件和由该防护薄膜和掩模组成的组件，其导致在掩模上的网状结构的低对比度（强度）阴影的投影，从而最小化阴影对光刻的不利影响 印刷; 还公开了一种用于组装这种组件的方法，其中防护薄膜组件相对于掩模旋转以最小化网格结构的对比度的阴影对比度; 旋转角度为30度以下，对比度为25％以下。

公开(公告)号：EP2796925A3

公开(公告)日：2014-12-24

申请号：EP14161918.9

申请日：2014-03-27

申请人： Shin-Etsu Chemical Co., Ltd.

发明人： Kazutoshi, Sekihara

IPC分类号： G03F1/00 ,  G03F1/64

CPC分类号： G03F1/22 ,  G03F1/142 ,  G03F1/64 ,  Y10T428/24008

摘要： A pellicle was well as an assembly of photomask plus pellicle is proposed in which the conventional agglutinant layer which bonds the pellicle to photomask is replaced by male and female screws and elastic body layer; in particular the pellicle frame is screwed to the photomask while the sealing of the space within the pellicle frame is secured by the elastic body layer.

公开(公告)号：EP2793081A1

公开(公告)日：2014-10-22

申请号：EP14152984.2

申请日：2014-01-29

申请人： Shin-Etsu Chemical Co., Ltd.

发明人： KAZUTOSHI, Sekihara

IPC分类号： G03F1/64 ,  C23C4/08 ,  C23C4/18 ,  C23C28/00

CPC分类号： G03F7/70916 ,  C23C4/08 ,  C23C4/18 ,  C23C28/00 ,  G03F1/64

摘要： A pellicle is proposed in which the frame is made of an aluminum alloy and at least the inner wall of the frame is entirely coated with a pure aluminum layer, which preferably has a purity of 99.7% or higher and a thickness of 3 through 50 micrometers; the pellicle frame with the pure aluminum layer may be subjected to anodic oxidation treatment, electric coloring, and void filling, and a resin layer can be formed as the outermost layer.

摘要翻译： 提出了一种防护薄膜，其中框架由铝合金制成，并且至少框架的内壁完全涂覆有纯铝层，纯铝层优选具有99.7％或更高的纯度和3至50微米的厚度 ; 具有纯铝层的防护膜框架可以进行阳极氧化处理，电色和空隙填充，并且可以形成树脂层作为最外层。

公开(公告)号：EP2749945A2

公开(公告)日：2014-07-02

申请号：EP13195988.4

申请日：2013-12-06

申请人： Shin-Etsu Chemical Co., Ltd.

发明人： Toru, Shirasaki

IPC分类号： G03F1/00 ,  G03F1/64

CPC分类号： G03F1/64 ,  G03F1/142

摘要： There is provided a pellicle wherein the frame is cut with one or more slight-chamfers, and in particular the one cut along the inner edge of the upper annular face of the frame, to which the pellicle membrane is glued, has a slope greater than 45 degrees so that the pellicle membrane when slackened does not touch the lower ridge of the slight chamfer.

摘要翻译： 提供了一种薄膜，其中框架被一个或多个轻微倒角切割，并且特别是沿着框架的上部环形面的内边缘切割的薄膜，薄膜膜被胶合到薄膜上，其具有大于 45度，以便松弛时的薄膜不会碰到轻微倒角的下棱线。

公开(公告)号：EP2592123A4

公开(公告)日：2014-01-29

申请号：EP11803292

申请日：2011-06-29

申请人： MITSUI CHEMICALS INC

发明人： TANEICHI DAIKI ,  KOZEKI TAKASHI ,  KOIDE AKIHIRO

IPC分类号： C09J133/00 ,  C09J109/00 ,  C09J125/08 ,  C09J133/06 ,  C09J153/00 ,  G03F1/64

CPC分类号： G03F1/62 ,  C08L23/20 ,  C08L57/02 ,  C08L91/06 ,  C08L2205/02 ,  C09J135/06 ,  C09J153/025 ,  G03F1/64

摘要： The purpose is to provide a pellicle which has a mask adhesive layer that can be plastic-deformed readily particularly at a temperature at which exposure to light is carried out, rarely remains an adhesive agent upon the removal of the mask adhesive layer from a mask and has good handling properties, and which can prevent the position gap of a pattern. For achieving the purpose, a pellicle (10) is provided, which comprises a pellicle frame (14), a pellicle membrane (12) and a mask adhesive layer (15) containing a mask adhesive agent. The mask adhesive agent comprises 100 parts by mass of a thermoplastic elastomer (A) having a tand peak temperature of -20 to 30 DEG C and 20 to 150 parts by mass of an adhesiveness-imparting resin (B).

公开(公告)号：EP2267528A3

公开(公告)日：2013-04-03

申请号：EP10167075.0

申请日：2010-06-23

申请人： Shin-Etsu Chemical Co., Ltd. ,  Intel Corporation (INTEL)

发明人： Shirasaki, Toru ,  Mushell, David ,  Chakravorty, Kishore ,  Ng, Grace

IPC分类号： G03F1/64

摘要： A pellicle frame is provided that includes a pellicle frame bar having a cross-section with a shape that has at least one triangular recess in at least one side edge of a quadrilateral having an upper edge and a lower edge parallel to each other and a cross-sectional area of no greater than 20 mm 2 . There is also provided a lithographic pellicle that includes a pellicle film stretched over one end face of the pellicle frame via a pellicle film adhesive, and that includes an exposure master plate adhesive on the other end face.

摘要翻译： 提供一种防护膜框架，其包括：防护膜框架杆，该防护膜框架杆的横截面形状具有在具有彼此平行的上边缘和下边缘的四边形的至少一个侧边缘中具有至少一个三角形凹部的形状; - 面积不大于20平方毫米。 还提供了一种平版印刷薄膜，其包括通过薄膜膜粘合剂在薄膜框架的一个端面上延伸的薄膜膜，并且在另一个端面上包括曝光主板粘合剂。

公开(公告)号：EP2518561A1

公开(公告)日：2012-10-31

申请号：EP12162067.8

申请日：2012-03-29

申请人： Shin-Etsu Chemical Co., Ltd.

发明人： Tsukada, Junichi ,  Shirasaki, Toru

IPC分类号： G03F1/62 ,  G03F1/64

CPC分类号： G03F1/64 ,  G03F1/62

摘要： A pellicle for lithography, in which an agglutinant layer is so controlled that the deformation of the pellicle frame is prevented from transferring to an exposure original plate to which the pellicle is attached so that pattern transferred scarcely undergoes deformation; in particular the agglutinant layer has a Young's modulus of 0.02 to 0.08 MPa and a tensile bond strength of 0.04 to 0.08 N/mm 2 .

摘要翻译： 一种用于平版印刷的防护膜，其中粘合剂层被如此控制，使得防护膜框架的变形不会转移到附着有防护膜的曝光原版上，从而图案几乎不转变; 特别是粘合剂层具有0.02至0.08MPa的杨氏模量和0.04至0.08N / mm 2的拉伸粘合强度。

公开(公告)号：EP2555052B1

公开(公告)日：2024-10-16

申请号：EP11765309.7

申请日：2011-03-10

发明人： AKIYAMA Shoji ,  KUBOTA Yoshihiro

IPC分类号： G03F1/24 ,  G03F1/62 ,  G03F1/64

公开(公告)号：EP4383007A1

公开(公告)日：2024-06-12

申请号：EP22853079.6

申请日：2022-08-03

申请人： SHIN-ETSU CHEMICAL CO., LTD.

发明人： KUBOTA, Yoshihiro ,  YANASE, Yu ,  TAKEUCHI, Ayano ,  NISHIMURA, Akinori

IPC分类号： G03F1/64 ,  G03F7/20

CPC分类号： G03F1/64 ,  G03F7/20

摘要： [Object] To improve the performance of a filter for a vent hole, which penetrates a pellicle frame, in response to a reduction in the maximum allowable size of foreign matter, which is required especially in EUV exposure, and to a severe change in atmospheric pressure to which a pellicle film is to be exposed.
[Solution] A pellicle according to the present invention includes: a pellicle frame 3; a pellicle film 1 provided on an upper end surface of the pellicle frame; a vent hole 6 provided in the pellicle frame; and a filter 7 that closes the vent hole. The filter includes a non-woven fabric composed partly or entirely of at least one of nanofibers and carbon nanotubes.