-
公开(公告)号：EP3426615A1
公开(公告)日：2019-01-16
申请号：EP17713793.2
申请日：2017-02-23
-
公开(公告)号：EP3424933A1
公开(公告)日：2019-01-09
申请号：EP18186240.0
申请日：2014-04-23
发明人： HIROKAMI, Munenao
摘要： Mercapto-containing organosilicon compounds of formula (3) :
wherein each A independently is a straight or branched C 1 -C 8 alkylene group, each B independently is a straight or branched C 1 -C 8 alkylene group and each E independently is hydrogen or a substituent group of the general formula (4):
wherein D is straight or branched C 1 -C 8 alkylene group, each R independently is a hydrolysable group, each R' independently is a C 1 -C 4 alkyl group, and m is an integer of 1 to 3, provided that at least one E is a said substituent group of formula (4). They can be used as adhesion improvers for improving the adhesion of a resin to inorganic substrates.-
公开(公告)号：EP2929924B1
公开(公告)日：2019-01-09
申请号：EP15162557.1
申请日：2015-04-07
发明人： Sugahara, Hiroto , Minowa, Takehisa
-
公开(公告)号：EP3422099A1
公开(公告)日：2019-01-02
申请号：EP18176359.0
申请日：2018-06-06
发明人： OZAWA, Ryoken , KOSAKA, Takuro , INAZUKI, Yukio
摘要： A photomask blank for an exposure light of ArF excimer laser, including a transparent substrate (1) and a light-shielding film (2) containing molybdenum, silicon, and nitrogen. The light-shielding film is formed in a single layer or a multilayer composed of a single composition layer or a composition gradient layer, a reflectance of the light-shielding film on a side remote from the substrate is 40% or less, and among the refractive indexes at the surfaces on the substrate side and the side remote from the substrate of all layers, a difference between the highest and lowest refractive indexes is 0.2 or less, and among the extinction coefficients at the surfaces, a difference between the highest and lowest extinction coefficients is 0.5 or less. The light-shielding film assumes a satisfactory and undeteriorated sectional shape of a mask pattern in an etching process in mask processing or defect correcting.
-
公开(公告)号：EP3421477A1
公开(公告)日：2019-01-02
申请号：EP17756110.7
申请日：2017-01-31
发明人： TSUCHIDA, Osamu
IPC分类号： C07F7/10 , C08F30/08 , C08F299/08 , C08G77/388 , C08L83/08
摘要： Provided are: a novel imide-modified organopolysiloxane in a liquid form having excellent resistance to heat; a method for producing the organopolysiloxane; and a curable composition that contains the organopolysiloxane and that can be cured by irradiation with light without using an initiator.
The organopolysiloxane is represented by formula (1).
(Wherein: each R 1 represents an unsubstituted or substituted monovalent hydrocarbon group having 1-10 carbon atoms or an organic group having a structure represented by formula (2) or (3), and at least one of the R 1 s is the organic group having a structure represented by formula (2) or (3); a represents an integer of 2 or more; b, c, and d each represent an integer of 0 or more; and 2 ≤ a+b+c+d ≤ 1,000 is satisfied.)
(Wherein: R 2 -R 7 each represent a hydrogen atom or an unsubstituted or substituted monovalent hydrocarbon group having 1-10 carbon atoms; R 2 or R 3 may be linked with R 4 or R 5 to form a ring, and R 6 may be linked with R 7 to form a ring; m and n each represent an integer of 0-3; and X and Y each represent an unsubstituted or substituted divalent hydrocarbon group that has 1-10 carbon atoms and that optionally contains an intervening heteroatom. A dashed line represents a bond.)-
公开(公告)号：EP2610918B1
公开(公告)日：2018-12-05
申请号：EP11819820.9
申请日：2011-08-16
发明人： OOIWA, Hideo , WATABE, Takenori , OTSUKA, Hiroyuki , HARA, Kazuo
IPC分类号： H01L31/04
CPC分类号： H01L31/065 , H01L29/045 , H01L29/0657 , H01L31/02168 , H01L31/022433 , H01L31/0352 , H01L31/035281 , H01L31/068 , H01L31/182 , H01L31/186 , Y02E10/546 , Y02E10/547 , Y02P70/521
摘要： Provided is a substrate for a solar cell, wherein a flat chamfered portion is formed on one corner of a silicon substrate having a square shape in a planar view, or a notch is formed on the corner or close to the corner. This invention makes it possible to easily check the position of the substrate and determine the direction of the substrate in a solar cell manufacturing step, and suppresses failures generated due to the direction of the substrate.
-
公开(公告)号：EP3404068A1
公开(公告)日：2018-11-21
申请号：EP17738336.1
申请日：2017-01-06
发明人： TAKADA Yuko , AOKI Shunji
IPC分类号： C08L83/12 , C08L83/04 , C08L101/00
CPC分类号： C08L83/04 , C08L83/12 , C08L101/00
摘要： An organopolysiloxane emulsion composition which contains a polyoxyalkylene-modified organopolysiloxane compound represented by formula (1) as an emulsifying agent or as an emulsifying assistant.
(LR 2 SiO 1/2 ) a (R 3 SiO 1/2 ) b (R 2 SiO 2/2 ) c (RSiO 3/2 ) d (SiO 4/2 ) e (1)
(In the formula, L represents a polyoxyalkylene group represented by formula (2); R represents a hydrogen atom, a hydroxy group, an alkyl group, an aryl group, an aralkyl group or an alkoxy group; a represents a number of 2-4; b represents a number of 0-2; c represents a number of 50-1,000; and each of d and e represents 0 or 1.)
-H 2 C-CH 2 -(CH 2 ) r -O-(EO) s -(AO) t -R 1 (2)
(In formula (2), EO represents an oxyethylene group; AO represents a linear or branched oxyalkylene group having 3-10 carbon atoms; R 1 represents an alkyl group, a hydrogen atom, a carboxy group, an acyl group or a phenyl group; r represents a number of 0-10; s represents a number of 1-100, t represents a number of 0-150; and (s+t) represents a number of 15 or more.)-
公开(公告)号：EP2963047B1
公开(公告)日：2018-11-14
申请号：EP14757365.3
申请日：2014-02-26
IPC分类号： B01J31/22 , C07C13/10 , C07C13/18 , C07C15/073 , C07C15/18 , C07C29/14 , C07C29/143 , C07C29/147 , C07C31/135 , C07C33/20 , C07C41/26 , C07C43/23 , C07C209/50 , C07C211/27 , C07C211/29 , C07C213/00 , C07C217/58 , B01J31/16 , B01J31/20 , C07C41/18 , C07F15/02
CPC分类号： B01J31/1608 , B01J31/20 , B01J31/226 , B01J2231/323 , B01J2231/643 , B01J2231/645 , B01J2531/842 , C07C5/03 , C07C29/14 , C07C29/147 , C07C41/18 , C07C41/26 , C07C209/50 , C07C213/00 , C07C213/02 , C07C227/06 , C07C227/16 , C07C227/18 , C07C2531/16 , C07C2531/20 , C07C2531/22 , C07C2601/08 , C07C2601/14 , C07D223/04 , C07F7/0805 , C07F7/0829 , C07F15/02 , Y02P20/52 , C07C43/23 , C07C9/16 , C07C13/18 , C07C13/10 , C07C15/073 , C07C15/18 , C07C211/29 , C07C211/27 , C07C217/58 , C07C229/38 , C07C33/20 , C07C31/1355
摘要： Provided is a mononuclear iron complex that comprises an iron-silicon bond that is represented by formula (1) and that exhibits excellent catalyst activity in each of a hydrosilylation reaction, a hydrogenation reaction, and reduction of a carbonyl compound. In formula (1), R 1 -R 6 either independently represent an alkyl group, an aryl group, an aralkyl group or the like that may be substituted with a hydrogen atom or X, or represent a crosslinking substituent in which at least one pair comprising one of R 1 -R 3 and one of R 4 -R 6 is combined. X represents a halogen atom, an organoxy group, or the like. L represents a two-electron ligand other than CO. When a plurality of L are present, the plurality of L may be the same as or different from each other. When two L are present, the two L may be bonded to each other. n and m independently represent an integer of 1 to 3 with the stipulation that n+m equals 3 or 4.
-
公开(公告)号：EP2963046B1
公开(公告)日：2018-10-17
申请号：EP14756744.0
申请日：2014-02-26
IPC分类号： C07F19/00 , B01J31/22 , C07C5/03 , C07C9/16 , C07C13/10 , C07C13/18 , C07C15/073 , C07C15/18 , C07C209/50 , C07C211/27 , C07C211/29 , C07C213/00 , C07C217/58 , C07D223/04 , C07F7/08 , C07B61/00 , C07F15/00
CPC分类号： B01J31/1608 , B01J31/22 , B01J2231/323 , B01J2231/643 , B01J2231/645 , B01J2531/821 , C07C5/03 , C07C9/16 , C07C13/10 , C07C13/18 , C07C15/073 , C07C15/18 , C07C29/14 , C07C209/50 , C07C213/00 , C07C2531/16 , C07C2531/22 , C07C2531/28 , C07C2601/08 , C07C2601/14 , C07D223/04 , C07F7/08 , C07F15/0046 , C07C217/58 , C07C211/29 , C07C211/27 , C07C9/18
摘要： Provided is a mononuclear ruthenium complex that comprises a ruthenium-silicon bond that is represented by formula (1) and that exhibits excellent catalyst activity in each of a hydrosilylation reaction, a hydrogenation reaction, and reduction of a carbonyl compound. In formula (1), R 1 -R 6 either independently represent an alkyl group, an aryl group, an aralkyl group or the like that may be substituted with a hydrogen atom or X, or represent a crosslinking substituent in which at least one pair comprising one of R 1 -R 3 and one of R 4 -R 6 is combined. X represents a halogen atom, an organoxy group, or the like. L represents a two-electron ligand other than CO and phosphine. When a plurality of L are present, the plurality of L may be the same as or different from each other. When two L are present, the two L may be bonded to each other. n and m independently represent an integer of 1 to 3 with the stipulation that n+m equals 3 or 4.
-
公开(公告)号：EP3385359A1
公开(公告)日：2018-10-10
申请号：EP16870741.2
申请日：2016-11-30
摘要： Docosahexaenoic acid-containing oil containing docosahexaenoic acid in a concentration of 40 wt.% or more of the total weight of fatty acids in the oil, and having an endothermic peak temperature determined by differential scanning calorimetry (DSC) of 15°C or lower; a biomass including the same; and a method for producing docosahexaenoic acid-containing oil including obtaining a biomass by culturing microorganisms of the genus Aurantiochytrium capable of producing this docosahexaenoic acid-containing oil, recovering the biomass after culture, and extracting the oil from the biomass after recovery.
-
-
-
-
-
-
-
-
-
搜索结果
3881 条记录 (耗时 0.03 秒)
